• Title/Summary/Keyword: acid etching

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Comparison of the shear bond strength of self-etching dentin bonding agents to dentin (자가부식형 상아질 접착제와 상아질과의 전단결합강도 비교)

  • Noh, Su-Jeong;Kim, Bu-Sub;Chung, In-Sung
    • Journal of Technologic Dentistry
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    • v.29 no.2
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    • pp.141-150
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    • 2007
  • The purpose of this study was to ascertain the bonding durability of self-etching dentin bonding agents to dentin by means of shear bonding strength. Several acid-etching dentin bonding system (ESPE Z100) and self-etching dentin bonding systems (DEN-FIL, GRADIA DIRET) were used. The occlusion surface of human molars were ground flat to expose dentin and treated with the etch bonding system according to manufactures instruction and followed by composite resin application. After 24hours of storage at 37$^{\circ}C$, the shear bonding strength of the specimens was measured in a universal testing machine with a 1mm/min crosshead speed. An one-way analysis of variance and the scheffe test were performed to identify significant differences (p<0.05). The bonded interfacial surfaces and treated dentin surfaces were examined using a SEM. Through the analysis of shear bond strength data and micro-structures of dentin-resin interfaces, following results are obtained. In dentin group, the shear bond strength of DEN-FIL showed statistical superiority in comparison to the other groups and followed by ESPE Z100 and GRADIA DIRECT (p<0.05).

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Macroporous Thick Tin Foil Negative Electrode via Chemical Etching for Lithium-ion Batteries (화학적 식각을 통해 제조한 리튬이온 이차전지용 고용량 다공성 주석후막 음극)

  • Kim, Hae Been;Lee, Pyung Woo;Lee, Dong Geun;Oh, Ji Seon;Ryu, Ji Heon
    • Journal of the Korean Electrochemical Society
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    • v.22 no.1
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    • pp.36-42
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    • 2019
  • A macroporous Sn thick film as a high capacity negative electrode for a lithium ion secondary battery was prepared by using a chemical etching method using nitric acid for a Sn film having a thickness of $52{\mu}m$. The porous Sn thick film greatly reduced the over-voltage for the alloying reaction with lithium by the increased reaction area. At the same time. The porous structure of active Sn film plays a part in the buffer and reduces the damage by the volume change during cycles. Since the porous Sn thick film electrode does not require the use of the binder and the conductive carbon black, it has substantially larger energy density. As the concentration of nitric acid in etching solution increased, the degree of the etching increased. The etching of the Sn film effectively proceeded with nitric acid of 3 M concentration or more. The porous Sn film could not be recovered because the most of Sn was eluted within 60 seconds by the rapid etching rate in the 5 M nitric acid. In the case of etching with 4 M nitric acid for 60 seconds, the appropriate porous Sn film was formed with 48.9% of weight loss and 40.3% of thickness change during chemical acid etching process. As the degree of etching of Sn film increased, the electrochemical activity and the reversible capacity for the lithium storage of the Sn film electrode were increased. The highest reversible specific capacity of 650 mAh/g was achieved at the etching condition with 4 M nitric acid. The porous Sn film electrode showed better cycle performance than the conventional electrode using a Sn powder.

A Review of Wet Chemical Etching of Glasses in Hydrofluoric Acid based Solution for Thin Film Silicon Solar Cell Application

  • Park, Hyeongsik;Cho, Jae Hyun;Jung, Jun Hee;Duy, Pham Phong;Le, Anh Huy Tuan;Yi, Junsin
    • Current Photovoltaic Research
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    • v.5 no.3
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    • pp.75-82
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    • 2017
  • High efficiency thin film solar cells require an absorber layer with high absorption and low defect, a transparent conductive oxide (TCO) film with high transmittance of over 80% and a high conductivity. Furthermore, light can be captured through the glass substrate and sent to the light absorbing layer to improve the efficiency. In this paper, morphology formation on the surface of glass substrate was investigated by using HF, mainly classified as random etching and periodic etching. We discussed about the etch mechanism, etch rate and hard mask materials, and periodic light trapping structure.

