• 제목/요약/키워드: cobalt thin film

검색결과 43건 처리시간 0.028초

Synthesis of Cobalt Oxide Film by Thermal Decomposition for Potential Various Applications

  • Han, Seong Ho;Park, Bo Keun;Son, Seong Uk;Kim, Chang Gyoun;Chung, Taek-Mo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.365.1-365.1
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    • 2014
  • Cobalt oxide has excellent various properties such as high catalytic activity, antiferromagnetism, and electrochromism. So cobalt oxides offer a great potential for their applications in the various areas such as optical gas sensor, catalysts for oxidation reaction, electrochromic devices, high temperature solar selective absorbers, magnetic materials, pigment for glasses and ceramics, and negative electrodes for lithium-ion batteries. We have synthesized novel cobalt complexes by simple reaction of cobalt bistrimethylsilylamide as a starting material with a lot of conventional ligands as potential cobalt oxide precursors. The studies include the facile preparation, structural characterization, and spectroscopic analysis of the new precursors. We are making efforts to grow cobalt oxide thin films using cobalt complexes newly synthesized in this study using deposition techniques.

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유리기판에 sol-gel법으로 제조된 나노입자 Co-ferrite 박막의 특성 (Nanoparticulate Co-Ferrite Thin Films on Glass Substrate Prepared by Sol-Gel Method)

  • 오영제;최현석;최세영
    • 한국세라믹학회지
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    • 제37권5호
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    • pp.425-431
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    • 2000
  • Cobalt ferrite thin films on Corming glass substrate were fabricated by a sol-gel method. Cobalt ferrite thin films with the grain size of 20-35 nm and thickness of 50nm were obtained. Rapid thermal annealing (RTA) and Annealing processes were adopted for comparison of characteristics of the films. Coercivity values were changed with thermal condition and magnetization values were increased as a function of soaking time. With prolonged soaking time, however, it was decreased because of the diffusion of cations from the glass substrate. The RTA process in preparation of cobalt ferrite thin film was the effective way to prevent and to form a single spinel phase in reduced soaking time. The film heated at 600$^{\circ}C$ for 30 minutes by RTA had coercivity of 2,600 Oe, saturation magnetization 460 emu/㎤, and Mr$.$$\delta$ of 1.43 memu/$\textrm{cm}^2$.

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PEALD 장치 제작 및 Co박막 증착 (Construction of a PEALD System and Fabrication of Cobalt Thin Films)

  • 이두형;노승정
    • 한국진공학회지
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    • 제16권2호
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    • pp.110-115
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    • 2007
  • Atomic layer deposition(ALD)에 유도결합 플라즈마 소스를 채용하여 plasma enhanced ALD(PEALD)장치를 제작하고 플라즈마 발생 실험을 수행하였다. ALD와 PEALD를 이용하여 기판온도 $230^{\circ}C$에서 p-type Si(100)기판 위에 Co박막을 증착하였다. 이때, $Co_{2}(CO)_{6}$을 Co전구체로, 암모니아를 반응가스로, 아르곤을 캐리어(carrier) 및 퍼지(purge)가스로 사용하였다. 증착된 Co박막의 구성성분과 박막의 두께를 auger electron spectroscopy(AES)와 field emission scanning electron microscopy(FESEM)을 이용하여 분석하였다. ALD와 PEALD를 이용하여 증착된 Co박막에서 모두 불순물이 발견되었는데, PEALD의 경우 ALD에 비해 불순물의 양이 약 반으로 감소되었다. 암모니아 플라즈마가 Co전구체에 포함된 탄소와의 반응을 매우 효과적으로 유도하는 것으로 확인되었다.

RF-diode Sputtering법으로 제작한 Co박막의 자기특성과 미세구조 (Magnetic Properties and Microstructure of Co Thin Films by RF-diode Sputtering Method)

  • 한창석;김상욱
    • 한국재료학회지
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    • 제28권3호
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    • pp.159-165
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    • 2018
  • In order to increase the efficiency of the sputtering method widely used in thin film fabrication, a dc sputtering apparatus which supplies both high frequency and magnetic field from the outside was fabricated, and cobalt thin film was fabricated using this apparatus. The apparatus can independently control the applied voltage, the target-substrate distance, and the target current, which are important parameters in the sputtering method, so that a stable glow discharge is obtained even at a low gas pressure of $10^{-3}$ Torr. The fabrication conditions using the sputtering method were mainly performed in $Ar+O_2$ mixed gas containing about 0.6 % oxygen gas under various Ar gas pressures of 1 to 30 mTorr. The microstructure of Co thin films deposited using this apparatus was examined by electron diffraction pattern and X-ray techniques. The magnetic properties were investigated by measuring the magnetization curves. The microstructure and magnetic properties of Co thin films depend on the discharge gas pressure. The thin film fabricated at high gas pressure showed a columnar structure containing a large amount of the third phase in the boundary region and the thin film formed at low gas pressure showed little or no columnar structure. The coercivity in the plane was slightly larger than that in the latter case.

