• 제목/요약/키워드: c-si solar cell

검색결과 289건 처리시간 0.021초

태양전지 응용을 위한 PECVD 실리콘 질화막 증착 및 열처리 최적화 (PECVD Silicon Nitride Film Deposition and Annealing Optimization for Solar Cell Application)

  • Yoo, Jin-Su;Dhungel Suresh Kumar;Yi, Jun-Sin
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제55권12호
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    • pp.565-569
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    • 2006
  • Plasma enhanced chemical vapor deposition(PECVD) is a well established technique for the deposition of hydrogenated film of silicon nitride (SiNx:H), which is commonly used as an antireflection coating as well as passivating layer in crystalline silicon solar cell. PECVD-SiNx:H films were investigated by varying the deposition and annealing conditions to optimize for the application in silicon solar cells. By varying the gas ratio (ammonia to silane), the silicon nitride films of refractive indices 1.85 - 2.45 were obtained. The film deposited at $450^{\circ}C$ showed the best carrier lifetime through the film deposition rate was not encouraging. The film deposited with the gas ratio of 0.57 showed the best carrier lifetime after annealing at a temperature of $800^{\circ}C$. The single crystalline silicon solar cells fabricated in conventional industrial production line applying the optimized film deposition and annealing conditions on large area substrate of size $125mm{\times}125mm$ (pseudo square) was found to have the conversion efficiencies as high as 17.05 %. Low cost and high efficiency silicon solar cells fabrication sequence has also been explained in this paper.

HIT Cell 최적화를 위한 AFORS HET 시뮬레이션 실행 (Operating AFORS HET Simulation for Optimize of HIT Cell)

  • 유호준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.448-449
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    • 2008
  • HIT(Heterojunction with intrinsic thin layer) solar cell은 결정 실리콘 (c-Si)을 n-type으로 제작시 수율이 어렵고 결정 실리콘 (c-Si)을 p-type위에 제조하는 것이 보다 보편적인 방법이므로 베이스의 결정 실리콘에는 p-type을, 그 위에는 진성 층(intrinsic layer) 그리고 반투명 전극의 아래에 제조되는 비정질 실리콘 (a-Si)을 n-type으로 하여 베이스 층과 TCO 후면 층의 두께, 도핑 농도 (doping concentration)와의 관계를 확인하여 본다.

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실리콘 기판 습식 세정 및 표면 형상에 따른 a-Si:H/c-Si 이종접합 태양전지 패시배이션 특성 (Effect of cleaning process and surface morphology of silicon wafer for surface passivation enhancement of a-Si/c-Si heterojunction solar cells)

  • 송준용;정대영;김찬석;박상현;조준식;윤경훈;송진수;이정철
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.99.2-99.2
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    • 2010
  • This paper investigates the dependence of a-Si:H/c-Si passivation and heterojunction solar cell performances on various cleaning processes of silicon wafer and surface morphology. It is observed that passivation quality of a-Si:H thin-films on c-Si wafer highly depends on wafer surface conditions. The MCLT(Minority carrier life time) of wafer incorporating intrinsic (i) a-Si:H as a passivation layer shows sensitive variation with cleaning process and surface morpholgy. By applying improved cleaning processes and surface morphology we can obtain the MCLT of $200{\mu}sec$ after H-termination and above 1.5msec after i a-Si:H thin film deposition, which has implied open circuit voltage of 0.720V.

