• 열처리공학회지
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• 제31권4호
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• pp.165-170
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• 2018

W, Fe, and carbon powders were mechanical alloyed to produce $W_{35}Fe_{43}C_{22}$ ternary alloy powders containing nanocrystal W embedded within amorphous matrix. When the powder samples were heated to the primary crystallization temperature of $735^{\circ}C$, most parts of their amorphous region were fully crystallized to [W,Fe]-rich $M_6C$ carbides. Interestingly, a little portion of the carbides changes to stoichiometric line compounds ($M_{12}C$ and $W_6Fe_7$) and a solution phase (Fe-rich bcc), and remaining parts of the crystallites were amorphized again. The resulting microstructure was retained even by cyclic heating between room temperature of $1,200^{\circ}C$, and thus we found that the amorphous structure can be irreversibly formed at above glass transition temperature.

• 공업화학
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• 제19권3호
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• pp.322-325
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• 2008

3,3-Dimethyl-1-butene ($C_6H_{12}$) 모노머를 PECVD 증착하였다. 비정질 탄소막은 FT-IR 스펙트럼에서 R.F.전력/압력비가 증가할수록 수소의 함유량과 dangling bond가 감소되고 막의 기계적 특성은 밀도가 상승함으로써 비례하여 향상되었다. 또한 Raman 스펙트럼에서 D 피크가 증가하였고 고리구조의 막을 형성하였다. 따라서 경도와 모듈러스가 각각 12 GPa과 85 GPa였다. 증착된 막의 굴절률(n)과 흡광계수(k)는 전력/압력비가 상승할수록 증가하였다.

• 한국진공학회지
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• 제22권1호
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• pp.31-36
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• 2013

마이크로플라즈마 화학기상증착법(microwave plasma enhanced chemical vapor deposition, MPCVD)에 의하여 형성된 비정질 탄소 박막의 효율적인 도핑 공정을 위하여, 비정질 탄소 박막의 성장 직전 nucleated seed 상태의 기판 혹은 일부 성장된 박막 위에 비소(As) 이온을 이온 주입하였고 그 직후 다시 MPCVD에 의하여 박막을 성장시켰다. MPCVD에 의한 성장 자체가 약 $500{\sim}600^{\circ}C$ 온도에서의 어닐링 공정을 대체할 수 있으므로, 기존의 이온 주입 후 별도의 어닐링 공정과 비교 시 간략화된 공정으로도 어닐링 효과가 있다고 할 수 있다. 이온 주입 후 박막 성장으로 어닐링 효과를 얻은 비정질 탄소 박막의 경우, $2.5V/{\mu}m$의 전계에서 약 $0.1mA/cm^2$의 전계 방출 특성을 관찰할 수 있었고 또한 라만 스펙트럼 특성에서도 다이아몬드 특성 및 그래파이트 특성 모두 뚜렷이 관찰되었다. 전기적, 구조적 특성 관찰로부터 이온 주입된 As 이온이 자동 어닐링 효과에 의해 충분히 비정질 탄소 박막에 도핑되었다고 할 수 있다.

• Tribology and Lubricants
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• 제20권3호
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• pp.125-131
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• 2004

Nano-wear behavior of amorphous carbon films was studied by Atomic Force Microscopy. The a-C films are deposited on Si(100) substrate by DC magnetron sputtering method. The influences of different surface roughness on the nano-wear are investigated. Nano-wear tests were carried out using a very sharp diamond coated tip. Its spring constant was 1.6 N/m and radius of curvature was 110 nm. Normal force used in the wear tests ranged 0 to 400 nN. It was found that surface depression occurred during scratching because of plastic deformation and abrasive wear (cutting St ploughing). Wear depth increased linearly with normal force. Changing the surface roughness variables according to the bias pulse control, the less surface roughness decreased the wear depth. The thickness did not affect the wear resistance.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.381.2-381.2
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• 2014

In this study the amorphous carbon films were deposited by PECVD at the substrate temperature range of 250 to $600^{\circ}C$, and the process conditions of higher and lower precursor flow rate, respectively. The temperature was a main parameter to control the density and mirco-structures of carbon films, and their's properties depended with the process temperatrue are changed by controlling precursor flow rate. The precursor feeding rate affect on the plasma ion density and a deposition reactivity. This change of film properties was obtained the instrinsic stress, FT-IR & Raman analysis, refractive index (RI) and ext. coef. (k) measured by ellipsometer. In the process conditions of lower and higher flow rate of precursor it had a different intrinsic stress as a function of the substrate temperature.

