• 제목/요약/키워드: deposition

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초음파 풍속온도계를 이용한 $SO_2$건성침착속도의 계절변화 특징 (Seasonal Variations of $SO_2$Dry Deposition Velocity Obtained by Sonic Anemometer-Thermometer)

  • 이종범;박세영
    • 한국대기환경학회지
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    • 제14권5호
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    • pp.465-478
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    • 1998
  • In this study, seasonal variations of the dry deposition velocity and deposition flux for the sulfur dioxide were analysed. The field observation was performed during one year (from November 1, 1995 to October 31, 1996) in Chunchon basin. The turbulence data were measured by 3-dimensional sonic anemometer/thermometer, and were estimated by mean meteorological data obtained at two heights (2.5 m and 10 m) of meteorological tower. Also, the estimation methods were evaluated by comparing the turbulence data. The results showed that the estimated dry deposition velocity and turbulence parameter such as uc and sensible heat flux using mean meteorological data were relatively similar to the sonic measurements, but all showed somewhat large differences. The dry deposition velocity was large in summer and small in winter mainly due to canopy resistance (rc). The major factor which affects diurnal variation of the velocity was aerodynamic resistance (rw). The SO2 dry deposition flux was large in winter and small in summer in Chunchon.

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PECVD법에 의해 제조된 Sb-doped $SnO_2$ 박막의 증착거동 및 전기적 특성 (Deposition Behaviors and Electrical Properties of Sb-doped $SnO_2$ Films by Plasma Enhanced Chemical Vapor Deposition)

  • 김근수;서지윤;이희영;김광호
    • 한국세라믹학회지
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    • 제37권2호
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    • pp.194-200
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    • 2000
  • Sb-doped tin oxide films were deposited on Corning glass 1737 substrate by plasma enhanced chemical vapor deposition(PECVD) technique using a gas mixture of SnCl4/SbCl5/O2/Ar. The deposition behaviors of tin oxide films by PECVD were compared with those by thermal CVD, and effects of deposition temperature, r.f. power and Sb doping on the electrical properties of tin oxide films were investigated. PECVD technique largely increased the deposition rate and smoothed the surface of tin oxide films compared with thermal CVD. Electrical resistivity decreased with doping of Sb due to the increase of carrier concentration. However, large doping of Sb diminished carrier concentration and mobility due to the decrease of crystallinity, which resulted in the increase of electrical resistivity. As the deposition temperature and r.f. power increased, Cl content in the film decreased.

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Characteristics of Bi-superconducting Thin Films Prepared by Co- and Layer-by-Layer Deposition

  • Yang, Sung-Ho;Park, Yong-Pil
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 제2회 학술대회 논문집 일렉트렛트 및 응용기술전문연구회
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    • pp.40-44
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    • 2000
  • $Bi_2Sr_2Ca_nCu_{n+1}O_y$($n{\geq}0$; BSCCO)thin film is fabricated via two different processes using an ion beam sputtering method i.e. co-deposition and layer-by-layer deposition. A single phase of Bi2212 can be fabricated via the co-deposition process. While it cannot be obtained by the layer-by-layer process. Ultra-low growth rate in our ion beam sputtering system brings out the difference in Bi element adsorption between the two processes and results in only 30% adsorption against total incident Bi amount by layer-by-layer deposition, in contrast to enough Bi adsorption by co-deposition.

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Study on Improvement of Diamond Deposition on Al2O3 Ceramic Substrates by a DC Arc Plasmatron

  • Kang, In-Je;Joa, Sang-Beom;Chun, Se-Min;Lee, Heon-Ju
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.457-457
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    • 2012
  • We presented plasma processing using a DC Arc Plasmatron for diamond deposition on Al2O3 ceramic substrates. Plasma surface treatments were conducted to improve deposition condition before processing for diamond deposition. The Al2O3 ceramic substrates deposited, $5{\times}15mm^2$, were investigated by Scanning Electron Microscopy (SEM), Fourier Transform Infrared Spectroscopy (FTIR) and X-ray Diffraction (XRD). Properties of diamond (111), (220) and (311) peaks were shown in XRD. We identified nanocrystalline diamond films on substrates. The results showed that deposition rate was approximately $2.2{\mu}m/h$ after plasma surface treatments. Comparing the above result with a common processing, deposition rate was improved. Also, the surface condition was improved more than a common processing for diamond deposition on Al2O3 ceramic substrates.

