• Title/Summary/Keyword: barrier films

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Degradation of thin carbon-backed lithium fluoride targets bombarded by 68 MeV 17O beams

  • Y.H. Kim;B. Davids;M. Williams;K.H. Hudson;S. Upadhyayula;M. Alcorta;P. Machule;N.E. Esker;C.J. Griffin;J. Williams;D. Yates;A. Lennarz;C. Angus;G. Hackman;D.G. Kim;J. Son;J. Park;K. Pak;Y.K. Kim
    • Nuclear Engineering and Technology
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    • v.55 no.3
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    • pp.919-926
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    • 2023
  • To analyze the cause of the destruction of thin, carbon-backed lithium fluoride targets during a measurement of the fusion of 7Li and 17O, we estimate theoretically the lifetimes of carbon and LiF films due to sputtering, thermal evaporation, and lattice damage and compare them with the lifetime observed in the experiment. Sputtering yields and thermal evaporation rates in carbon and LiF films are too low to play significant roles in the destruction of the targets. We estimate the lifetime of the target due to lattice damage of the carbon backing and the LiF film using a previously reported model. In the experiment, elastically scattered target and beam ions were detected by surface silicon barrier (SSB) detectors so that the product of the beam flux and the target density could be monitored during the experiment. The areas of the targets exposed to different beam intensities and fluences were degraded and then perforated, forming holes with a diameter around the beam spot size. Overall, the target thickness tends to decrease linearly as a function of the beam fluence. However, the thickness also exhibits an increasing interval after SSB counts per beam ion decreases linearly, extending the target lifetime. The lifetime of thin LiF film as determined by lattice damage is calculated for the first time using a lattice damage model, and the calculated lifetime agrees well with the observed target lifetime during the experiment. In experiments using a thin LiF target to induce nuclear reactions, this study suggests methods to predict the lifetime of the LiF film and arrange the experimental plan for maximum efficiency.

Cultural Tunneling Effect: Conceptual adoption & Application in movie industry

  • Roh, Seungkook
    • Asia Marketing Journal
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    • v.16 no.3
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    • pp.77-100
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    • 2014
  • Many researchers have analyzed the relationship between the financial success patterns of a motion picture and many other factors, such as the production cost, marketing, stars, awards, reviews, genre, and rating. Through these studies, many researchers and investors concluded that big budgets to make a blockbuster movie can serve as an insurance policy to meet their ROI; thus the box office is dominated by blockbuster movies. High-budget blockbuster movies are more likely to receive attention because these movies are more recognizable given their high expenses for production and casting. Therefore, audiences choose blockbusters in an effort to reduce the searching cost and to mitigate the possibility of a regrettable choice. This behavior of consumers, in turn, causes distributors to allocate screens for blockbusters, resulting in "concentration of blockbuster consumption." As such, low-budget films cannot easily become popular due to the lack of distribution. Indeed, low-budget films released on a small number of screens often end up becoming dismal failures. However, there are exceptional examples which are contrary to the general idea in the movie industry that a big budget and showings on a large number of screens can guarantee the success of a movie. Although researchers have attempted to analyze the performances of movies with small budgets, such movies are likely to be regarded as outliers and then be entirely discarded, as they are far from the 'three-sigma' range, especially given that previous research methodologies could not explain the financial success of such unique examples. This study attempts to explain the financial success at the box office of low-budget movies by applying the concept of the tunnel effect in quantum mechanics, as the phenomenon found in the movie industry is similar to a particle's movement in quantum physics. The tunneling effect is a phenomenon by which a particle without enough energy to pass over a potential barrier tunnels through it. Adopting the analogy, this study draws a tunneling probability function and cultural constant to forecast other outliers using the Schrödinger equation. Moreover, the study finds that word-of-mouth creates in the movie industry this phenomenon of finding outliers.

A circular economical application of eggshell waste as a bio-filler in the fabrication of gum Arabic composite film

  • Blessing A. Oredokun-Lache;Esther B. Ibrahim;Adekemi G. Oluwafemi;Georgina O. Erifeta;Sunday J. Josiah;Olarewaju M. Oluba
    • Food Science and Preservation
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    • v.31 no.3
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    • pp.394-407
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    • 2024
  • The poultry industry faces disposal difficulty in waste, but recent advancements in material science and sustainability have enabled the innovative transformation of waste into valuable resources. In this study, eggshell (EC) was added as a bio-filler to gum Arabic (GA) to fabricate a GA-EC bio-composite film. Bio-composites containing 0.5 g (GA-EC0.5) and 1.0 g (GA-EC1.0) EC dispersed in 30 mL of 15% GA solution were fabricated and characterized using standard analytical techniques. The GA-EC0.5 composites showed significantly higher moisture content, transparency, water solubility, and water vapor permeability but lower tensile strength and thermal stability than GA-EC1.0. Following a post-harvest wrapping of tomato fruits with the GA-EC composite films and storage at 25±2℃ for 20 days, significant (p>0.05) reductions in weight loss, pH, lycopene content, and activities of polyphenol oxidase and pectin methylesterase compared to unwrapped fruits were recorded. Adding EC to GA has enabled the fabrication of composite films with improved mechanical, barrier, and thermal properties with potential application in the post-harvest storage of tomato fruits.

