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http://dx.doi.org/10.21218/CPR.2017.5.3.075

A Review of Wet Chemical Etching of Glasses in Hydrofluoric Acid based Solution for Thin Film Silicon Solar Cell Application  

Park, Hyeongsik (College of Information and Communication Engineering, Sungkyunkwan University)
Cho, Jae Hyun (College of Information and Communication Engineering, Sungkyunkwan University)
Jung, Jun Hee (Department of Energy Science, Sungkyunkwan University)
Duy, Pham Phong (College of Information and Communication Engineering, Sungkyunkwan University)
Le, Anh Huy Tuan (College of Information and Communication Engineering, Sungkyunkwan University)
Yi, Junsin (College of Information and Communication Engineering, Sungkyunkwan University)
Publication Information
Current Photovoltaic Research / v.5, no.3, 2017 , pp. 75-82 More about this Journal
Abstract
High efficiency thin film solar cells require an absorber layer with high absorption and low defect, a transparent conductive oxide (TCO) film with high transmittance of over 80% and a high conductivity. Furthermore, light can be captured through the glass substrate and sent to the light absorbing layer to improve the efficiency. In this paper, morphology formation on the surface of glass substrate was investigated by using HF, mainly classified as random etching and periodic etching. We discussed about the etch mechanism, etch rate and hard mask materials, and periodic light trapping structure.
Keywords
Light trapping; Wet etching; Chemical; Hydrofluoric acid; Thin film; Solar cell;
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Times Cited By KSCI : 1  (Citation Analysis)
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