• 제목/요약/키워드: composite films

검색결과 527건 처리시간 0.029초

그래핀을 포함하는 폴리설폰 멤브레인의 구조 및 열 특성 (Structural and Thermal Properties of Polysulfone Membrane Including Graphene)

  • 최현명;최용진;성충현;오원태
    • 멤브레인
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    • 제28권1호
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    • pp.37-44
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    • 2018
  • Polysulfone 수지를 사용한 그래핀 복합조성물을 제조하고, 이것들의 멤브레인에 대한 잔류응력과 열전도 특성을 분석하였다. 그래핀을 포함하는 polysulfone 멤브레인의 잔류응력분석은 Si (100) 기판에 스핀코팅으로 $10{\mu}m$ 두께의 막을 도포하여 준비한 시료를 대상으로 하였으며, 잔류응력의 측정은 온도를 승온하고 냉각하는 완전한 1주기 동안 수행하였다. 그래핀을 포함하는 polysulfone 평막을 증류수를 사용한 상전이법으로 제조하여 두께방향과 면방향으로 열전도도를 구분하여 각각 측정하였으며 평막시료의 열전도 이방성을 분석하였다. 그래핀의 구조적 특징에 의해 이를 포함하는 polysulfone 막의 잔류응력은 그래핀 함량이 증가함에 따라 점차로 완화되는 경향을 나타내었고, 열전도특성은 평막형성의 구조적 특성과 그래핀의 고유특성에 의해 두께방향과 면방향의 차이를 확인할 수 있었다.

Modification of polyamide reverse osmosis membranes seeking for better resistance to oxidizing agents

  • Silva, Lucinda F.;Michel, Ricardo C.;Borges, Cristiano P.
    • Membrane and Water Treatment
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    • 제3권3호
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    • pp.169-179
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    • 2012
  • One of the major limitations in the use of commercial aromatic polyamide thin film composite (TFC) reverse osmosis (RO) membranes is to maintain high performance over a long period of operation, due to the sensitivity of polyamide (PA) skin layer to oxidizing agents, such as chlorine, even at very low concentrations in feed water. This article reports surface modification of a commercial TFC RO membrane (BW30-Dow Filmtec) by covering it with a thin film of poly(vinyl alcohol) (PVA) crosslinked with glutaraldehyde (GA) to improve its resistance to chlorine. Crosslinking reaction was carried out at 25 and $40^{\circ}C$ by using PVA 1.0 wt.% solutions at different GA/PVA mass ratio, namely 0.0022, 0.0043 and 0.013. Water swelling measurements indicated a maximum crosslinking density for PVA films prepared at $40^{\circ}C$ and GA/PVA 0.0043. ATR-FTIR and TGA analysis confirmed the reaction between GA and PVA. SEM images of the original and modified membranes were used to evaluate the surface coating. Chlorine resistance of original and modified membranes was evaluated by exposing it to an oxidant solution (NaClO 300 mg/L, NaCl 2,000 mg/L, pH 9.5) and measuring water permeability and salt rejection during more than 100 h period. The surface modification effectively was demonstrated by increasing the chlorine resistance of PA commercial membrane from 1,000 ppm.h to more than 15.000 ppm.h.

Li 이온 포함하는 PEO/PMMA 고분자 전해질의 제조 및 전기화학적 거동 (Preparation and Electrochemical Behaviors of Polymer Electrolyte Based on PEO/PMMA Containing Li Ion)

  • 한아름;박수진;신재섭;김석
    • Korean Chemical Engineering Research
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    • 제47권4호
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    • pp.476-480
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    • 2009
  • 본 연구는 리튬 이차전지용 고분자 전해질 복합재료에 관한 것으로, 고분자는 poly(ethylene oxide)(PEO)와 poly(methyl methacrylate) (PMMA) 블렌드를 사용하고, 용매로는 Ethylene carbonate(EC), 그리고 $LiClO_4$를 리튬염으로 하는 전해질 복합체 필름을 제조하였으며, PMMA의 함유량에 따른 고분자 전해질의 전기화학적 특성을 관찰하였다. 제조된 고분자 전해질의 결정화도와 이온전도도는 시차주사열량계(DSC)와 주파수반응분석기(FRA)로 분석하였다. 그 결과 PMMA의 함량을 증가시킴에 따라서, PEO의 결정 영역이 감소하고 이온전도도가 증가하였다. 또한, PMMA의 함량이 20 wt.% 이상인 경우, 고분자 블렌드필름에서 상분리되는 현상을 관찰하였다. 즉, SEM 분석결과에 의해서, PMMA 주성분 영역과 PEO 주성분 영역의 구분이 가능하였다. 고분자 전해질의 이온전도도는 20 wt.% 첨가한 경우 가장 큰 이온전도도를 가지며, 함유량이 20 wt.% 이상에서는 PMMA 상의 증가로 인해 다소 감소된 이온전도도 변화를 나타내었다.

