• 제목/요약/키워드: bottom electrode

검색결과 349건 처리시간 0.027초

Effect of the Plasma-assisted Patterning of the Organic Layers on the Performance of Organic Light-emitting Diodes

  • Hong, Yong-Taek;Yang, Ji-Hoon;Kwak, Jeong-Hun;Lee, Chang-Hee
    • Journal of Information Display
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    • 제10권3호
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    • pp.111-116
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    • 2009
  • In this paper, a plasma-assisted patterning method for the organic layers of organic light-emitting diodes (OLEDs) and its effect on the OLED performances are reported. Oxygen plasma was used to etch the organic layers, using the top electrode consisting of lithium fluoride and aluminum as an etching mask. Although the current flow at low voltages increased for the etched OLEDs, there was no significant degradation of the OLED efficiency and lifetime in comparison with the conventional OLEDs. Therefore, this method can be used to reduce the ohmic voltage drop along the common top electrodes by connecting the top electrode with highly conductive bus lines after the common organic layers on the bus lines are etched by plasma. To further analyze the current increase at low voltages, the plasma patterning effect on the OLED performance was investigated by changing the device sizes, especially in one direction, and by changing the etching depth in the vertical direction of the device. It was found that the current flow increase at low voltages was not proportional to the device sizes, indicating that the current flow increase does not come from the leakage current along the etched sides. In the etching depth experiment, the current flow at low voltages did not increase when the etching process was stopped in the middle of the hole transport layer. This means that the current flow increase at low voltages is closely related to the modification of the hole injection layer, and thus, to the modification of the interface between the hole injection layer and the bottom electrode.

Intracellular Electrical Stimulation on PC-12 Cells through Vertical Nanowire Electrode

  • Kim, Hyungsuk;Kim, Ilsoo;Lee, Jaehyung;Lee, Hye-young;Lee, Eungjang;Jeong, Du-Won;Kim, Ju-Jin;Choi, Heon-Jin
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.407-407
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    • 2014
  • Nanotechnology, especially vertically grown silicon nanowires, has gotten great attentions in biology due to characteristics of one dimensional nanostructure; controllable synthetic structure such as lengths, diameters, densities. Silicon nanowires are promising materials as nanoelectrodes due to their highly complementary metal-oxide-semiconductor (CMOS) - and bio-compatibility. Silicon nanowires are so intoxicated that are effective for bio molecular delivery and electrical stimulation. Vertical nanowires with integrated Au tips were fabricated for electrical intracellular interfacing with PC-12 cells. We have made synthesized two types of nanowire devices; one is multi-nanowires electrode for bio molecular sensing and electrical stimulation, and the other is single-nanowires electrode respectively. Here, we demonstrate that differentiation of Nerve Growth Factor (NGF) treated PC-12 cells can be promoted depending on different magnitudes of electrical stimulation and density of Si NWs. It was fabricated by both bottom-up and top-down approaches using low pressure chemical vapor deposition (LPCVD) with high vacuuming environment to electrically stimulate PC-12 cells. The effects of electrical stimulation with NGF on the morphological differentiation are observed by Scanning Electron Microscopy (SEM), and it induces neural outgrowth. Moreover, the cell cytosol can be dyed selectively depending on the degree of differentiation along with fluorescence microscopy measurement. Vertically grown silicon nanowires have further expected advantages in case of single nanowire fabrication, and will be able to expand its characteristics to diverse applications.

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Crystal Structure and Dielectric Responses of Pulsed Laser Deposited (Ba, Sr)$TiO_3$ Thin Films with Perovskite $LaNiO_3$ Metallic Oxide Electrode

