• Title/Summary/Keyword: deposited layer

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수열합성법으로 합성된 산화구리 나노막대의 일산화질소 가스 감지 특성 (Nitrogen Monoxide Gas Sensing Properties of CuO Nanorods Synthesized by a Hydrothermal Method)

  • 박수정;김효진;김도진
    • 한국재료학회지
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    • 제24권1호
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    • pp.19-24
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    • 2014
  • We report the nitrogen monoxide (NO) gas sensing properties of p-type CuO-nanorod-based gas sensors. We synthesized the p-type CuO nanorods with breadth of about 30 nm and length of about 330 nm by a hydrothermal method using an as-deposited CuO seed layer prepared on a $Si/SiO_2$ substrate by the sputtering method. We fabricated polycrystalline CuO nanorod arrays at $80^{\circ}C$ under the hydrothermal condition of 1:1 morality ratio between copper nitrate trihydrate [$Cu(NO_2)_2{\cdot}3H_2O$] and hexamethylenetetramine ($C_6H_{12}N_4$). Structural characterizations revealed that we prepared the pure CuO nanorod array of a monoclinic crystalline structure without any obvious formation of secondary phase. It was found from the gas sensing measurements that the p-type CuO nanorod gas sensors exhibited a maximum sensitivity to NO gas in dry air at an operating temperature as low as $200^{\circ}C$. We also found that these CuO nanorod gas sensors showed reversible and reliable electrical response to NO gas at a range of operating temperatures. These results would indicate some potential applications of the p-type semiconductor CuO nanorods as promising sensing materials for gas sensors, including various types of p-n junction gas sensors.

Sol-gel 및 CVD법을 이용한 고온 수소 분리용 silica/alumina 복합막의 합성 (Synthesis of Silica/Alumina Composite Membrane Using Sol-Gel and CVD Method for Hydrogen Purification at High Temperature)

  • 서봉국;이동욱;이규호
    • 멤브레인
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    • 제11권3호
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    • pp.124-132
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    • 2001
  • 고온에서 수소 분리 회수를 목적으로 silica/alumina 복합 막을 합성하였다. 막의 선택 투과 성능을 향상시키기 위해, sol-gel법에 의한 silica 및 alumina층을 중간층으로 도입하고, 그 위에 강제유동 CVD법에 의한 silica를 합성하였다. Sol-gel법에 의해 ${\alpha}$-alumina tube에 합성한 ${\gamma}$-alumina 및 silica 막은 Knudsen 확산 영역의 많은 mesopore를 포함하고 있어서 수소 선택 분리 막으로는 적합하지 못했다. 하지만, sol-gel법에 의해 합성한 silica/${\gamma}$-alumina층에 강제유동 CVD법으로 silica를 합성한 결과, 질소 투과 영역의 세공이 완전히 제거되어, 높은 수소 선택성을 가지는 복합 막이 형성되었다. 그 막은 온도에 따라 수소 투과 속도가 증가하여 $450^{\circ}C$에서 $5.57{\times}10^{-8}molm^2s^LPa^1$의 수소 투과 속도와, 9.52 kJ/mol의 활성화 에너지를 나타냈다. 분자체 효과에 의해 질소 투과가 완전히 배제되고, 수소만 선택적으로 투과되는 silica/alumina 복합막이 성공적으로 합성된다.

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$SiN_x$유전 보호막이 이동통신용 고주파 SAW필터의 특성에 미치는 영향 (The Effects of $SiN_x$ Dielectric Thin Films on SAW Properties of the High Frequency SAW Filter for Cellular Communication System)

  • 이용의;이재빈;김형준;김영진;양형국;박종철
    • 한국재료학회지
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    • 제5권6호
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    • pp.650-656
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    • 1995
  • 이동통신용 고주파 표면탄성파(SAW) 필터를 36$^{\circ}$Y-X LiTaO$_3$압전기판과 IIDT 전극구조를 이용하여 제작하였다. 제작한 SAW 필터의 중심주파수는 주파수 응답 특성 측정 결과 설계한 중심주파수보다 낮아짐이 관찰되었다. 이러한 단점을 보완하고 미세한 주파수의 조절을 가능하게 하기 위해 SiN$_{x}$ 유전박막을 보호막으로 증착하여 이에 따른 주파수 특성 변화를 관찰하였다. SAW파장에 대한 SiN$_{x}$ 유전 박막의 두께비를 증가시킬수록 SAW 진행 속도가 증가하여, 제조한 필터의 중심주파수를 높게 이동시킬 수 있었다. 그러나 유전박막의 두께가 증가할수록 필터의 삽입손실이 증가하는 문제점이 존재하였다.

