• 한국자기학회지
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• 제10권5호
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• pp.203-209
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• 2000

Synthetic antiferromagnet CoFe/Ru/CoFe/FeMn을 사용하고 자유층으로 NiFe/CoFe 이중 층을 사용한 top스핀밸브 구조를 dc magnetron 방식으로 제조하여, 자유층과 구속층의 두께변화에 따른 자기적 특성과 interlayer coupling field티 변화를 조사하였다 Si/Ta(50 $\AA$)/NiFe(x $\AA$)/CoFe(y $\AA$)/Cu(26 $\AA$)/CoFe(30 $\AA$)/Ri(7 $\AA$)/CoFe(15 $\AA$)/FeMn(100 $\AA$)/Ta(50 $\AA$) top synthetic 스핀밸브 시료에서 자유층의 두께 감소에 따른 interlayer coupling field를 조사한 결과 interlayer coupling field가 증가하였으며, 이것은 Neel 모델에 의한 정자기 교환결합에 기인하는 것으로 설명하였다. Top synthetic 스핀 밸브에서 Cu에 인접한 자성층(Pl)과 FeMn에 인접한 자성층(P2) 두께 차이에 따른 interlayer coupling field 의 의존성을 조사한 결과 $t_{P1}$> $t^{P2}$ 일 경우 interlayer coupling field(층간 교환 결합력 세기)는 기존 스핀 밸브에서 적용한 Kools이 제시한 modified Nel 모델에 잘 부합되나, $t_{P1}$ $\leq$ $t_{P2}$ 인 경우 모델과 부합되지 않음으로 새로운 모델이 필요함을 확인하였다 Cu 두께에 변화에 따른 층간 교환 결합력 세기 의존성을 조사한 결과 Cu 두께를 32 $\AA$으로 증가시 층간 교환결합력 세기는 10 Oe 이하로 감소하였다.감소하였다.다.

• 한국자기학회지
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• 제11권6호
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• pp.272-277
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• 2001

FeMr에 의해 교환 바이어스된 synthetic antiferromagnet(CoFe/Ru/CoFe)을 가진 Top Ta/NiFe/CoFe/Cu/CoFe/Ru/CoFe/FeMn/Ta 스핀 밸브 구조를 마그네트론 스퍼터링법에 의해 증착하였다. 이러한 스핀 밸브에서는 자유층, 구속층등의 두께 및 조성이 층간 결합력의 세기를 비롯한 자성특성에 영향을 미치게 된다 후방산란법은 두께 및 조성에 대한 절대정량이 가능하며 비파괴 분석법이라는 장점을 지니고 있으나, 원자번호가 20번 이상인 주기율표상의 인접원소로 이루어진 자성박막을 분석하는데 있어서 신호의 중첩현상으로 인해 분석이 불가능하였다 본 연구에서는 element-specific 한 분석기술인 양성자 여기 X선 검출법과, 절대 정량이 가능하고 깊이분해능을 현저히 향상시킨 grazing-exit 후방산란법 (RBS : Rutherford Backscattering Spectrometry)을 동시에 사용하여 상호 보완적인 분석을 함으로써 스핀밸브에 대한 성분 및 두께에 대한 정량분석을 수행하였다. 이를 위하여 먼저 spin valve 구조에서 자성층인 NiFe, CoFe, FeMn 단일층이 증착된 시료에 대한 표준화를 수행함으로써 spin valve 구조에서 grazing-exit 후방산란 스펙트럼 상의 중첩된 신호를 Simulation을 통하여 분리가 가능하였으며, 특히 Ru층의 두께는 단위의 정확도로 측정이 가능 하였다

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 하계학술대회 논문집 D
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• pp.1756-1758
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• 1999

As new gas sensing material with high cata activity for NO decomposition and for CO oxid $LaFeO_3$ thin films with different thicknesses fabricated by the R.F. magnetron sputtering m on an $Al_2O_3$ substrates with Ag electrodes. The sensing characteristics of the $LaFeO_3$ thin films studied as a function of annealing temperature film thickness. The thin film annealed at showed the highest sensitivity of 110% for CO 60% for NO.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.307.1-307.1
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• 2016

Amorphous zinc tin oxide (ZTO) thin films are being widely studied for a variety electronic applications such as the transparent conducting oxide (TCO) in the field of photoelectric elements and thin film transistors (TFTs). Thin film transistors (TFTs) with transparent amorphous oxide semiconductors (TAOS) represent a major advance in the field of thin film electronics. Examples of TAOS materials include zinc tin oxide (ZTO), indium gallium zinc oxide (IGZO), indium zinc oxide, and indium zinc tin oxide. Among them, ZTO has good optical and electrical properties (high transmittance and larger than 3eV band gap energy). Furthermore ZTO does not contain indium or gallium and is relatively inexpensive and non-toxic. In this study, ZTO thin films were formed by UHV RF magnetron co-sputter deposition on silicon substrates and sapphires. The films were deposited from ZnO and SnO2 target in an RF argon and oxygen plasma. The deposition condition of ZTO thin films were controlled by RF power and post anneal temperature using rapid thermal annealing (RTA). The deposited and annealed films were characterized by X-ray diffraction (XRD), atomic force microscope (AFM), ultraviolet and visible light (UV-VIS) spectrophotometer.

