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http://dx.doi.org/10.5370/KIEE.2012.61.4.585

The Characteristic and Formation of Ti(B,N) Films on Steel by EA Hot Filament CVD  

Yoon, Jung-H. (단국대 공대 신소재공학과)
Choi, Yong (단국대 공대 신소재공학과)
Choe, Jean-I. (단국대 공대 신소재공학과)
Publication Information
The Transactions of The Korean Institute of Electrical Engineers / v.61, no.4, 2012 , pp. 585-589 More about this Journal
Abstract
The characteristics of interface layer and the effect of mole fraction of inlet gas mixture($B_2H_6/H_2/N_2/TiCl_4$) on the microstructure of Ti(B,N) films were studied by microwave plasma hot filament CVD process. Ti(B,N) films were deposited on a substrate(STD-61) to develop a high performance of resistance wear coating tool. Ti(B,N) films were obtained at a gas pressure of 1 torr, bias voltage of 300 V and substrate temperature of $480^{\circ}C$ in $B_2H_6/H_2/N_2/TiCl_4$gas system. It was found that TiN, $TiB_2$, TiB and hexagonal boron nitride(h-BN) phases exist in thin layer on the STD-61.
Keywords
(B,N)Films; Microwave plasma hot filament CVD; Resistance wear coating tool;
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