• 한국전기전자재료학회논문지
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• 제22권5호
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• pp.411-414
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• 2009

It has been investigated for the film uniformity and deposition rate of a-C:H films on glass substrate and polymeric materials in the presence of the modulated crossed magnetic field. We used Plasma CVD, i.e, using a crossed electromagnetic field, for uniform depositing thin film. The optimum discharge condition has been discussed for the gas pressure, the magnetic flux density and the distance between substrate and electrodes, As a result, it is found that the optimum discharge conditions are $CH_4$ concentration $CH_4$=10 %, modulated magnetic flux density B=48 Gauss, pressure P=100 mTorr, discharge power supply voltage V=l kV under these experimental conditions. By using these experimental condition, it is possible to prepare the most uniform film extends over about 160 mm of the film width. In this study, we deposited a-C:H thin film on glass substrate, and have a plan that using this condition, study depositing a-C:H thin film on polymeric substrate in next studies.

• 한국자기학회지
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• 제13권5호
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• pp.198-203
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• 2003

경자성박막을 이용한 자기임피던스센서의 바이어스 자계 인가의 유용성을 알아보기 위해서, SmCo 경자성박막의 조성에 따른 자기적 특성과 이 박막이 아몰퍼스 CoZrNb 연자성박막에 미치는 바이어스 효과에 대하여 조사하였다. 아몰퍼스상을 가지는 SmCo 경자성박막의 포화자화는 Sm 조성이 증가함에 따라 감소하였으며, 보자력은 Sm 조성의 증가에 따라 증가하다가 28 at% 부근에서 약 500 Oe를 나타낸 후 다시 감소하였다. SmCo 박막에 의해서 발생된 바이어스 자계가 CoZrNb 박막에 미치는 효과는 자화곡선과 투자율의 측정, 그리고 자구관찰을 통하여 조사되었다. MI센서로 사용이 가능한 3${\times}$0.5 $\textrm{mm}^2$ 크기의 박막시료에 있어서, 약 60 Oe의 바이어스 자계가 얻어졌으며, 센서의 감도를 최적화하기에 충분한 바이어스 자계를 경자성박막을 이용하여 발생시킬 수 있음을 입증하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.633-636
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• 1999

In this study, we have fabricated amorphous FeZrBAg thin films with low core losses by using DC magnetron sputtering method. After deposition, rotational field annealing (RFA) method was performed in the dc field of 1.5 kOe. The amorphous FeZrBAg thin films produced by annealing at 35$0^{\circ}C$ was founded to have high permeability of 8680 at 100 MHz, 0.2 mOe, low coercivity of 0.86 Oe high magnetization of 1.5 T and very low core loss of 1.3 W/cc at 1 MHz, 0.IT respectively. Excellent soft magnetic properties in a amorphous FeZrBAg thin films in the present study are presumably the homogeneous formation of very fine bcc $\alpha$-Fe crystalline with the 8.2 nm in an amorphous FeZrBAg thin film matrix.

• 한국통신학회논문지
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• 제19권10호
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• pp.1849-1860
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• 1994

본 논문은 비정질 회토류 천이 급속 박막내에서의 자벽 역학(Magnetic domain wall dynamics)을 란다우 리프쉬츠 길버트 (Landau Lifshitz Gilbert) 방정식을 이용한 수치적 해석을 수행하여 연구하였다. 박막을 이차원 정방형 격자($30\times30$)로 나누고, 각 격자 셀(Cell)에 쌍극자간 존재한다고 상정하여, 이들 쌍극자간의 상호 교환 작용과 자기 이방성, 외부 인가 자계, 그리고 감자계의 영향이 고려되었다. 단축 자기 이방성이 존재하고 역방향의 자화가 존재한다고 가정된 상태에서 자벽이 형성되는 시간과 자벽의 두께를 알아보았다. 또한 외부 자계의 인가에 따른 자벽 이동을 연구하였다. 시뮬레이션 결과, 감자계를 고려했을 때 자벽 형성 시간이 상당히 빨라졌고, 평균 자벽의 이동도(Mobility)는 약간 증가되었다.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2003년도 somma/kms meeting
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• pp.261-261
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• 2003

• 한국자기학회지
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• 제16권4호
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• pp.197-200
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• 2006

