• 제목/요약/키워드: cell refractive index

검색결과 71건 처리시간 0.023초

p-type (100) Cz 단결정 실리콘 태양전지의 $MgF_2/CeO_2$ 반사 방지막에 관한 연구 ($MgF_2/CeO_2$ AR Coating on p-type (100) Cz Silicon Solar Cells)

  • 이수은;최석원;박성현;강성호;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.593-596
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    • 1999
  • This paper presents a process optimization of antireflectiun (AR) coating on crystalline Si solar cells. Theoretical and experimental investigations were performed on a doble-layer AR(DLAR) coating of MgF$_2$/CeO$_2$, We investigated CeO$_2$ films as an All layer because they hale a proper refractive index of 2.46 and demonstrate the same lattice constant as Si substrate. RF sputter grown CeO$_2$ film showed strong dependence on a deposition temperature. The CeO$_2$ film deposited at 400 $^{\circ}C$ exhibited a strong (111) preferred orientation and the lowest surface roughness of 6.87 $\AA$. Refractive index of MgF$_2$ film was measured as 1.386 for the most of growth temperature. An optimized DLAR coating showed a reflectance as low as 2.04 % in the wavelengths ranged from 0.4 7m to 1.1 7m. We achieved the efficiencies of solar cells greater than 15% with 3.12 % improvement with DLAR coatings . Further details on MgF$_2$, CeO$_2$ films, and cell fabrication Parameters are presented in this paper.

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Invention of Ultralow - n SiO2 Thin Films

  • Dung, Mai Xuan;Lee, June-Key;Soun, Woo-Sik;Jeong, Hyun-Dam
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.281-281
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    • 2010
  • Very low refractive index (<1.4) materials have been proved to be the key factor improving the performance of various optical components, such as reflectors, filters, photonic crystals, LEDs, and solar cell. Highly porous SiO2 are logically designed for ultralow refractive index materials because of the direct relation between porosity and index of refraction. Among them, ordered macroporous SiO2 is of potential material since their theoretically low refractive index ~1.10. However, in the conventional synthesis of ordered macroporous SiO2, the time required for the crystallization of organic nanoparticles, such as polystyrene (PS), from colloidal solution into well ordered template is typical long (several days for 1 cm substrate) due to the low interaction between particles and particle - substrate. In this study, polystyrene - polyacrylic acid (PS-AA) nanoparticles synthesized by miniemulsion polymerization method have hydrophilic polyacrylic acid tails on the surface of particles which increase the interaction between particle and with substrate giving rise to the formation of PS-AA film by simply spin - coating method. Less ordered with controlled thickness films of PS-AA on silicon wafer were successfully fabricated by changing the spinning speed or concentration of colloidal solution, as confirmed by FE-SEM. Based on these template films, a series of macroporous SiO2 films whose thicknesses varied from 300nm to ~1000nm were fabricated either by conventional sol - gel infiltration or gas phase deposition followed by thermal removal of organic template. Formations of SiO2 films consist of interconnected air balls with size ~100 nm were confirmed by FE-SEM and TEM. These highly porous SiO2 show very low refractive indices (<1.18) over a wide range of wavelength (from 200 to 1000nm) as shown by SE measurement. Refraction indices of SiO2 films at 633nm reported here are of ~1.10 which, to our best knowledge, are among the lowest values having been announced.

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결정질 실리콘 태양전지를 위한 고주파 PECVD SiNx막 연구 (A Study on Silicon Nitride Films by high frequency PECVD for Crystalline Silicon Solar Cells)

  • 김정환;노시철;최정호;정종대;서화일
    • 반도체디스플레이기술학회지
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    • 제11권2호
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    • pp.7-11
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    • 2012
  • SiNx films have been wildly used as anti-reflection coatings and passivation for crystalline silicon solar cells. In this study, the SiNx films were deposited by using high frequency (13.56MHz) PECVD and optical & passivation properties were investigated. The RF power was changed in a certain range for the film deposition. Then, the refractive index, etch rate, minority carrier lifetime and cell efficiency were measured to study the properties of the film respectively. The optimal deposition conditions for application to crystalline silicon solar cells were proposed as results of the study. Finally, the best cell efficiency of 16.98% was obtained from the solar cell with the SiNx films deposited by RF power of 550W.

