• 제목/요약/키워드: chemical filter

검색결과 521건 처리시간 0.029초

마이크론 금속섬유 필터에서 탄소나노튜브의 직접 성장에 의한 나노구조체 합성 및 여과성능 (Synthesis of Nanostructures by Direct Growth of Carbon Nanotubes on Micron-sized Metal Fiber Filter and its Filtration Performance)

  • 이동근;박석주;박영옥;류정인
    • Korean Chemical Engineering Research
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    • 제45권3호
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    • pp.264-268
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    • 2007
  • 마이크론 금속섬유 필터 표면상에 탄소나노튜브를 직접 합성 성장함으로써 마이크론 필터의 성능을 향상할 수 있었다. 탄소나노튜브는 합성조건에 따라 마이크론 섬유 주위를 덮는 덤불 나노구조체 또는 섬유 사이를 연결하는 망 형상의 나노구조체로 성장하였다. 탄소나노튜브가 성장한 금속필터와 탄소나노튜브가 성장하지 않은 금속필터의 여과성능을 측정하여 비교한 결과, 차압의 변화는 미미하나 여과효율은 더욱 향상되었고, 이는 탄소나노튜브가 오염 나노입자를 잡는 트랩으로 작용하였기 때문이다.

주름필터를 적용한 CYBAGFILTER®의 여과성능 특성 (Dust Filtration Characteristics of Pleated Filter Bags Installed in CYBAGFILTER®)

  • 박영옥;노학재;이영우
    • 한국대기환경학회지
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    • 제24권4호
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    • pp.483-491
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    • 2008
  • The filtration characteristics of $CYBAGFILTER^{(R)}$ unit with pleated filter bags were evaluated by comparing the performance of the unit with the lower part of cyclone shape with that of the unit with conventional lower part. Results from the test were also compared with those from the previous research with the $CYBAGFILTER^{(R)}$ in which round filter bags were installed. $CYBAGFILTER^{(R)}$ is the unit which combines the centrifugal separation mechanism and the fabric filtration mechanism in a single unit for efficient removal of particulate matters. The pleated filter bags are made of pleated fabric with an extension of the filtration area about 3 times compared with the conventional round filter bags. The results from the test using pleated filter bags showed an overall collection efficiency of over 99.9% regardless of the shape of lower part installed. When the lower part of cyclone shape was installed, the filter cleaning interval was over 2 times longer compared with that when the conventional lower part was installed. At the same conditions of filtration velocity and filter pressure drop, the $CYBAGFILTER^{(R)}$ with the lower part of cyclone shape, in which the pleated filter bags are installed, can be operated with a flow rate of round 3 times higher than that with conventional round filter bags.

금속/세라믹 중공사형 복합 한외여과막의 제조 (Preparation of Metal/Ceramic Composite Ultrafiltration Hollow Fiber Membranes)

  • 김인철;정보름;이동욱;박주영;권자영;이규호
    • 멤브레인
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    • 제19권1호
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    • pp.47-53
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    • 2009
  • 본 연구의 목적은 금속 중공사형 필터에 무기 입자를 코팅하여 금속/세라믹 복합 한외여과막을 제조하는 것이다. 직경이 2.0 mm이며 기공 크기가 $2{\sim}8{\mu}m$ 범위를 갖는 니켈 중공사 필터에 급냉건조법과 침지-건조법으로 실리카 졸과 티타니아 졸을 코팅하여 금속쎄라믹 복합 한외여과막을 제조하였다. SEM과 PMI 결과로부터 기공 크기가 50 nm 수준을 갖는 것을 확인하였다. 기공 크기는 입자 크기, 소성시간 및 온도에 따라 차이를 보였다.

