• 제목/요약/키워드: device degradation

검색결과 474건 처리시간 0.026초

A Method to Predict the Performance of a-Si TFT device

  • Shih, Ching-Chieh;Wei, Chun-Ching;Wu, Yang-En;Gan, Feng-Yuan
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.52-55
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    • 2006
  • The driving-current degradation of a-Si:H thin-film transistor(TFT) device has been analyzed for the first time. A method to analyze the performance of TFT circuits is presented, which is different from the conventional one by threshold voltage shift method. It can be also used to evaluate the performance of gate driver on array (GOA) circuit, which is integrated in a 12.1" WXGA ($1280{\ast}3{\ast}800$) TFT-LCD panel.

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Separation and Quantification of Parasitic Resistance in Nano-scale Silicon MOSFET

  • Lee Jun-Ha;Lee Hoong-Joo;Song Young-Jin;Yoon Young-Sik
    • KIEE International Transactions on Electrophysics and Applications
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    • 제5C권2호
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    • pp.49-53
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    • 2005
  • The current drive in a MOSFET is limited by the intrinsic channel resistance. All other parasitic elements in a device structure perform significant functions leading to degradation in the device performance. These other resistances must be less than 10$\%$-20$\%$ of the channel resistance. To meet the necessary requirements, the methodology of separation and quantification of those resistances should be investigated. In this paper, we developed an extraction method for the resistances using calibrated TCAD simulation. The resistance of the extension region is also partially determined by the formation of a surface accumulation region that gathers below the gate in the tail region of the extension profile. This resistance is strongly affected by the abruptness of the extension profile because the steeper the profile is, the shorter this accumulation region will be.

A Study on the Hot Carrier Effect Improvement by HLDBD (High-temperature Low pressure Dielectric Buffered Deposition)

  • Lee, Yong-Hui;Kim, Hyeon-Ho;Woo, Kyong-Whan;Kim, Hyeon-Ki;Yi, Jae-Young;Yi, Cheon-Hee
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2002년도 ITC-CSCC -2
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    • pp.1042-1045
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    • 2002
  • The scaling of device dimension and supply voltage with high performance and reliability has been the main subject in the evolution of VLSI technology, The MOSFET structures become susceptible to high field related reliability problems such as hot-electron induced device degradation and dielectric breakdown. HLDBD(HLD Buffered Deposition) is used to decrease junction electric field in this paper. Also we compared the hot carrier characteristics of HLDBD and conventional.

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ZnSSe:Te계 청 -녹색 발광다이오드의 고효율화 및 장수명화에 관한 연구 (Study of High-efficiency and Long-lived Blue - Green Light Emitting Diodes Using ZnSSe:Te System Grown by MBE)

  • 이홍찬;이상태;이성근;김윤식
    • 한국마린엔지니어링학회:학술대회논문집
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    • 한국마린엔지니어링학회 2002년도 춘계학술대회논문집
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    • pp.167-171
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    • 2002
  • We have investigated the optical properties of Te-doped ZnSSe:Te epitaxial layers grown on (100) GaAs substrates by molecular beam epitaxy. The Te-doped ternary specimen shows strong blue or green emission (at 300k) which is assigned to Te$_{1}$ or Te$_{n}$( n$\geq$2) cluster bound exciton. Bright green and blue light-emitting diodes (LEDs) have been developed using ZnSSe:Te system as an active layer. The green LEDs exhibit a fairly long device lifetime (>2000 h) when operated at 3 A/cm$^{2}$ under CW condition at room temperature. It is confirmed that the Te-doping induced "crystal-hardening effect" plays a significant role in both efficient and strong suppression of the optical device degradation.gradation.

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Simplified Ground-type Single-plate Electrowetting Device for Droplet Transport

  • Chang, Jong-Hyeon;Kim, Dong-Sik;Pak, James Jung-Ho
    • Journal of Electrical Engineering and Technology
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    • 제6권3호
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    • pp.402-407
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    • 2011
  • The current paper describes a simpler ground-type, single-plate electrowetting configuration for droplet transport in digital microfluidics without performance degradation. The simplified fabrication process is achieved with two photolithography steps. The first step simultaneously patterns both a control electrode array and a reference electrode on a substrate. The second step patterns a dielectric layer at the top to expose the reference electrode for grounding the liquid droplet. In the experiment, a $5{\mu}m$ thick photo-imageable polyimide, with a 3.3 dielectric constant, is used as the dielectric layer. A 10 nm Teflon-AF is coated to obtain a hydrophobic surface with a high water advancing angle of $116^{\circ}$ and a small contact angle hysteresis of $5^{\circ}$. The droplet movement of 1 mM methylene blue on this simplified device is successfully demonstrated at control voltages above the required 45 V to overcome the contact angle hysteresis.