On Formation of Residual Carbon Layer in CuInSe2 Thin Films Formed via direct Solution Coating Process (직접 용액 코팅법에 의해 제조한 CuInSe2 에 잔존하는 탄소 불순물층 형성에 관한 연구)

  • Ahn, SeJin;Rehan, Shanza;Eo, Young-Joo;Gwak, Jihye;Yoon, Kyunghoon;Cho, Ara
    • Current Photovoltaic Research
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    • v.2 no.1
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    • pp.36-39
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    • 2014
  • Formation mechanism of residual carbon layer, frequently observed in the $CuInSe_2$ (CIS) thin film prepared by direct solution coating routes, was investigated in order to find a way to eliminate it. As a model system, a methanol solution with dissolved Cu and In salts, whose viscosity was adjusted by adding ethylcellulose (EC), was chosen. It was found that a double layer, a top metal ion-derived film and bottom EC-derived layer, formed during an air drying step presumably due to different solubility between metal salts and EC in methanol. Consequently, the top metal ion-derived film acts as a barrier layer inhibiting further thermal decomposition of underlying EC, resulting a formation of bottom carbon residue layer.

Application of Taguchi Method and Orthogonal Arrays for Optimization of Adhesion of $SrZrO_3$ Coatings on Ag/Bi(2223) Tapes

  • Lee, Se-Jong;Lee, Deuk-Yong;Song, Yo-Seung;Kim, Bae-Yeon
    • Progress in Superconductivity and Cryogenics
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    • v.5 no.1
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    • pp.13-16
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    • 2003
  • Adhesion of $SrZrO_3$ resistive oxide barrier on Ag sheathed Bi(2223) tapes prepared by the sol-gel and dip-coating method was evaluated with an aid of Taguchi method and Lie($2^1{\times}3^7$) orthogonal arrays to determine the optimal process combination of levels of factors that best satisfy the bigger is better quality characteristic (QC=B). For analyses of results statistical calculations such as average and analysis of variance (ANOVA) were employed to analyze the results for improving the performance qualities of the dip-coated $SrZrO_3$ film. Experimentally, the performance of the films was evaluated in terms of bond strength by varying Sr/Zr moi ratio (A), amount of organic vehicle additives (B), drying temperature (C) and time (D), heat treatment temperature (E) and time (F), respectively. The optimal combination of levels of factors was determined to be $A_3B_2C_3D_2E_1F_3$ having a 90% confidence level.

The Influence of the $SiH_4/NH_3$ Ratios on the Characteristics of Nonvolatile MNOS Memories during the PECVD Silicon Nitride Film deposition (PECVD 질화막 증착시 $SiH_4/NH_3$ 유량비가 비휘발성 MNOS 기억소자의 특성에 미치는 영향)

  • Yi, Sang-Bae;Lee, Keun-Hyuk;Lee, Hyung-Ok;Kim, Jin-Young;Seo, Kwang-Yell
    • Proceedings of the KIEE Conference
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    • 1992.07b
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    • pp.832-834
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    • 1992
  • Using the PECVD method, the silicon nitride films were deposited by changing the $SiH_4/NH_3$ gas flow ratio from 0.2 to 1.4 at an interval of 0.2, AES, FTIR, and Spectroscopic Ellipsomter were used to analyze the film composition and structure, the refractive index, and the deposition rate. Also the C-V analysis was used to estimate the memory performance in the capacitor type MNOS memory devices, which utilized native oxide as the tunneling barrier, with the silicon nitride by the above deposition conditions. As a result, it was confirmed that the performance of MNOS memory devices with PECVD silicon nitride was comparable to that with LPCVD or APCVD silion nitride.

