• Journal of the Korean institute of surface engineering
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• v.44 no.6
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• pp.260-263
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• 2011

GZO/ITO double layered films were deposited on unheated non-alkali glass substrates by RF magnetron sputtering using an ITO ($SnO_2$: 10 wt%) and GZO($Ga_2O_3$: 5.57 wt%) ceramic targets, respectively. The electrical resistivity of GZO/ITO films depends on the thickness ratio between the GZO film and ITO film. With increasing ITO film thickness, the resistivity of GZO/ITO films decreased which due to large increase in the Hall mobility. Also, the crystallinity of GZO/ITO film was improved with an increase in ITO thickness which was evaluated by X-ray diffraction. The average transmittance of the films was more than 85% in the visible region, which is slightly higher than ITO single layer films.

• Journal of the Korean Ceramic Society
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• v.52 no.4
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• pp.290-293
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• 2015

The properties of the IZTO thin films on the glass were studied with a variation of the $SiO_2$ buffer layer thickness. $SiO_2$ buffer layers were deposited by plasma-enhanced chemical vapor deposition (PECVD) on the glass, and the In-Zn-Tin-Oxide (IZTO) thin films were deposited on the buffer layer by RF magnetron sputtering. All the IZTO thin films with the $SiO_2$ buffer layer are shown to be amorphous. Optimum $SiO_2$ buffer layer thickness was obtained through analyzing the structural, morphological, electrical, and optical properties of the IZTO thin films. As a result, the IZTO surface roughness is 0.273 nm with a sheet resistance of $25.32{\Omega}/sq$ and the average transmittance is 82.51% in the visible region, at a $SiO_2$ buffer layer thickness of 40 nm. The result indicates that the uniformity of surface and the properties of the IZTO thin film on the glass were improved by employing the $SiO_2$ buffer layer and the IZTO thin film can be applied well to the transparent conductive oxide for display devices.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.35 no.11
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• pp.1169-1176
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• 2011

Liquid film flows are classified into waveless laminar, wavy laminar, and turbulent flows depending on the Reynolds number or the flow stability. Since the wavy motions of the film flows are so intricate and nonlinear, studies on them have largely been experimental. Most numerical approaches have been limited to the waveless flow regime. The various free surface-tracking schemes adopted for this problem were used to more accurately estimate the average film thickness, rather than to capture the unsteady wavy motion. In this study, the wavy motions in laminar wavy liquid film flows with Reynolds numbers of 200-1000 were simulated with various numerical schemes based on the volume of fluid (VOF) method for interface tracking. The results from each numerical scheme were compared with the experimental results in terms of the average film thickness, the wave velocity, and the wave amplitude.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.31 no.6
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• pp.403-407
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• 2018

In this study, double layer KTN/STO thin films were fabricated on $Pt/Ti/SiO_2/Si$ substrate, their structural and electrical properties were measured according with the number of STO coatings, and their applicability to microwave materials was investigated. The average grain size was about 80~90 nm, the average thickness of the 6-coated KTN thin film was about 320 nm, and the average thickness of the STO thin film coated once was about 45~50 nm. The dielectric constant decreased with increasing frequency, and as the number of STO coatings increased, the rate of change of the dielectric constant with the applied electric field decreased. The tunability of the KTN thin film showed a maximum value of 19.8% at 3 V. The figure of merit of the KTN/1STO thin film was 9.8 at 3 V.

• Tribology and Lubricants
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• v.20 no.5
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• pp.284-291
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• 2004

We present a three-dimensional average flow model considering elastic deformation of pad asperities for chemical mechanical planarization. To consider the contact deformation of pad asperities in the calculation of the flow factor, three-dimensional contact analysis of a semi-infinite solid based on the use of influence functions is conducted from computer generated three dimensional roughness data. The average Reynolds equation and the boundary condition of both force and momentum balance are used to investigate the effect of pad roughness and external pressure conditions on film thickness and wafer position angle.

• Proceedings of the KSME Conference
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• 2000.11b
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• pp.732-737
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• 2000

The purpose of this study is to compare the SMD(Sauter mean diameter) with different vibrant plates. Each vibrant plates have different surface roughness. Also liquid film thickness are measured for explanation how to concern atomization. Ultrasonic waves is used for vibration. Immersion liquid method is used for the measure of SMD and also liquid film thickness is measured using of point needle method. Distilled water and gasoline fuel are used to liquids. Supplied liquid flow rates are $18{\sim}296cc/min$. Centerline average roughness of vibrant plates are 0.5, 2.0, 4.7, $9.5\;{\mu}m$ and diameter of vibrant plate is 60mm. In result, good atomization of liquid is obtained in widen flow rates. The mean droplet size is increased in orders of 4.7, 2.0. 9.5, $0.5\;{\mu}m$ surface roughness. Distilled water has a big mean droplet size than gasoline fuel in low flow rate. Above the 78cc/min flow rates, distilled water has a small mean droplet size than gasoline fuel. Liquid films changes are measured with ultrasonic power. Also, cavitation effect on sprays is observed.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.15 no.2
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• pp.118-124
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• 2016

In this study, experiments are conducted to improve spray coating uniformity by using second and third electrodes based on the electrospray atomization mechanism. The uniformity of fabricated thin films can be improved by adjusting the design of the second electrode. The implementation of the second electrode with an elongated hole and a bending angle of $90^{\circ}$ results in highly uniform films. In addition, induced area to substrate is increased by lowering the applied voltage using the third electrode with a round rod shape. A linear correlation between applied voltage and induced area is confirmed. Thin film thickness and surface roughness are measured after the fabrication of thin films through the electrospray process. It is confirmed that a thin film is formed having an average thickness of 273.44 nm, a thickness uniformity of less than 10%, and a surface roughness of 3 nm.

• Tribology and Lubricants
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• v.29 no.1
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• pp.27-32
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• 2013

This study examined the effects of surface roughness in the mixed lubrication regime of smooth and rough surfaces for roller bearings. The average flow model was adopted for interaction between the flow rheology of the lubricant and the surface roughness. The average Reynolds equation and related flow factor that describes the coupled effects of surface roughness and flow rheology, the viscosity-pressure and density-pressure equations, the elastic deformation equation, and the force balance equation were solved simultaneously. The results showed that the effects of surface roughness on the film thickness and pressure distribution should be considered, especially in elastohydrodynamic lubrication contact problems.

• Journal of Korean Vacuum Science & Technology
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• v.1 no.1
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• pp.13-18
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• 1997

The critical phenomena in nickel films have been studied by observing the resistivity behavior with temperatures near the Curie point. We observed the thickness dependence of the Curie point in nickel films, that is, the thinner the film is, the lower the Curie point is. This is as expected. Using the heat capacity data, we also found the amplitude ratios of bulk and film systems to be 1.222 and 1.197(average0, respectively. These values are cose to the theoretical prediction of 1.46 given by the Heisenberg, S=$\infty$ Model.

• Journal of the Semiconductor & Display Technology
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• v.19 no.1
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• pp.93-96
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• 2020

Polyimide thin film was prepared by annealing the polyamic acid that was synthesized through co-deposition of diamine and dianhydride. The polyamic acid and polyimide thin film were characterized with FT-IR and HR FE-SEM. The average roughness of the film surface, evaluated with AFM, were 0.385 nm and 0.299 nm after co-deposition, and annealing at 120 ℃ respectively. OLED was passivated with the polyimide layer of 200 nm thickness. While the inorganic passivation layer enhances the WVTR of OLED, the organic passivation layer gives flexibility to the OLED. The in-situ passivation of OLED with organic thin film layer provides the leading technique to develop flexible OLED Display.