전자빔 조사에 의한 유리상 탄소에서의 구조적 변화와 열전 성능의 상관관계 (Correlation between a Structural Change and a Thermoelectric Performance of a Glassy Carbon Thin Film Induced by Electron Beam Irradiation)

  • 오인선;조준현;안기석;유정우
    • Composites Research
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    • 제29권4호
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    • pp.156-160
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    • 2016
  • 유리상 탄소는 열적으로 안정하고, 화학적 반응성이 매우 낮으며, 다양한 크기로 제작이 가능하고, 전기적 저항 또한 낮아서 다양한 극한 환경에서 사용 가능하다. 이 논문에서는 전자빔 조사가 유리상 탄소 박막의 구조 변화에 미치는 영향과 그에 따른 열전효과 변화에 대해 연구하였다. 라만 분광 특성 분석을 바탕으로 유리상 탄소 박막에 전자빔 조사에 따라 결정화 또는 비정질화가 일어나는 것을 확인하였다. 또한, 이러한 결정변화가 유리상 탄소 박막의 자유전자 도핑 농도의 변화시키며 그에 따른 제백 상수나 전기적 전도도의 변화도 확인하였다. 전자빔 조사로 인하여 유리상 탄소의 열전파워 펙터가 최대 200%까지 향상되는 것을 보여 주었다.

Roll-to-roll 적용 가능한 마이크로 응집 구조를 갖는 EVA/SiO2 복합 필름의 산란 특성 (The Scattering Property of EVA/SiO2 Composite Film Formed Micro-aggregation Structure for Roll-to-roll Process)

  • 조국현;양준영;이시우;박은경;최근석;송기원;김효정
    • 한국염색가공학회지
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    • 제30권3호
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    • pp.190-198
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    • 2018
  • We fabricated high transmission and high scattering poly(ethylene-co-vinyl acetate)(EVA) films embedding $SiO_2$ nanoparticles to improve outcoupling efficiency in organic display. The 800nm diameter $SiO_2$ nanoparticles aggregated and formed $1.56{\mu}m$ (with ${\pm}0.853{\mu}m$ standard deviation) diameter microparticles in EVA. The total transmission of scattering film was 83.3% on Polyethylene terephthalate(PET), which was higher than reference 82.8% PET substrate. The diffuse transmission and haze of the $SiO_2$ embedded EVA film were 76.1% and 91.4%, respectively. The optimized condition was 1:1 weight ratio of $SiO_2$ nanoparticles to EVA in Tetrahydrofuran(THF) solution. When the ratio of $SiO_2$ was larger than 1, the total transmission decreased by the increase in backscattering of light due to high scattering. With the optimized condition, we could succeed to fabricate a large scale film(35m in length) with a roll-to-roll process.

전사 인쇄에 의한 3D와 다층의 Pt 전극의 CO가스 흡착 (CO Adsorption on Three-Dimensional and Multilayered Platinum Electrode Prepared through Transfer Printing)

  • 정윤서;최유정;신정희;정영훈;박종후;윤대호;조정호
    • 센서학회지
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    • 제29권4호
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    • pp.232-236
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    • 2020
  • Three-dimensional (3D) multilayered Pt electrodes were fabricated to develop a porous electrode using a pattern-transfer printing process. The Pt thin films were deposited using a transferred sputtering pattern having a 250 nm line width on the substrate, and the uniform line patterns were efficiently transferred using our proposed method. Temperature-programmed desorption (TPD) analyses were used to evaluate the porosity of the electrodes. It was possible to distinguish between two resolved maxima at 168 and 227 ℃, which could be described in terms of desorption reactions on the Pt (111) planes. The results of the TPD analysis of the 3D and multilayered Pt electrodes prepared through transfer printing were compared to those of an electrode fabricated through screen printing using a commercial Pt-carbon paste commonly used as porous electrodes. It was confirmed that the 3D multilayered electrodes exhibited a desorption concentration approximately 100 times higher than that of the Pt-carbon composite electrode, and the desorption concentration increased by approximately 0.02 mg/mol per layer. The 3D multilayered electrode effectively functions as a porous electrode and a catalyst.

