• Title/Summary/Keyword: c-BN films

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Synthesis of Boron-Nitride Film by Plasma Assisted Chemical Vapor Deposition Using $BCl3-NH3-Ar$ Mixed Gas ($BCl3-NH3-Ar$계의 플라즈마화학증착공정을 이용한 질화붕소막의 합성)

  • 박범수;백영준;은광용
    • Journal of the Korean Ceramic Society
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    • v.34 no.3
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    • pp.249-256
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    • 1997
  • The effect of process parameter of plasma assisted chemical vapor deposition (PACVD) on the variation of the ratio between cubic boron nitride (c-BN) and hexagonal boron nitride (h-BN) in the film was in-vestigated. The plasma was generated by electric power with the frequency between 100 and 500 KHz. BCl3 and NH3 were used as a boron and nitrogen source respectively and Ar and hydrogen were added as a car-rier gas. Films were composed of h-BN and c-BN and its ratio varied with the magnitude of process parameters, voltage of the electric power, substrate bias voltage, reaction pressure, gas composition, sub-strate temperature. TEM observation showed that h-BN phase was amorphous while crystalline c-BN par-ticle was imbedded in h-BN matrix in the case of c-BN and h-BN mixed film.

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Photoluminescence of Hexagonal Boron Nitride (h-BN) Film

  • Jin, Moon-Seog;Kim, Nam-Oh
    • Journal of Electrical Engineering and Technology
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    • v.5 no.4
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    • pp.637-639
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    • 2010
  • Hexagonal boron nitride (BN) films were prepared. The process involved, spraying BN powder-dispersed $H_3BO_4-BCl_3$-ethyl alcohol solution on quartz plates, and the drying off quartz plates before, and annealing at $1070^{\circ}C$ in a nitrogen atmosphere. The optical energy band gap of the BN films was 5.28 eV. Photoluminescence peaks with energies of 3.44, 3.16, 2.97, and 2.35 eV at 10 K were observed and analyzed. Accordingly, these have resulted from donor-acceptor pair recombinations.

Effect of Moisture in a Vacuum Chamber on the Deposition of c-BN Thin Film using an Unbalanced Magnetron Sputtering Method (비대칭 마그네트론 스퍼터링 방법에 의한 질화붕소막의 증착시 반응실내의 초기 수분이 입방정질화붕소 박막의 형성에 미치는 영향)

  • Lee, Eun-Sook;Park, Jong-Keuk;Lee, Wook-Seong;Seong, Tae-Yeon;Baik, Young-Joon
    • Journal of the Korean Ceramic Society
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    • v.49 no.6
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    • pp.620-624
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    • 2012
  • The role of moisture remaining inside the deposition chamber during the formation of the cubic boron nitride (c-BN) phase in BN film was investigated. BN films were deposited by an unbalanced magnetron sputtering (UBM) method. Single-crystal (001) Si wafers were used as substrates. A hexagonal boron nitride (h-BN) target was used as a sputter target which was connected to a 13.56 MHz radiofrequency electric power source at 400 W. The substrate was biased at -60 V using a 200 kHz high-frequency power supply. The deposition pressure was 0.27 Pa with a flow of Ar 18 sccm - $N_2$ 2 sccm mixed gas. The inside of the deposition chamber was maintained at a moisture level of 65% during the initial stage. The effects of the evacuation time, duration time of heating the substrate holder at $250^{\circ}C$ as well as the plasma treatment on the inside chamber wall on the formation of c-BN were studied. The effects of heating as well as the plasma treatment very effectively eliminated the moisture adsorbed on the chamber wall. A pre-deposition condition for the stable and repeatable deposition of c-BN is suggested.

Fabrication of Boron-Doped Polycrystalline Silicon Films for the Pressure Sensor Application (압력센서용 Boron이 첨가된 다결정 Silicom 박막의 제조)

  • 유광수;신광선
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.3 no.1
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    • pp.59-65
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    • 1993
  • The boron-doped polycrystalline silicon films which can be used in pressure sensors were fabricated in a high-vacuum resistance heating evaporator. Poly-Si films were deposited on quartz substrates at various temperatures and the boron was doped to the silicon film in a diffusion furnace using BN wafer. The silicon films deposited at $500^{\circ}C$ was amorphous, began to show crystalline at $600^{\circ}C$, and became polycrystalline at $700^{\circ}C$. After doping boron at $900^{\circ}C$for 10 minutes, the resistivity of the films was in the range of $0.1{\Omega}cm~1.5{\Omega}cm$, the boron density was $9.4\times10^{15}~2.1\times{10}^{17}cm^{-3}$, and the grain size was $107{\AA}~191{\AA}$.

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Antimicrobial (BN/PE) Film Combined with Modified Atmosphere Packaging Extends the Shelf Life of Minimally Processed Fresh-Cut Iceberg Lettuce

  • Kang, Sun-Chul;Kim, Min-Jeong;Park, In-Sik;Choi, Ung-Kyu
    • Journal of Microbiology and Biotechnology
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    • v.18 no.3
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    • pp.568-572
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    • 2008
  • This study was conducted to investigate the effect of modified atmosphere packaging (MAP) in combination with BN/PE film on the shelf life and quality of fresh-cut iceberg lettuce during cold storage. The total mesophilic population in the sample packed in BN/PE film under MAP conditions was dramatically reduced in comparison with that of PE film, PE film under MAP conditions, and BN/PE film. The $O_2$ concentration in the BN/PE film under MAP conditions decreased slightly as the storage period progressed. The coloration of the iceberg lettuce progressed the slowest when it was packaged in BN/PE film under MAP conditions, followed by BN/PE film, PE film, and PE film under MAP conditions. The shelf life of fresh-cut iceberg lettuce packaged in the BN/PE film under MAP conditions was extended by more than 2 days at $10^{\circ}C$ as compared with that of the BN/PE film in which the extension effect was more than 2 days longer than that of PE, PET, and OPP films.

Microstructure and mechanical properties of superhard Ti-B-C-N films deposited by dc unbalanced magnetron sputtering

  • Jeong, Da-Un;Kim, Kwang-Ho
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.10a
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    • pp.163-164
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    • 2009
  • dc unbalanced magnetron sputtering 방법으로 superhard quarternary Ti-B-C-N films을 합성하였다. XPS, XRD 분석 결과 Ti-B-C-N films은 solid-solution (Ti,C,N)$B_2$와 Ti(C,N) 결정이 amorphous BN에 분포된 나노 복합체를 형성하였다. 여기에서는 film내 N의 양에 따라 강도가 증가하다가 그 후 감소하는 경향을 보였다.

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The Characteristic and Formation of Ti(B,N) Films on Steel by EA Hot Filament CVD (EA hot filament CVD system을 이용하여 금형공구강에 증착한 Ti(B,N)박막의 합성과 특성에 관하여)

  • Yoon, Jung-H.;Choi, Yong;Choe, Jean-I.
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.61 no.4
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    • pp.585-589
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    • 2012
  • The characteristics of interface layer and the effect of mole fraction of inlet gas mixture($B_2H_6/H_2/N_2/TiCl_4$) on the microstructure of Ti(B,N) films were studied by microwave plasma hot filament CVD process. Ti(B,N) films were deposited on a substrate(STD-61) to develop a high performance of resistance wear coating tool. Ti(B,N) films were obtained at a gas pressure of 1 torr, bias voltage of 300 V and substrate temperature of $480^{\circ}C$ in $B_2H_6/H_2/N_2/TiCl_4$gas system. It was found that TiN, $TiB_2$, TiB and hexagonal boron nitride(h-BN) phases exist in thin layer on the STD-61.