• Bulletin of the Korean Mathematical Society
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• v.47 no.1
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• pp.211-219
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• 2010

Let P be a Jacobian polynomial such as deg P = $deg_y$ P. Suppose the Jacobian polynomial P satisfies the intersection condition satisfying $dim_C$ C[x, y]/$P_y$> = deg P - 1, we can prove that the Keller map which has P as one of coordinate polynomial always has its inverse.

• KIEE International Transactions on Electrophysics and Applications
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• v.11C no.4
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• pp.142-145
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• 2001

The residual DC phenomena in the in-plane switching(IPS)-liquid crystal display(LCD) by the voltage-transmittance (V-T) and capacitance-voltage (C-V) hysteresis method on rubbed polyimide (PI) surfaces were studied. We found that the residual DC voltage in the IPS-LCD was decreasing with the increasing concentration of cyano LCs. The residual DC voltage of the IPS-LCD can be improved by the high polarity of cyano LCs.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.141-141
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• 2009

Blue light-emitting diodes (LEDs), violet laser diodes 같은 광전소자들은 질화물 c-plane 기판위에 소자로 응용되어 이미 상품화 되어 왔다. 그러나 2족-질화물 재료들은 wurtzite 구조를 가지므로 c-plane에 평행한 자연적인 극성을 띌 뿐만 아니라 결정 내부 stress로 인한 압전현상 또한 나타나 큰 내부 전기장을 형성하게 된다. 이렇게 생성된 내부 전기장은 전자와 홀의 재결합 효율을 감소시키고 소자 응용 시 red-shift의 원인이 되곤 한다. 따라서 최근 들어 m-plane(1-100), a-plane (11-20)같은 무극성을 뛰는 기판 위에 소자를 만드는 방법이 각광을 받고 있는 추세다. 그러나 무극성 기판을 소자에 응용 시 Chemical Mechanical Planarization (CMP)에 의한 가공은 반도체 기판으로써 이용하기 위한 필수 불가결의 공정이다. c면(0001) SiC wafer에 대한 연구는 현재 많이 발표가 되어 있으나 무극성면 SiC wafer에 대한 CMP 공정에 대한 연구사례는 없는 실정이다. 본 연구에서는 C면 (0001)으로 성장된 잉곳을 a면(11-20)과 m(1-100)면으로 절단 후, slurry type (KOH-based colloidal silica slurry, NaOCl), 산화제, 연마제등을 변화하여 CMP 공정을 거침으로서 일어나는 기계 화학적 가공 양상에 대하여 알아보았다. 그 후 표면 형상 분석 하기위해 Atomic Force Microscope(AFM)을 사용하였고, 표면 스크레치를 SEM을 이용해서 알아보았다.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.26 no.4
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• pp.82-87
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• 2012

In this paper, flashover characteristics of air in the vertical arrangement of cylinder-shaped rod and plane gap in the case of combustion flame on the plane electrode were examined under the application of a.c. and d.c. high-voltages. In order to investigate the effect of propane flame on the flashover characteristics of air, flashover voltages in accordance with the variation of the gap length and the horizontal distance between the flame and the high-voltage rod electrode were measured. As the result of the experiment, flashover voltages in the presence of the flame were substantially lowered than those in the absence of flame, and the polarity effects with the d.c. voltages on appeared owing to the flame. Flashover voltages of air were increased in the proportion of the gap length and the horizontal distance in the case of both a.c. and d.c. voltages, but the flame was extinguished by such corona wind that was produced from the rod electrode when the gap length and the horizontal distance reached to a certain degree.

• Proceedings of the KIEE Conference
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• 2002.07c
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• pp.1878-1880
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• 2002

In this paper, electromagnetic waves radiated from discharge at three-type electrodes (needle-plane, plane-plane and sphere-plane electrode) using DC power source in air measured and the peculiar patterns of their spectra are reported. The radiated electrodmagnetic waves were measured in bandwidth of VHF($30{\sim}230$[MHz]) using a biconcal antenna and a spectrum analyzer. Frequency spectrum distribution of radiated electromagnetic wave was revealed under 50[MHz] at positive DC, and high electric field was shown at 45[MHz] frequency band. But, it was revealed under 70[MHz] frequency band at negative DC under plane-plane electrodes and sphere-plane electrodes, and high electric field was shown at 55 [MHz] frequency band.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.172-172
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• 2010

In the area of optoelectronic devices based on GaN and related ternary compounds, the two-dimensional system like as quantum wells (QWs) has been investigated as an effective structure for improving the light-emitting efficiency. Generally, the quantum well active regions in III-nitride light-emitting diodes grown on conventional c-plane sapphire substrates have critical problems given by the quantum confined Stark effect (QCSE) due to the effects of strong piezoelectric and spontaneous polarizations. However, the QWs grown on nonpolar templates are free from the QCSE since the polar-axis lies within the growth plane of the template. Also the unique characteristic of linear polarized light emission from nonpolar QW structures is attracting attentions because it is proper to the application of back-light units of liquid crystal display. In this study, we characterized optical properties of the a-plane InGaN/GaN QW structures by temperature-dependent photoluminescence (TDPL) measurements. From the photoluminescence (PL) spectrum measured at 300 K, green emission centered at 520 nm was observed for the QW region. Since indium incorporation on nonpolar QWs is lower than that on c-plane, this high indium-doping on a-plane InGaN QWs is not common. Therefore, the effect of high indium composition on optical properties in a-plane InGaN QWs will be extensively studied.

