• 제목/요약/키워드: carrier trapping

검색결과 56건 처리시간 0.026초

적외선 탐지소자의 내방사선화 연구 (A Study on Radiation Hardening of a Infrared Detector)

  • 이남호;김승호;김영호
    • 대한전기학회논문지:전기물성ㆍ응용부문C
    • /
    • 제54권11호
    • /
    • pp.490-492
    • /
    • 2005
  • A study on radiation hardening of infrared(IR) detector, the chief component of IR camera was performed. The radiation test on IR sensor passivated with the ZnS by Co$^{60}$ gamma-ray over 1 Mrads showed the reduction in Ro by 1/100 which was related to the noise level. This effect that was caused by carrier trapping in the ZnS passivation layer increased the leakage current and resulted in degradation in the device performance. For the radiation hardening of IR devices we suggested the ones with CdTe passivation layer which had a tendency to reluctant to carrier trapping in its layer and developed test patterns. Radiation test to the patterns showed that the our CdTe passivated device could survived over 1 Mrad gamma-ray dose.

$Al-Al_2O_3-Si$(N형)의 MAS 구조에 있어서 고전계에 의한 Carrier 주인과 트?에 관한 연구 (A Study on Carrier Injection and Trapping by the High Field for MAS (Al-Al2O3-Si(n)) Structure)

  • 이영희;박성희
    • 대한전기학회논문지
    • /
    • 제35권10호
    • /
    • pp.465-472
    • /
    • 1986
  • The present study was carried out to investigate the mechanism which control the voltage instability and the breakdown of CVD Al2O3 on Si substrates. Our sample were metal-Al2O3-Oi Capacitors with both Al and Au field plates. Electron injection and trapping, with resultant positive flatband voltage shift, occur at fields as low as 1-2[MV/cm.] We developed an approximate method for computing the location of the centroid of the trapped electrons. Our results indicate that the electrons are trapped near the injecting interface, at least for fields less than about 5[MV/cm ] Because of continued charging, a true steady state is probably never reached, and the only unique I-V curve is the one obtained initially, when the traps are empty. We measured this I-V curve for both polarities of applied voltage, using a fresh sample for each point. The observed current densities are much larger than those obtained in thermally grawn SiO2.

  • PDF

그라비어 조각용 망점화 알고리즘 (Algorithm for Halftone Generation for Gravure Engraving)

  • 윤종태
    • 한국인쇄학회지
    • /
    • 제16권1호
    • /
    • pp.13-24
    • /
    • 1998
  • The color difference caused by the overprinting sequence of ink in multicolor printing is due to both trapping and optical properties of ink layers. Hence the effect of optical properties only cannot be analyzed without removing the effect of ink trapping This study was carrier out for the purpose of analyzing optically the color difference caused by only the optical properties of ink under the various printing sequence. The present optical analysis for overprints showed a good agreement with the experimental result. It is expected that this study may contribute to decreasing the color difference between the original and the printed reproduction in multi-color printing.

  • PDF

NMOSFET의 제조를 위한 습식산화막과 질화산화막 특성에 관한 연구 (A Study on Characteristics of Wet Oxide Gate and Nitride Oxide Gate for Fabrication of NMOSFET)

  • 김환석;이천희
    • 정보처리학회논문지A
    • /
    • 제15A권4호
    • /
    • pp.211-216
    • /
    • 2008
  • 본 논문에서는 핫 케리어 효과, 항복전압 전하, 트랜지스터 Id Vg 특성곡선, 전하 트래핑, SILC와 같은 특성들을 비교하기 위하여 HP 4145 디바이스 테스터를 사용하여 습식 산화막과 질화 산화막으로된 $0.2{\mu}m$ NMOSFET를 만들어 측정하였다. 그 결과 질화 산화막으로 만들어진 디바이스가 핫 케리어 수명(질화 산화막은 30년 이상인 반면에 습식 산화막 소자는 0.1년임), Vg의 변화, 항복전압, 전계 시뮬레이션, 전하 트래핑면에서도 습식 산화막 소자보다 우수한 결과를 얻을 수 있었다.

고전압 SiO2 절연층 nMOSFET n+ 및 p+ poly Si 게이트에서의 Positive Bias Temperature Instability 열화 메커니즘 분석 (Analysis of Positive Bias Temperature Instability Degradation Mechanism in n+ and p+ poly-Si Gates of High-Voltage SiO2 Dielectric nMOSFETs)

  • 윤여혁
    • 한국정보전자통신기술학회논문지
    • /
    • 제16권4호
    • /
    • pp.180-186
    • /
    • 2023
  • 본 논문은 4세대 VNAND 공정으로 만들어진 고전압 SiO2 절연층 nMOSFET의 n+ 및 p+ poly-Si 게이트에서의 positive bias temperature instability(PBTI) 열화에 대해 비교하고 각각의 메커니즘에 대해 분석한다. 게이트 전극 물질의 차이로 인한 절연층의 전계 차이 때문에 n+/nMOSFET의 열화가 p+/nMOSFET의 열화보다 더 클 것이라는 예상과 다르게 오히려 p+/nMOSFET의 열화가 더 크게 측정되었다. 원인을 분석하기 위해 각각의 경우에 대해 interface state와 oxide charge를 각각 추출하였고, 캐리어 분리 기법으로 전하의 주입과 포획 메커니즘을 분석하였다. 그 결과, p+ poly-Si 게이트에 의한 정공 주입 및 포획이 p+/nMOSFET의 열화를 가속시킴을 확인하였다.