산화아연과 탄소나노튜브의 선형 층상 복합체의 일산화질소 가스 감지특성 (NO Gas Sensing Characteristics of Wire-Like Layered Composites Between Zinc Oxide and Carbon Nanotube)

  • 김옥길;김효진;김도진
    • 한국재료학회지
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    • 제22권5호
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    • pp.237-242
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    • 2012
  • We report on the NO gas sensing properties of Al-doped zinc oxide-carbon nanotube (ZnO-CNT) wire-like layered composites fabricated by coaxially coating Al-doped ZnO thin films on randomly oriented single-walled carbon nanotubes. We were able to wrap thin ZnO layers around the CNTs using the pulsed laser deposition method, forming wire-like nanostructures of ZnO-CNT. Microstructural observations revealed an ultrathin wire-like structure with a diameter of several tens of nm. Gas sensors based on ZnO-CNT wire-like layered composites were found to exhibit a novel sensing capability that originated from the genuine characteristics of the composites. Specifically, it was observed by measured gas sensing characteristics that the gas sensors based on ZnO-CNT layered composites showed a very high sensitivity of above 1,500% for NO gas in dry air at an optimal operating temperature of $200^{\circ}C$; the sensors also showed a low NO gas detection limit at a sub-ppm level in dry air. The enhanced gas sensing properties of the ZnO-CNT wire-like layered composites are ascribed to a catalytic effect of Al elements on the surface reaction and an increase in the effective surface reaction area of the active ZnO layer due to the coating of CNT templates with a higher surface-to-volume ratio structure. These results suggest that ZnO-CNT composites made of ultrathin Al-doped ZnO layers uniformly coated around carbon nanotubes can be promising materials for use in practical high-performance NO gas sensors.

초소수성 표면특성을 갖는 폴리프로필렌 박막형성 (Formation of Polypropylene Thin Films with Superhydrophobic Surface)

  • 박재남;신영식;이원규
    • 공업화학
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    • 제25권6호
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    • pp.598-601
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    • 2014
  • Polypropylene의 농도와 코팅 막의 건조 온도 및 나노실리카의 첨가량의 변화 등 polypropylene 박막 제조를 위한 공정 변수들이 박막의 표면 형상 및 특성에 미치는 영향을 연구하였다. Polypropylene의 농도가 30 mg/mL인 경우에 $30^{\circ}C$의 건조 온도로 90 min 동안 93 mTorr의 진공 조건으로 최대 접촉각 $154^{\circ}$를 갖는 초소수성 polypropylene 박막을 얻을 수 있었다. 용매 휘발을 위한 진공 오븐에서의 건조 온도가 증가함에 따라 박막의 거칠기가 감소하여 접촉각이 낮아지는 효과를 가져왔다. Polypropylene-실리카 복합막은 박막 내에 나노실리카의 함유량의 증가에 따라 박막 표면이 미세 다공성 구조에서 미세 구형 구조물로 변환되면서 접촉각의 증가로 초소수성 표면 특성을 보였다.

질화막 성장의 하지의존성에 따른 적층캐패시터의 이상산화에 관한 연구 (A Study on the Abnormal Oxidation of Stacked Capacitor due to Underlayer Dependent Nitride Deposition)

  • 정양희
    • 한국전기전자재료학회논문지
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    • 제11권1호
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    • pp.33-40
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    • 1998
  • The composite SiO$_2$/Si$_3$N$_4$/SiO$_2$(ONO) film formed by oxidation on nitride film has been widely studied as DRAM stacked capacitor multi-dielectric films. Load lock(L/L) LPCVD system by HF cleaning is used to improve electrical capacitance and to scale down of effective thickness for memory device, but is brings a new problem. Nitride film deposited using HF cleaning shows selective deposition on poly silicon and oxide regions of capacitor. This problem is avoidable by carpeting chemical oxide using $H_2O$$_2$cleaning before nitride deposition. In this paper, we study the limit of nitride thickness for abnormal oxidation and the initial deposition time for nitride deposition dependent on underlayer materials. We proposed an advanced fabrication process for stacked capacitor in order to avoid selective deposition problem and show the usefulness of nitride deposition using L/L LPCVD system by $H_2O$$_2$cleaning. The natural oxide thickness on polysilicon monitor after HF and $H_2O$$_2$cleaning are measured 3~4$\AA$, respectively. Two substrate materials have the different initial nitride deposition times. The initial deposition time for polysilicon is nearly zero, but initial deposition time for oxide is about 60seconds. However the deposition rate is constant after initial deposition time. The limit of nitride thickness for abnormal oxidation under the HF and $H_2O$$_2$cleaning method are 60$\AA$, 48$\AA$, respectively. The results obtained in this study are useful for developing ultra thin nitride fabrication of ONO scaling and for avoiding abnormal oxidation in stacked capacitor application.

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