• Title/Summary/Keyword: delta-V

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Structural Analysis and Magnctic Propcrics of Amorphous $Fe_{78}Si_{9}B_{13}$ Alloy (비정질 $Fe_{78}Si_{9}B_{13}$ 합금의 구조와 자성 연구)

  • 이희복;송인명;유성초;임우영
    • Journal of the Korean Magnetics Society
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    • v.3 no.3
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    • pp.179-184
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    • 1993
  • The X-ray diffraction pattern of amorphous $Fe_{78}Si_{9}B_{13}$ alloy was analyzed to obtain the radial distribution function (RDF) where the first peak was in the form of Gaussian function. The calculated coordination number of the form of Gaussian functiono The calculated coordination number of the sample is 13.5, the mean distance betweeon near-neighbor atoms $r_{0}$ is $2.595{\AA}$ and a Gaussian parametet ${\delta}r$ indicating near-neighbor atomic distri-bution is $0.27{\AA}$. The temperature dependence of saturated magnetization at low temperature could be explained by spin wave excitations theory yielding the spin wave stiffness constant as $117.8\;meV\;{\AA}^2$. Also, we tried to fit the observed temperature dependence of saturated magnetization with the Handrich's equation of the modified molecular field theory for the amorphous ferromagnet. Nice fittings are obtained when we used the parameters ${\Delta}=0.32$(S=1/2) and ${\Delta}=0.23$(S=1), respectively. Finally, the calculated spin wave stiffness constant using the parameters and the structural data are $149\;meV\;{\AA}^2$ for S=1/2 and $138\;meV\;{\AA}^2$ for S=1, respectively. The mean exchange coupling integral between near-neighbor atoms was estimated to be 17.9 meV for S=1/2 and 6.7 meV for S=1.

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Stability of Tris(2-cyclohexylaminoethyl)amine-Zn(II) Complex (Tris(2-cyclohexylaminoethyl)amine-Zn(II) 착물의 안정성)

  • Yong Woon Shin;Hyun Sook Baek;Jae-Kyung Yang;Jineun Kim;Moo Lyong Seo
    • Journal of the Korean Chemical Society
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    • v.47 no.2
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    • pp.121-126
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    • 2003
  • Tris(2-cyclohexylaminoethyl)amine (L) was synthesized by the Schiff base condensation reaction of tris(2-aminoethyl)amine with cyclohexanone, followed by reduction. The thermodynamic characteristics, mole ratio and formation constant of [Zn(II)-L] complex were measured by the cyclic voltammetry and isothermal titration. In the case of Zn(II), well-defined cathodic and anodic peak were obtained at -1.02V and -0.48V vs Ag/AgCl , respectively. For the [Zn(II)-L] complex, both peaks were obtained at -1.19V and -0.45V vs Ag/AgCl, respectively. In addition, the peak height gradually increases as the scan rate increases, suggesting that the currents obtained were diffusion - controlled. The mole ratio and stability constant of the complex measured cyclic voltammerty were 1:1 and logK$_f$= 5.8, respectively. And the mole ratio and stability constant of the complexe calculated by isothermal titration method was 1:1 and logK =5.4, respectively. ${\Delta}$H, ${\Delta}$G and T${\Delta}$S for the complex formation were -53.0 kJ/mol, -31.1 kJ/mol, and -21.9 J/K at 25 ${\circ}$C, respectively.

A Study on Dielectric Properties of XLPE for High Voltage (고압용 XLPE의 유전특성에 관한 연구)

  • Lee, Yong-Sung;Lee, Kyung-Yong;Lee, Kwan-Woo;Choi, Yong-Sung;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2004.07c
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    • pp.1561-1563
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    • 2004
  • In this paper, we researched the dielectric properties and voltage dependence on slice XLPE sheet from 22[kV] and 154[kV] power cable. We studied effects for impurities and water for semiconductor shield through a dielectric properties experiment to estimate performance of insulating materials in power cable. Capacitance and tan${\delta}$ of 22[kV], 154[kV] were 53/43[pF] and $7.4{\times}10^{-4},\;2.1510^{-4}$. In these results, the trend was increased with the increase of temperature. The tan${\delta}$ of XLPF/ semiconductor layer was increased as compared with that of XLPE. Dielectric properties reliability of tan${\delta}$ was small.