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고품질 실리콘 박막을 이용한 저가 고효율 실리콘 박막 및 a-Si:H/c-Si 이종접합 태양전지 개발 (Development of low cost and high efficiency silicon thin-film and a-Si:H/c-Si hetero-junction solar cells using low temperature silicon thin-films)

  • 이정철;임충현;안세진;윤재호;김석기;김동섭;양수미;강희복;이보영;이준신;송진수;윤경훈
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2005년도 춘계학술대회
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    • pp.113-116
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    • 2005
  • In this paper, silicon thin-film solar cells(Si- TFSC) and a-Si/c-Si heterojunction solar cells(HJ-cell) are investigated. The Si-TFSC was prepared on glass substrate by depositing $1-3{\mu}m$ thin-film silicons by glow discharge method. The $a-Si:H/{\mu}c-Si:H$ tandem solar cells on textured ZnO:A1 TCO (transparent conducting oxide) showed improved Jsc in top and bottom cells than that on $SnO_2:F$ TCO. This enhancement of jsc resulted from improved light trapping effect by front textured ZnO:A1. The a-Si/c-Si HJ-cells with simple structure without high efficiency features are suffering from low Voc and Jsc. The improvement of front nip and back interface properties by adopting high quality silicon-films at low temperature should be done both for increasing device performances and production cost.

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다이아몬드 와이어에 의해 절단된 다결정 실리콘 태양전지의 나노텍스쳐링 및 후속 식각 연구 (Nanotexturing and Post-Etching for Diamond Wire Sawn Multicrystalline Silicon Solar Cell)

  • 김명현;송재원;남윤호;김동형;유시영;문환균;유봉영;이정호
    • 한국표면공학회지
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    • 제49권3호
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    • pp.301-306
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    • 2016
  • The effects of nanotexturing and post-etching on the reflection and quantum efficiency properties of diamond wire sawn (DWS) multicrystalline silicon (mc-Si) solar cell have been investigated. The chemical solutions, which are acidic etching solution (HF-$HNO_3$), metal assisted chemical etching (MAC etch) solutions ($AgNO_3$-HF-DI, HF-$H_2O_2$-DI) and post-etching solution (diluted KOH at $80^{\circ}C$), were used for micro- and nano-texturing at the surface of diamond wire sawn (DWS) mc-Si wafer. Experiments were performed with various post-etching time conditions in order to determine the optimized etching condition for solar cell. The reflectance of mc-Si wafer texturing with acidic etching solution showed a very high reflectance value of about 30% (w/o anti-reflection coating), which indicates the insufficient light absorption for solar cell. The formation of nano-texture on the surface of mc-Si contributed to the enhancement of light absorption. Also, post-etching time condition of 240 s was found adequate to the nano-texturing of mc-Si due to its high external quantum efficiency of about 30% at short wavelengths and high short circuit current density ($J_{sc}$) of $35.4mA/cm^2$.

삼중접합 태양전지에서 Intrinsic Layer 밴드갭 가변을 통한 태양전지 고효율화 시뮬레이션 (Optimization of I layer bandgap for efficient triple junction solarcell by ASA simulation)

  • 강민호;장주연;백승신;이준신
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2011년도 추계학술대회 초록집
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    • pp.64.1-64.1
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    • 2011
  • 다중접합 태양전지는 흡수대역이 다른 juntion으로 구성되어, 각각의 태양전지 간의 전류정합(current matching)이 효율 향상에 중요하다. 본 실험에서는 Top cell에 i-a-Si:H(Thinckness:100nm), Middle cell에는 i-a-SiGe:H(Thickness:800nm)을 적용하였고, bottom cell에는 i-${\mu}c$-Si:H(Thickness:1800nm), 수광부의 p-layer에 에 SiOx을 이용하여 triple juntion amorphous silicon solar cell(삼중접합태양전지)을 구현하였다. 이를 최적화 시키기 위해 ASA simulation을 이용하여 각 Cell의 intrinsic layer의 밴드갭을 가변하였다. 가변 결과 i-a-Si:H : 1.85 eV, i-a-SiGe:H: 1.6 eV, i-${\mu}c$-Si:H: 1.4 eV에서 태양전지 효율 14.5 %을 기록 하였다. 본 연구를 통해 Triple juntion cell에서의 intrinsic layer의 밴드갭 최적화를 구현해 볼 수 있었다.

