• Journal of the Korean Chemical Society
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• v.39 no.3
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• pp.204-212
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• 1995

The graphite furnace atomic absorption spectrophotometric determination of trace lead in water samples was studied using matrix modifiers. In order to modify the sample matrix, the type and optimum amount of the modifier were investigated with a given concentration of Pb solution. In fact, if the matrix is not modified, lead has low ashing and atomization temperatures as to give a low absorbance with bad reproducibility because of its volatility. Therefore, optimum modifiers should be used to stabilize the atomization. In this work, the ashing and atomization temperatures were raised from 400 and $1800^{\circ}C$, to 1,000 and $2000^{\circ}C$, by the addition of palladium to 50 ng/mL lead solution as a modifier. The concentration of palladium was 5.0 ${\mu}g/mL$ in the modified solution. Furthermore, if 1.5 ${\mu}g/mL$ of aluminum was mixed with the palladium modifier as an auxiliary modifier, the ashing temperature could be increased $150^{\circ}C$ additionally. With such a treatment, the sensitivity was improved more than 5 times of the solution unmodified and the reproducible results of less than 5% RSD were obtained in the samples of university's waste water and pipe-washing tap water. It could be concluded that this procedure was quantitative in the determination of trace lead from the recoveries of more than 88% obtained in the samples in which a given amount of lead was spiked.

• Korean Journal of Plant Resources
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• v.19 no.2
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• pp.243-247
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• 2006

To develop the natural brown hair-dye, we investigated the dyeability of hairs dyed with the extracts of Boehmeria tricuspis and chemical hair-dye and the changes in its colors as affected by the number of washing frequencies. When dyed with the extracts of Boehmeria tricuspis, ${\Delta}E$ values was increased over 11 compared with control and dyed an order of descent YR. ${\Delta}E$ values treated the ashing juice of Japanese cleyera with a mordant was mostly increased about 15.52. Hairs was dyed with the extracts of Boehmeria tricuspis and we investigated L, a, b and ${\Delta}E$ values as affected by the number of washing frequencies. When treated the ashing juice of Japanese cleyera with a mordant, L values was mostly decreased, however, a, b and ${\Delta}E$ values was increased significantly. L values of hairs dyed with the extracts of Boehmeria tricuspis and washed over thirty times became low compared with that dyed with chemical hair-dye and changes in a, b and ${\Delta}E$values of that was small.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.11 no.6
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• pp.1099-1103
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• 2007

TFT's have been intensively researched for possible electronic and display applications. Through tremendous engineering and scientific efforts, a-Si:H TFT fabrication process was greatly improved. In this paper, the reason on defects occurring at a-Si:H TFT fabrication process is analyzed and solved, so a-Si:H TFT's yield is increased and reliability is improved. The a-Si:H TFT of this paper is inverted staggered type TFT. The gate electrode is formed by patterning with length of $8{\mu}m{\sim}16{\mu}m$ and width of $80{\sim}200{\mu}m$ after depositing with gate electrode (Cr). We have fabricated a-SiN:H, conductor, etch-stopper and photo-resistor on gate electrode in sequence, respectively. We have deposited n+a-Si:H, NPR(Negative Photo Resister) layer after forming pattern of Cr gate electrode by etch-slower pattern. The NPR layer by inverting pattern of upper Sate electrode is patterned and the n+a-Si:H layer is etched by the NPR pattern. The NPR layer is removed. After Cr layer is deposited and patterned, the source-drain electrode is formed. The a-Si:H TFT made like this has problems at photo-lithography process caused by remains of PR. When sample is cleaned, this remains of PR makes thin chemical film on surface and damages device. Therefor, in order to improve this problem we added ashing process and cleaning process was enforced strictly. We can estimate that this method stabilizes fabrication process and makes to increase a-Si:H TFT's yield.

• 전기의세계
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• v.34 no.8
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• pp.470-475
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• 1985

우주물질의 대부분이 플라즈마 상태에 있지마는 지구상에서는 천둥이 칠 때 생기는 방전이나 극지방에서 볼 수 있는 오로라와 같이 극히 일부분이 자연상태의 프라즈마로 존재한다. 지금까지 플라즈마의 이용은 그것이 내는 밝은 빛을 이용한 조명이나, 높은 열을 이용한 용접이나 절단이 고작이었으나, 최근에 들어 초고온, 고밀도 플라즈마를 이용한 핵융합 에너지 연구나 Free Electron Laser나 Gyrotron과 같이 새로운 Radiation Source로써 종래의 Source가 만들지 못하던 주파수 영역이나 Glow Discharge에서 생기는 저온 Plasma를 이용한 Plasma Etching PECVD(Plasma Enhanced CHemical Vapor Deposition), Plasma Ashing, Sputtering등은 VLSI의 제조에 필요불가결한 공정의 일부분이 되고 있다. 앞으로 수회에 걸쳐 본 기술해설란을 통하여 이들 Plasma의 이용 기술을 소개하고자 하며 본회에서는 그중에서 Plasma Etching에 대해서 그 원리와 기술상의 특징을 살펴보고자 한다.

• Analytical Science and Technology
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• v.12 no.5
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• pp.355-359
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• 1999

Trace cadmium was determined in urine by flame and nameless AAS. Inflame method, cadmium was extracted into MIBK from Cd-DDTC complex. In flameless method, samples were pretreated with 1%, Triton X-100. 1% $HNO_3$ and matrix modifier $Pd(NO_3)_2$. Analysis of cadmium was, performed at $450-750^{\circ}C$ ashing temperature by use of pyrocoated tubes. Results of analysis, flameless method superior in sample treatment and reproducibility to flame method and highest absorbance was obtained at $550^{\circ}C$ ashing temperature. 100 mg/L $Pd(NO_3)_2$ concentration. Proposed method were applied to the determination of cadmium in standard urine Lononorm-Metalle 3.