확장칼만필터를 활용한 배터리 시스템에서의 State of Charge와 용량 동시 추정 (Simultaneous Estimation of State of Charge and Capacity using Extended Kalman Filter in Battery Systems)

  • 문예진;김남훈;유지훈;이경민;이종혁;조원희;김연수
    • Korean Chemical Engineering Research
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    • 제60권3호
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    • pp.363-370
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    • 2022
  • 본 논문에서는 전기자동차용 배터리 충/방전 상태 추정의 정확도를 개선하기 위해 칼만 필터(Kalman Filter, KF) 알고리즘과 등가회로모델(Equivalent Circuit Model)을 활용한 State Of Charge (SOC) 추정 방법을 적용하였다. 특히 노화된 배터리 용량을 함께 추정 가능한 관측기(observer)를 설계하였다. 우선 노화가 없는 경우, 칼만 필터를 이용하여 SOC를 단일 추정하면, 관측기 없이 모델로 계산된 경우와 비교하여 평균 절대 오차율이 1.43%(관측기 미사용)에서 0.27%(관측기 사용)로 감소하였다. 차량 주행상태에서는 전류가 고정되지 않아 SOC와 배터리 용량을 모두 추정하는 것에 일반적인 KF 혹은 Extended KF 알고리즘을 이용할 수 없다. 배터리 노화에 의한 용량 변화는 단시간에 일어나지는 않다는 점에 착안하여, 충전 시 배터리 용량 추정을 주기적으로 실시하는 전략을 제시하였다. 충전 모드에서는 일정 구간마다 전류가 고정되기에, 해당 상황에서 배터리 노화 용량을 SOC와 함께 추정 전략을 제시하였다. 전류가 고정된 상태에서 SOC 추정의 평균 절대 오차율은 0.54% 였으며, 용량 추정의 평균 절대 오차율은 2.24%로 나타났다. 충전상태에서 전류가 고정됨으로 일반적인 EKF를 활용하여 배터리 용량과 SOC 동시 추정이 가능하도록 하였다. 이를 통하여 배터리 충전 시 주기적인 배터리 용량 보정을 수행할 수 있다. 그리고, 방전 시에는 해당 용량으로 고정한 채 SOC를 추정하는, 배터리 관리 시스템에서 활용 가능한 추정 알고리즘을 제안하였다.

Free-Standing Langmuir-Blodgett Films of Maleic Acid-Vinyl Ether Copolymers across 1 μm Pores

  • 이범종;최기선;권영수
    • Bulletin of the Korean Chemical Society
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    • 제16권12호
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    • pp.1167-1172
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    • 1995
  • A coverage of about 1 μm-sized pores of a membrane filter by four monolayers of maleic acids copolymers and poly(allylamine) (PAA) was attained by Langmuir-Blodgett (LB) technique through a covalent cross-linking followed a polyion complexation at the air-water interface. The copolymers were prepared to have side chains of hydrocarbon tail, carboxyl, and/or oligoether in the repeat unit. The surface pressure-area isotherms showed that the monolayers on an aqueous PAA have more expanded area than on pure water. The monolayers were transferable on a calcium fluoride substrate and a fluorocarbon membrane filter as Y deposition type, and the resulting LB films were characterized by FT-IR spectroscopy and scanning electron microscopy. A polymer network produced through interchain amide formation was confirmed in as-deposited films. The films were heat-treated in order to complete the cross-linking. SEM observation of the heat-treated film on a porous membrane filter showed that the four layer film was sufficiently stable to cover the filter pore of about 1 μm. Immersion of the film in water or in chloroform did not cause any change in its appearance on SEM and in FT-IR spectra.

CMP 공정에서 마이크로 스크래치 감소를 위한 슬러리 필터의 특성 (Characteristics of Slurry Filter for Reduction of CMP Slurry-induced Micro-scratch)

  • 김철복;김상용;서용진
    • 한국전기전자재료학회논문지
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    • 제14권7호
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    • pp.557-561
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    • 2001
  • Chemical mechanical polishing (CMP) process has been widely used to planarize dielectric layers, which can be applied to the integraded circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of in the defect-free inter-level dielectrics (ILD). Especially, defects such as micro-scratch lead to severe circuit failure which affect yield. CMP slurries can contain particles exceeding 1㎛ in size, which could cause micro-scratch on the wafer surface. The large particles in these slurries may be caused by particles agglomeration in slurry supply line. To reduce these defects, slurry filtration method has been recommended in oxide CMP. In this work, we have studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in inter-metal dielectrics(IMD)-CMP process. The filter installation in CMP polisher could reduce defects after IMD-CMP process. As a result of micro-scratch formation, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. We have concluded that slurry filter lifetime is fixed by the degree of generating defects.