ULTRA-STRUCTURE AND ACID ETCHING CHARACTERISTICS OF OCCLUSAL FISSURE ENAMEL (교합면 열구 법랑질의 미세구조 및 산부식 형태)

  • Cho, Tae-Sik;Yoon, Jeong-Hoon;Kim, Su-Gwan;Lee, Sang-Ho
    • Journal of the korean academy of Pediatric Dentistry
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    • v.32 no.2
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    • pp.321-331
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    • 2005
  • The purpose of this study was to compare the effectiveness of mechanical and acid treatment on enamel surfaces for the retention of pit and fissure sealants and evaluate the presence of a prismless layer. The etch pattern produced on enamel from immature and mature premolar teeth extracted with varying period of acid etching using 37% phosphoric acid was examined using a scanning electron microscope(SEM). The composition of each groups was evaluated using an energy dispersive x-ray(EDX) spectroscopy. The result of present study can be summarized as follows: 1. Prismless layer was commonly observed on the fissure enamel in young and mature premolar. 2. There were no differences in micro-structure and etching pattern on fissure enamel between the young and the mature premolar. 3. The most effective etching pattern for retention of pit and fissure sealant was observed in 60 seconds of etching time and no apparent difference of etching pattern was found among 15, 30, and 45 seconds of etching time which showed non-retentive etching patterns. 4. The etching pattern obtained by grinding enamel surface with bur followed by 60 seconds of etching was similar to that of 60 seconds of etching without any pretreatment of fissure surface. 5. Type 2 etching pattern was commonly found on fissure enamel in both young and mature premolar. 6. The calcium content and P/Ca ratio in fissure enamel between the young and the mature premolar were significantly different(P<0.05). But content of calcium, phosphate and P/Ca ratio on various regions of fissure enamel in both young and mature premolar did not showed any difference. Based on these results, prismless layer may negatively influence the retention of pit and fissure sealants. Therefore, the mechanical removal of the prismless layer by grinding prior to etching or by prolonged etching time of enamel within the fissure system should result in an improved bonding of a pit and fissure sealant.

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Effects of Ingredients of Wet Etchant on Glass Slimming Process (유리기판 박막화를 위한 습식공정에서 식각액 성분의 영향)

  • Shin, Young Sik;Lee, Won Gyu
    • Korean Chemical Engineering Research
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    • v.58 no.3
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    • pp.474-479
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    • 2020
  • The etching solution for slimming of glass substrates was manufactured and HF was used as the main ingredient of wet etching solutions. Various types of strong acids such as HCl, HNO3, H2SO4, amino acids and carboxylic acids such as citric acid, and etched solutions, respectively, were used to measure the etching rates and changes in surface shape of the glass. Regardless of the type of strong acids, the etching rate of the glass increased linearly as the added amount increased, and the sludge removal effect of the glass surface was also shown. The etching solution containing HCl showed more efficient results than other strong acids in the etching rate and the effect of removing sludge. The addition of carboxylic acid did not significantly affect the variation of etching rate, but had the effect of removing sludge. However, if amino acids were added, changes in etching rate and sludge removal were not significant.

MICROLEAKAGE TEST ACCORDING TO ACID ETCHING TREATMENT IN CLASS V COMPOMERS (치면 산처리가 V급 와동의 compomer 수복에서 미세누출에 미치는 영향)

  • Moon, Sang-Hee;Lee, Chang-Seop;Lee, Sang-Ho
    • Journal of the korean academy of Pediatric Dentistry
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    • v.27 no.2
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    • pp.351-360
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    • 2000
  • The purpose of this study was to evaluate the microleakage of class V compomers according to acid etching treatment and treatment times. Extracted 180 sound human molar teeth were selected then prepared physiologic pulpal pressure far this experiment. In this study class V cavities were prepared on buccal surface with gingival margin located in 1mm superior to CEJ under simulate physiological conditions. These specimens were randomly divided into 6 groups of 30 each and restored following methods : A: Dyract AP + Prime&Bond 2.1 Group 1 : No acid etching, according to manufacturer's instruction. Group 2 : 15 seconds acid etching and same method with Group 1. Group 3 : 30 seconds acid etching and same method with Group 1. B: F2000 groups + Single Bond adhesive Group 1 : No acid etching, according to manufacturer's instruction. Group 2 : 15 seconds acid etching and same method with Group 1 Group 3 : 30 seconds acid etching and same method with Group 1. After 500 thermocycling between $5^{\circ}C\;and\;55^{\circ}C$, the specimens were sealed with glass ionomer and nail varnish then placed in 5% methylene blue dye for 5 hours and rinsed with tab water. The specimens were embedded in orthodontic clear resin, then sectioned buccolingually through the center of restoration with a low speed diamond saw. The dye penetration on each of the specimens were then observed with a stereomicroscope at $\times20$ magnification. The results of this study were statistically analyzed using the indepedent sample t-test and analysis of variance. Results were as follows, 1. In occlusal walls, microleakage were significantly reduced in acid etched group restored with Dyract AP but no statistically significance in F2000 groups. 2. In gingival walls, microleakage were significantly reduced in group 2 restored with Dyract AP, and group 2 and group 3 in F2000 groups. 3. All groups, except group 3 in Dyract AP, showed significantly less microleakage in occlusal wall than gingival wall. 4. No statistical significance were showed between group 2 and group 3 in both materials.

