• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2016.11a
• /
• pp.128-128
• /
• 2016

Cu 배선폭 미세화 기술은 반도체 디바이스의 성능 향상을 위한 핵심 기술이다. 현재 배선 기술은 lithography, deposition, planarization등 종합적인 공정 기술의 발전에 따라 10x nm scale까지 감소하였다. 하지만 지속적인 feature size 감소를 위하여 요구되는 높은 공정 기술 및 비용과 배선폭 미세화로 인한 재료의 물리적 한계로 인하여 배선폭 미세화를 통한 성능의 향상에는 한계가 있다. 배선폭 미세화를 통한 2차원적인 집적도 향상과는 별개로 chip들의 3차원 적층을 통하여 반도체 디바이스의 성능 향상이 가능하다. 칩들의 3차원 적층을 위해서는 별도의 3차원 배선 기술이 요구되는데, TSV(through-Si-via)방식은 Si기판을 관통하는 via를 통하여 chip간의 전기신호 교환이 최단거리에서 이루어지는 가장 진보된 형태의 3차원 배선 기술이다. Si 기판에 $50{\mu}m$이상 깊이의 via 및 seed layer를 형성 한 후 습식전해증착법을 이용하여 Cu 배선이 이루어지는데, via 내부 Cu ion 공급 한계로 인하여 일반적인 공정으로는 void와 같은 defect가 형성되어 배선 신뢰성에 문제를 발생시킨다. 이를 해결하기 위해 각종 유기 첨가제가 사용되는데, suppressor를 사용하여 Si 기판 상층부와 via 측면벽의 Cu 증착을 억제하고, accelerator를 사용하여 via 바닥면의 Cu 성장속도를 증가시켜 bottom-up TSV filling을 유도하는 방식이 일반적이다. 이론적으로, Bottom-up TSV filling은 sample 전체에서 Cu 성장을 억제하는 suppressor가 via bottom의 강한 potential로 인하여 국부적 탈착되고 via bottom에서만 Cu가 증착되어 되어 이루어지므로, accelerator가 없이도 void-free TSV filling이 가능하다. Accelerator가 Suppressor를 치환하여 오히려 bottom-up TSV filling을 방해한다는 보고도 있었다. 본 연구에서는 유기 첨가제의 치환으로 인한 TSV filling performance 저하를 방지하고, 유기 첨가제 조성을 단순화하여 용액 관리가 용이하도록 하기 위하여 suppressor만을 이용한 TSV filling 연구를 진행하였다. 먼저, suppressor의 흡착, 탈착 특성을 이해하기 위한 연구가 진행되었고, 이를 바탕으로 suppressor만을 이용한 bottom-up Cu TSV filling이 진행되었다. 최종적으로 $60{\mu}m$ 깊이의 TSV를 1000초 내에 void-free filling하였다.

• Journal of the Korean Recycled Construction Resources Institute
• /
• v.3 no.1
• /
• pp.7-14
• /
• 2015

The aim of this research is suggesting dry processed bottom ash as a new and economical source of lightweight aggregate for mortar and concrete. The dry process of bottom ash is an advance method of water-free and no chloride because only cooled down by double dry conveyer belt systems. Furthermore, because of relatively slow cooling down process helps burning up the remaining carbon in bottom ash. Using this dry process bottom ash, to evaluate the feasibility of using as a lightweight aggregate for mortar and concrete, two-phase of experiments were conducted: 1) improving shape of the bottom ash, and 2) controlling grade of the bottom ash. From the first phase of experiment, additional abrasing process was conducted for round shape bottom ash, hence improved workability and compressive strength was achieved while unit weight was increased comparatively. Based on the better shape of bottom ash, from the second phase, various grades were adopted on cement mortar, standard grade showed the most favorable results on fresh and hardened properties. It is considered that the results of this research contribute on widening sustainable method of using bottom ash based on the dry process and increasing value of bottom ash as a lightweight aggregate for concrete.