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제품담배 연기성분 분포 특성 조사 및 물리적 특성과의 관련성 구명 (Study of Smoking Component Distribution and the Relation between Chemical Components and Physical Characteristics of Cigarettes)

  • 황건중;이영택
    • 한국연초학회지
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    • 제23권2호
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    • pp.179-184
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    • 2001
  • This study was conducted to determine the smoke component distribution and the relationship between chemical components and physical characteristics of cigarettes. 16 different cigarette brands which were sold in the market were selected for this study. Five kinds of smoke components which have been tar, nicotine, water, carbon monoxide(CO) puff No., and six kinds of physical characteristics which were filter type, leaf weight, filter weight, UPD, EPD, dilution rate were analyzed. The average values in tar, nicotine, water, CO concentration were 6.5 mg/cig. 0.66 mg/cig, 1.12 mg/cig. and 6.32 mg/cig., respectively. The average ratios of nicotine/tar and CO/tar were 0.10, and 1.02 respectively. The distribution of smoke components collected in the cambridge filter and cigarette filter was different. The averages of tar and nicotine removal efficiency by a cigarette filter were 53%, and 48%, respectively. All smoking components were positively correlated with other smoking components. filter types, EPD, and dilution rate were showed high correlation to the changes of smoke components. Especially, dilution rate of cigarette strongly affected on the changes of all smoke components.

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STI-CMP 공정에서 Consumable의 영향 (Effects of Consumable on STI-CMP Process)

  • 김상용;박성우;정소영;이우선;김창일;장의구;서용진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 추계학술대회 논문집
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    • pp.185-188
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    • 2001
  • Chemical mechanical polishing(CMP) process is widely used for global planarization of inter-metal dielectric (IMD) layer and inter-layer dielectric (ILD) for deep sub-micron technology. However, as the IMD and ILD layer gets thinner, defects such as micro-scratch lead to severe circuit failure, which affect yield. In this paper, for the improvement of CMP Process, deionized water (DIW) pressure, purified $N_2$ (P$N_2$) gas, slurry filter and high spray bar were installed. Our experimental results show that DIW pressure and P$N_2$ gas factors were not related with removal rate, but edge hot-spot of patterned wafer had a serious relation. Also, the filter installation in CMP polisher could reduce defects after CMP process, it is shown that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. However, the slurry filter is impossible to prevent defect-causing particles perfectly. Thus, we suggest that it is necessary to install the high spray bar of de-ionized water (DIW) with high pressure, to overcome the weak-point of slurry filter. Finally, we could expect the improvements of throughput, yield and stability in the ULSI fabrication process.

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슬러리 공급 시스템을 이용한 화학적 기계적 연마 공정에서의 POU 필터의 성능 평가 (Evaluation of Point-Of-Use (POU) Filters Performance in Chemical Mechanical Polishing Slurry Supply System)

  • 장선재;김호중;진홍이;남미연;아툴 쿨르카르니;김태성
    • 한국입자에어로졸학회지
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    • 제9권4호
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    • pp.261-269
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    • 2013
  • The chemical mechanical polishing (CMP) process is widely used in semiconductor manufacturing process for planarization of various materials and structures. Point-of-use (POU) filters are used in most of the CMP processes in order to reduce the unwanted micro-scratches which may result in defects. The performance of the POU filter is depends on type and size of the abrasives used during cleaning process. For this reason, there is a need to evaluate POU filters for their filtration efficiency (FE) with different types of abrasives. In this study, we developed filter test system to evaluate the FE of POU using ceria and silica abrasives (slurry). The POU filter is roll type capsule filter with retention size of 0.2 ${\mu}m$. Two POU filters of different make are evaluated for FE. We observed that both POU filters show similar filtration efficiency for silica and ceria slurry. Results reveal that the ceria slurry and the colloidal silica particle are removed not only by mechanical way but also hydrodynamic and electrostatic interaction way.