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Write-in and Retention Characteristics of Nonvolatile MNOS Memory Devices (비휘발성 MNOS기억소자의 기억 및 유지특성)

  • 이형옥;강창수;이상배;서광열
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1991.10a
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    • pp.44-47
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    • 1991
  • Electron injection and memory retention chracteristics of the MNOS devices with thin oxide layer of 23${\AA}$ thick and silicon nitride layer of 1000${\AA}$ thick which are fabricated for this experiment. As a result, pulse amplitude increase oxide current is dominated in linearly increasing region of $\Delta$V$\_$FB/the decreasing region after saturation was due to the increased silicon nirtide current. In low pulse ampiltude $\Delta$V$\_$FB/ is not variated on temperature, but as temperature and pulse amplitude increase. $\Delta$V$\_$FB/ is decreased after saturation. And the decay rate during 10$^4$sec after electron injection was ohiefly dominated by the back tunneling of emission from memory trap to silicon. Memory retention characteristics in V$\_$FB/ stage was better than that of OV retention regardless of injection conditions.

Dielectric Properties of XLPE/Semiconductor Sheet in Power Cables (전력케이블용 XLPE/반도전층의 유전 특성)

  • 이관우;이경용;최용성;박대희
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.8
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    • pp.904-909
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    • 2004
  • We studied the dielectric properties and voltage dependence on slice XLPE sheet from 22 kV and 154 kV power cables. Interface structures are XLPE/semiconductor and XLPE/water/semiconductor capacitance and tan6 of 22 kV, 154 kV were 52/42 pF and $7.4\times{10}/^{-4}, 2.15\times{10}^{-4}$, respectively in these results, the trend was increased with the increase of temperature the tan$\delta$ of XLPE/semiconductive layer and XLPE/water/ semiconductive layer were increased as compared with that of XLPE Temperature reliability of tan$\delta$ was small.

Construction of Amylolytic Industrial Strains of Saccharomyces cerevisiae for Improved Ethanol Production from Raw Starch (생전분으로부터 에탄올 생산이 증진된 전분 분해성 산업용 Saccharomyces cerevisiae의 개발)

  • Im, Young-Kum;Park, Jin-Yeong;Lee, Ja-Yeon;Choi, Seung-Hyun;Chin, Jong-Eon;Ko, Hyun-Mi;Kim, Il-Chul;Bai, Suk
    • Korean Journal of Microbiology
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    • v.49 no.2
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    • pp.200-204
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    • 2013
  • To contruct amylolytic industrial strains of Saccharomyces cerevisiae which produce ethanol efficiently from raw starch, the Bacillus amyloliquefaciens ${\alpha}$-amylase genes (Amy) or Aspergillus awamori glucoamylase genes (GA1) was separately introduced into the ribosomal DNA loci in the chromosomes of the raw starch fermenting-parental strain (ATCC 9763/$YIp{\delta}AGSA{\delta}$), using double 18S rDNA-integration system. Ethanol production after 3 days of fermentation by the strain that produced ethanol most efficiently from raw starch (ATCC 9763/$YIp{\delta}AGSA{\delta}$/YIpAG2rD) among the transformant strains was 1.5-times higher than that by the parental strain. This new strain generated 9.2% (v/v) ethanol (72 g/L) from 20% (w/v) raw corn starch and consumed 75% of the raw starch content during the same period.

Experimental analysis of the sedimentation processes by variation of standing angle in the improved-pneumatic-movable weir (실내실험에 의한 가동보 기립각도 변화에 대한 토사의 퇴적 과정 분석)

  • Lee, Kyung Su;Jang, Chang-Lae
    • Journal of Korea Water Resources Association
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    • v.51 no.9
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    • pp.795-802
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    • 2018
  • This study investigates the hydraulic characteristics and the delta development processes in the improved-pneumatic-movable weir by considering the standing angle of the weir through laboratory experiments. The delta migration speed decreases rapidly with time. As the ratio of delta height to water depth increases, the dimensionless delta migration speed decreases at the delta point. Therefore, the water depth decreases as the delta height increases. Although the delta volume is large due to the effective height of the delta, the delta migration speed and sediment deposition decreases because of the backwater effect on the delta. On the same bed slope condition, the larger the weir height, the larger the delta volume and the ratio of delta height to delta front length is close to 1.0. The delta development could be suppressed when the weir is high. Therefore, the condition that the weir is high has the suppressing effect on the delta developments.