Sound Propagation in 5CB Liquid Crystals Homogeneously Confined in a Planar Cell

  • Ko, Jae-Hyeon;Hwang, Yoon-Hwae;Kim, Jong-Hyun
    • Journal of Information Display
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    • 제10권2호
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    • pp.72-75
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    • 2009
  • The Brillouin spectrum of 4'-n-pentyl-4-cyano-biphenyl (5CB) liquid crystals homogeneously confined in a planar liquid crystal (LC) cell was measured using a 6-pass tandem Fabry-Perot interferometer. By adopting a special right-angle scattering geometry, the sound velocity of 5CB was estimated from the Brillouin shift without knowing the refractive index. The sound velocity of the longitudinal wave propagating along the direction of the directors aligned parallel to the glass plates of the LC cell was 1784${\pm}$7 m/s at 300 K. The attenuation coefficient $\alpha$ was estimated to be approximately $1.9{\times}10^6m^{-1}$, which is about twice as large as that of the longitudinal sound wave propagating along the direction perpendicular to the directors. The present method may be very useful in the evaluation of the elastic properties of the materials used in display devices, whose refractive indices are not known.

PECVD의 주파수 조건에 따른 $SiN_x$막 증착 (The Silicon Nitride Films according to The Frequency Conditions of Plasma Enhanced Chemical Vapor Deposition)

  • 최정호;노시철;정종대;서화일
    • 반도체디스플레이기술학회지
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    • 제13권4호
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    • pp.21-25
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    • 2014
  • The silicon nitride ($SiN_x$) film for surface passivation and anti-reflection coating of crystalline silicon solar cell is very important and it is generally deposited by plasma enhanced chemical vapor deposition (PECVD). PECVD can be divided into low and high frequency method. In this paper, the $SiN_x$ film deposited by low and high frequency PECVD method was studied. First, to optimize the $SiN_x$ film deposited by low frequency PECVD method, the refractive index was measured by varying the process conditions like $SiH_4$, $NH_3$, $N_2$ gas rate, and RF power. When $SiH_4$ gas rate was increased and $NH_3$ gas rate was decreased, the refractive index was increased. The refractive index was also increased with RF power decline. Second, to compare the characteristics of the low and high frequency PECVD $SiN_x$ film, the refractive index was measured by varying $NH_3/SiH_4$ gas ratio and RF power and the minority carrier lifetime of before and after high temperature treatment process was also measured. The refractive index of both low and high frequency PECVD $SiN_x$ film was decreased with increase in $NH_3/SiH_4$ gas ratio and RF power. After high temperature treatment process, the minority carrier lifetime of both low and high frequency PECVD $SiN_x$ film was increased and increased degree was similar. The minority carrier lifetime of low frequency PECVD $SiN_x$ was increased from $11.03{\mu}m$ to $28.24{\mu}m$ and that of high frequency PECVD $SiN_x$ was increased from $11.60{\mu}m$ to $27.10{\mu}m$.

Double layer 반사방지막 구조에 대한 태양전지 표면 반사율 simulation (Simulation on Reflectance from Solar Cell Surface Using Double Layered Anti-Reflective Coating)

  • 라창호;양청;유원종
    • 한국표면공학회지
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    • 제43권2호
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    • pp.97-104
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    • 2010
  • In this paper, we conducted MATLAB simulation using the reflectance formula and the Planck's black body radiation principle, for the purpose of identifying the opimum material and thickness of anti-reflective coating from double layered structures. We found that the optimum condition was obtained when refractive index of upper layer is 1.44 and that of lower layer is 2.29. As materials close to these refractive indices, $MgF_2$ as the upper layer and $HfO_2$, ZnS, $TiO_2$ as the lower layer were suggested. The best result in an average reflectance of 2.759% was obtained from a double layered structure of $MgF_2$ 94 nm/ZnS 55 nm.

In Vitro Biocompatibility Test of Multi-layered Plasmonic Substrates with Flint Glasses and Adhesion Films

  • Kim, Nak-Hyeon;Byun, Kyung Min;Hwang, Seoyoung;Lee, Yena;Jun, Sang Beom
    • Journal of the Optical Society of Korea
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    • 제18권2호
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    • pp.174-179
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    • 2014
  • Since in vitro neural recording and imaging applications based on a surface plasmon resonance (SPR) technique have expanded dramatically in recent years, cytotoxicity assessment to ensure the biosafety and biocompatibility for those applications is crucial. Here, we report the cytotoxicity of the SPR substrate incorporating a flint glass whose refractive index is larger than that of a conventional crown glass. A high refractive index glass substrate is essential in neural signal detection due to the advantages such as high sensitivity and wide dynamic range. From experimental data using primary hippocampal neurons, it is found that a lead-based flint glass is not appropriate as a neural recording template although the neuron cells are not directly attached to the toxic glass. We also demonstrate that the adhesion layer between the glass substrate and the gold film plays an important role in achieving the substrate stability and the cell viability.

