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http://dx.doi.org/10.5695/JKISE.2011.44.6.260

Effect of ITO Layer on Electrical and Optical Properties of GZO/ITO Double-layered TCO Films Deposited by RF Magnetron Sputtering for Application to Solar Cells  

Chung, Ah-Ro-Mi (Department of Materials Science and Engineering, Pusan National University)
Song, Pung-Keun (Department of Materials Science and Engineering, Pusan National University)
Publication Information
Journal of the Korean institute of surface engineering / v.44, no.6, 2011 , pp. 260-263 More about this Journal
Abstract
GZO/ITO double layered films were deposited on unheated non-alkali glass substrates by RF magnetron sputtering using an ITO ($SnO_2$: 10 wt%) and GZO($Ga_2O_3$: 5.57 wt%) ceramic targets, respectively. The electrical resistivity of GZO/ITO films depends on the thickness ratio between the GZO film and ITO film. With increasing ITO film thickness, the resistivity of GZO/ITO films decreased which due to large increase in the Hall mobility. Also, the crystallinity of GZO/ITO film was improved with an increase in ITO thickness which was evaluated by X-ray diffraction. The average transmittance of the films was more than 85% in the visible region, which is slightly higher than ITO single layer films.
Keywords
ITO; GZO; Magnetron sputtering; Double layer; Solar cells;
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Times Cited By KSCI : 4  (Citation Analysis)
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