Browse > Article
http://dx.doi.org/10.3740/MRSK.2006.16.8.490

Microstructure and Properties of ITO and ITO/Ag/ITO Multilayer Thin Films Prepared by D.C. Magnetron Sputtering  

Choi, Yong-Lak (Department of Materials Engineering, Soonchunhyang University)
Kim, Seon-Hwa (Department of Materials Engineering, Soonchunhyang University)
Publication Information
Korean Journal of Materials Research / v.16, no.8, 2006 , pp. 490-496 More about this Journal
Abstract
ITO monolayer and ITO/Ag/ITO multilayer thin films are prepared by D.C. magnetron sputtering method. Ag layer was inserted for applying ITO to a flexible substrate at low temperature. Carrier concentration and carrier mobility of ITO and ITO/Ag/ITO thin films were measured, the transmittance of them also was done. The amorphous phase was confirmed to be combined in addition to (400) and (440) peaks from XRD result of ITO thin film. As the substrate temperature increased, the preferred orientation of (400) appeared. From the result of application of Ag layer at room temperature, the growth of columnar structure was inhibited, and the amorphous phase formed mostly. The ITO/Ag/ITO thin film represented the transmittance of above 80% when the thickness of Ag layer was 50 ${\AA}$, and the concentration of carrier increased up to above 10 times than that of ITO thin film. Finally, since very low resistance of 3.9${\Omega}/{\square}$ was observed, the effective application of low temperature process is expected to be possible for ITO thin film.
Keywords
ITO thin film; flexible display; multilayer; transmittance; sheet resistance;
Citations & Related Records
Times Cited By KSCI : 5  (Citation Analysis)
연도 인용수 순위
1 T. W. Park, S. J. Yoon, J. W. Choi, H. J. Kim, H. J. Jung and C. Y. Park, J. of KIEEME, 11, 833 (1998)   과학기술학회마을
2 Y. S. Kim, Y. S. Jeon and S. S. Kim., Kor. J. Mater. Res., 9(11), 1055 (1999)   과학기술학회마을
3 E. Kaneko, Liquid Crystal Displays, KTK Scientific, Tokyo (1987)
4 J. R. Bellingham, W. A. Philips and C. J. Adkins, Thin Solid Films, 195 (1991)   DOI   ScienceOn
5 S. Takaki, K. Matsumotoa and K. Suzuki, Appl. Surf. Sci., 33/34, 919 (1988)   DOI   ScienceOn
6 K. L. Chopra, S. Major and D. K. Pandya, Thin Solid Films, 102, 1-8 (1983)   DOI   ScienceOn
7 Sung Kyu Park, Jeong In Han, Dae Gyu Moon, Won Keun Kim and Min Gi Kwak, Mat. Res. Soc. Symp. Proc., 747 (2003)
8 N. Basu, A. K. Batabyal and A. K. Barua, J. Appl. Phys., 54, 6 (1983)   DOI   ScienceOn
9 H. Sirringhaus, P. J. Brown, R. H. Friend and M. M. Nielsen, Nature, 401, 685 (1999)   DOI
10 J. S. Kim, R. H. Friend and F. Cacialli, Appl. Phys. Lett., 74, 3084 (1999)   DOI
11 K. D. Leaver and B. N. Chapman, Thin Films, p29, Whkeham Publication, London (1971)
12 W. J. Jeong, J. C. Cho, Y. K. Jeong and Y. T. Yoo, J. of the Korean Sensors Society, 6, 49 (1997)
13 J. Y. Kim, Y. E. Lee, H. S. Cho, D. H. Lee and Y. J. Kim, Kor. J. Mater. Res., 5(3), 280 (1995)   과학기술학회마을
14 A. Kulkarni, T. Lim, M. Khan and K. Schulz, J. Vac. Sci. Techmol., A16, 1636 (1998)   DOI   ScienceOn
15 S. J. Lee, H. W. Yoon, B. S. Kim, S. U. Lee, M. W. Park and D. J. Kwak, J. Kor. Inst. Met.& Mater., 42(9), 745 (2004)
16 T. Karasawa and Y. Miyata, Thin Solid Films, 223, 135 (1997)   DOI   ScienceOn
17 S. Maniv, C. J. Miner and W. D. Westwood, J. Vac. Sci. Technol., A1(3), 1379 (1983)   DOI   ScienceOn
18 Kwang-Hyun Ro, Won Park, Geon Choe and Jong-Chun Ahn, Kor. J. Mater. Res., 7(1), 21 (1997)   과학기술학회마을
19 J. McMillan and E. Petersnon, J. Appl. Phys., 8, 5238 (1979)   DOI   ScienceOn
20 Leon Maissel and Reingard Glang, Handbook of Thin Films Technology, p18, McGraw-Hill, (1970)
21 W. F. W and B. S. Chiou, Appl. Surf. Sci., 68, 497 (1993)   DOI   ScienceOn
22 K. K. Yee, Int. Met. Rev., 23, 19 (1978)   DOI