나노급 소자의 핫캐리어 특성 분석 (Characterization of Hot Carrier Mechanism of Nano-Scale CMOSFETs)

  • 나준희;최서윤;김용구;이희덕
    • 대한전자공학회:학술대회논문집
    • /
    • 대한전자공학회 2004년도 하계종합학술대회 논문집(2)
    • /
    • pp.327-330
    • /
    • 2004
  • It is shown that the hot carrier degradation due to enhanced hot holes trapping dominates PMOSFETs lifetime both in thin and thick devices. Moreover, it is found that in 0.13 ${\mu}m$ CMOSFET the PMOS lifetime under CHC (Channel Hot Carrier) stress is lower than the NMOSFET lifetime under DAHC (Drain Avalanche Hot Carrier) stress. Therefore. the interface trap generation due to enhanced hot hole injection will become a dominant degradation factor. In case of thick MOSFET, the degradation by hot carrier is confirmed using charge pumping current method and highly necessary to enhance overall device lifetime or circuit lifetime in upcoming nano-scale CMOS technology.

  • PDF

Charge Confinement and Interfacial Engineering of Electrophosphorescent OLED

  • Chin, Byung-Doo;Lee, Chang-Hee
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
    • /
    • pp.1203-1205
    • /
    • 2007
  • Confinement of charge carrier and exciton is the essential factor for enhancing the efficiency and stability of the electrophosphorescent devices. The interplay between the properties of emitters and other adjacent layers are studied based on the physical interpretation with difference of energy level, charge carrier mobility, and corresponding charge-trapping behavior.

  • PDF

박막태양전지의 광포획 기술 현황 (Current Status in Light Trapping Technique for Thin Film Silicon Solar Cells)

  • 박형식;신명훈;안시현;김선보;봉성재;;;이준신
    • Current Photovoltaic Research
    • /
    • 제2권3호
    • /
    • pp.95-102
    • /
    • 2014
  • Light trapping techniques can change the propagation direction of incident light and keep the light longer in the absorption layers of solar cells to enhance the power conversion efficiency. In thin film silicon (Si) solar cells, the thickness of absorption layer is generally not enough to absorb entire available photons because of short carrier life time, and light induced degradation effect, which can be compensated by the light trapping techniques. These techniques have been adopted as textured transparent conduction oxide (TCO) layers randomly or periodically textured, intermediate reflection layers of tandem and triple junction, and glass substrates etched by various patterning methods. We reviewed the light trapping techniques for thin film Si solar cells and mainly focused on the commercially available techniques applicable to textured TCO on patterned glass substrates. We described the characterization methods representing the light trapping effects, texturing of TCO and showed the results of multi-scale textured TCO on etched glass substrates. These methods can be used tandem and triple thin film Si solar cells to enhance photo-current and power conversion efficiency of long term stability.

Effects of Doping in Organic Electroluminescent Devices Doped with a Fluorescent Dye

  • Kang, Gi-Wook;Ahn, Young-Joo;Lee, Chang-Hee
    • Journal of Information Display
    • /
    • 제2권3호
    • /
    • pp.1-5
    • /
    • 2001
  • The effect of doping on the energy transfer and charge carrier trapping processes has been studied in organic light-emitting diodes (OLEDs) doped with a fluorescent laser dye. The devices consisted of N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1,1-biphenyl-4,4'-diamine (TPD) as a hole transporting layer, tris(8-hydroxyquinoline) aluminum ($Alq_3$) as the host, and a fluorescent dye, 4-dicyanomethylene-2-methyl-6-[2-(2,3,6,7-tetrahydro-1 H,5H-benzo[i,j]quinolizin-8-yl) vinyl]-4H-pyran) (DCM2) as the dopant. Temperature dependence of the current-voltage-luminescence (I-V-L) characteristics, the electroluminescence (EL) and photoluminescence (PL) spectra are studied in the temperature ranging between 15 K and 300 K. The emission from DCM2 was seen to be much stronger compared with the emission from $Alq_3$, indicative of efficient energy transfer from $Alq_3$ to DCM2. In addition, the EL emission from DCM2 increasd with increasing temperature while the emission from the host $Alq_3$ decreased. The result indicates that direct charge carrier trapping becomes efficient with increasing temperature. The EL emission from DCM2 shows a slightly sublinear dependence on the current density, implying the enhanced quenching of excitons at high current densities due to the exciton-exciton annihilation.

  • PDF

산화막의 질화 조건에 따른 트랩 파라미터에 관한 연구 (Study on the Trap Parameters according to the Nitridation Conditions of the Oxide Films)

  • 윤운하;강성준;정양희
    • 한국전자통신학회논문지
    • /
    • 제11권5호
    • /
    • pp.473-478
    • /
    • 2016
  • 본 논문은 RTP법으로 산화막을 질화시킨 질화산화막으로 MIS 커패시터를 제작하여 avalanche 주입에 따른 캐리어 트랩 특성을 조사하였다. avalanche 주입에 의한 flatband 전압 변화는 두 번의 turn-around가 관찰되었는데 이는 처음 산화막에서 전자 트래핑이 있어나고, 전하 주입에 따라 홀 트래핑에 의한 turn-around 후 다시 전자 트래핑이 일어나는 것을 관찰하였다. 질화 산화막의 캐리어 트랩 파라미터를 결정하기 위하여 실험 결과를 기초로 종류가 다른 여러 트랩을 갖는 계에 대한 캐리어 트래핑을 비교한 결과 실험값과 일치함을 확인하였다.