• 제목/요약/키워드: columnar growth

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LaNiO3의 (100)배향성이 Pb(Zr,Ti)O3 박막의 결정성장과 강유전성에 미치는 영향 (Effects of (100) Orientation of LaNiO3 on the Growth and Ferroelectric Properties of Pb(Zr,Ti)O3 Thin Films)

  • 박민석;서병준;유영배;문병기;손세모;정수태
    • 한국전기전자재료학회논문지
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    • 제18권4호
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    • pp.338-343
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    • 2005
  • Pb(Zr,Ti)O₃[PZT] thin films were prepared on a highly (100) oriented LaNiO₃[LNO] and a randomly oriented LNO by sol-gel process. The PZT thin films on a highly (100) oriented LNO show a high (100) crystal orientation (F=100 %), those on a randomly oriented LNO show a random crystal orientation (F=60 %). All the PZT layer have a flat and dense microstructure with large columnar grains and their grain size are 25 nm. In the ferroelectric curves at electric field of 40 kV/cm, a highly (100) oriented PZT/LNO samples show coercive field, E/sub c/=10 kV/cm and remanent polarization, P/sub r/=14.5 μC/㎠, while a randomly oriented PZT/LNO sample show E/sub c/=10 kV/cm and P/sub r/=5.4 μC/㎠.

R.F Magnetron Sputtering법으로 제조한 TiO2 박막의 특성 (Characteristics of TiO2 Thin Films Fabricated by R.E, Magnetron Sputtering)

  • 추용호;최대규
    • 한국재료학회지
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    • 제14권11호
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    • pp.821-827
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    • 2004
  • Titanium oxide thin films were prepared on Si(100) substrates by R.F. magnetron reactive sputtering at $30\sim200watt$ R.F power range, and annealed at $600^{\circ}C\sim800^{\circ}C$ for 1 hour. The properties of $TiO_2$ thin films were analyzed using x-ray, ${\alpha}-step$, ellipsometer, scanning electron microscopy, and FT-IR spectrometer. Upon in-situ depositions, the initial phase of $TiO_2$ thin film showed non-crystalline phase at R.F. power $30\sim100$ watt. The crosssection of $TiO_2$ thin films were sbserved to be the columnar structure. With the increasing R.F power and annealing temperature, the grain size, crystallinity, refractive index, and void size of titanium oxides showed a tended to increase. The FT-IR transmittance spectra of titanium oxide thin films have the obsorption band of Ti-O bond, Si-O bond, Si-O-Ti bond and O-H bond. With the increase of R.F. power and annealing temperature, these films have the stronger bond structures. It is considered that such a phenomena is due to phase transition and good crystallinity

YBCO Coated Conductor용 버퍼총의 제조 및 특성 (Preparation of buffer layers for YBCO coated conductors and the properties)

  • 김찬중;홍계원;박해웅;김호진;지봉기
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.98-104
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    • 2002
  • CeO$_2$ and NiO buffers for YBCO coated conductors were deposited on biaxially textured Ni substrate by metalorganic chemical vapor deposition(MOCVD) and the deposition behavior were investigated. The degree of texture of deposited CeO$_2$ and NiO films was strongly dependent on the deposition temperature(T$\sub$d/) and oxygen partial pressure(P$\sub$O$_2$/). ($\ell$00) textured films were well deposited at specific deposition temperatures and oxygen partial pressures. The in-plane and out of plane textures estimated form the full width half maximum of the pole figure peaks were less than 10$^{\circ}$. The surface morphology showed that the CeO$_2$ films consisted of columnar grains grown normal to the Ni substrates, while NiO films were slate and clean like a mirror. The surface roughness of both films estimated by atomic force microscopy(AFM) were as smooth as 3-10 m. The growth rate of the films is much faster than that of other physical deposition methods.

