• 대한전기학회논문지
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• 제44권4호
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• pp.483-489
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• 1995

To investigate the mechanism generated by irradiation in the insulator layer irradiated MIS (Metal - Insulator - Semiconductor) device, the various types of MIS capacitors depending on insulator thickness, insulator types and implanted impurities are fabricated on the P-type wafer. MIS capacitors exposed by 1Mrad Co$^{60}$ .gamma.-ray are measured for flat band voltage and charge density shifts pre- and post-irradiation. The measuring results of post-irradiation show the flat band voltage shifting toward negative direction and charge density increasing regardless of parameters. This results have a good agreement with calculated data by computer simulation. Si$_{3}$N$_{4}$ layers have a good radiation-hardness than SiO$_{2}$ layers compared to the results of post-irradiation. Also, radiation-induced negative trap is discovered in the implanted insulator layer. Using numerical analysis, four continuty equations (conduction-band electrons continuity equation, valence-band holes continuity equation, trapped electrons continuity equation, trapped holes continuity equation) are solved and charge distributions according to the distance and Si-Insulator interface states are investigated.

• Journal of Electrochemical Science and Technology
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• 제8권4호
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• pp.344-355
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• 2017

In this study, a numerical approach is adopted to investigate the effectiveness factors for distributed electrochemical reactions in thin active reaction layers of solid oxide fuel cells (SOFCs), taking into account the Butler-Volmer reaction kinetics. The mathematical equations for the electrochemical reaction and charge conduction process were formulated by assuming that the active reaction layer has a small thickness, homogeneous microstructure, and high effective electronic conductivity. The effectiveness factor is defined as the ratio of the actual reaction rate (or equivalently, current generation rate) in the active reaction layer to the nominal reaction rate. From extensive numerical calculations, the effectiveness factors were obtained for various charge transfer coefficients of 0.3-0.8. These effectiveness data were then fitted to simple correlation equations, and the resulting correlation coefficients are presented along with estimated magnitude of error.

• 한국생물공학회:학술대회논문집
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• 한국생물공학회 2002년도 생물공학의 동향 (X)
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• pp.30-33
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• 2002

We have shown that it is possible to form a fibrilar network of fibronectin on a polyelectrolyte polymer film whose dimensions are similar to those reported on the extra cellular matrix. The fibronectin network was observed to form only when the charge density of the polymer was in excess of the natural charge density of the cell wall. Furthermore, the self-organized fibronectin layer was much thicker than the polymer film, indicating that long ranged interaction may playa key role in the assembly process. It is therefore important to understand the structure of the polymer layer/protein interface. Here we report on a neutron reflectivity study where we explore the structure of the polyelectrolyte layer, in this case sulfonated polystyrene (PSSx,), with varying degree of sulfonation (x<30%), as a function of sulfur content and counter ion concentration. These results are then correlated with systemic study of the adsorption and the multilayer formation of fibronectin as a function of incubation time for various sulfonation levels of $PSSx.^1$

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.136-136
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• 2011

반도체 및 전자기기 산업에 있어서 NVM은 아주 중요한 부분을 차지하고 있다. NVM은 디스플레이 분야에 많은 기여를 하고 있는데, 측히 AMOLED에 적용이 가능하여 온도에 따라 변하는 구동 전류, 휘도, color balance에 따른 문제를 해결하는데 큰 역할을 한다. 본 연구에서는 bottom gate 구조의 nc-Si NVM 실험을 진행하였다. P-type silicon substrate (0.01~0.02 ${\Omega}-cm$) 위에 Blocking layer 층인 SiO2 (SiH4:N2O=6:30)를 12.5nm증착하였고, Charge trap layer 층인 SiNx (SiH4:NH3=6:4)를 20 nm 증착하였다. 마지막으로 Tunneling layer 층인 SiOxNy은 N2O (2.5 sccm) 플라즈마 처리를 통해 2.5 nm 증착하였다. 이러한 ONO 구조층 위에 nc-Si을 50 nm 증착후에 Source와 Drain 층을 Al 120 nm로 evaporator 이용하여 증착하였다. 제작한 샘플을 전기적 특성인 Threshold voltage, Subthreshold swing, Field effect mobility, ON/OFF current ratio, Programming & Erasing 특성, Charge retention 특성 등을 알아보았다.

• Transactions on Electrical and Electronic Materials
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• 제8권2호
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• pp.97-102
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• 2007

The charging/discharging characteristics of electric double layer capacitors (EDLCs) for an electric power storage device application were investigated. The specific area of the carbonaceous electrode surface by the BET method was in the range of $1800{\sim}2000\;m^2/g$. The charge distributions during charging and discharging were measured by means of a pulsed-electro-acoustic (PEA) method, and the voltage characteristics of EDLCs connected to solar cells were evaluated. The results showed that the distributions of positive and negative charges were spatially uneven, which was due to the mobility of the positive and negative charges in the carbonaceous electrode surface of the EDLCs. The charge accumulation region concentrated on central part of the carbonaceous electrode and the required times for charging and discharging were almost same.