• Journal of Industrial Technology
• /
• v.25 no.B
• /
• pp.127-133
• /
• 2005

Manufacturing methods of Nano particles can be distinguished by top-down technology as physical method and bottom-up technology as chemical synthetic method. Top-down technology is a kind of method for making microstructure as like carving after forming a macroscopic structure in advance and its typical methods are ball milling, gas condensation method and so on. Nano Particles synthesized by bottom-up method have got to do dispersing process for using them as actual nano particles because their viscosity are very strong and so easy to shape cohesive substances. Therefore, this study is about a particle separating device which separates a certain constant size of grains processed already in mill and mixer because we mostly use media agitating mill as a device of milling and dispersing and we necessarily use very slight balls as media for manufacturing nano particles in the machine. The centrifugal device has been designed for passing and separating below a certain type of grain size after final process of particles in the mill.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.17 no.6
• /
• pp.277-282
• /
• 2007

The artificial lightweight aggregate (ALA) was manufactured using coal bottom ashes produced from a thermoelectric power plant with clay and, the sintering temperature and batch composition dependence upon physical properties of ALA were studied. The bottom ash (BA) had 13wt% coarse particle (>4.75mm) and showed very irregular shape so should be crushed to fine particles to be formed with clay by extrusion process. Also the bottom ash contained a many unburned carbon which generates the gas by oxidation and lighten a aggregate during a sintering process. Plastic index of green bodies decreased with increasing bottom ash content but the extrusion forming process was possible for the green body containing BA up to 40wt% whose plastic index and plastic limit were around 10 and 22 respectively. The ALA containing $30{\sim}40wt%$ BA sintered at $1100{\sim}1200^{\circ}C$ showed a volume specific density of $1.3{\sim}1.5$ and water absorption of $13{\sim}15%$ and could be appled for high-rise building and super-long bridge.

• Journal of Korean Society of Rural Planning
• /
• v.28 no.3
• /
• pp.49-59
• /
• 2022

Recently, Korea aimed to increase water use efficiency by implementing integrated management according to the water management unification policy. Considering the enormous use of water resources in the agricultural sector, it is necessary to efficiently conserve water in terms of demand management by intensifying the stakeholders' involvement and awareness campaigns. The existing agricultural water management system in Korea is based on a top-down approach by which the government agencies directly plan budgets and policies to be enforced on and implemented by farmers, with little to no involvement of farmers in the decision-making process. However, this process has hindered the desired water resources management and the water conservation goal at the field level. Moreover, the limited research on water governance operations focusing on agricultural water creates a knowledge gap, particularly in Korea. Thus, it is necessary to investigate water governance cases with successful implementations in agricultural and rural areas to identify the factors applicable to domestic governance in Korea. In addition, a more systematic governance model should be established by identifying the subjectivity of the stakeholders' involvement in agricultural water governance. Therefore, this study proposed a new bottom-up model for agricultural water governance, which aims to raise the problem of autonomous water governance while promoting stakeholders' voluntary participation in agricultural water management and reflecting farmers' involvement in the decision-making process. Moreover, if agricultural water governance is expanded nationwide by reflecting agricultural and water resource policies in the future, it is believed that positive effects can be achieved in increasing utilization efficiency and securing sustantiality through agricultural water saving.

• Proceedings of the Korean Society for Technology of Plasticity Conference
• /
• 2003.10a
• /
• pp.333-338
• /
• 2003

Nano-imprint lithography(NIL) is a polymer embossing technique, capable of transferring nano-scale patterns onto a thin film of thermoplastics such as polymethyl methacrylate(PMMA) using this parallel process. Feature size down 10 nm have been demonstrated. In NIL, the pattern is formed by displacing polymer material, which can be squeeze flow of a viscous liquid. Due to the size of the pattern, a thorough understood of the process through experiments may be very different. Therefore we nead to resort to numerical simulation on the embossing process. Generally, there are two ways of numerical simulation on nano-scale flow, namely top-down and bottom-up approach. Top-down approach is a way to simulate the flow assuming that polymer is a continuum. On the contrary, in the bottom-up approach, simulation is peformed using molecular dynamics(MD). However, as latter method is not feasible yet. we chose the top-down approach. For the numerical analysis, two dimensional moving grid was used since the moving grid can predict the flow front. Effects of surface tension as well as the slip at the boundary were also considered.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2014.02a
• /
• pp.430.1-430.1
• /
• 2014

According to advanced nanotechnology in the field of biomedical engineering, many studies of the interaction between topography of surfaces and cellular responses have been focused on nanostructure. In order to investigate this interaction, it is essential to make well-controlled nanostructures. Electron beam lithography (EBL) have been considered the most typical processes to fabricate and control nano-scale patterns. In this work, $TiO_2$ nanowire array was fabricated with hybrid process (top-down and bottom-up processes). Nanodot arrays were patterned on the substrate by EBL process (top-down). In order to control the spacing between nanodots, we optimized the EBL process using Poly(methyl methacrylate) (PMMA) as an electron beam resist. Metal lift-off was used to transfer the spacing-controlled nanodots as a seed pattern of $TiO_2$ nanowire array. Au or Sn nanodots which play an important role for catalyst using Vapor-Liquid-Solid (VLS) method were patterned on the substrate through the lift-off process. Then, the sample was placed in the tube furnace and heated at the synthesis temperature. After heat treatment, $TiO_2$ nanowire array was fabricated from the nanodots through VLS method (bottom-up). These results of spacing-controlled nanowire arrays will be used to study the interaction between nanostructures and cellular responses in our next steps.