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$BNdT(Bi_{3.25}Nd_{0.75}Ti_{3}O_{12})$ 강유전 박막 성장거동에 미치는 증착온도의 영향 (The Effects of Deposition Temperature on the Growth Behavior of the $BNdT(Bi_{3.25}Nd_{0.75}Ti_{3}O_{12})$ Ferroelectric Thin Films)

  • 권현율;남성필;김정훈;이성갑;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2005년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.176-178
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    • 2005
  • Ferroelectric $Bi_{3.25}Nd_{0.75}Ti_{3}O_{12}(BNdT)$ thin films were proposed for capacitor of FeRAM. The BNdT thin films were grown on Pt/Ti $SiO_2/P-Si(100)$ substrates by the RF magnetron sputtering deposition. The dielectric properties of the BNdT were investigated by varying deposition temperatures. Increasing deposition temperature, the (117) peak was increased. An increase of columnar and recrystalline structure of BNdT films with increasing deposition temperature was observed by the Field Emission Scanning Electron Microscopy(FE-SEM). The dielectric constant and dielectric loss of the BNdT thin films with deposition temperature of $600^{\circ}C$ were 319 and 0.05, respectively.

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Glandular papilloma of the lung with malignant transformation

  • Sung, Woo Jung
    • Journal of Yeungnam Medical Science
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    • 제34권2호
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    • pp.298-302
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    • 2017
  • Glandular papilloma of the lung is one of three histologic types of solitary endobronchial papillomas. It is known as an uncommon benign neoplasm. No malignant glandular papillomas have been reported. Herein, the first case of granular papilloma with malignant transformation is reported. A 74-year-old man with huge right lung mass extended upper and lower lobe was admitted to the hospital complaining of progressive cough and dyspnea. An open lung biopsy was performed. Microscopically, the tumor showed papillary growth pattern with thick fibrovascular cores. The stroma of the fibrovascular cores shown the infiltration of lymphoplasmacytic cells and proliferation of capillaries. The epithelial cells surrounding the papillary fronds were cilliated columnar cells with focal cellar atypia, and frequent mitoses. Suspicious pleural invasion foci were identified. The Ki-67 labeling index was about 24.3% and p53 labeling index was about 31.7%. Glandular papilloma is known as a benign neoplasm, which is lack of atypia and mitosis. In present case, there were several indications of malignant transformation, such as cellular atypia, frequent mitosis, architectural distortion, and pleural invasion. Pathologists must be aware that glandular papilloma can have a changes of malignant transformation. Further studies about disease behavior and molecular characteristics are needed.

AIP 공정 적용 TiAlSiWN 나노 복합체 코팅층의 형성 거동 및 특성 평가 (Property and formation behavior of TiAlSiWN nanocomposite coating layer by the AIP process)

  • 이정한;박현국;장준호;홍성길;오익현
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2018년도 춘계학술대회 논문집
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    • pp.97.2-97.2
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    • 2018
  • This study formed a hard TiAlSiWN coating layer using Ti, Al, Si and W raw powders that were mechanically alloyed and refined. The TiAlSi and TiAlSiW coating targets were fabricated using a single PCAS process in a short time with the optimal sintering conditions. The coating targets were deposited on the WC substrate by forming coating layers using TiAlSiN and TiAlSiWN nitride nano-composite structures with an AIP process. The properties of the nitride nano-composite coating layers were compared according to the addition of W. The microstructure of the nitride nano-composite coating layer was analyzed, focusing on the distribution of the crystalline phases, amorphous phases ($Si_3N_4$), and growth orientation of the columnar crystal depending on the addition of W. The mechanical properties of the coating layers were exhibited a hardness of approximately $3,000kg/mm^2$ and adhesion of about 117.77N in the TiAlSiN. In particular, the TiAlSiWN showed excellent properties with a hardness of more than $4,300kg/mm^2$ and an adhesion of about 181.47N.

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양축 정렬된 Ni기판 위에 MOCVD법에 의한 YBCO 초전도 선재용 $CeO_2$ 완충층의 증착 (Deposition of $CeO_2$ buffer layer for YBCO coated conductors on biaxially textured Ni substrate by MOCVD technique)

  • 김호진;주진호;전병혁;정충환;박순동;박해웅;홍계원;김찬중
    • 한국초전도ㆍ저온공학회논문지
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    • 제4권2호
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    • pp.21-26
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    • 2002
  • Textured CeO2 buffer layers for YBCO coated conductors were deposited on biaxially textured Ni substrate by metalorganic chemical vapor deposition (MOCVD). The degree of texture of deposited $CeO_2$ films was strong1y dependent on the deposition temperature (Td) and oxygen Partial Pressure(PO2). ($\ell$00) textured $CeO_2$ films were well deposited at T=500~52$0^{\circ}C$. PO2=0.90~3.33 Torr. The surface morphology showed that the films consisted of columnar CeO2 films grown from the Ni substrates. The root mean square roughness of CeO$_2$ films estimated by atomic force microscopy(AFM) increased as the deposition temperature(Td) increa- sed. The growth rate of the $CeO_2$ films deposited at T=52$0^{\circ}C$ and PO2=2.30 Torr was 150~200 nm/min that was much faster than that of other Physical deposition methods.