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적층형 태양전지를 위한 비정질실리콘계 산화막 박막태양전지의 광흡수층 및 반사체 성능 향상 기술 (Advances in Absorbers and Reflectors of Amorphous Silicon Oxide Thin Film Solar Cells for Tandem Devices)

  • 강동원
    • 한국전기전자재료학회논문지
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    • 제30권2호
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    • pp.115-118
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    • 2017
  • Highly photosensitive and wide bandgap amorphous silicon oxide (a-$SiO_x$:H) films were developed at low temperature ranges ($100{\sim}150^{\circ}C$) with employing plasma-enhanced chemical vapor deposition by optimizing $H_2/SiH_4$ gas ratio and $CO_2$ flow. Photosensitivity more than $10^5$ and wide bandgap (1.81~1.85 eV) properties were used for making the a-$SiO_x$:H thin film solar cells, which exhibited a high open circuit voltage of 0.987 V at the substrate temperature of $100^{\circ}C$. In addition, a power conversion efficiency of 6.87% for the cell could be improved up to 7.77% by employing a new n-type nc-$SiO_x$:H/ZnO:Al/Ag triple back-reflector that offers better short circuit currents in the thin film photovoltaic devices.

A Novel Atomic Layer Deposited Al2O3 Film with Diluted NH4OH for High-Efficient c-Si Solar Cell

  • Oh, Sung-Kwen;Shin, Hong-Sik;Jeong, Kwang-Seok;Li, Meng;Lee, Horyeong;Han, Kyumin;Lee, Yongwoo;Lee, Ga-Won;Lee, Hi-Deok
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제14권1호
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    • pp.40-47
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    • 2014
  • In this paper, $Al_2O_3$ film deposited by thermal atomic layer deposition (ALD) with diluted $NH_4OH$ instead of $H_2O$ was suggested for passivation layer and anti-reflection (AR) coating of the p-type crystalline Si (c-Si) solar cell application. It was confirmed that the deposition rate and refractive index of $Al_2O_3$ film was proportional to the $NH_4OH$ concentration. $Al_2O_3$ film deposited with 5 % $NH_4OH$ has the greatest negative fixed oxide charge density ($Q_f$), which can be explained by aluminum vacancies ($V_{Al}$) or oxygen interstitials ($O_i$) under O-rich condition. $Al_2O_3$ film deposited with $NH_4OH$ 5 % condition also shows lower interface trap density ($D_{it}$) distribution than those of other conditions. At $NH_4OH$ 5 % condition, moreover, $Al_2O_3$ film shows the highest excess carrier lifetime (${\tau}_{PCD}$) and the lowest surface recombination velocity ($S_{eff}$), which are linked with its passivation properties. The proposed $Al_2O_3$ film deposited with diluted $NH_4OH$ is very promising for passivation layer and AR coating of the p-type c-Si solar cell.

이종접합 실리콘 태양전지 적용을 위한 선택적 전하접합 층으로의 전이금속산화물에 관한 연구 (A Study on the Selective Hole Carrier Extraction Layer for Application of Amorphous/crystalline Silicon Heterojunction Solar Cell)

  • 김용준;김선보;김영국;조영현;박창균;이준신
    • 한국전기전자재료학회논문지
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    • 제30권3호
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    • pp.192-197
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    • 2017
  • Hydrogenated Amorphous Silicon (a-Si:H) is used as an emitter layer in HIT (heterojunction with Intrinsic Thin layer) solar cells. Its low band gap and low optical properties (low transmittance and high absorption) cause parasitic absorption on the front side of a solar cell that significantly reduces the solar cell blue response. To overcome this, research on CSC (carrier Selective Contacts) is being actively carried out to reduce carrier recombination and improve carrier transportation as a means to approach the theoretical efficiency of silicon solar cells. Among CSC materials, molybdenum oxide ($MoO_x$) is most commonly used for the hole transport layer (HTL) of a solar cell due to its high work function and wide band gap. This paper analyzes the electrical and optical properties of $MoO_x$ thin films for use in the HTL of HIT solar cells. The optical properties of $MoO_x$ show better performance than a-Si:H and ${\mu}c-SiO_x:H$.