• Korean Journal of Environmental Agriculture
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• v.14 no.3
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• pp.338-344
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• 1995

The wet ash method has been used as an official standard procedure for the analysis of Cd in brown rice in Korea, but this method involves several disadvantages. Thus, four analytical methods were compared in this experiment in order to find a more efficient method for the Cd analysis in brown rice. Evaluation was made based on both the Cd recovery percentages from the Cd-spiked samples and the relationships between Cd contents obtained by the official procedure and other methods. Results showed that ashing 50g brown rice at $600^{\circ}C$(dry ash method) recovered nearly 80% of the spiked Cd. This recovery percentage was a little lower than that of the wet ash method(87%) but higher than those of other methods. The dry ash method had the lowest standard deviations and revealed the highest correlation coefficient($r=0.98^{\ast\ast}$) in Cd contents with the standard wet ash method. These results demonstrated that the dry ash method, ashing 50g brown rice at $600^{\circ}C$, would be as efficient as the wet ash method and could be employed as a recommended procedure for the Cd analysis of brown rice.

• Journal of the Korean Vacuum Society
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• v.6 no.2
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• pp.103-108
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• 1997

Silicon field emitter arrays (FEAs) have been fabricated by a novel method employing a two-step tip etch and a spin-on-glass (SOG) etch-back process using double layered thermal/tetraethylortho-silicate (TEOS) oxides as a gate dielectric. A partial etching was performed by coating a low viscous photo resist and $O_2$ plasma ashing on order to form the double layered gate dielectric. A small gate aperture with low gate leakage current was obtained by the novel process. The hight and the end radius of the fabricated emitter was about 1.1 $\mu\textrm{m}$ and less than 100$\AA$, respectively. The anode emission current from a 256 tips array was turned-on at a gate voltage of 40 V. Also, the gate current was less than 0.1% of the anode current.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2007.06a
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• pp.507-509
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• 2007

본 연구는 기존의 방식으로 만든 비정질 실리콘 박막 트랜지스터의 제조공정에서 발생되는 결함에 대한 원인을 분석하고 해결함으로써 수율을 증대시키고 신뢰성을 개선하고자한다. 본 연구의 수소화 된 비정질 실리콘 박막 트랜지스터는 Inverted Staggered 형태로 게이트 전극이 하부에 있다. 실험 방법은 게이트전극, 절연층, 전도층, 에치스토퍼 및 포토레지스터층을 연속 증착한다. 스토퍼층을 게이트 전극의 패턴으로 남기고, 그 위에 $n^+a-Si:H$ 층 및 NPR(Negative Photo Resister)을 형성시킨다. 상부 게이트 전극과 반대의 패턴으로 NPR층을 패터닝하여 그것을 마스크로 상부 $n^+a-Si:H$ 층을 식각하고, 남아있는 NPR층을 제거한다. 그 위에 Cr층을 증착한 후 패터닝하여 소오스-드레인 전극을 위한 Cr층을 형성시켜 박막 트랜지스터를 제조한다. 이렇게 제조한 박막 트랜지스터에서 생기는 문제는 주로 광식각공정시 PR의 잔존이나 세척 시 얇은 화학막이 표면에 남거나 생겨서 발생되며, 이는 소자를 파괴시키는 주된 원인이 된다. 그러므로 이를 개선하기 위하여 ashing 이나 세척공정을 보다 엄격하게 수행하였다. 이와 같이 공정에 보다 엄격한 기준의 세척과 여분의 처리공정을 가하여 수율을 확실히 개선 할 수 있었다.

• Tribology and Lubricants
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• v.19 no.5
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• pp.280-284
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• 2003

High performance characteristics are required for rolling bearings and the various functions of bearing are greatly influenced by grease. Recently, higher performance is being demanded of rolling bearing greases for bearing lubrication. Four special greases with different composition such as lithium soap/ester oil, urea/ester oil, urea/ether oil and PTFE/fluorine oil were synthesized to compare the performance of these greases with that of the conventional lithium soap/mineral oil grease. The grease properties were investigated using a series of typical grease testing methods and grease life test. After the life test, the greases were charaterized by FTIR analysis and a microscope. And the iron amount in the greases was analyzed by AAS after ashing. The composition and manufacturing process determined the grease performance. The grease with a base oil of synthetic oil showed higher performance and the urea/ester oil and PTFE/fluorine oil showed about three times longer life as compared with conventional lithium grease.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.31 no.1 s.256
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• pp.50-54
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• 2007

Nickel nano and microstructures are fabricated with simple process. The fabrication process consists of nickel deposition, lithography, nickel ion etching and plasma ashing. Well-aligned nickel nanowalls and nickel self-encapsulated microchannels were fabricated. We found that the ion etching condition as a key fabrication process of nickel nanowalls and self-encapsulated microchannels, i.e., 40 sccm Ar flow, 550 W RF power, 15 mTorr working pressure, and $20^{\circ}C$ water cooled platen without using He backside cooling unit and with using it, respectively. We present the experimental results and discuss the formational conditions and the effect of nickel redeposition on the fabrication of nickel nano and microstructures.