• Title/Summary/Keyword: bipolar process

Search Result 231, Processing Time 0.028 seconds

A Sub-1V Nanopower CMOS Only Bandgap Voltage Reference (CMOS 소자로만 구성된 1V 이하 저전압 저전력 기준전압 발생기)

  • Park, Chang-Bum;Lim, Shin-Il
    • Journal of IKEEE
    • /
    • v.20 no.2
    • /
    • pp.192-195
    • /
    • 2016
  • In this paper, we present a nanopower CMOS bandgap voltage reference working in sub-threshold region without resisters and bipolar junction transistors (BJT). Complimentary to absolute temperature (CTAT) voltage generator was realized by using two n-MOSFET pair with body bias circuit to make a sufficient amount of CTAT voltage. Proportional to absolute temperature (PTAT) voltage was generated from differential amplifier by using different aspect ratio of input MOSFET pair. The proposed circuits eliminate the use of resisters and BJTs for the operation in a sub-1V low supply voltage and for small die area. The circuits are implemented in 0.18um standard CMOS process. The simulation results show that the proposed sub-BGR generates a reference voltage of 290mV, obtaining temperature coefficient of 92 ppm/$^{\circ}C$ in -20 to $120^{\circ}C$ temperature range. The circuits consume 15.7nW at 0.63V supply.

Molecular Hydrogen Outflow in Infrared Dark Cloud Core MSXDC G53.11+00.05

  • Kim, Hyun-Jeong;Koo, Bon-Chul;Pyo, Tae-Soo;Davis, Christopher J.
    • The Bulletin of The Korean Astronomical Society
    • /
    • v.40 no.2
    • /
    • pp.41.4-42
    • /
    • 2015
  • Outflows and jets from young stellar objects (YSOs) are prominent observational phenomena in star formation process. Indicating currently ongoing star formation and directly tracing mass accretion, they provide clues about the accretion processes and accretion history of YSOs. While outflows of low-mass YSOs are commonly observed and well studied, such studies for high-mass YSOs have been so far rather limited owing to their large distances and high visual extinction. Recently, we have found a number of molecular hydrogen (H2 1-0 S(1) at 2.12 micron) outflows in the long, filamentary infrared dark cloud (IRDC) G53.2 located at 1.7 kpc from UWISH2, the unbiased, narrow-band imaging survey centered at 2.12 micron using WFCAM/UKIRT. In IRDC G53.2 which is an active star-forming region with ~300 YSOs, H2 outflows are ubiquitously distributed around YSOs along dark filaments. In this study, we present the most prominent H2 outflow among them identified in one of the IRDC cores MSXDC G53.11+00.05. The outflow shows a remarkable bipolar morphology and has complex structures with several flows and knots. The outflow size of ~1 pc and H2 luminosity about ~1.2 Lsol as well as spectral energy distributions of the Class I YSOs at the center suggest that the outflow is likely associated with a high-mass YSO. We report the physical properties of H2 outflow and characteristics of central YSOs that show variability between several years using the H2 and [Fe II] images obtained from UWISH2, UWIFE and Subaru/IRCS+AO188 observations. Based on the results, we discuss the possible origin of the outflow and accretion processes in terms of massive star formation occurring in IRDC core.

  • PDF

An Automatic Measuring System of the Electric Fields Produced by Lightning Strokes (뇌방전에 의하여 발생하는 전장의 자동측정시스템)

  • Lee, Bok-Hee;Ahn, Chang-Hwan;Kil, Gyung-Suk
    • Journal of Sensor Science and Technology
    • /
    • v.5 no.2
    • /
    • pp.47-54
    • /
    • 1996
  • This paper deals with the electric field sensor and automatic measuring system of the time-varying space electric field produced by lightning discharges. The theoretical principle and the design rule of the measuring devices are investigated, and the semisphere-type electric field sensor and the signal process system are fabricated. From the calibration experiments, the frequency bandwidth of the measuring system ranges from 200 [Hz] to 1.56 [MHz] and the sensitivity is 0.96 [m V/V/m] as the amplification gain is 10. In addition, the electric field waveforms produced by lightning discharges are observed by the proposed electric field measuring system from June to August in 1995. The data is sampled with the time interval of 200 [ns] and is automatically recorded by transient signal analyzer(Necolet Pro 30), the resolution of which is 12 bit. And it is registered at personal computer. The electric field waveforms produced by intracloud discharge tend to be bipolar, with two or three narrow and fast rising pulses superimposed on the initial half-cycle.