표면 플라즈몬 공명에 의한 에탄올의 농도 및 굴절률 분석 (Analysis of ethanol concentration and refractive-index by use of surface plasmon resonance effect)

  • 도용화;이관수;송석호;손대원;이상선
    • 한국광학회지
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    • 제13권1호
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    • pp.9-14
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    • 2002
  • 감쇠 전반사(attenuated total reflection)를 이용하여 액체의 농도 변화를 측정할 수 있는 표면 플라즈몬 공명 센서를 제작하였다. 센서의 구조는 프리즘 밑면에 금속 박막을 코팅하고 그 밑에 유전체론 접촉시킨 Kretschmann-Raether타입으로 하였고, 금속 박막으로는 센서 물질로 적합한 은(Ag) 박막을 사용하였다. 본 센서의 특성은 일반적으로 금속 박막의 두께에 영향을 받는데, 이론적 분석을 통하여 은 박막의 경우 54 nm의 두께에서 매우 좋은 특성을 나타냄을 알 수 있었다. 물과 에탄올을 혼합한 용액에서 에탄올의 농도를 변화시켜 가며 이에 따른 보면 플라즈몬 공명 각을 측정하였고, 표면 플라즈몬 공명 각의 변화로부터 혼합 용액의 농도 변화를 구하였다. 에탄올의 농도가 증가하여 50% 질량비 가지 변하는 구간에서 SPR센서가 매우 좋은 특성을 보였으며, 에탄올의 농도 변화를 3$\times$$10^{-2}$ % 질량비 가지 측정할 수 있었다. 또한 물과 에탄올을 혼합한 용액의 굴절률이 용액의 농도 변화에 따라 비선형적으로 변함을 관측하였으며, 물과 에탄을 혼합 용액의 농도에 따른 밀도 변화를 이용해 굴절률 변화의 비선형적 경향을 설명할 수 있었다.

Impact of Anti-Reflective Coating on Silicon Solar Cell and Glass Substrate : A Brief Review

  • Zahid, Muhammad Aleem;Khokhar, Muhammad Quddamah;Cho, Eun-Chel;Cho, Young Hyun;Yi, Junsin
    • Current Photovoltaic Research
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    • 제8권1호
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    • pp.1-5
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    • 2020
  • The most important factor in enhancing the performance of an optical device is to minimize reflection and increasing transmittance of light for a broad wavelength range. The choice of appropriate coating material is crucial in decreasing reflection losses at the substrate. The purpose of this review is to highlight anti-reflection coating (ARC) materials that can be applied to silicon solar cell and glass substrate for minimizing reflection losses. The optical and electrical behavior of ARC on a substrate is highly dependent on thickness and refractive index (RI) of ARC films that are being deposited on it. The coating techniques and performance of single and multi-layered ARC films after coated on a substrate in a wide range of wavelength spectrum will be studied in the paper.

대면적 실리콘 태양전지의 PDMS 도포에 의한 반사방지막 특성 (Anti-reflection Coating of PDMS by Screen-printing on Large Area of Silicon Solar Cells)

  • 심명섭;정유진;최동진;박현정;강윤묵;김동환;이해석
    • Current Photovoltaic Research
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    • 제10권4호
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    • pp.95-100
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    • 2022
  • Solar cell is a device that converts photon energy into electrical energy. Therefore, absorption of solar spectrum light is one of the most important characteristics to design the solar cell structures. Various methods have emerged to reduce optical losses, such as textured surfaces, back contact solar cells, anti-reflection layers. Here, the anti-reflection coating (ARC) layer is typically utilized whose refractive index value is between air (~1) and silicon (~4) such as SiNx layer (~1.9). This research is to print a material called polydimethylsiloxane (PDMS) to form a double anti-reflection layer. Light with wavelength in the range of 0.3 to 1.2 micrometers does not share a wavelength with solar cells. It is confirmed that the refractive index of PDMS (~1.4) is an ARC layer which decreases the reflectance of light absorption region on typical p-type solar cells with SiNx layer surface. Optimized PDMS printing with analyzing optical property for cell structure can be the effective way against outer effects by encapsulation.