Electron-beam 증발법으로부터 증착속도 및 열처리 온도에 따른 $LiCoO_2$ 박막의 충방전 특성 (Charge/discharge characteristics of $LiCoO_2$ thin film prepared by electron-beam evaporation with deposition rate and annealing temperatures)

  • 남상철;조원일;조병원;윤경석;전해수
    • 전기화학회지
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    • 제2권1호
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    • pp.46-49
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    • 1999
  • Electron-beam 증발장치를 이용하여 리튬 박막 2차 전지 양극용 lithium cobalt oxide 박막을 제조하였다. Stainless steel -기판 위에 입혀진 $LiCoO_2$ 박막은 열처리 과정을 거쳐 잘 발달된 hexagonal 구조의 (003)면을 나타냈으며, 3.9 V 부근에서 전위 평탄 영역이 나타났다. $LiCoO_2$, 박막은 증착속도가 증가함에 따라 Li/co 조성비가 양론비에 근접하였으며, $15{\AA}/s$의 증착속도로 제작한 경우 높은 방전용량을 나타내었다. 열처리 온도가 증가함에 따라 용량이 증가하여 $700^{\circ}C$에서 최대 값을 나타내었으나, 그 이상의 온도에서는 기판과의 반응 때문에 방전용량이 현저히 감소하였다. 박막 내부의 리튬과 코발트의 불균일한 조성은 초기 방전용량의 감소를 가져왔다.

실리콘과 코발트 박막의 계면구조에서 발생하는 1/f 잡음현상 연구 (Generation of 1/f Noise in Interfacial Structures between Silicon Substrate and Cobalt Thin Film)

  • 조남인;남형진;박종윤
    • 한국진공학회지
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    • 제5권1호
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    • pp.48-53
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    • 1996
  • We present a microscopic description for generation of 1/f noise in interfaces between cobalt thin film and silicon substrate. Along with surface resistance measurements and transmission electron diffraction observations. 1/f noise power spectral density has been measured for the interfacial structures at the liquid nitrogen temperature . The cobalt films have been deposited by the electron-beam evaporation technique onto p-type (100) silicon in the high vacuum condition. The measured noise power spectral density shows highest magnitude near the structural transition and metallization transition region. The noise magnitude rapidly decreased after the cobalt silicide nucleation. The noise parameter is concluded to be originated form the structural fluctuations.

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Nickel Doping on Cobalt Oxide Thin Film Using by Sputtering Process-a Route for Surface Modification for p-type Metal Oxide Gas Sensors

  • Kang, Jun-gu;Park, Joon-Shik;An, Byeong-Seon;Yang, Cheol-Woong;Lee, Hoo-Jeong
    • Journal of the Korean Physical Society
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    • 제73권12호
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    • pp.1867-1872
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    • 2018
  • This study proposes a route for surface modification for p-type cobalt oxide-based gas sensors. We deposit a thin layer of Ni on the Co oxide film by sputtering process and annealed at $350^{\circ}C$ for 15 min in air, which changes a typical sputtered film surface into one interlaced with a high density of hemispherical nanoparticles. Our in-depth materials characterization using transmission electron microscopy discloses that the microstructure evolution is the result of an extensive inter-diffusion of Co and Ni, and that the nanoparticles are nickel oxide dissolving some Co. Sensor performance measurement unfolds that the surface modification results in a significant sensitivity enhancement, nearly 200% increase for toluene (at $250^{\circ}C$) and CO (at $200^{\circ}C$) gases in comparison with the undoped samples.

Passive Film on Cobalt: A Three-Parameter Ellipsometry Study During the Film Formation

  • Woon-Kie Paik;Seunghyun Koh
    • Bulletin of the Korean Chemical Society
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    • 제12권5호
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    • pp.540-544
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    • 1991
  • Thin film being formed on the surface of cobalt in the early stage of electrochemically induced passivation was studied by the three-parameter ellipsometry. The growth of the passive film was complete in a few seconds from the onset of the passivating potential, and was followed by a slight decrease in the thickness in 4-40 seconds. The optical constants of the passive film changed gradually during the changes in the thickness. The thickness and the optical properties at the steady state of passivation depended on the potential of the electrode. From the coulometric data and the optical properties, the composition of the passive films was deduced to be close to those of CoO, ${Co_3}{O_4}$ and ${Co_2}{O_3}$ depending on the potential. Cathodic reduction in the presence of EDTA was found to be an efficient way to obtain film-free reference surface of cobalt.

전기화학적 방법을 통한 다공성 코발트 박막 합성 (Preparation of Porous Cobalt Thin Films by Using an Electrochemical Method)

  • 하성혁;신헌철
    • 한국표면공학회지
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    • 제53권6호
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    • pp.312-321
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    • 2020
  • Morphology of porous cobalt electro-deposits was systematically investigated as functions of cobalt precursors in the plating bath and applied cathodic current density with a special focus on cobalt nano-rod formation. It was proved that the concentration of cobalt precursor plays little effect on the morphology of cobalt electro-deposits at relatively low plating current density while it significantly affects the morphology with increasing plating current density. Such a dependence was discussed in terms of the kinetics of two competitive reactions of cobalt reduction and hydrogen evolution. Cobalt nano-rod structure was created at specific ranges of cobalt precursor content and applied cathodic current density, and its diameter and length varied with plating time without notable formation of side branches which is usually found during dendrite formation. Specifically, the nano-rod length was preferentially increased in relative short plating time (<15 s), resulting in higher aspect ratio of nano-rod with plating time. Whereas, both the nano-rod length and diameter were increased nearly at the same level in a prolonged plating time, making the aspect ratio unchanged. From the analysis of crystal structure, it was confirmed that the cobalt nano-rod preferentially grew in the form of single crystal on a dense poly-crystalline cobalt thin film initially formed on the substrate.