• 제목/요약/키워드: ZnO substrates

검색결과 477건 처리시간 0.024초

PLD 기술로 제작된 ZnO 박막의 특성 (Characterization of ZnO Thin Films prepared by Pulsed Laser Deposition Technique)

  • 노임준;신백균;이능헌;김용혁;지승한;이상희;한상옥
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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    • pp.1404-1405
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    • 2006
  • Transparent ZnO thin films were deposited on quartz substrates by a KrF pulsed laser deposition (PLD) technique with different process conditions such as substrate temperature ($T_s$) and oxygen ambient pressure ($pO_2$). Surface morphology, crystal structure, and electrical properties of the ZnO films were investigated in order to characterize their thin film properties. The pulsed laser deposited ZnO films showed highly c-oriented crystalline structures depending on the process conditions: the highest FWHM (Full Width Half Maximum) value of (002) peak was observed for the ZnO film prepared at $T_{s}=550^{\circ}C$, $pO_2$=5mTorr and laser fluence of $2J/cm^2$.

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DC 바이어스를 인가하여 수열합성법으로 성장시킨 ZnO 나노와이어의 성장 특성 (Growth Characteristics of the ZnO Nanowires Prepared by Hydrothermal Synthesis Technique with Applied DC Bias)

  • 임영택;신백균
    • 한국전기전자재료학회논문지
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    • 제27권5호
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    • pp.317-321
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    • 2014
  • Hydrothermal synthesis technique could be carried out for growth of ZnO nanowires at relatively low process temperature, and it could be freely utilized with various substrates for fabrication process of functional electronic devices. However, it has also a demerit of relatively slow growth characteristics of the resulting ZnO nanowires. In this paper, an external DC bias of positive and negative 0.5 [V] was applied in the hydrothermal synthesis process for 2~8 [h] to prepare ZnO nanowires on a seed layer of AZO with high electrical conductivity. Growth characteristics of the synthesized ZnO nanowires were analyzed by FE-SEM. Material property of the grown ZnO nanowires was examined by PL analysis. The ZnO nanowires grown with positive bias revealed distinctively enhanced growth characteristics, and they showed a typical material property of ZnO.

수열합성법으로 성장된 ZnO 나노로드 가스 센서의 제작 및 특성 연구 (Characteristics and Preparation of Gas Sensor Using ZnO Nanorods Grown by Hydrothermal Process)

  • 정종훈;유일
    • 한국재료학회지
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    • 제21권4호
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    • pp.232-235
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    • 2011
  • ZnO nanorods for gas sensors were prepared by a hydrothermal method. The ZnO gas sensors were fabricated on alumina substrates by a screen printing method. The gas-sensing properties of the ZnO nanorods were investigated for $CH_4$ gas. The effects of growth time on the structural and morphological properties of the ZnO nanorods were investigated by X-ray diffraction and scanning electron microscope. The XRD patterns of the nanocrystallized ZnO nanorods showed a wurtzite structure with the (002) predominant orientation. The diameter and length of the ZnO nanorods increased in proportion to the growth time. The sensitivity of the ZnO sensors to 5 ppm $CH_4$ gas was investigated for various growth times. The ZnO sensors exhibited good sensitivity and rapid response-recovery characteristics to $CH_4$ gas, and both traits were dependent on the growth time. The highest sensitivity of the ZnO sensors to $CH_4$ gas was observed with the growth time of 7 h. The response and recovery times were 13 s and 6 s, respectively.

실리콘 박막 태양전지 전면 전극용 ZnO : Al 투명전도막의 표면형상 및 산란광 특성 (Characterization of Surface Morphology and Light Scattering of Transparent Conducting ZnO:Al Films as Front Electrode for Silicon Thin Film Solar Cells)

  • 김영진;조준식;이정철;왕진석;송진수;윤경훈
    • 한국재료학회지
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    • 제19권5호
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    • pp.245-252
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    • 2009
  • Changes in the surface morphology and light scattering of textured Al doped ZnO thin films on glass substrates prepared by rf magnetron sputtering were investigated. As-deposited ZnO:Al films show a high transmittance of above 80% in the visible range and a low electrical resistivity of $4.5{\times}10^{-4}{\Omega}{\cdot}cm$. The surface morphology of textured ZnO:Al films are closely dependent on the deposition parameters of heater temperature, working pressure, and etching time in the etching process. The optimized surface morphology with a crater shape is obtained at a heater temperature of $350^{\circ}C$, working pressure of 0.5 mtorr, and etching time of 45 seconds. The optical properties of light transmittance, haze, and angular distribution function (ADF) are significantly affected by the resulting surface morphologies of textured films. The film surfaces, having uniformly size-distributed craters, represent good light scattering properties of high haze and ADF values. Compared with commercial Asahi U ($SnO_2$:F) substrates, the suitability of textured ZnO:Al films as front electrode material for amorphous silicon thin film solar cells is also estimated with respect to electrical and optical properties.

기판과 열처리 조건에 따른 ZnO 성장 연구 (Thin Film Growth of ZnO dependant upon conditions of Temp. & Sub-streate)

  • 이경주;이동우;노지형;문병무
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.340-341
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    • 2007
  • Thin film of ZnO was deposited on various substrate by Nd:YAG Pulsed Laser Deposition(PLD) with a wavelength of 355nm. Further more, Thin filme of ZnO conducted by various temperature conditions. The surface morphology of the ZnO thin film was investigated by X-Ray Diffraction(XRD) and Atomic Force Microscopy(AFM). Effects of various substrates and Temperature conditions were analyzed. The best properties were obtained on $600^{\circ}C$ with post-deposition annealing at $600^{\circ}C$ in flowing $O_2$ atmosphere for several hours.

