• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.528-528
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• 2012

Recently, atmospheric pressure plasmas attract lots of interests for the useful applications such as surface modification and bio-medical treatment. In this study, a particle-in-cell Monte Carlo collision (PIC-MCC) simulation was adopted to investigate the discharge characteristics of a planar micro dielectric barrier discharge (DBD) with a driving frequency from 13.56 MHz to 162.72 MHz and with a gap distance of 80 micrometers. The variation of frequency, in the change in the electron energy probability function (EEPF). Through the relation between the ion trajectories and the frequency, results in the change of EEPFs is achievable with the turning point of frequency mode. Therefore, it is possible to categorize the efficient operation range of DBDs for its applications by controlling the interactions between plasmas and neutral gas for the generation of preferable radicals.

• 전기학회논문지
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• 제61권5호
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• pp.717-720
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• 2012

Various types of dielectric-barrier-discharge (DBD) devices have been developed for diverse applications for the last decade. In this study, a flat non-thermal DBD micro plasma source under atmospheric pressure has been developed. The flat-panel type plasma is generated by bipolar pulse voltages, and driving gas is air. In this study, the plasma source was investigated with intensified charge coupled device (ICCD) images and Optical Emission Spectroscopy (OES). The micro discharges are generated on the crossed electrodes. For theoretical analysis, 2-dimensional fluid simulation was performed. The plasma source can be driven in air, and thus the operation cost is low and the range of application is wide.

• 반도체디스플레이기술학회지
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• 제17권2호
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• pp.16-19
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• 2018

The development speed of semiconductor and display device manufacturing technology is growing faster than the development speed of process equipment. So, there is a growing need for process diagnostic technology that can measure process conditions in real time and directly. In this study, a plasma diagnosis was carried out using impedance variation due to the plasma discharge. Variation of the measurement impedance appears as a voltage change at the reference impedance, and the plasma density is calculated using this. The above experiment was conducted by integrating the plasma diagnosis system and the linear atmospheric pressure DBD plasma source. It was confirmed that plasma density varies depending on various parameters (gas flow rate, $Ar/O_2$ mixture ratio, Input power).

• 한국진공학회지
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• 제18권5호
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• pp.337-345
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• 2009

패키지 기판의 지름 $100{\mu}m$ 이하 미세 드릴 구멍의 경우 습식 디스미어 공정만으로는 구멍 내부의 스미어를 효과적으로 제거할 수 없다. 본 연구에서는 습식 디스미어 공정의 이전 단계에서 대기압 플라즈마를 처리하여 소수성의 기판 표면을 친수성으로 개질하고자 하였다. 대기압 플라즈마 공정은 리모트 DBD 방식의 전극을 이용하여 패키지 제조 공정에 적합한 인라인 형태의 장비로 구성되었다. 대기압 플라즈마를 처리한 결과 접촉각 기준으로 $71^{\circ}$의 소수성 절연 필름 표면이 $30^{\circ}$ 정도의 친수성 표면으로 개질되었다. 대기압 플라즈마 처리 유무에 따른 습식 디스미어 공정의 특성을 평가하기 위하여 절연 필름의 두께, 드릴 구멍 지름, 표면 조도의 변화를 측정하였는데, 대기압 플라즈마 처리 시 기판 전면에서 공정 특성의 균일도가 향상되는 것을 확인하였다. 또한 대기압 플라즈마 처리 유무에 따른 드릴 구멍의 SEM 사진 분석 결과 대기압 플라즈마 처리 시 구멍 내부의 스미어가 효과적으로 제거됨을 실험적으로 확인하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.176-177
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• 2016

