• 디지털산업정보학회논문지
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• 제15권4호
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• pp.63-70
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• 2019

The subject of the simultaneous measuring system of base pattern and deposition pattern is a new research topic on a defect inspection of OLED. In this paper, we propose a new OLED inspection method that simultaneously measures standard and deposition pattern images. This method reduces unnecessary processes and tac time during OLED inspection. For an additional reduction of the tac time during pattern measurement, the ROI was configured to measure only in the designated ROI area instead of measuring the entire area of an image. During the ROI set-up, the value of effective deposition pattern area is included so that if the deposition pattern is out of the ROI zone, it would be treated as a defect before measuring the size and center point of the pattern. As a result, the tac time and inspection process could be shortened. The proposed method also could be applied to the OLED manufacturing process. Production of OLED could be increased by reducing tac time and inspection process.

• 한국멀티미디어학회논문지
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• 제22권2호
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• pp.117-127
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• 2019

Simultaneous pattern measurement system is new research subject for OLED panel inspection. It is defect inspection of OLED panel after deposition. This research suggests the system that calculates the size and center point of each patterns after obtaining standard and deposition pattern as one image. This system could be applied to OLED manufacturing process. The research result shows that the size and center point of each patterns could be obtained by displaying the standard pattern and deposition pattern in one image.

• Applied Science and Convergence Technology
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• 제26권6호
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• pp.184-188
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• 2017

Polymer deposition pattern on the ceramic lid surface is analyzed by numerical modeling. Assumption was made that is affected by gas flow pattern from the horizontal and vertical nozzles, temperature profile from the finger-like branches made of graphite and electrostatic potential effect. Calculated results showed gas flow dynamics is less relevant than two others. Temperature and electrostatic effects are likely determining the polymer deposition pattern based on our numerical simulation results.

• Journal of Periodontal and Implant Science
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• 제24권1호
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• pp.1-14
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• 1994

Dental calculus which is calcifing and/or calcified dental plaque is divided into supragingival calculus and subgingival calculus according to the position of deposit to gingival margin. Subgingival calculus has more important clinical significance in diagnosis and treatment of periodontal disease than supragingival calculus. In order to investigate the deposition pattern of subgingival calculus on each root surface of different tooth type, extracted 192 teeth due to excessive destruction of periodontal tissue were divided according to tooth type and the deposition pattern of subgingival calculus was classified into linear type, veneer type, scattered type, and aggregated type according to the configuration and the extent of deposit. The difference of percentage between each deposition pattern was statistically analyzed by Chi-Square test. Following results were obtained : l. In maxillary incisors, linear type and aggregated type were predominant deposition pattern of subgingival calculus on labial(45.5%, 36.4%) and palatal(36.4%, 36.4%) root surface, aggreated type(72.7%) was on mesial surface, and aggregated type(54.5%) and scattered type(36.4%) was on distal suface. 2. In mandibular incisors, scattered type, linear type and aggregated type were predominant deposition pattern of subgingival calculus on labial(33.3%, 30.6%, 27.8%) and lingual(36.1%, 30.6%, 25.0%) root surface, aggregated type(33.3%), scattered type(27.8% ), and veneer type(27.8%) were on mesial surface, and aggregated type(38.9%) and scattered type(33.3%) on distal surface. 3. In maxillary peremolars, the predominant deposition patterns of subgingival calculus were linear type(28.6%) on buccal root suface, scattered type(35.7%) and linear type(28.6%) on palatal surface, scattered type(39.3%) on mesial surface, aggregated type(46.4%) on distal surface, and aggregated type(53.6%) on furcation area. 4. In mandibular premolars, scattered type was predominant deposition pattern of subgingival calculus on buccal(39.3%) and lingual(50.0%) root surface, scattered type(32.1%) and aggregated type(32.1% ) were on mesial surface, and aggregated type(42.9%) was on distal surface. 5. In maxillary molars, aggregated type(40.0%) and scattered type(32.5%) were predominat deposition pattern of subgingival calculus on buccal root surface, aggregated type was on distal(40.0%) and furcation area(50.0%), but there was no predominat pattern on palatal and mesial root surfaces. 6. In mandibular molars, aggregated type(39.5%) and scattered type(28.9%) were predominant deposition patterns of subgingival calculus on buccal root surface, aggregated type(36.8%) was on lingual surface, linear type(39.5%) and aggregated type(34.2%) were on furcation area, but there was no predominant pattern on mesial and distal root surfaces.

• 한국환경과학회지
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• 제11권12호
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• pp.1235-1242
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• 2002

The purpose of this study is to estimate wet deposition flux and to investigate wet deposition characteristics by using the ADOM model. Wet deposition flux of highly reactive $SO_2$ is estimated by applying observed meteorological parameters and concentrations of chemical species to the ADOM model. Wet deposition is largely dependent on large scale precipitation and cloud thickness. Wet deposition flux of sulfate depends on $SO_2$ oxidation in clouds. When large amount of $SO_2$ is converted to sulfate, deposition flux of sulfate increases, but wet deposition flux of $SO_2$ is small. On the whole, the pattern of sulfate wet deposition flux agrees with the typical pattern of sulfate wet deposition that is high in the summer(July) and low in the winter(January).

• 환경영향평가
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• 제8권1호
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• pp.1-16
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• 1999

The acid deposition and photochemical modeling study was performed on the Eastern Asia using Regional Acid Deposition Model(RADM). The results of this study show that horizontal distribution of $SO_2$, concentration and dry deposition flux was higher in Beking, Shanghai and central part of Korea. However distribution pattern of sulfate and $O_3$ concentration calculated by RADM were not similar to emission pattern. In daytime, $SO_2$, sulfate and $O_3$ were mixed to whole PBL but in nighttime because of inversion layer these pollutants were suppressed to lower level.

• 한국정밀공학회지
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• 제29권6호
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• pp.686-692
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• 2012

Solid free-form fabrication (SFF) technology was developed to fabricate three-dimensional (3D) scaffolds for tissue engineering (TE) applications. In this study, we developed a polymer deposition system (PDS) and created 3D microstructures using a bioresorbable polycaprolactone (PCL) polymer. Fabrication of 3D scaffolds by PDS requires a combination of several devices, including a heating system, dispenser, and motion controller. The system can process a polymer with extremely high precision by using a 200 ${\mu}m$ nozzle. Based on scanning electron microscope (SEM) images, both the line width and the piled line height were fine and uniform. Several 3D micro-structures, including the ANU pattern (a pattern named after Andong National University), $45^{\circ}$ pattern square, frame, cylindrical, triangular, cross-shaped, and hexagon, have been fabricated using the polymer deposition system.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.369-369
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• 2012

The present work deals with selective deposition of copper on fluoropolymers patterned silicon (111) surfaces. The pattern of fluoropolymer was fabricated by nanoimprint lithography (NIL) and plasma reactive ion etching (RIE) was used to remove the residuals layers. Copper was electrochemically deposited in bare Si regions which were not covered with fluoropolymers. The patterns of fluoropolymers and copper have been investigated by scanning electron microscopy (SEM). In this work, we used two deposition methods. One is galvanic displacement method and another is electrodeposition. Selective deposition works in both cases and it shows applicability to other materials. By optimization of the deposition conditions can be achieved therefore this process represents a simple approach for a direct high resolution patterning of silicon surfaces.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2012년도 춘계학술대회 논문집
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• pp.151-152
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• 2012

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2013년도 춘계학술대회 논문집
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• pp.221-222
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• 2013