• 한국전기전자재료학회논문지
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• 제17권12호
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• pp.1332-1336
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• 2004

Amorphous carbon (a-C) films have been deposited on Si(100) substrate using RF magnetron system in order to investigate the electron field emission properties. The a-C films were treated by $N_2$ gas plasma at room temperature. Surface morphologices and structural properties of the a-C films before and after $N_2$ plasma treatment were observed by scanning electron microscopy and Raman spectroscope, respectively. Structural properties and surface morphology of the a-C films were changed by $N_2$ plasma treatment. The emission properties can be improved by the plasma treatment according to the contents of nitrogen on the a-C films which is varied by plasma treatment time. Before the plasma treatment, the a-C films are found to have a threshold field of 14 V/$\mu$m, but the a-C film treated by $N_2$ plasma for 30 min exhibit threshold field as low as 6.5 V/$\mu$m.

• 한국전기전자재료학회논문지
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• 제32권5호
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• pp.403-406
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• 2019

We prepared yarned carbon nanotube (CNT) fibers from a CNT forest synthesized on a Si wafer by chemical vapor deposition (CVD). The yarned CNT fibers were thermally annealed to reduce their resistance by removing the amorphous carbonaceous impurities present in the fibers. The resistance of the yarned CNT fiber gradually decreased with an increase in the annealing temperature from $200^{\circ}C$ to $400^{\circ}C$ but increased again above $450^{\circ}C$. We carried out thermogravimetric analysis (TGA) to confirm the burning properties of the amorphous carbonaceous impurities and the crystalline CNTs present in the fibers. The pattern of the mass change of the sample CNT fibers was very similar to that of the resistance change. We conclude that CNT fibers should be thermally annealed at temperatures below $400^{\circ}C$ for reducing and stabilizing their resistance.

• 한국전기전자재료학회논문지
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• 제20권8호
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• pp.701-705
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• 2007

The incorporation of N in a-C film is able to improve the friction coefficient and the adhesion to various substrates. In this study, a-C:N films were deposited on Si and steel substrates by closed-field unbalanced magnetron (CFUBM) sputtering system in $Ar/N_2$ plasma. The lubricant characteristics was investigated for a-C:N deposited with total working pressure from 4 to 7 mTorr. We obtained high hardness up to 24GPa, friction coefficient lower than 0.1 and the smooth surface of having the extremely low roughness (0.16 nm). The physcial properties of a-C:N thin film are related to the increase of cross-linked $sp^2$ bonding clusters in the film. However, the decrease of hardness, elastic modulus and the increase of surface roughness, friction coefficient with the increase of $N_2$ partial pressrue might be due to the effect of energetic ions as a result of the increase of ion bombardment with the increase of ion density in the plasma.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.748-752
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• 2004

The Hydrogenated amorphous carbon (a-C:H) thin films are deposited to fabricate suppored layer on silicon substrate with a closed field unbalanced magnetron(CFUBM) sputtering system. This study focuses on the characteristic of Diamond like carbon (DLC) films and Pb(Zr,Ti)$O_3$ (PZT) films for membrane structure. The deposition rate and the surface roughness of DLC fims decrease with DC bias voltage. hardness is 26 GPa at -200 V. Interface of DLC/Si and Pt/DLC layers was excellent.

• 대한금속재료학회지
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• 제48권4호
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• pp.335-341
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• 2010

High-quality single-walled carbon nanotubes (SWCNTs) were synthesized by catalytic decomposition of $C_2H_2$ using Fe-Mo/MgO catalyst at $800^{\circ}C$. The as-synthesized SWCNTs typically occurred in the form of a bundle with a diameter of 10~20 nm together with amorphous carbon and catalytic impurities, which were removed by a two-step purification process consisting of oxidation and an acid treatment. The oxidation step, using an $O_2$-Ar mixture at $380^{\circ}C$ for 5 hr in a vertical-type furnace and a $HNO_3$ treatment at $100^{\circ}C$ for one hour, was utilized to remove the amorphous carbon particles. Subsequently, metallic catalysts were removed in HCl at room temperature for 5 hr under magnetic stirring. The SWCNT suspension was prepared by dispersing the purified SWCNTs in an aqueous sodium dodecyl benzene sulfonate solution with horn-type sonication. This was then air-sprayed on glass to fabricate CNT field emitters. The samples had a turn-on field value of 4 V/${\mu}m$ and a current density of 0.67 mA/$cm^2$ at 9 V/${\mu}m$. Increasing the HCl treatment time improved the field emission properties.