• International Journal of Contents
• /
• v.15 no.2
• /
• pp.53-58
• /
• 2019

The aim of this paper is to discuss how designers lead and direct 'technology-driven society' using their creative communication skill. To this end, it is required for communication designers to take conscious steps to recognize the future direction of their profession. Despite the advancement in technology, there is a human being at the center of all design activities. From a certain point of view, contemporary communication design takes an open-ended exploration of the subject matter, rather than a finished output. The notion of creative leadership may potentially expand more in terms of improving the methodology of today's visual culture. The paper will examine creative leadership that could be proposed by the challenge of discourse upon the upcoming industrial revolution. Today, communication designers are confronted by new leadership opportunities and challenges. Some leading designers seem to focus on brand new media technologies to prepare the 4th industrial revolutions. However, communication design cannot be discussed in the medium but can be understood as a process. Top-down and bottom-up process is always a concerned about the relationship since the focus of leadership has changed. In the top-down process, the leadership has existed between 'designer and client' because designers have played their role as a problem solver. On the other hand, there is a different model of leadership between 'design and technology' based on bottom-up process, which stem from the design authorship. In this regard, the new definition of creative leadership in the $4^{th}$ industrial revolution proposes a designer as a problem-finder based on the relationship between the 'designer and the public'.

• Review of Culture and Economy
• /
• v.19 no.2
• /
• pp.97-120
• /
• 2016

This study aims to identify how performing artists in Korea, who are the target beneficiaries of the Arts Council Korea's Performing Arts Fostering Program, Chang-jak-san-shil(CJSS), would perceive and assess the current state of CJSS and its effects. To do so, this paper has adopted a bottom-up approach as a theoretical lens for policy evaluative analysis. This research engages with qualitative research design by conducting a series of in-depth interviews and FGIs with 28 participants in total. The interview participants consist of CJSS grantees(n=21) and peer-review panels(n=7) based on the intension to enhance objectivity and reliability of the study. Results of the data analysis suggest that the grant program still carries pressing needs to achieve a success as follows: providing post-program support, enhancing transparency of the panel appointment process and the peer review process, reflecting different nature of each arts discipline, and having more open communications with arts professionals. Based on these findings, this paper will provide and discuss about policy implications which can contribute to the performing arts domain at large.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.18 no.5
• /
• pp.389-395
• /
• 2005

The etching technology of the high aspect ratio contact(HARC) is necessary at the critical contact processes of semiconductor devices. Etching the $SiO_{2}$ contact hole with the sub-micron design rule in manufacturing VLSI devices, the unexpected phenomenon of 'profile tilting' or 'bottom distortion' is often observed. This makes a short circuit between neighboring contact holes, which causes to drop seriously the device yield. As the aspect ratio of contact holes increases, the high C/F ratio gases, $C_{4}F_{6}$, $C_{4}F_{8}$ and $C_{5}F_{8}$, become widely used in order to minimize the mask layer loss during the etching process. These gases provide abundant fluorocarbon polymer as well as high selectivity to the mask layer, and the polymer with high sticking yield accumulates at the top-wall of the contact hole. During the etch process, many electrons are accumulated around the asymmetric hole mouth to distort the electric field, and this distorts the ion trajectory arriving at the hole bottom. These ions with the distorted trajectory induce the deformation of the hole bottom, which is called 'profile tilting' or 'bottom distortion'. To prevent this phenomenon, three methods are suggested here. 1) Using lower C/F ratio gases, $CF_{4}$ or $C_{3}F_{8}$, the amount of the Polymer at the hole mouth is reduced to minimize the asymmetry of the hole top. 2) The number of the neighboring holes with equal distance is maximized to get the more symmetry of the oxygen distribution around the hole. 3) The dual frequency plasma source is used to release the excessive charge build-up at the hole mouth. From the suggested methods, we have obtained the nearly circular hole bottom, which Implies that the ion trajectory Incident on the hole bottom is symmetry.