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An Organic Electrophosphorescent Device Driven by All-Organic Thin-Film Transistor using Polymeric Gate Insulator

  • Pyo, S.W.;Shim, J.H.;Kim, Y.K.
    • Journal of Information Display
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    • 제4권2호
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    • pp.1-6
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    • 2003
  • In this paper, we demonstrate that the organic electrophosphorescent device is driven by the organic thin film transistor with spin-coated photoacryl gate insulator. It was found that electrical output characteristics in our organic thin film transistors using the staggered-inverted top-contact structure showed the non-saturated slope in the saturation region and the sub-threshold nonlinearity in the triode region, where we obtained the maximum power luminance that was about 90 $cd/m^2$. Field effect mobility, threshold voltage, and on-off current ratio in 0.45 ${\mu}m$ thick gate dielectric layer were 0.17 $cm^2/Vs$, -7 V, and $10^6$ , respectively. In order to form polyimide as a gate insulator, vapor deposition polymerization process was also introduced instead of spin-coating process, where polyimide film was co-deposited by high-vacuum thermal evaporation from 4,4'-oxydiphthalic anhydride (ODPA) and 4,4'-oxydianiline (ODA) and cured at 150${\sqsubset}$for 1hr. It was also found that field effect mobility, threshold voltage, on-off current ratio, and sub-threshold slope with 0.45 ${\mu}m$ thick gate dielectric films were 0.134 $cm^2/Vs$, -7 V, and $10^6$ A/A, and 1 V/decade, respectively.

다결정 CdTe박막의 저저항 접축을 위한 배선금속 및 열처리방법의 효과에 관한 연구 (Effects of lead metal and annealing methods on low resistance contact formation of polycrystalline CdTe thin film)

  • 김현수;이주훈;염근영
    • E2M - 전기 전자와 첨단 소재
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    • 제8권5호
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    • pp.619-625
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    • 1995
  • Polycrystalline CdTe thin film has been studied for photovoltaic application due to the 1.45 eV band gap energy ideal for solar energy conversion and high absorption coefficient. The formation of low resistance contact to p-CdTe is difficult because of large work function(>5.5eV). Common methods for ohmic contact to p-CdTe are to form a p+ region under the contact by in-diffusion of contact material to reduce the barrier height and modify a p-CdTe surface layer using chemical treatment. In this study, the surface chemical treatment of p CdTe was carried out by H$\_$3/PO$\_$4/+HNO$\_$3/ or K$\_$2/Cr$\_$2/O$\_$7/+H$\_$2/SO$\_$4/ solution to provide a Te-rich surface. And various thin film contact materials such as Cu, Au, and Cu/Au were deposited by E-beam evaporation to form ohmic contact to p-CdTe. After the metallization, post annealing was performed by oven heat treatment at 150.deg. C or by RTA(Rapid Thermal Annealing) at 250-350.deg. C. Surface chemical treatments of p-CdTe thin film improved metal/p-CdTe interface properties and post heat treatment resulted in low contact resistivity to p-CdTe.Of the various contact metal, Cu/Au and Cu show low contact resistance after oven and RTA post-heat treatments, respectively.

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Fabrication Technology of the Focusing Grating Coupler using Single-step Electron Beam Lithography

  • Kim, Tae-Youb;Kim, Yark-Yeon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Lim, Byeong-Ok;Kim, Sung-Chan;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Transactions on Electrical and Electronic Materials
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    • 제3권1호
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    • pp.30-37
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

스미어 현상이 발생한 암반에 근입된 현장타설말뚝의 주변부 거동예측을 위한 변수분석 (A Parametric Study for Estimating the Side Performance of Drilled Piers Socketed in Smeared Rock)

  • 김홍택;남열우
    • 한국지반환경공학회 논문집
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    • 제9권4호
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    • pp.5-13
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    • 2008
  • 충전물이 암 절리면의 전단강도를 감소시키는 것과 유사하게 콘크리트와 주변 암반근입부 사이의 연약한 물질은 암반에 근입된 현장타설말뚝의 주면저항력을 감소시킨다. 이러한 현상은 콘크리트 타설 후에 암반 근입부 측벽에서 천공잔류물이나 스미어 또는 재성형 암반을 생성시키는 시공과정에서도 형성되게 된다. 콘크리트 말뚝과 주변 암반 사이의 접촉면의 특성은 시공법에 따라서 크게 영향을 받는다. 콘크리트 타설과정 또는 그 이후 형성되는 연약한 물질이 존재하거나 거칠기와 같은 콘크리트-암 접촉면의 특성은 말뚝의 주면부 거동에 큰 영향을 미친다. 본 연구에서는 유한차분법 코드를 기반으로 하는 FLAC 2D를 이용하여 스미어현상이 발생한 암반에 근입된 현장타설말뚝의 거동특성을 조사하기 위하여 변수분석을 실시하였다. 본 연구의 결과로서, 정적연직하중을 받는 암반에 근입된 현장타설말뚝의 극한주면저항력에 영향을 미치는 요소와 말뚝두부의 침하에 영향을 미치는 요소들을 확인할 수 있었다.