In the last few decades, attention toward atmospheric pressure plasma (APP) has been greatly increased due to the numerous advantages of those applications, such as non-necessity of high vacuum facility, easy setup and operation, and low temperature operation. The practical applications of APP can be found in a wide spectrum of fields from the functionalization of material surfaces to sterilization of medical devices. In the secondary battery industry, separator film has been typically treated by APP to enhance adhesion strength between adjacent films. In this process, the plasma is required to have high stability and uniformity for better performance of the battery. Dielectric barrier discharge (DBD) was usually adopted to limit overcurrent in the plasma, and we developed the pre-discharge technology to overcome the drawbacks of streamer discharge in the conventional DBD source which makes it possible to produce a super-stable plasma at atmospheric pressure. Simulations for the fluid flow and electric field were parametrically performed to find the optimized design for the linear jet plasma source. The developed plasma source (Plasmapp LJPS-200) exhibits spatial non-uniformity of less than 3%, and the adhesion strength between the separator and electrode films was observed to increase 17% by the plasma treatment.

• International Journal of Oral Biology
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• 제39권4호
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• pp.187-192
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• 2014

Nonthermal atmospheric pressure plasma has attracted great interest for biomedical applications. The plasma consists of charged particles, radicals, and a strong electric field as the fourth state of matter. This study evaluated the change in the surface roughness after tooth bleaching by plasma in combination with a low concentration (15%) of carbamide peroxide, specifically whether the application of plasma produced detriments, such as demineralization and structural change, with the goal of efficient and safe tooth bleaching. After being combined with plasma and 15% carbamide peroxide, the hydroxyapatite surface was significantly smoother with a low roughness average value. Tooth bleaching with 15% carbamide peroxide alone produced an irregular surface and increased the surface roughness with high roughness average value. Tooth bleaching with plasma resulted in no significant variations in hydroxyapatite in terms of change in surface roughness and surface topography. The application of tooth bleaching with plasma is not deleterious to dental hard tissue, implicating it as a safe tooth bleaching technique.

• Applied Science and Convergence Technology
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• 제25권3호
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• pp.51-55
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• 2016

The surface treatment of a titanium implant is investigated with a non-thermal atmospheric pressure plasma jet. The plasma jet is generated by the injection of He and $O_2$ gas mixture with a sinusoidal driving voltage of 3 kV or more and with a driving frequency of 20 kHz. The generated plasma plume has a length up to 35 mm from the jet outlet. The wettability of 4 different titanium surfaces with plasma treatments was measured by the contact angle analysis. The water contact angles were significantly reduced especially for $O_2/He$ mixture plasma, which was explained with the optical emission spectroscopy. Consequently, plasma treatment enhances wettability of the titanium surface significantly within the operation time of tens of seconds, which is practically helpful for tooth implantation.

• 한국정밀공학회지
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• 제19권8호
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• pp.34-37
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• 2002

• International Journal of Precision Engineering and Manufacturing
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• 제9권2호
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• pp.39-43
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• 2008

Atmospheric pressure plasma polishing (APPP) is a noncontact precision machining technology that uses low temperature plasma chemical reactions to perform atom-scale material removal. APPP is a complicated process, which is affected by many factors. Through a preliminary theoretical analysis and simulation, we confirmed that some of the key factors are the radio frequency (RF) power, the working distance, and the gas ratio. We studied the influence of the RF power and gas ratio on the removal rate using atomic emission spectroscopy, and determined the removal profiles in actual operation using a commercial form talysurf. The experimental results agreed closely with the theoretical simulations and confirmed the effect of the working distance. Finally, we determined the element compositions of the machined surfaces under different gas ratios using X-ray photoelectron spectroscopy to study the influence of the gas ratio in more detail. We achieved a surface roughness of Ra 0.6 nm on silicon wafers with a peak removal rate of approximately 32 $mm^{3}$/min.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.1500-1503
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• 2009

In this paper, we studied about atmospheric pressure remote plasma ashing of photoresist(PR), by using a modified dielectric barrier discharge(DBD). The effect of various gas combinations such as $N_2/O_2$, $N_2/O_2+SF_6$ on the changes PR ashing rate was investigated as a function of power. The maximum PR ashing rate of 1850 nm/min was achieved at $N_2$ (70 slm)/ $O_2$ (200 sccm) + $SF_6$ (3 slm). We found that as the oxygen and fluorine radical peaks were increased, the ashing rate is increased, too.