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Stability of the Grain Configurations of Thin Films-a Model for Agglomeration (박막내 결정립 배열의 열적 불안정성1)-응집 모델)

  • Na, Jong-Ju;Park, Jung-Geun
    • 연구논문집
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    • s.27
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    • pp.183-200
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    • 1997
  • We have calculated the energy of three distinct grain configurations, namely completely connected, partially connected and unconnected configurations, evolving during a spheroidization of polycrystalline thin film by extending a geometrical model due to Miller et al. to the case of spheroidization at both the surface and film-substrate interface. "Stabilitl" diagram defining a stable region of each grain configuration has been established in terms of the ratio of grain size to film thickness vs. equilibrium wetting or dihedral angles at various interface energy conditions. The occurrence of spheroidization at the film-substrate interface significantly enlarges the stable region of unconnected grain configuration thereby greatly facilitating the occurrence of agglomeration. Complete separation of grain boundary is increasingly difficult with a reduction of equilibrium wetting angle. The condition for the occurrence of agglomeration differs depending on the equilibrium wetting or dihedral angles. The agglomeration occurs, at low equilibrium angles, via partially connected configuration containing stable holes centered at grain boundary vertices, whereas it occurs directly via completely connected configuration at large equilibrium angles except for the case having small surface and/or film-substrate interface energy. The initiation condition of agglomeration is defined by the equilibrium boundary condition between the partially connected and unconnected configurations for the former case, whereas it can, for the latter case, largely deviate from the equilibrium boundary condition between the completely connected and unconnected configurations because of the presence of a finite energy barrier to overcome to reach the unconnected grain configuration.

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Advanced Permeation Properties of Solvent-free Multi-Layer Encapsulation of thin films on Ethylene Terephthalate(PET)

  • Han, Jin-Woo;Kang, Hee-Jin;Kim, Jong-Yeon;Kim, Jong-Hwan;Han, Jung-Min;Moon, Hyun-Chan;Park, Kwang-Bum;Kim, Hwi-Woon;Seo, Dae-Shik
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.973-976
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    • 2006
  • In this paper, the inorganic multi-layer encapsulation of thin film was newly adopted to protect the organic layer from moisture and oxygen. Using the electron beam, Sputter, inorganic multi-layer thin-film encapsulation was deposited onto the Ethylene Terephthalate(PET) and their interface properties between inorganic and organic layer were investigated. In this investigation, the SiON $SiO_2$ and parylene layer showed the most suitable properties. Under these conditions, the water vapor transmission rate (WVTR) for PET can be reduced from level of $0.57g/m^2/day$ (bare substrate) to $1^{\ast}10^{-5}g/m^2/day$ after application of a SiON and $SiO_2$ layer. These results indicate that the $PET/SiO_2/SiON/Parylene$ barrier coatings have high potential for flexible organic light-emitting diode(OLED) applications.

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A Study on Energy Band Change and Stability in Photoelectrolysis by Use of Titanium Oxide Films on Ti-Bi Alloy (Ti-Bi 합금 위에 형성된 산화티타늄 피막의 광 전기분해시 에너지밴드와 안정성에 관한 연구)

  • Park, Seong-Yong;Cho, Byung-Won;Yun, Kyung-Suk
    • Journal of Hydrogen and New Energy
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    • v.5 no.1
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    • pp.41-49
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    • 1994
  • Ti-Bi alloy was prepared by arc melting of appropriate amounts of titanium and bismuth powder. The photocurrent($I_{ph}$) of Ti-Bi oxide electrode was increased with the increase of Bi content, up to 10wt%. The maximum $I_{ph}$ showed $7.6mA/cm^2$ at V=0.5V vs. SCE. The band gap energy of Ti-Bi oxide electrode was observed to 3.0~2.87eV. Surface barrier($V_s$) of Ti-10Bi oxide electrode showed maximum value(1.08V) but didn't exceed 1.23V, then it was impossible to run $H_2$ generation without any other energy sources other than the light. Ti-Bi oxide electrode was found to be quite stable under alkaline solution and showed no signs of photodecomposition.

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Electricial properties of oxynitride films prepared by furnace oxidation in $N_2O$ ($N_2O$ 가스에서 형성된 oxynitride막의 전기적 특성)

  • Bae, Sung-Sig;Seo, Yong-Jin;Kim, Tae-Hyung;Kim, Chang-Il;Chang, Eui-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1992.11a
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    • pp.90-93
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    • 1992
  • In this paper, MOS characteristics of gate dielectrics prepared by furnace oxidation of Si in an $N_2O$ ambient have been studied. Compared with the oxides grown in $O_2$, $N_2O$ oxides show significantly improved breakdown field and low flat band voltage. Also, $N_2O$ oxide is more controllable for ultrathin film growth than $O_2$ oxide. This improvement is caused by nitrogen incorporation into the $N_2O$ oxide. Therefore, the nitrogen-rich-layer at the Si/$SiO_2$ interface formed during $N_2O$ oxidation not only strengthen $N_2O$ oxide structure at the interface and improves the gate dielectric quality, it also acts as a oxidant diffusion barrier that reduces the oxidation rate significantly.

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