• Journal of the Korean Ceramic Society
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• v.32 no.4
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• pp.419-428
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• 1995

Polycrystalline silicon carbide (SiC) thick films were depostied by low pressure chemical vapor deposition (LPCVD) using CH3SiCl3 (MTS) and H2 gaseous mixture onto isotropic graphite substrate. Effects of deposition variables on the SiC film were investigated. Deposition rate had been found to be surface-reaction controlled below reactor temperature of 120$0^{\circ}C$ and mass-transport controlled over 125$0^{\circ}C$. Apparent activation energy value decreased below 120$0^{\circ}C$ and deposition rate decreased above 125$0^{\circ}C$ by depletion effect of the reactant gas in the direction of flow in a horizontal hot wall reactor. Microstructure of the as-deposited SiC films was strongly influenced by deposition temperature and position. Microstructural change occurred greater in the mass transport controlled region than surface reaction controlled region. The as-deposited SiC layers in this experiment showed stoichiometric composition and there were no polytype except for $\beta$-SiC. The preferred orientation plane of the polycrystalline SiC layers was (220) plane at a high reactant gas concentration in the mass transfer controlled region. As depletion effect of reactant concentration was increased, SiC films preferentially grow as (111) plane.

• Journal of the Korean Mathematical Society
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• v.53 no.2
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• pp.461-473
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• 2016

Let C be a projective plane curve of degree d whose singularities are all isolated. Suppose C is not concurrent lines. P loski proved that the Milnor number of an isolated singlar point of C is less than or equal to $(d-1)^2-{\lfloor}\frac{d}{2}{\rfloor}$. In this paper, we prove that the Milnor sum of C is also less than or equal to $(d-1)^2-{\lfloor}\frac{d}{2}{\rfloor}$ and the equality holds if and only if C is a P loski curve. Furthermore, we find a bound for the Milnor sum of projective plane curves in terms of GIT.

• Korean Journal of Materials Research
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• v.28 no.4
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• pp.208-213
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• 2018

Epitaxial ($11{\bar{2}}0$) a-plane GaN films were grown on a ($1{\bar{1}}02$) R-plane sapphire substrate with photoresist (PR) masks using metal organic chemical vapor deposition (MOCVD). The PR mask with striped patterns was prepared using an ex-situ lithography process, whereas carbonization and heat treatment of the PR mask were carried out using an in-situ MOCVD. The heat treatment of the PR mask was continuously conducted in ambient $H_2/NH_3$ mixture gas at $1140^{\circ}C$ after carbonization by the pyrolysis in ambient $H_2$ at $1100^{\circ}C$. As the time of the heat treatment progressed, the striped patterns of the carbonized PR mask shrank. The heat treatment of the carbonized PR mask facilitated epitaxial lateral overgrowth (ELO) of a-plane GaN films without carbon contamination on the R-plane sapphire substrate. Thhe surface morphology of a-plane GaN films was investigated by scanning electron microscopy and atomic force microscopy. The structural characteristics of a-plane GaN films on an R-plane sapphire substrate were evaluated by ${\omega}-2{\theta}$ high-resolution X-ray diffraction. The a-plane GaN films were characterized by X-ray photoelectron spectroscopy (XPS) to determine carbon contamination from carbonized PR masks in the GaN film bulk. After $Ar^+$ ion etching, XPS spectra indicated that carbon contamination exists only in the surface region. Finally, the heat treatment of carbonized PR masks was used to grow high-quality a-plane GaN films without carbon contamination. This approach showed the promising potential of the ELO process by using a PR mask.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.17 no.1
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• pp.1-5
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• 2007

The structural and morphological properties of planar, nonpolar (11-20) a-plane GaN layers grown by hydride vapor phase epitaxy on (1-102) r-plan sapphire substrates are characterized. We report on the effect of low temperature ($500/550/600/660^{\circ}C$) AIN buffer layers on the structural properties of HVPE grown a-GaN kayers. and for the comparison, low temperature GaN and InGaN buffer layers are also tried for the growth of a-plane GaN layers. The structural geometry of a-GaN layers is severely affected on the growth condition of low temperature buffer layers. The most planar a-GaN could be obtained with $GaCl_3$ pretreatment at the growth temperature of $820^{\circ}C$.