  • Lee, Su-Jae;Kang, Kwang-Yong;Jung, Sang-Don;Kim, Jin-Woo;Han, Seok-Kil
    • The Korean Journal of Ceramics
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    • 제6권3호
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    • pp.258-261
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    • 2000
  • Highly (h00)-oriented (Ba, Sr)TiO$_3$(BST) thin films were grown by pulsed laser deposition on the perovskite LaNiO$_3$(LNO) metallic oxide layer as a bottom electrode. The LNO films were deposited on SiO$_2$/Si substrates by rf-magnetron sputtering method. The crystalline phases of the BST film were characterized by x-ray $\theta$-2$\theta$, $\omega$-rocking curve and $\psi$-scan diffraction measurements. The surface microsturcture observed by scanning electron microscopy was very dense and smooth. The low-frequency dielectric responses of the BST films grown at various substrate temperatures were measured as a function of frequency in the frequency range from 0.1 Hz to 10 MHz. The BST films have the dielectric constant of 265 at 1 kHz and showed multiple dielectric relaxation at the low frequency region. The origin of these low-frequency dielectric relaxation are attributed to the ionized space charge carriers such as the oxygen vacancies and defects in BST film, the interfacial polarization in the grain boundary region and the electrode polarization. We studied also on the capacitance-voltage characteristics of BST films.

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Al2O3 기판위에 형성된 Ti-O 완충층을 가진 Ta/Ta2O5커패시티의 특성 (The Characteristics of Ti-O Buffer Layered Ta/Ta2O5Capacitors on the Al2O3 substrate)

  • 김현주;송재성;김인성;김상수
    • 한국전기전자재료학회논문지
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    • 제16권9호
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    • pp.807-811
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    • 2003
  • We investigated the electrical characterisitics of T $a_2$ $O_{5}$ (tantalum pentoxide) film and Ti-O/T $a_2$ $O_{5}$ film deposited on $Al_2$ $O_3$based substrate. Ta (tantalum) electrode and $Al_2$ $O_3$ substrate was used for the purpose of simplifying the manufacturing process in IPD's (integrated passive devices). Dielectric materials (T $a_2$ $O_{5}$ and Ti-O/T $a_2$ $O_{5}$ films) deposited on Ta/Ti/A $l_2$ $O_3$ were annealed at 700 $^{\circ}C$ for 60 sec. in vacuum. The XRD results showed that as-deposited T $a_2$ $O_{5}$ film possessed amorphous structure, which was transformed to crystallines by rapid thermal heat treatment. We compared the lnJ- $E^{{\frac}{1}{2}}$, C-V, C-F of both as-deposited and annealed dielectric thin films deposited on Ta bottom electrode. From this results, we concluded that the leakage current could be reduced by introducing Ti-O buffer layer and conduction mechanisms of T $a_2$ $O_{5}$ and Ti-O/T $a_2$ $O_{5}$ could be interpreted appropriately by Schottky emission effect.

그래핀 기반 3단자 NEMS 스위칭 소자 설계 및 동작 시뮬레이션 연구 (Design and Simulation Study on Three-terminal Graphene-based NEMS Switching Device)

  • 권오근;강정원;이규영
    • 예술인문사회 융합 멀티미디어 논문지
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    • 제8권6호
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    • pp.939-946
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    • 2018
  • 본 논문에서는 그래핀의 우수한 전기적 기계적 특성을 이용하여 정전기 인력에 의하여 휘어지는 그래핀이 수직 팁 게이트에 접촉 여부에 따라서 스위칭이 이루어지도록 조절할 수 있는 3단자 그래핀 NEMS 스위칭 소자에 대하여 연구하였다. 전형적인 MEMS 제작 공정을 이용하여 3단가 그래핀 NEMS 스위칭 소자 제작을 위한 공정을 설계하였고, 그 동작의 핵심 역학은 그래핀에 작용하는 정전기력과 그래핀 자체의 탄성력에 의하여 스우칭의 기계적인 동작이 설명될 수 있었다. 전기적인 동작에서는 그래핀과 핀 전극 사이의 접촉에 의한 접촉 전류와 그래핀이 전극에 접촉하지 않았음에도 그래핀과 핀 전극 사이의 강한 전기장으로 인한 방출전류가 흐를 수 있을 것으로 예상되었다. 실제 기계적인 동작에서 원자단위에서의 움직임을 분석하기 위하여 분자동력학 시뮬레이션 방법을 사용하여 수직 팁 게이트를 가지는 그래핀 기반 3단자 NEMS 스위치 동작에 관하여 연구하여, 기계적인 동작에 따라서 발생되는 다양한 현상들을 분자동력학 시뮬레이션을 통하여 연구함으로써 원자단위에서 이루어지는 다양한 역학들을 살펴보았다.