RF magnetron reactive sputtering법으로 CoFeHfO 박막을 상온에서 제작하여 산소분압에 따른 포화자화, 보자력, 이방성자계를 조사하였다. 최적조건인 산소분압 8%에서 제조한 $Co_{39}Fe_{34}Hf_{9.5}O_{17.5}$ 박막은 포자자속밀도($4{\pi}M_s$) 19kG, 보자력($H_c$) 0.37Oe, 이방성자계($H_k$) 48.62Oe의 우수한 연자성을 나타내었다. CoFeHfO 박막의 전기비저항은 산소분압이 늘어남에 따라 증가하는 경향을 나타내었으며 우수한 연자기적 성질을 가지는 $Co_{39}Fe_{34}Hf_{9.5}O_{17.5}$ 박막의 경우, 300 ${\mu}{\Omega}cm$의 높은 전기비저항과 48.62 Oe의 높은 이방성자계 때문에 $Co_{39}Fe_{34}Hf_{9.5}O_{17.5}$박막이 고주파에서 우수한 연자기 특성을 가지는 것으로 사료된다.

• 한국진공학회지
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• 제5권1호
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• pp.77-84
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• 1996

Silicon deposition by Penning discharge was carried out using a mixture of 5% $SiH_4/H_2$ and Ar gas, and the effects of the deposition conditions(gas mixing raito, substrate temperature. discharge power etc.) on the growth rate, crystallinity and morphology of the films deposited were investigated. The magnetic field(800 G) confined the plasma in the region between the two cathodes and enhanced the discharge current by a factor of a few hundreds below 1 mTorr. The magnetic field-enhanced plasma density resulted in a very large deposition rate of about 300 $\AA$/min at $SiH_4$ flow rate of 0.7 sccm and the substrate temperature of $800^{\circ}C$. Characterization of the films by Raman spectroscopy, X-ray diffraction, and scanning electron microscopy revealed that an epitaxial film with a smooth surface grows above 80$0^{\circ}C$, an amorphous film below $400^{\circ}C$, and a rough polycrystalline film at intermediate temperatures.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2007년도 The 1st International Symposium on Advanced Magnetic Materials
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• pp.246.2-246.2
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• 2007

• 연구논문집
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• 통권30호
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• pp.147-157
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• 2000

The filtered vacuum arc source (FVAS), which is adopted by magnetic filtering methode to remove the macro-particle in vacuum arc plasma, was composed of a torus structure with bending angle of 60 degree. The radius of torus was 266 mm, the radius of plasma duct was 80 mm and the total length was 600 mm. The magnet parts were consisted of one permanent magnet, one magnetic yoke and five solenoid magnets. The plasma duct was electrically isolated from the ground so that a bias voltage could be applied. The baffles inside plasma duct were installed in order to prevent the recoil effect of macro-particles. Graphite was used as the cathode material to coat the amorphic diamond film and its diameter was 80 mm. The amorphic diamond film attracts much attention due to its excellent mechanical, optical and tribological properties suitable for wide range of applications. The effects of solenoid magnet in plasma extraction were studied by computer simulation and experiment using Taguchi's method. The source and extraction magnet affected the arc stabilization. The extraction beam current was maximized with low value of the source magnet current and high value of the filtering magnet current. Optimum deposition condition was obtained when the currents of arc discharge, source, extraction, bending, deflection and outlet magnet were 30 A, 1 A, 3 A, 5 A, and 5 A, respectively.

• 한국자기학회지
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• 제5권5호
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• pp.524-527
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• 1995

The temperature dependence of spin wave mode separation in amorphous $Co_{89.5}Zr_{10.5}$ thin film has been investigated at temperatures between 100 K and 300 K. The magnetization and the spectroscopic splitting factor were obtained for the main resonance mode in parallel and perpendicular magnetic field. ${\Delta}H_{2-3}$, the difference between resonance field of mode 2 and the resonance field of mode 3, increases with decreasing temperature. The linewidth increases for all the modes with decreasing temperature. Especially in mode 3 it increases rapidly below 200 K. This phenomenon could be caused by the increase of exchange stiffness constant or the decrease of surface magnetic anisotropy constant with decreasing temperature.