• 제목/요약/키워드: bumping

검색결과 87건 처리시간 0.025초

Novel Low-Volume Solder-on-Pad Process for Fine Pitch Cu Pillar Bump Interconnection

  • Bae, Hyun-Cheol;Lee, Haksun;Eom, Yong-Sung;Choi, Kwang-Seong
    • 마이크로전자및패키징학회지
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    • 제22권2호
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    • pp.55-59
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    • 2015
  • Novel low-volume solder-on-pad (SoP) process is proposed for a fine pitch Cu pillar bump interconnection. A novel solder bumping material (SBM) has been developed for the $60{\mu}m$ pitch SoP using screen printing process. SBM, which is composed of ternary Sn-3.0Ag-0.5Cu (SAC305) solder powder and a polymer resin, is a paste material to perform a fine-pitch SoP in place of the electroplating process. By optimizing the volumetric ratio of the resin, deoxidizing agent, and SAC305 solder powder; the oxide layers on the solder powder and Cu pads are successfully removed during the bumping process without additional treatment or equipment. The Si chip and substrate with daisy-chain pattern are fabricated to develop the fine pitch SoP process and evaluate the fine-pitch interconnection. The fabricated Si substrate has 6724 under bump metallization (UBM) with a $45{\mu}m$ diameter and $60{\mu}m$ pitch. The Si chip with Cu pillar bump is flip chip bonded with the SoP formed substrate using an underfill material with fluxing features. Using the fluxing underfill material is advantageous since it eliminates the flux cleaning process and capillary flow process of underfill. The optimized interconnection process has been validated by the electrical characterization of the daisy-chain pattern. This work is the first report on a successful operation of a fine-pitch SoP and micro bump interconnection using a screen printing process.

UV 검출기 제작을 위한 $8{\times}8$ ReadOut IC에 관한 연구 (Investigation on the $8{\times}8$ ReadOut IC for Ultra Violet Detector)

  • 김주연;김태근
    • 대한전자공학회논문지TE
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    • 제42권3호
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    • pp.45-50
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    • 2005
  • 산업용, 의학용 및 군사용, 환경감시용 등 다양한 분야에서 UV 카메라가 이용되고 있다. 높은 분해능과 고효율을 가진 GaN 계열의 III-V족 질화물 반도체를 이용하여 제작한 UV 센서인 포토다이오드로 부터 최적의 자외선 응답을 읽어낼 수 있는 ROIC(ReadOut IC)를 개발 했다. FPA(Focal Plane Array)용 UV $8{\times}8$ ReadOut IC(ROIC)를 설계를 위하여 포토다이오드 타입 센서 소자를 커패시터로 모델링하였다. ROIC는 검출되는 신호를 받아 이를 증폭하고 잡음제거 필터링을 거쳐 픽셀 단위로 순차적으로 출력하는 기능을 수행하도록 하였다. ROIC는 $0.5{\mu}m$ 2Poly, 3Metal N-well CMOS process를 이용하여 제작되었으며, 이방성 전도성 페이스트 (Anisotropic Conductive Paste:ACP)를 사용하는 gold stud bumping 공정으로 ROIC와 포토다이오드 어레이를 하이브리드 패키지 (package)한 후 PC에서 자외선 영상으로 확인함으로써 ROIC의 동작을 검증하였다.

사고사망자의 심층적 실증분석을 통한 예방적 개입점 발견 연구 (Finding on Preventive Intervention of Fatal Occupational Injuries Through Empirical Analysis of Accident Death)