• 한국전기전자재료학회논문지
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• 제21권6호
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• pp.499-502
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• 2008

In this work, Ga-doped ZnO (GZO) thin films for gas sensor application were deposited on low temperature co-fired ceramics (LTCC) substrates, by RF magnetron sputtering method. The LTCC substrate is one of promising materials for this application since it has many advantages (e.g., low cost production, high manufacturing yields and easy realizing 3D structure etc.). The LTCC substrates with thickness of $400\;{\mu}m$ were fabricated by laminating 12 green tapes which consist of alumina and glass particle in an organic binder. The structural properties of the fabricated GZO thin film with thickness of 50 nm is analyzed by X-ray diffraction method (XRD) and field emission scanning electron microscope (FESEM). The film shows good adhesion to the substrate. The GZO gas sensors are tested by gas measurement system and show fast response and recovery characteristics to $NO_x$ gas that is 27.2 and 27.9 sec, recpectively.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1999년도 추계학술대회 논문집 전문대학교육위원 P
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• pp.31-34
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• 1999

In the present study, we fabricated stoichiometric $(Ba_{1-x}Sr_x)TiO_3$ thin films at various substrate temperature and contents using of magnetron sputtering method on optimized Pt-based electrodes (Pt/TiN/$SiO_2$/Si). The substate temperature deposited at 200[ $^{\circ}C$], 400[$^{\circ}C$] and 600[$^{\circ}C$] and crystalline BST thin films show above 400[$^{\circ}C$]. Also, the composition of $(Ba_{1-x}Sr_x)TiO_3$ thin films deposited on Si wafer substrate at 400[$^{\circ}C$] were closed to stoichiometry($1.015{\sim}1.093$ in A/B ratio), but compositional deviation from a stoichiometry is larger as $SrCO_3$ is added. The drastic decrease of dielectric constant and increase of dielectric loss in $(Ba_{1-x}Sr_x)TiO_3$thin films is observed above 100[kHz]. V-I characteristics of $(Ba_{1-x}Sr_x)TiO_3$ thin films show the decrease of leakage current with the increase of $SrCO_3$ contents.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.1071-1074
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• 2002

This paper presents Bi thin films have been fabricated by atomic layer-by-layer deposition and co-deposition at an IBS method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and $820^{\circ}C$ and the highly condensed ozone gas pressure$(PO_3)$ in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}Torr$. Bi 2212 phase appeared in the temperature range of 750 and $795^{\circ}C$: and single phase of Bi 2201 existed in the lower region than $785^{\circ}C$. Whereas, $PO_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 2003년도 추계학술대회
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• pp.89-94
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• 2003

Hard coatings are known to improve the performance of cutting tools in aggressive machining applications, such as high speed machining. New superhard Ti-Al-Si-W films, characterized by a nanocomposite nano-sized (Ti,Al,Si)N crystallites embedded in amorphous $Si_3 N_4$ matrix, could be successfully synthesized on WC-Co substrates by a hybrid coating system of arc ion plating(AIP) and sputtering method. The hardness of Ti-Al-Si-N film increased with incorporation of Si, and had the maximum value ~50 GPa at the Si content of 9 at.%, respectively. And the X-ray diffraction patterns of Ti-Al-Si-N films with various Si content is investigated. In this study, Ti-Al-Si-N coatings were applied to end-mill tools made of WC-Co material by a hybrid coating system. Cutting tests fir the high-hardened material (STD11,$H_R$)C62 and their performances in high speed cutting conditions were studied. Also, the tool wear and tool lift of Ti-Al-Si-N with various si(6, 9, 19) contents were measured.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2008년도 제39회 하계학술대회
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• pp.1270-1271
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• 2008

Effects of thin ZnO/Mg interlayers on electrical and optical properties between p-GaN and ITO were characterized for its application to GaN-LEDs. The ZnO and Mg layers were deposited to have various thicknesses (1${\sim}$6nm for ZnO and 1${\sim}$2nm for Mg) by sputtering. After RTA process, the atomic migration between Mg and ZnO and the formation of Ga vacancy were observed from SIMS depth profile, resulting in the increase of hole concentration and the reduction of band bending at the surface region of p-GaN. The sample using ZnO(2nm)/Mg(2nm) interlayer produced the lowest contact resistance with SBH(Schottky barrier height) of 0.576 eV and the transmittance higher than 83% at a wavelength of 460nm when annealed at 500$^{\circ}C$ for 3min in air ambient.

• 열처리공학회지
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• 제27권4호
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• pp.175-179
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• 2014

IGZO thin films were prepared by radio frequency (RF) magnetron sputtering on glass substrates and then annealed in vacuum for 30 minutes at 100, 200 and $300^{\circ}C$, respectively. The thickness of films kept at 100 nm by controlling the deposition rate. While the optical transmittance and sheet resistance of as deposited films were 91.9% and $901{\Omega}/{\Box}$, respectively, the films annealed at $300^{\circ}C$ show the optical transmittance of 95.4% and the sheet resistance of $383{\Omega}/{\Box}$. The experimental results indicate that vacuum-annealed IGZO film at $300^{\circ}C$ is an attractive candidate for the transparent thin film transistor (TTFT) in large area electronic applications.