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Acid etching of glass-infiltrated zirconia and its biological response

  • Vu, Van Thi;Oh, Gye-Jeong;Yun, Kwi-Dug;Lim, Hyun-Pil;Kim, Ji-Won;Nguyen, Thao Phuong Thi;Park, Sang-Won
    • The Journal of Advanced Prosthodontics
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    • v.9 no.2
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    • pp.104-109
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    • 2017
  • PURPOSE. The purpose of this study was to evaluate the influence of acid etching treatment on surface characteristics and biological response of glass-infiltrated zirconia. MATERIALS AND METHODS. A hundred zirconia specimens were divided into four groups depending on surface treatments: untreated zirconia (group Z); acid-etched zirconia (group ZE); glass-infiltrated zirconia (group ZG); and glass-infiltrated and acid-etched zirconia (group ZGE). Surface roughness, surface topography, surface morphology, and Vickers hardness of specimens were evaluated. For biological response test, MC3T3-E1 cell attachment and proliferation on surface of the specimens were examined. The data were statistically analyzed using one-way ANOVA and Tukey's HSD test at a significance level of 0.05. RESULTS. Group ZGE showed the highest surface roughness ($Ra=1.54{\mu}m$) compared with other groups (P < .05). Meanwhile, the hardness of group Z was significantly higher than those of other groups (P < .05). Cell attachment and cell proliferation were significantly higher in group ZGE (P < .05). CONCLUSION. We concluded that effective surface roughness on zirconia could be made by acid etching treatment after glass infiltration. This surface showed significantly enhanced osteoblast cell response.

Effect of zirconia surface treatment using nitric acid-hydrofluoric acid on the shear bond strengths of resin cements

  • Cho, Jin Hyung;Kim, Sun Jai;Shim, June Sung;Lee, Keun-Woo
    • The Journal of Advanced Prosthodontics
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    • v.9 no.2
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    • pp.77-84
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    • 2017
  • PURPOSE. The aim of this study was to compare the surface roughness of zirconia when using Zircos E etching system (ZSAT), applying a nitric acid-hydrofluoric acid compound as a pretreatment agent, and also to compare the shear bonding strength according to different resin cements. MATERIALS AND METHODS. ZSAT, air abrasion, and tribochemical silicacoating were applied on prepared 120 zirconia specimens (10 mm in diameter, 7 mm in height) using CAD/CAM. Each 12 specimens with 4 different resin cements (Panavia F 2.0, Rely X Unicem, Superbond C&B, and Hot bond) were applied to test interfacial bond strength. The statistical analysis was performed using SAS 9.1 (SAS Institute Inc., Cary, NC, USA). The results are as follows: after application of the ZSAT on the zirconia specimens, surface roughness value after 2-hour etching was higher than those after 1- and 3-hour etching on SEM images. RESULTS. For Superbond C&B and Rely X Unicem, the specimens treated with ZSAT showed higher shear bond strength values than those treated with air abrasion and tribochemical silicacoating system. Regarding the failure mode of interface over cement and zirconia surface, Rely X Unicem and Hot bond showed cohesive failures and Panavia F 2.0 and Superbond C&B showed mixed failures. CONCLUSION. Zircos E etching system in zirconia restoration could increase its shear bond strength. However, its long term success rate and clinical application should be further evaluated.