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유리기판에 제작한 ZnO 박막의 c축 배향성에 관한 연구 (A study on the c-axis orientation of ZnO thin film deposited on glass substrates)

  • 고상춘;이종덕;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 추계학술대회 논문집
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    • pp.9-13
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    • 1995
  • In this paper, Zinc Oxide films, with a high degree of c-axis orientation, have been grown on glass substrates by a rf magnetron sputtering. The maximum crystal orientation was found to occur with substrate temperature 150$^{\circ}C$, input power 190W, oxygen rate 50%, target-substrate distance 55mm. It is proposed to achieve high-resistivity ZnO films by increasing the annealing temperature. The piezoelectric layers, preferred oriented with (002) perpendicular to the layer with 4.9$^{\circ}$, could be obtained by the annealing temperature 300$^{\circ}C$ in oxygen atmosphere. It is indicated that the relative permittivity is range from 8.9 to 9.8 in the frequency ranging from 10KHz to 5MHz.

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Preparation of Highly Oriented ZnO Thin Films Prepared by Sol-Gel Method

  • Cheol Jeong;Hwang, Kyu-Seog;Moon, Jong-Ha;Kim, Byung-Hoon
    • The Korean Journal of Ceramics
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    • 제3권4호
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    • pp.249-252
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    • 1997
  • Highly oriented ZnO thin films were fabricated by dip-coating technique using zinc acetate 2-methoxyethanol 2-aminoethanol solution as starting materials, and effects of substrates on the film's orientation were investigated. Product films were obtained by prefiring at 300, 400, 500 and 550℃ for 10 min, followed by final heat-treatment at the same temperatures as prefiring for 1h. c-axis oriented films on glass substrates were prepared by heat treatment of prefiring films at 300-550℃, while films on alumina showed polycrystalline structure. Films with c-axis orientation exhibited lower specific resistivities than those of polycrystalline films with partial crack and pore.

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ALD로 성장된 ZnO박막에 대한 질소이온 조사효과 (Study of the Nitrogen-Beam Irradiation Effects on ALD-ZnO Films)

  • 김희수
    • 한국진공학회지
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    • 제18권5호
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    • pp.384-389
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    • 2009
  • ZnO는 육방정계결정구조의 물질로서 3.37 eV의 넓은 띠 간격과 60 meV의 큰 exciton 결합에너지에 따른 높은 효율의 자외선발광으로 짧은 파장의 빛 (녹, 청, 자외선)을 내는 LED (Light Emitting Diode) 분야에서 관심을 기울이고 있는 물질이다. LED제작을 위해서는 n형의 ZnO와 p형의 ZnO가 필요하지만 기본적으로 ZnO은 n형이므로 신뢰성 있는 p형 ZnO박막을 제작하기 위한 노력이 기울여지고 있다. 본 연구에서는 ALD (Atomic Layer Deposition)로 제작된 ZnO박막에 20 keV의 에너지를 갖는 질소이온을 $10^{13}{\sim}10^{15}ions/cm^2$로 조사한 후 Hall 효과 측정장치를 이용하여 질소이온 조사에 따른 전기적 특성변화를 조사하였다.

SiO$_2$ 완충층이 ZnO 박막의 물성 및 IDT/ZnO/SiO$_2$/Si 다층막 구조 표면탄성파 소자의 특성에 미치는 영향 (Effects of SiO$_2$ Buffer Layer on Properties of ZnO thin films and Characteristics of SAW Devices with a Multilayered Configuration of IDT/ZnO/SiO$_2$/Si)

  • 이진복;이명호;박진석
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제51권9호
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    • pp.417-422
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    • 2002
  • ZnO thin films were deposited on various substrates, such as Si-(111), SiO$_2$(5000 $\AA$ by thermal CVD)/Si-(100), and SiO$_2$(2000 $\AA$ by RF sputtering)/Si-(100). The (002)-orientation, surface morphology and roughness, and electrical resistivity of deposited films were measured and compared in terms of substrate. Surface acoustic wave(SAW) filters with a multilayered configuration of IDT/ZnO/SiO$_2$/Si were also fabricated and the IDT was obtained using a lift-off method. From the frequency-response characteristics of fabricated devices, the insertion loss and side-lobe rejection were estimated. The experimental results showed that the (002)-oriented growth nature of ZnO films, which played a crucial role of determining the characteristic of SAW device, was strong1y dependent upon the SiO$_2$buffer.

Ga 도핑된 ZnO 박막의 기판에 따른 성장 특성 (Effect of substrate on growth of Ga-doped ZnO thin films)

  • 김지홍;노지형;류경진;문성준;김재원;도강민;문병무;구상모
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.296-296
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    • 2010
  • In this work, we report the effect of substrate on the growth of Ga-doped ZnO (GZO) thin films. GZO thin films were deposited on various substrates by using pulsed laser deposition (PLD). The structural properties, surface morphologies, and electrical properties were investigated. From the results of HRXRD, c-plane (0002) oriented growth of GZO films was confirmed on $Al_2O_3$ (0001). On the other hand, the GZO films on LAO (100) substrates were grown along the a-axis. The obvious differences on the electrical properties of each film were also obtained.

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