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Optimization of auto-deposition for Po-210 in environmental sample

  • Lee, Myung-Ho;Cho, Hye-Ryun;Park, Kyoung-Kyun;Joe, Kih-Soo;Kim, Won-Ho;Jung, Euo-Chang;Jee, Kwang-Yong
    • 한국방사성폐기물학회:학술대회논문집
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    • 한국방사성폐기물학회 2007년도 학술논문요약집
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    • pp.327-328
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    • 2007
  • The deposition conditions for plating polonium have been optimized with deposition parameters such as pH, volume and temperature of the deposition and deposition time. In the tap water, the chemical yields of polonium forthe deposition solution adjusted to pH 0 were higher than those for the deposition solution adjusted to pH 2. This modified auto-deposition method made it possible to obtain reliable data of activity concentration of Po-210.

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화학증착법에 의해 성장된 TiO2박막의 증착기구와 표면형상에 미치는 증착조건의 영향 (Effect of Deposition Conditions on Deposition Mechanism and Surface Morphology of TiO2 Thin Films Deposited by Chemical Vapor Deposition)

  • 황철성;김형준
    • 한국세라믹학회지
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    • 제26권4호
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    • pp.539-549
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    • 1989
  • Polycrystalline TiO2 thin films were deposited on Si and Al2O3 substrates by CVD method. Ethyl titanate, Ti(OC2H5)4, was used as a source material for Ti and O, and Ar was used for carrier gas. In the surface chemical reaction controlled deposition condition, the apparent activation energy of 6.74 Kcal/mole was obtained, and the atomic adsorption on substrate surface was proved to be governed by Rideal-Elley mechanism. In the mass transfer controlled deposition condition, the deposition rate was in a good agreement with the result which was calculated by the simple boundary layer theory. It was also observed that TiO2 thin films show different surface morphology according to the different deposition mechanism, which was fixed by deposition conditions. This phenomenon could be well explained by the surface perturbation theory.

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정전효과를 고려한 반도체 웨이퍼의 입자침착 특성 (Particle Deposition Characteristics with Electrostatic Effect on Semiconductor Wafers)

  • 이건형;채승기;문영준
    • 대한설비공학회:학술대회논문집
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    • 대한설비공학회 2006년도 하계학술발표대회 논문집
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    • pp.779-785
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    • 2006
  • Particle transport and deposition characteristics on semiconductor wafers inside the chamber were experimentally investigated via a particle generation & deposition system and a wafer surface scanner. Especially the relation between particle size($0.083{\sim}0.495{\mu}m$) and particle deposition velocity with ESA(Electrostatic Attraction) effect was studied. Spot deposition technique with the deposition system using nozzle type outlets of the chamber was newly conducted to derive particle deposition velocity and all experiment results were compared with the previous study and were in a good agreement as well.

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A Study on the Remanufacturing for Drive Spur Gear in Planner Miller by Directed Energy Deposition

  • Jin, Chul-Kyu;Kim, Min-Woo;Woo, Jae-Hyeog
    • 한국산업융합학회 논문집
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    • 제25권6_1호
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    • pp.941-952
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    • 2022
  • In this study, additive manufacturing technology was applied to restore a planner miller that was unusable due to aging. The drive spur gear of the planner miller was inoperable due to many defects in the teeth. The shape of the defective gear teeth was restored by deposition of the defective teeth using the DED method. However, as the location of the deposition head and the location of the set origin became farther, the deposition shape was different from the modeling shape. Nonetheless, since the modeling of the deposition part was designed to be larger than the tooth shape of the original gear, it was possible to completely restore all gear teeth through post-processing. The arrangement interval of the flow lines of the deposition part was narrower than that of the substrate. The hardness of the substrate was 172 HV, and that of the deposition part was 345 HV, which was twice as high as that of the substrate.

