Large-area Uniform Deposition of Amorphous Hydrogenated Carbon Films using a Plasma CVD Method (플라즈마 CVD 법을 이용한 대면적 균일한 비정질 탄소 막 증착)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.22 no.5
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- pp.411-414
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- 2009