D.C. 마그네트론 스퍼터링법으로 제조한 ITO 및 ITO/Ag/ITO 박막의 미세조직과 투명 전극 특성 (Microstructure and Properties of ITO and ITO/Ag/ITO Multilayer Thin Films Prepared by D.C. Magnetron Sputtering)

  • 최용락;김선화
    • 한국재료학회지
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    • 제16권8호
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    • pp.490-496
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    • 2006
  • ITO monolayer and ITO/Ag/ITO multilayer thin films are prepared by D.C. magnetron sputtering method. Ag layer was inserted for applying ITO to a flexible substrate at low temperature. Carrier concentration and carrier mobility of ITO and ITO/Ag/ITO thin films were measured, the transmittance of them also was done. The amorphous phase was confirmed to be combined in addition to (400) and (440) peaks from XRD result of ITO thin film. As the substrate temperature increased, the preferred orientation of (400) appeared. From the result of application of Ag layer at room temperature, the growth of columnar structure was inhibited, and the amorphous phase formed mostly. The ITO/Ag/ITO thin film represented the transmittance of above 80% when the thickness of Ag layer was 50 ${\AA}$, and the concentration of carrier increased up to above 10 times than that of ITO thin film. Finally, since very low resistance of 3.9${\Omega}/{\square}$ was observed, the effective application of low temperature process is expected to be possible for ITO thin film.

유리렌즈 성형용 초경합금의 Pt 박막의 특성에 관한 연구 (Characteristics of Pt thin films on WC for glass lens molding)

  • 박순섭;이기용;원종호
    • 한국기계가공학회지
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    • 제8권3호
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    • pp.62-67
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    • 2009
  • Pt thin films on Cr or Ti interlayer were deposited onto a tungsten carbide(WC) substrate by the ion beam assisted DC magnetron sputtering. The various atomic percent of Cr and Ti underneath of the Pt films were prepared to examine the total thin film characteristics. The microstructure and surface analysis of the specimen were conducted by using the SEM, XRD and AFM. Mechanical properties such as hardness and adhesion strength of Pt thin film also were examined. The interlayer of pure Ti was formed with 40 nm thickness while that of pure Cr was done with 50 nm as standard reference. The growth rate of either Cr or Ti thin film was almost same under the same deposition conditions. The SEM images showed that anisotropic grain of Pt thin films consisting of dense columnar structures irrespectively grew from the different target compositions. The values of hardness and adhesion strength of Cr/Pt thin film coated on a WC substrate were higher than those of Ti/Pt thin film.

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CoCr(Mo) 박막의 자기적 특성 및 미세구조에 미치는 Si 하지층의 영향 (The Effect of Si Underlayer on the Magnetic Properties and Crystallographic Orientatation of CoCr(Mo) Thin Film)

  • 이호섭;남인탁
    • 한국자기학회지
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    • 제9권5호
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    • pp.256-262
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    • 1999
  • DC/RF magnetron sputtering system을 이용하여 CoCr 박막 및 CoCrMo 박막의 Si 하지층의 도입에 따른 자기적 특성 및 미세구조의 변화에 대해 살펴보았다. 박막의 자기적 특성을 VSM을 통하여 측정한 결과, 고온에서 증착된 CoCrMo/Si 박막의 경우가 CoCr/Si 박막과는 달리 Si 하지층의 두께가 증가할수록 수직보자력값이 증가하는 것을 알 수 있었으며 AFM과 SEM을 이용한 surface morphology의 변화를 통하여 결정립 미세화와 균일화가 수직보자력을 증진시킴을 알 수 있었다. 또한, 박막의 결정배향성 및 미세구조를 XRD와 SEM을 통하여 관찰한 결과, CoCrMo/Si 박막의 (0002)우선 배향성이 CoCr/Si 박막의 (0002) 우선 배향성보다 상당히 크게 증진된 것을 볼 수 있었으며, SEM의 단면 측정을 통하여 CoCrMo/Si 박막과 CoCr/Si 박막의 기판 표면에서 성장하는 columnar 구조의 발달을 잘 관찰할 수 있었다.

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