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Plasma Density Measurement of Linear Atmospheric Pressure DBD Source Using Impedance Variation Method  

Shin, Gi Won (Kwangwoon University Dept. of Electrical and Biological Physics)
Lee, Hwan Hee (Kwangwoon University Dept. of Electrical and Biological Physics)
Kwon, Hee Tae (Kwangwoon University Dept. of Electrical and Biological Physics)
Kim, Woo Jae (Kwangwoon University Dept. of Electrical and Biological Physics)
Seo, Young Chul (YOUNGSIN-RF CO.,Ltd.)
Kwon, Gi-Chung (Kwangwoon University Dept. of Electrical and Biological Physics)
Publication Information
Journal of the Semiconductor & Display Technology / v.17, no.2, 2018 , pp. 16-19 More about this Journal
Abstract
The development speed of semiconductor and display device manufacturing technology is growing faster than the development speed of process equipment. So, there is a growing need for process diagnostic technology that can measure process conditions in real time and directly. In this study, a plasma diagnosis was carried out using impedance variation due to the plasma discharge. Variation of the measurement impedance appears as a voltage change at the reference impedance, and the plasma density is calculated using this. The above experiment was conducted by integrating the plasma diagnosis system and the linear atmospheric pressure DBD plasma source. It was confirmed that plasma density varies depending on various parameters (gas flow rate, $Ar/O_2$ mixture ratio, Input power).
Keywords
Atmospheric Pressure Plasma; Plasma Diagnosis; DBD Plasma; Plasma Density;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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