  • PDF

Low-Temperature Si and SiGe Epitaxial Growth by Ultrahigh Vacuum Electron Cyclotron Resonance Chemical Vapor Deposition (UHV-ECRCVD)

  • Hwang, Ki-Hyun;Joo, Sung-Jae;Park, Jin-Won;Euijoon Yoon;Hwang, Seok-Hee;Whang, Ki-Woong;Park, Young-June
    • Proceedings of the Korea Association of Crystal Growth Conference
    • /
    • 1996.06a
    • /
    • pp.422-448
    • /
    • 1996
  • Low-temperature epitaxial growth of Si and SiGe layers of Si is one of the important processes for the fabrication of the high-speed Si-based heterostructure devices such as heterojunction bipolar transistors. Low-temperature growth ensures the abrupt compositional and doping concentration profiles for future novel devices. Especially in SiGe epitaxy, low-temperature growth is a prerequisite for two-dimensional growth mode for the growth of thin, uniform layers. UHV-ECRCVD is a new growth technique for Si and SiGe epilayers and it is possible to grow epilayers at even lower temperatures than conventional CVD's. SiH and GeH and dopant gases are dissociated by an ECR plasma in an ultrahigh vacuum growth chamber. In situ hydrogen plasma cleaning of the Si native oxide before the epitaxial growth is successfully developed in UHV-ECRCVD. Structural quality of the epilayers are examined by reflection high energy electron diffraction, transmission electron microscopy, Nomarski microscope and atomic force microscope. Device-quality Si and SiGe epilayers are successfully grown at temperatures lower than 600℃ after proper optimization of process parameters such as temperature, total pressure, partial pressures of input gases, plasma power, and substrate dc bias. Dopant incorporation and activation for B in Si and SiGe are studied by secondary ion mass spectrometry and spreading resistance profilometry. Silicon p-n homojunction diodes are fabricated from in situ doped Si layers. I-V characteristics of the diodes shows that the ideality factor is 1.2, implying that the low-temperature silicon epilayers grown by UHV-ECRCVD is truly of device-quality.

  • PDF

Microwave Annealing in Ag/HfO2/Pt Structured ReRAM Device

  • Kim, Jang-Han;Kim, Hong-Ki;Jang, Ki-Hyun;Bae, Tae-Eon;Cho, Won-Ju;Chung, Hong-Bay
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2014.02a
    • /
    • pp.373-373
    • /
    • 2014
  • Resistive-change random access memory (ReRAM) device is one of the promising candidates owing to its simple structure, high scalability potential and low power operation. Many resistive switching devices using transition metal oxides materials such as NiO, Al2O3, ZnO, HfO2, $TiO_2$, have attracting increased attention in recent years as the next-generation nonvolatile memory. Among various transition metal oxides materials, HfO2 has been adopted as the gate dielectric in advanced Si devices. For this reason, it is advantageous to develop an HfO2-based ReRAM devices to leverage its compatibility with Si. However, the annealing temperature of these high-k thin films for a suitable resistive memory switching is high, so there are several reports for low temperature process including microwave irradiation. In this paper, we demonstrate the bipolar resistive switching characteristics in the microwave irradiation annealing processed Ag/HfO2/Pt ReRAM device. Compared to the as-deposited Ag/HfO2/Pt device, highly improved uniformity of resistance values and operating voltage were obtained from the micro wave annealing processed HfO2 ReRAM device. In addition, a stable DC endurance (>100 cycles) and a high data retention (>104 sec) were achieved.