나노미터 MOSFET 파워 게이팅 구조의 노화 현상 분석 (Analysis of Aging Phenomena in Nanomneter MOSFET Power Gating Structure)

  • 이진경;김경기
    • 센서학회지
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    • 제26권4호
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    • pp.292-296
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    • 2017
  • It has become ever harder to design reliable circuits with each nanometer technology node under normal operation conditions, a transistor device can be affected by various aging effects resulting in performance degradation and eventually design failure. The reliability (aging) effect has traditionally been the area of process engineers. However, in the future, even the smallest of variations can slow down a transistor's switching speed, and an aging device may not perform adequately at a very low voltage. Because of such dilemmas, the transistor aging is emerging as a circuit designer's problem. Therefore, in this paper, the impact of aging effects on the delay and power dissipation of digital circuits by using nanomneter MOSFET power gating structure has been analyzed.. Based on this analyzed aging models, a reliable digital circuits can be designed.

실리콘 액정표시 장치 시스템을 위한 00.5μm 이중 게이트 고전압 CMOS 공정 연구 (A Study on the 0.5μm Dual Gate High Voltage CMOS Process for Si Liquid Display System)

  • 송한정
    • 한국전기전자재료학회논문지
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    • 제15권12호
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    • pp.1021-1026
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    • 2002
  • As the development of semiconductor process technology continue to advance, ICs continue their trend toward higher performance low power system-on-chip (SOC). These circuits require on board multi power supply. In this paper, a 0.5 ㎛ dual date oxide CMOS Process technology for multi-power application is demonstrated. 5 V and 20 V devices fabricated by proposed process is measured. From 5 V devices using dual gate precess, we got almost the same characteristics as are obtained from standard 5 V devices. And the characteristics of the 20 V device demonstrates that 3 ㎛ devices with minimum gate length are available without reliability degradation. Electrical parameters in minimum 3 ㎛ devices are 520 ㎂/㎛ current density, 120 ㎷ DIBL, 24 V BV for NMOS and ,350 ㎂/㎛ current density, 180 ㎷ DIBL, 26 V BV for PMOS, respectively.

고온초전도 박막을 이용한 두 고리형 공진소자의 고주파 특성 (Microwave performance of High Tc Superconducting Double Ring Resonator)

  • 송승용;이조용;최선웅;송기영
    • 한국재료학회지
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    • 제7권5호
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    • pp.431-433
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    • 1997
  • We investigated a double ring resonator(DRR)device to improve the resonating Q value of a superconductor resonator. To make a DRR device, we made a large area YBCO film on a MgO substrate by pulsed laser deposition(PLD). Thetransition temperature was 88 K and the film was uniformly deposited. We also deposited 500$\AA$SrTiO$_{3}$on the YBCO thin film to protect the superconducting properties from degradation. The loaded Q value was measured as 50000 from simulation and as 2000 from experiment near 10GHz at 77K.

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무선랜에서 주기적인 채널탐색이 TCP 처리율에 미치는 영향 (Impact of Periodic Channel Scanning on the TCP Throughput in a WLAN)

  • 황재룡;최재혁
    • 한국통신학회논문지
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    • 제41권1호
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    • pp.107-109
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    • 2016
  • 본 논문은 모바일 환경의 무선랜 사용자들이 주기적인 채널 탐색을 통해 새로운 AP를 찾고자 할 경우 TCP 처리율 측면에서 발생할 수 있는 문제점을 살펴보고 그 원인에 대하여 분석한다. 실험을 통하여 채널 탐색 주기에 따른 TCP 처리율을 측정하였으며, 짧은 주기에 큰 성능저하가 발생하였다. 이것은 모바일 노드의 채널 전환에도 불구하고 AP로부터 전송에 의해 패킷 손실이 발생하기 때문이다.

고휘도 발광을 위한 유기 EL 소자 제작 (The fabrication of organic EL device for high contrast)

  • 여철호;손철호;박정일;장선주;박종화;이영종;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.166-169
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    • 2000
  • The Organic Electroluminescence (OEL) device, that was consisted of ALq3(8-hydroxyquinoline aluminum) and TPD(N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1,1'-biphenyl-4,4'-diamine), has been used. We investigated characteristics of brightness and current density about OEL that was oxidated each layers. We used two samples that were fabricated each continuous and non-continuous method. Emission was observed above 10mA/$\textrm{cm}^2$ and luminance was measured to be 1530cd/$\textrm{cm}^2$ at a current density of 100mA/$\textrm{cm}^2$. A luminance of over 2600cd/$\textrm{cm}^2$ was also observed after the final fabrication process.

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