Systematic Design of High-Resolution High-Frequency Cascade Continuous-Time Sigma-Delta Modulators

  • Tortosa, Ramon;Castro-Lopez, Rafael;De La Rosa, J.M.;Roca, Elisenda;Rodriguez-Vazquez, Angel;Fernandez, F.V.
    • ETRI Journal
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    • v.30 no.4
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    • pp.535-545
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    • 2008
  • This paper introduces a systematic top-down and bottom-up design methodology to assist the designer in the implementation of continuous-time (CT) cascade sigma-delta (${\Sigma}{\Delta}$) modulators. The salient features of this methodology are (a) flexible behavioral modeling for optimum accuracy-efficiency trade-offs at different stages of the top-down synthesis process, (b) direct synthesis in the continuous-time domain for minimum circuit complexity and sensitivity, (c) mixed knowledge-based and optimization-based architectural exploration and specification transmission for enhanced circuit performance, and (d) use of Pareto-optimal fronts of building blocks to reduce re-design iterations. The applicability of this methodology will be illustrated via the design of a 12-bit 20 MHz CT ${\Sigma}{\Delta}$ modulator in a 1.2 V 130 nm CMOS technology.

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THE C-M DIAGRAM OF THE GLOBULAR CLUSTER, NGC 6752

  • Lee, See-Woo;Cannon, R.D.
    • Journal of The Korean Astronomical Society
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    • v.13 no.1
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    • pp.15-26
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    • 1980
  • The BV-photographic photometry was made for 1714 stars (V<19.5) in NGC 6752. The C-M diagram of this cluster shows an unusually extended blue horizontal branch $(V=13.5{\sim}17.8)$ with a wide gap $(V=16{\sim}16.7)$ and the well defined giant branch with gaps at V=13.85 and 16.2. The turnoff point is defined at $V=17.25{\pm}0.15$ and (B-V) = $0.46{\pm}0.02$. If we take $V_{HB}=13.85$ for NGC 6752, then ${\Delta}V=2.80,\;(B-V)_{0,g}=0.76\;and\;{\Delta}V_{TO}=3.40$ and the chemical abundance is estimated to be [Fe/H]=-1.67 or $Z=4.3{\times}10^{-4}\;and\;Y=0.26$. Some other physical parameters of this cluster are derived and compared with those for the well observed clusters M 3, M 13, M 15 and M 92.

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Effect of Sintering Temperature on Electrical Stability against Surge Stress of Zn-Pr-Co-Cr-Er Oxides-based Varistors (Zn-Pr-Co-Cr-Er 산화물계 바리스터의 써지 스트레스에 대한 전기적 안정성에 미치는 소결온도의 영향)

  • Nahm, Choon-Woo;Park, Jong-Ah;Yoo, Dea-Hoon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.11
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    • pp.1167-1173
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    • 2004
  • This paper reports the variations of varistor voltage, nonlinear exponent, leakage current, and dissipation factor against surge stress of ZnO-P $r_{6}$ $O_{11}$-CoO-C $r_2$ $O_3$-E $r_2$ $O_3$(ZPCCE)-based varistors manufactured with the variations of sintering temperature. It was found that the variations of electrical parameters against surge stressing current of 100 A/$\textrm{cm}^2$(8x20 ${\mu}\textrm{s}$) is not so large under the surge stress of 700 times. Among varistors, specially the varistor sintered at 134$0^{\circ}C$ exhibited the smallest variations, with %$\Delta$ $V_{lmA}$=+0.23%, %$\Delta$$\alpha$=+0.23%, %$\Delta$ $I_{L}$=0%, %$\Delta$tan$\delta$=-6.94%. The clamping voltage ratio( $V_{c}$/ $V_{lmA}$) of all varistors was less than 2.2.2.2.2.2.2.