뇌파를 이용한 열차 최적의 HUD위치 평가 (Evaluation for Optimal HUD Location on a Train Using EEG)

  • 왕창원;김용규;민세동
    • 한국통신학회논문지
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    • 제39C권11호
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    • pp.985-993
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    • 2014
  • 본 논문은 뇌파와 ANOVA를 이용하여 생체신호와 통계 분석기반의 상관관계를 통해 열차 최적의 HUD위치를 평가하는 새로운 방법을 제안하였다. 본 연구에서는 최적의 HUD위치를 평가하기 위해 총 2가지 실험을 진행하였다. 첫 번째 연구실에서 각각 다른 여섯 위치(좌측 상단 및 하단, 중앙 상단 및 하단, 우측 상단 및 하단)에 시각자극을 제시하였고, 이미지는 $235{\times}197cm2$ 크기의 스크린에 30초동안 나타냈다. 두 번째 HUD 이미지는 철도시뮬레이터에서 각각 다른 세 군데에 구성하였고, 이미지는 스크린에 30초 동안 나타냈다. 뇌파는 정서적 안정성을 평가하기 위해 알파파와 베타파를 이용하였고, 10-20전극 배치법에 따라 Fp1, Fp2, F7, F8채널에서 측정하였다. 연구실 실험 결과, F7채널 베타파에서 유의확률 0.006으로 통계적으로 유의하게 나타났고, 알파파와 베타파 간 음의 상관관계(r=-0.190)가 있는 것으로 나타났다. 또한 스크린의 좌측 상단, 중앙 하단 위치가 우측 하단 위치에 비해 베타파가 낮게 나타났다. 철도 시뮬레이터 실험 결과, Fp1베타파가 유의확률 0.033으로 통계적으로 유의하게 나타났고, 중앙보다는 좌측일 때 베타파가 낮게 나타났다. 본 연구의 결과는 알파 파와 베타 파 사이의 상관 관계를 통해 최적의 HUD 위치의 평가에 대한 도움이 될 것으로 생각된다.

2단계 스퍼터링에 의한 PZT 박막의 유전특성 (Dielectric properties of PZT thin films by 2 step sputtering)

  • 박삼규;마재평
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2004년도 하계종합학술대회 논문집(2)
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    • pp.363-366
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    • 2004
  • PZT thin films were formed by rf-magnetron sputtering on $Pt/Ti/SiO_2/Si$ substrate. Bulk PZT target containing $5\%$ excess PbO was used. They were formed with in-situ process at $650^{\circ}C$ as total thickness of 175 and 250 nm after the depositing of thin PZT films at room temperature, i. e. 2-step Sputtering. It was found that the ferroelectric perovskite phase is formed at $650^{\circ}C$ by XRD and the interface between room temp.-layer and $650^{\circ}C$ -layer is not existent. In the samples undergoing 2-step sputtering the dielectric constant was 600 or more and the leakage current density was $2{\times}10^{-7}A/cm^2$. So, we found that the room temp.-layer on the bottom electrode stabilize the underlaid layers.

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프린지 필드에 의해 구동되는 하이브리드형 네마틱 액정 디스플레이의 전기광학 특성 (Electro-optic Characteristics of Hybrid Aligned Nematic Liquid Crystal Display Driven by Fringe Field)

  • 정연학;김향율;이승희
    • 한국전기전자재료학회논문지
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    • 제15권6호
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    • pp.524-528
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    • 2002
  • Conventional hybrid aligned nematic liquid crystal display (HAN-LCD) has several advantages on low operating voltage, fast response time and rubbing free on one substrate. We have fabricated a new hybrid aligned nematic display driven by fringe field. The new device exhibits much wider viewing: angle than that of the conventional HAN mode, owing to almost in-plane rotation of the LC director. Furthermore, we have developed the device that reveals more efficient electro-optic characteristics by placing common electrode on top and bottom substrates. In this paper, the electro-optic characteristics of the novel cell are investigated.