  • PDF

Exploration of growth mechanism for layer controllable graphene on copper

  • Song, Woo-Seok;Kim, Yoo-Seok;Kim, Soo-Youn;Kim, Sung-Hwan;Jung, Dae-Sung;Jun, Woo-Sung;Jeon, Cheol-Ho;Park, Chong-Yun
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2011.02a
    • /
    • pp.490-490
    • /
    • 2011
  • Graphene, hexagonal network of carbon atoms forming a one-atom thick planar sheet, has been emerged as a fascinating material for future nanoelectronics. Huge attention has been captured by its extraordinary electronic properties, such as bipolar conductance, half integer quantum Hall effect at room temperature, ballistic transport over ${\sim}0.4{\mu}m$ length and extremely high carrier mobility at room temperature. Several approaches have been developed to produce graphene, such as micromechanical cleavage of highly ordered pyrolytic graphite using adhesive tape, chemical reduction of exfoliated graphite oxide, epitaxial growth of graphene on SiC and single crystalline metal substrate, and chemical vapor deposition (CVD) synthesis. In particular, direct synthesis of graphene using metal catalytic substrate in CVD process provides a new way to large-scale production of graphene film for realization of graphene-based electronics. In this method, metal catalytic substrates including Ni and Cu have been used for CVD synthesis of graphene. There are two proposed mechanism of graphene synthesis: carbon diffusion and precipitation for graphene synthesized on Ni, and surface adsorption for graphene synthesized on Cu, namely, self-limiting growth mechanism, which can be divided by difference of carbon solubility of the metals. Here we present that large area, uniform, and layer controllable graphene synthesized on Cu catalytic substrate is achieved by acetylene-assisted CVD. The number of graphene layer can be simply controlled by adjusting acetylene injection time, verified by Raman spectroscopy. Structural features and full details of mechanism for the growth of layer controllable graphene on Cu were systematically explored by transmission electron microscopy, atomic force microscopy, and secondary ion mass spectroscopy.

  • PDF

Antireflection Layer Coating for the Red Light Detecting Si Photodiode (적색검출 Si 포토다이오드의 광반사 방지막 처리)

  • Chang, Gee-Keun;Hwang, Yong-Woon;Cho, Jae-Uk;Yi, Sang-Yeoul
    • Korean Journal of Materials Research
    • /
    • v.13 no.6
    • /
    • pp.389-393
    • /
    • 2003
  • The effect of antireflection layer on the reduction of optical loss has been investigated in Si photodiodes detecting red light with central wavelength of 670 nm. The theoretical analysis showed minimum reflection loss of 6% for the $SiO_2$thickness of about $1100∼1200\AA$ in the $SiO_2$-Si system with the single antireflection layer and no reflection loss for the X$N_3$N$_4$$SiO_2$thickness of $2000\AA$/$1200\AA$ in the $Si_3$$N_4$$SiO_2$-Si system with double antireflection layer. In our experiments, Si photodiodes with the web-patterned $p^{+}$-shallow diffusion region were fabricated by bipolar IC process technology and the devices were classified into three kinds according to the structure of $Si_3$$N_4$/$SiO_2$antireflection layer. The fabricated devices showed maximum spectral response in the optical spectrum of 650∼700 nm. The average photocurrents of the devices with the $Si_3$$N_4$$SiO_2$thickness of $1000\AA$/X$SiO\AA$, and $2000\AA$$1800\AA$ under the incident power, of -17 dBm were 3.2 uA, 3.5 uA and 3.1 uA, respectively.