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Effects of Lanthanides-Substitution on the Ferroelectric Properties of Bismuth Titanate Thin Films Prepared by MOCVD Process

  • Kim, Byong-Ho;Kang, Dong-Kyun
    • 한국세라믹학회지
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    • 제43권11호
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    • pp.688-692
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    • 2006
  • Ferroelectric lanthanides-substituted $Bi_4Ti_3O_{12}$ $(Bi_{4-x}Ln_xTi_3O_{12}, BLnT)$ thin films approximately 200 nm in thickness were deposited by metal organic chemical vapor deposition onto Pt(111)/Ti/SiO$_2$/Si(100) substrates. Many researchers reported that the lanthanides substitution for Bi in the pseudo-perovskite layer caused the distortion of TiO$_6$ octahedron in the a-b plane accompanied with a shift of the octahedron along the a-axis. In this study, the effect of lanthanides (Ln=Pr, Eu, Gd, Dy)-substitution and crystallization temperature on their ferroelectric properties of bismuth titanate $(Bi_4Ti_3O_{12}, BIT)$ thin films were investigated. As BLnT thin films were substituted to lanthanide elements (Pr, Eu, Gd, Dy) with a smaller ionic radius, the remnant polarization (2P$_r$) values had a tendency to increase and made an exception of the Eu-substituted case because $Bi_{4-x}Eu_xTi_3O_{12}$ (BET) thin films had the smaller grain sizes than the others. In this study, we confirmed that better ferroelectric properties can be expected for films composed of larger grains in bismuth layered peroskite materials. The crystallinity of the thin films was improved and the average grain size increased as the crystallization temperature,increased from 600 to 720$^{\circ}C$. Moreover, the BLnT thin film capacitor is characterized by well-saturated polarization-electric field (P-E) curves with an increase in annealing temperature. The BLnT thin films exhibited no significant degradation of switching charge for at least up to $1.0\times10^{11}$ switching cycles at a frequency of 1 MHz. From these results, we can suggest that the BLnT thin films are the suitable dielectric materials for ferroelectric random access memory applications.

Preparation and Electrochemical Performance of Electrode Supported La0.75Sr0.25Ga0.8Mg0.16Fe0.04O3-δ Solid Oxide Fuel Cells

  • Yu, Ji-Haeng;Park, Sang-Woon;Woo, Sang-Kuk
    • 한국세라믹학회지
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    • 제48권5호
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    • pp.479-484
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    • 2011
  • In this paper, investigations of thick film $La_{0.75}Sr_{0.25}Ga_{0.8}Mg_{0.16}Fe_{0.04}O_{3-{\delta}}$ (LSGMF) cells fabricated via spin coating on either NiO-YSZ anode or $La_{0.7}Sr_{0.3}Ga_{0.6}Fe_{0.4}O_3$ (LSGF) cathode substrates are presented. A La-doped $CeO_2$ (LDC) layer is inserted between NiO-YSZ and LSGMF in order to prevent reactions from occurring during co-firing. For the LSGF cathode-supported cell, no interlayer was required because the components of the cathode are the same as those of LSGMF with the exception of Mg. An LSGMF electrolyte slurry was deposited homogeneously on the porous supports via spin coating. The current-voltage characteristics of the anode and cathode supported LSGMF cells at temperatures between $700^{\circ}C$ and $850^{\circ}C$ are described. The LSGF cathode supported cell demonstrates a theoretical OCV and a power density of ~420 mW $cm^2$ at $800^{\circ}C$, whereas the NiO-YSZ anode supported cell with the LDC interlayer demonstrates a maximum power density of ~350 mW $cm^2$ at $800^{\circ}C$, which decreased more rapidly than the cathode supported cell despite the presence of the LDC interlayer. Potential causes of the degradation at temperatures over $700^{\circ}C$ are also discussed.

TiO2 박막의 온도에 따른 산소공공의 분포와 전기적인 특성사이의 상관성 (Relationship between Electrical Characteristics and Oxygen Vacancy in Accordance with Annealing Temperature of TiO2 Thin Film)

  • 오데레사
    • 한국정보통신학회논문지
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    • 제22권4호
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    • pp.664-669
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    • 2018
  • 본 연구는 투명산화물반도체의 전기적인 특성과 산소공공과의 관계를 알아보기 위해서 $TiO_2$ 박막을 증착하여 MIM 구조를 만들어서 전압전류 특성을 관찰하였다. 산소공공은 XPS분석으로 이루어졌으며, 커패시턴스를 측정하여 전하의 용량이 많은 곳에서 산소공공이 어떤 영향을 주는가에 대하여도 조사하였다. 열처리를 통하여 결정질구조로 변하는 $TiO_2$ 박막은 산소공공이 가장 낮은 곳에서 커패시턴스 값이 가장 높았으며, 전하의 양이 많았다. 따라서 전하의 양이 많은 $TiO_2$박막이 $CO_2$ 가스에 대하여 가장 잘 민감하게 반응하는 것을 확인하였다.