  • 이관형;이홍석
    • 한국안전학회지
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    • 제34권3호
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    • pp.83-88
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    • 2019
  • The 7,993 cases of Survey Report of Fatal Industrial Accidents conducted jointly by the MEOL and the KOSHA for the recent seven years(2007-2013) were categorized according to personal and occupational characteristics, industry types, business sizes, job types, activities at the time accident, types of accidents, material agents(assailing materials), unsafe conditions, and unsafe acts. And it is found that among the 72.2 percent of fatal occupational accidents in the construction and manufacturing industries are caused by falling, sticking, bumping and being caught under objects & overturning. For this study, through the empirical analysis on causes of fatal industrial accidents, was used to identity high risk groups based on total data of 7,993 victims of occupational accidents. An annual fatal occupational injury (FOI) rate per 10,000 workers was about 0.47‱. The middle-aged group and the elderly group showed the highest FOI rates per 10,000 workers (0.73‱, 0.80‱), and the daily workers showed the highest FOI rate (1.46‱), and the craft and related trades workers showed the highest FOI rate (2.17‱). In case of industry type the mining industry (7.26‱) showed the highest FOI rate, followed by the sewerage, waste management, materials recovery and remediation activity industry (3.91‱) and the construction industry (2.71‱). The primary high risk target group that requires a strategy designed to reduce fatal occupation injuries caused by falling and bumping & contact(collision) is the construction industry, and the secondary high risk target group in the construction industry is classified as the equipment, machine operating and assembling workers in the construction industry, those aged 50 years old and above need the prevention measures against bumping & contact(collision) and being caught under an object & falling(objects), while those aged less than 50 years old need prevention measures against falling(persons).

비아 홀(TSV)의 Cu 충전 및 범핑 공정 단순화 (Copper Filling to TSV (Through-Si-Via) and Simplification of Bumping Process)

  • 홍성준;홍성철;김원중;정재필
    • 마이크로전자및패키징학회지
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    • 제17권3호
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    • pp.79-84
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    • 2010
  • 3차원 Si 칩 패키징 공정을 위한 비아 홀(TSV: Through-Si-Via) 및 Au 시드층 형성, 전기 도금을 이용한 Cu 충전기술과 범핑 공정 단순화에 관하여 연구하였다. 비아 홀 형성을 위하여 $SF_6$$C_4F_8$ 플라즈마를 교대로 사용하는 DRIE(Deep Reactive Ion Etching) 법을 사용하여 Si 웨이퍼를 에칭하였다. 1.92 ks동안 에칭하여 직경 40 ${\mu}m$, 깊이 80 ${\mu}m$의 비아 홀을 형성하였다. 비아 홀의 옆면에는 열습식 산화법으로 $SiO_2$ 절연층을, 스퍼터링 방법으로 Ti 접합층과 Au 시드층을 형성하였다. 펄스 DC 전기도금법에 의해 비아 홀에 Cu를 충전하였으며, 1000 mA/$dm^2$ 의 정펄스 전류에서 5 s 동안, 190 mA/$dm^2$의 역펄스 조건에서 25 s 동안 인가하는 조건으로 총 57.6 ks 동안 전기도금하였다. Si 다이 상의 Cu plugs 위에 리소그라피 공정 없이 전기도금을 실시하여 Sn 범프를 형성할 수 있었으며, 심각한 결함이 없는 범프를 성공적으로 제조할 수 있었다.

Solder Bumping Technology using Ti-W/ Cu Structure

  • Hwang, Kyu-Sung;Choi, Sung-Chang;Bok, Kyung-Soon;Chi, In-Ho;Jin, Jeong-Gi
    • 한국마이크로전자및패키징학회:학술대회논문집
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    • 한국마이크로전자및패키징학회 2001년도 3rd Korea-Japan Advanced Semiconductor Packaging Technology Seminar
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    • pp.193-205
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    • 2001
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SCHENSTED INSERTION AND DELETION ALGORITHMS FOR SHIFTED RIM HOOK TABLEAUX

  • Lee, Jaejin
    • Korean Journal of Mathematics
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    • 제14권1호
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    • pp.125-136
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    • 2006
  • Using the Bumping algorithm for the shifted rim hook tableaux described in [5], we construct Schensted insertion and deletion algorithms for shifted rim hook tableaux. This may give us the combinatorial proof for the orthogonality of the second kind of the spin characters of $S_n$.

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