Thermal Characteristic and Failure Modes and Effects Analysis for Components of Photovoltaic PCS (태양광 발전 PCS 구성부품에 대한 열적특성 및 고장모드영향분석)

  • Kim, Doo-Hyun;Kim, Sung-Chul;Kim, Yoon-Bok
    • Journal of the Korean Society of Safety
    • /
    • v.33 no.4
    • /
    • pp.1-7
    • /
    • 2018
  • This paper is analyzed for the thermal characteristics(1 year) of the 6 components(DC breaker, DC filter(including capacitor and discharge resistance), IGBT(Insulated gate bipolar mode transistor), AC filter, AC breaker, etc.) of a photovoltaic power generation-based PCS(Power conditioning system) below 20 kW. Among the modules, the discharge resistance included in the DC filter indicated the highest heat at $125^{\circ}C$, and such heat resulting from the discharge resistance had an influence on the IGBT installed on the rear side the board. Therefore, risk priority through risk priority number(RPN) of FMEA(Failure modes and effects analysis) sheet is conducted for classification into top 10 %. According to thermal characteristics and FMEA, it is necessary to pay attention to not only the in-house defects found in the IGBT, but also the conductive heat caused by the discharge resistance. Since it is possible that animal, dust and others can be accumulated within the PCS, it is possible that the heat resulting from the discharge resistance may cause fire. Accordingly, there are two options that can be used: installing a heat sink while designing the discharge resistance, and designing the discharge resistance in a structure capable of avoiding heat conduction through setting a separation distance between discharge resistance and IGBT. This data can be used as the data for conducting a comparative analysis of abnormal signals in the process of developing a safety device for solar electricity-based photovoltaic power generation systems, as the data for examining the fire accidents caused by each module, and as the field data for setting component management priorities.

Effect of Retinoic Acid on Membrane Fusion and Expression of Fibronectin in Chick Embryonic Myoblasts (Retinoic Acid가 배양게배 근원세포의 융합과 Fibronictin의 발현에 미치는 영향)

  • 김혜선;정필중;강만식;정진하;하두봉
    • The Korean Journal of Zoology
    • /
    • v.38 no.4
    • /
    • pp.483-489
    • /
    • 1995
  • Retinoic acid was found to block membrane fusion of chick embryonic myoblasts in culture. This effed was dosedependent and could he reversed upon removal of the agent from the culture medium. Furthermore, the retinoic acid-mediated inhibition of membrane fusion was observed with the fusion competent cells but not with the cells that had already been committed for fusion, indicating that the effect of RA is differentiation stage-specific. However, retinoic acid showed little or no effect on the ability of the cells to form bipolar shape and to align along their axes. Neither the cell proliferation nor accumulation of muscle specific proteins, such as creatine kinase and tropomyosin, was impaired significantly. On the other hand, retinoic acid blocked the differentiation time~ependent loss of fibronectin, whose process is prerequisite for myoblast fusion. These results suggest that retinoic add acts as a specific inhibitor of membrane fusion by preventing the loss of fibronectin from the differentiating myoblasts.

  • PDF

A Design of Peak Current-mode DC-DC Buck Converter with ESD Protection Devices (ESD 보호 소자를 탑재한 Peak Current-mode DC-DC Buck Converter)

  • Park, Jun-Soo;Song, Bo-Bae;Yoo, Dae-Yeol;Lee, Joo-Young;Koo, Yong-Seo
    • Journal of IKEEE
    • /
    • v.17 no.1
    • /
    • pp.77-82
    • /
    • 2013
  • In this paper, dc-dc buck converter controled by the peak current-mode pulse-width-modulation (PWM) presented. Based on the small-signal model, we propose the novel methods of the power stage and the systematic stability designs. To improve the reliability and performance, over-temperature and over-current protection circuits have been designed in the dc-dc converter systems. To prevent electrostatic An electrostatic discharge (ESD) protection circuit is proposed. The proposed dc-dc converter circuit exhibits low triggering voltage by using the gate-substrate biasing techniques. Throughout the circuit simulation, it confirms that the proposed ESD protection circuit has lower triggering voltage(4.1V) than that of conventional ggNMOS (8.2V). The circuit simulation is performed by Mathlab and HSPICE programs utilizing the 0.35um BCD (Bipolar-CMOS-DMOS) process parameters.