• Journal of international Conference on Electrical Machines and Systems
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• 제2권2호
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• pp.171-178
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• 2013

This paper discusses to conduct experimental verification of two types of micro electric vehicles (EV) in order to realize improvement in electric mileage and shorten a charging time of the battery. First, electric double layer capacitor (EDLC) systems to use as a secondary battery are proposed. The internal resistance of EDLC is small compared with a rechargeable battery, and it is suitable for momentary charge-discharge of EV. Next, control circuits of the capacitors to increase the regenerative electric power are utilized. Then, a novel method to charge a main battery of the EV is introduced. Finally, experimental results demonstrate the validity of the proposed method.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.515-518
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• 2000

The electrochromic properties of $WO_{3}$/$MoO_{3}$ and $MoO_{3}$/$WO_{3}$ double-layers have been systemically studied. The double-layers were made by a e-beam evaporation method and investigated by studying optical modulation, transmittance, and cyclic voltammetry. The devices exhibit good optical properties with wavelength range of 400 to 1100 nm(visible and infrared) during coloration as a function of lithium ion charge injection. It has shown that the double-layer electrochromic thin films are improved the electrochromic properties, but the electrochemical properties are less stable.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.324-326
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• 2016

In this study, we have investigated indium tin zinc oxide (ITZO) as an active channel for non-volatile memory (NVM) devices. The electrical and memory characteristics of NVM devices using multi-stack gate insulator SiO2/SiOx/SiOxNy (OOxOy) with Si-rich SiOx for charge storage layer were also reported. The transmittance of ITZO films reached over 85%. Besides, ITZO-based NVM devices showed good electrical properties such as high field effect mobility of 25.8 cm2/V.s, low threshold voltage of 0.75 V, low subthreshold slope of 0.23 V/dec and high on-off current ratio of $1.25{\times}107$. The transmission Fourier Transform Infrared spectroscopy of SiOx charge storage layer with the richest silicon content showed an assignment at peaks around 2000-2300 cm-1. It indicates that many silicon phases and defect sources exist in the matrix of the SiOx films. In addition, the characteristics of NVM device showed a retention exceeding 97% of threshold voltage shift after 104 s and greater than 94% after 10 years with low operating voltage of +11 V at only 1 ms programming duration time. Therefore, the NVM fabricated by high transparent ITZO active layer and OOxOy memory stack has been applied for the flexible memory system.

• 펄프종이기술
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• 제46권1호
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• pp.46-55
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• 2014

In this study, we modified the surface of nanofibrillated cellulose (NFC) through LbL (Layer-by-Layer) multilayering process with polyelectrolytes and investigated the effects of the NFC modification on the charge of NFC surface and the dewatering ability of NFC suspension. The multilayering process was done onto NFC fibers using polydiallyldimethylammonium chloride (PDADMAC) and poly-sodium 4-styrene sulfonate (PSS) under different dosage and washing conditions. When the washing was carried out in every adsorption stage, the modified NFC had strong cationic or anionic charge depending on the type of polyelectrolyte in the outermost layer and the dewatering ability was not affected. In the case of no washing treatment or washing in the final adsorption stage, however, the zeta potential of NFC was close to an isoelectric point so that the dewatering ability increased remarkably. Low addition level of polyelectrolytes also showed the similar results. The mixing of NFC suspensions with opposite charge resulted in higher network strength and improved dewatering ability due to the flocculation.

• 전기전자학회논문지
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• 제10권2호통권19호
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• pp.156-160
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• 2006

Al2O3 층의 유무에 따른 Ge 나노입자가 형성된 MOS 구조의 캐패시터의 전압에 대한 캐패시턴스 (C-V)의 특성을 측정하였다. Al20O층이 형성된 MOS 캐패시터의 C-V 곡선은 전압의 변화에 대해 나타나는 반시계 방항의 히스테리시스 특성은 Si 기판과 Ge 나노입자 사이를 전자가 터널링하여 Ge 나노입자에 저장되었기 때문이다. Al2O3 층이 없는 MOS 캐패시터의 경우, 시계 방향의 히스테리시스 특성과 좌측으로 이동한 플랫-밴드 전압 값을 볼 수 있다. 이것은 SiO2 층에 존재하는 산소 결원 (oxygen vacancy) 으로 인한 전하 트랩이 이러한 특성을 나타냈다 할 수 있다. 또, 백색광이 C-V 특성에 미치는 영향에 대하여 논하였다.