VAD공정 관련 회전하는 원판으로의 입자 부착 (Particle deposition on a rotating disk in application to vapor deposition process (VAD))

  • 송창걸;황정호
    • 대한기계학회논문집B
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    • 제22권1호
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    • pp.61-69
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    • 1998
  • Vapor Axial Deposition (VAD), one of optical fiber preform fabrication processes, is performed by deposition of submicron-size silica particles that are synthesized by combustion of raw chemical materials. In this study, flow field is assumed to be a forced uniform flow perpendicularly impinging on a rotating disk. Similarity solutions obtained in our previous study are utilized to solve the particle transport equation. The particles are approximated to be in a polydisperse state that satisfies a lognormal size distribution. A moment model is used in order to predict distributions of particle number density and size simultaneously. Deposition of the particles on the disk is examined considering convection, Brownian diffusion, thermophoresis, and coagulation with variations of the forced flow velocity and the disk rotating velocity. The deposition rate and the efficiency directly increase as the flow velocity increases, resulting from that the increase of the forced flow velocity causes thinner thermal and diffusion boundary layer thicknesses and thus causes the increase of thermophoretic drift and Brownian diffusion of the particles toward the disk. However, the increase of the disk rotating speed does not result in the direct increase of the deposition rate and the deposition efficiency. Slower flow velocity causes extension of the time scale for coagulation and thus yields larger mean particle size and its geometric standard deviation at the deposition surface. In the case of coagulation starting farther from the deposition surface, coagulation effects increases, resulting in the increase of the particle size and the decrease of the deposition rate at the surface.

도심 지역의 다이옥신류 폴리염화비페닐류의 침적 플럭스 (Deposition flux of dioxin-like polychlorinated biphenyls(DLPCBs) in urban environment of Busan)

  • 문효방;이수정;최희구;옥곤
    • 한국환경과학회지
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    • 제13권5호
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    • pp.469-478
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    • 2004
  • Atmospheric bulk (wet and dry) samples were monthly collected in an urban environment (Daeyeon-dong) of Busan over a year, to assess the deposition flux and seasonality of dioxin-like polychlorinated biphenyls (DLPCBs) using stainless steel pots. Deposition fluxes of DLPCBs in bulk samples were determined using high resolution gas chromatography coupled to high resolution mass spectrometry (HRGC/HRMS). Particle deposition fluxes in the urban environment varied from 23 to 98 $mg^2$/year (mean 41 $gm^2$/year). DLPCB deposition fluxes in atmospheric bulk samples ranged from 0.09 to 0.77 ng-$TEQ/m^2$/year (mean 0.35 ng-$TEQ/m^2$/year). Seasonal atmospheric deposition fluxes of DLPCBs were high in winter and low in summer. Atmospheric deposition fluxes of particles and DLPCBs in this study were comparable to or slightly lower values than those of different locations in the world. Monthly DLPCB profiles in deposition bulk samples were similar over a year. Non-ortho PCBs were higher contributions to the total DLPCBs fluxes than mono-ortho PCBs. In particular, PCB 126 had the highest concentrartion (>75%) in all deposition samples, followed by PCB 169 and PCB 156. A highly positive correlation was found among the deposition fluxes of DLPCB species, suggesting the possibility of that the DLPCB contamination originated from one source. The deposition fluxes of DLPCBs were not significantly correlated with temperature and the amount of precipitation even though the summer season with the highest temperature and the largest amount of precipitation showed the lowest DLPCB deposition flux.