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http://dx.doi.org/10.3795/KSME-A.2002.26.6.1001

Pyroelectric Peyformance Evaluation of Pure PZT and Alternately Deposited PZT/PT Thin Films  

Ko, Jong-Soo (한국전자통신연구원 원천기술연구소)
Kwak, Byung-Man (한국과학기술원 기계공학과)
Publication Information
Transactions of the Korean Society of Mechanical Engineers A / v.26, no.6, 2002 , pp. 1001-1007 More about this Journal
Abstract
To improve the performance of the PZT thin flms, each PZT and PT layer was alternately deposited on a Pt/Ti/Si$_3$N$_4$/SiO$_2$/Si substrate by a modified sol-gel solid precursor technique. For comparison, PZT thin films were also prepared with an identical method under the same conditions. XRD measurement revealed that the diffraction pattern of the multilayer film was due to the superimposition of the PZT and PT patterns. At 1㎑, a dielectric constant of 389 and 558, a dielectric loss of 1.2% and 1.1% were obtained for the PZT/PT and PZT thin films, respectively. If we consider the PT dielectric constant to be 260, it is clear that the dielectric constant of alternately deposited PZT/PT thin films was well adjusted. The PZT/PT thin film showed a low dielectric constant and a similar dielectric loss compared with those of the PZT film. The figures of merit on detectivity for the PZT/PT and PZT thin films were 20.3$\times$10$\^$-6/㎩$\^$-$\sfrac{1}{2}$/, and 18.7$\times$10$\^$-6/㎩$\^$-$\sfrac{1}{2}$/, and the figures of merit on voltage response were 0.038㎡/C and 0.028 ㎡/C, respectively. The high figures of merit for the PZT/PT film were ascribed to its relatively low dielectric constant when compared to the PZT thin films.
Keywords
PZT Thin Film; Alternately Deposited PZT/PT Thin Film; Sol-Gel Method; Infrared Detector; Silicon Micromachining;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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