• 제목/요약/키워드: ZnO substrates

검색결과 477건 처리시간 0.027초

Single-Domain-Like Graphene with ZnO-Stitching by Defect-Selective Atomic Layer Deposition

  • 김홍범;박경선;;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.329-329
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    • 2016
  • Large-area graphene films produced by means of chemical vapor deposition (CVD) are polycrystalline and thus contain numerous grain boundaries that can greatly degrade their performance and produce inhomogeneous properties. A better grain boundary engineering in CVD graphene is essential to realize the full potential of graphene in large-scale applications. Here, we report a defect-selective atomic layer deposition (ALD) for stitching grain boundaries of CVD graphene with ZnO so as to increase the connectivity between grains. In the present ALD process, ZnO with hexagonal wurtzite structure was selectively grown mainly on the defect-rich grain boundaries to produce ZnO-stitched CVD graphene with well-connected grains. For the CVD graphene film after ZnO stitching, the inter-grain mobility is notably improved with only a little change in free carrier density. We also demonstrate how ZnO-stitched CVD graphene can be successfully integrated into wafer-scale arrays of top-gated field effect transistors on 4-inch Si and polymer substrates, revealing remarkable device-to-device uniformity.

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사파이어 기판 위에 증착된 ZnO 박막의 후열처리에 따른 발광특성 연구 (Effects of post-annealing treatment at various temperature on the light emission properties of ZnO thin films on sapphire)

  • 강홍성;심은섭;강정석;김종훈;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.119-122
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    • 2001
  • ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition(PLD) technique at the oxygen pressure of 350 mTorr. In order to investigate the effect of post-annealing treatment with oxygenn pressure of 350 mTorr on the optical property of ZnO thin films, films have been annealed at various substrate temperatures after deposition. After post-annealing treatment in the oxygen ambient, the optical properties of the ZnO thin films were characterized by PL(Photoluminescence) and structural properties of the ZnO were characterized by XRD, and have investigated structural property and optical property for application of light emission device.

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PLD증착 변수에 따른 II-VI족 화합물 ZnO 반도체 박막의 발광 특성 연구 (Correlation Between Deposition Parameters and Photoluminescence of ZnO Semiconducting Thin Films by Pulsed laser Deposition)

  • 배상혁;윤일구;서대식;명재민;이상렬
    • 한국전기전자재료학회논문지
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    • 제14권3호
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    • pp.246-250
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    • 2001
  • ZnO thin films for light emission device have been deposited on sapphire and silicon substrates by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of355 nm. In order to investigate the emission properties of ZnO thin films, Pl measurements with an Ar ion laser a light source using an excitation wavelength of 351 nm and a power of 100 mW are used. All spectra were taken at room temperature by using a grating spectrometer and a photomultiplier detector. ZnO exhibited Pl bands centers around 390, 510 and 640 nm, labeled near ultra-violet(UV), green and orange bands. Structural properties of ZnO thin films are analyzed with X-ray diffraction(XRD).

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PLD-Furnace로 증착시킨 금촉매를 이용한 ZnO 나노와이어 합성 (ZnO Nanowires Fabricated by Pulsed Laser Deposition using Gold Catalyst)

  • 손효정;전경아;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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    • pp.5-6
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    • 2005
  • ZnO nanowlres (NWs) were fabricated using Au as catalyst for a method combining laser ablation cluster formation and vapor-liquid-solid (VLS) growth. The target used in synthesis was pure ZnO ceramics. Two different substrates were used; (0001)-oriented sapphires and Au-coated sapphires. The Au thin film was deposited by thermal evaporation and the thickness was about 50 ${\AA}$. ZnO NWs were only formed in case of that used catalyst metal. Field effect scanning electron microscopic (FESEM) investigation showed that the average diameter of ZnO NWs was about 70 nm and the typical lengths varied from $3{\sim}4{\mu}m$.

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RF 마그네트론 스퍼터링법으로 증착한 ZnO:Er 박막형광체의 발광 특성 (Photoluminescence of ZnO:Er Thin Film Phosphors Deposited by RF Magnetron Sputtering)

  • 송현돈;김영진
    • 한국재료학회지
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    • 제16권7호
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    • pp.401-407
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    • 2006
  • ZnO is well-known as a promising material for optical communication systems and electronic displays. ZnO:Er thin films were deposited on c-plane sapphire substrates by rf magnetron sputtering, and the effects of sputtering parameters and the annealing conditions on the luminescence in the visible range were investigated. Luminescent properties depended on the crystallinity of films and annealing atmosphere. Highly c-axis oriented ZnO:Er films showed a strong emission band at 465 nm and a weak emission at 525 nm due to the energy transition of $^{4}I_{15/2}-^{4}F_{5/2}\;and\;^{4}I_{15/2}-^{2}H_{11/2}$, respectively. ZnO:Er thin films annealed at air atmosphere were superior to those annealed in $H_2$ in photoluminescence intensity.

태양전지용 ZnO:Al 투명전도막의 제작 (Fabrication of Transparent and Conductive Al-doped ZnO Films for Solar Cells)

  • 탁성주;강민구;김동환
    • 한국재료학회지
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    • 제16권7호
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    • pp.449-454
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    • 2006
  • Al-doped zinc oxide (ZnO:Al) films for transparent electrodes in thin film solar cells were deposited on glass substrates at a low temperature of $200^{\circ}C$ by rf magnetron sputtering. The transmittance of the ZnO:Al films in the visible range was 87%. The lowest resistivity of the ZnO:Al films was about $5.8{\times}10^{-4}{\Omega}$ cm at the Al content of 2.5 wt%. After deposition, the surface of ZnO:Al films were etched in dilute HCl (0.5%) for the investigation of the change in the electrical properties and the surface morphology due to etching.

펄스 레이저 증착법으로 제작한 ZnO 박막의 발광 특성 (Light emission properties of ZnO thin films grown by pulsed laser deposition)

  • 배상혁;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.539-542
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    • 2000
  • ZnO thin films for light emission device have been deposited on sapphire and silicon substrates by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of 355 nm. In order to investigate the emission properties of ZnO thin films, PL measurements with an Ar ion laser as a light source using an excitation wavelength of 351 nm and a power of 100 mW are used. All spectra were taken at room temperature by using a grating spectrometer and a photomultiplier detector. ZnO exhibited PL bands centered around 390, 510 and 640 nm, labeled near ultra-violet (UV), green and orange bands. Structural properties of ZnO thin films are analized with X-ray diffraction (XRD).

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Characterization of AZO thin films grown on various substrates by using facing target sputtering system

  • 이창현;손선영;배강;이창규;김화민
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.123-123
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    • 2015
  • Al doped ZnO(AZO) films as a transparent conductive oxide (TCO) electrode were deposited on glass, polyethylene naphthalate (PEN) and polyethylene terephthalate (PET) at room temperature by a conventional rf-magneton sputtering (CMS) and a facing target sputtering (FTS) using Al2O3 and ZnO targets. In order to investigation of AZO properties, the structural, surface morphology, electrical, and optical characteristics of AZO films were respectively analyzed. The resistivities of AZO films using FTS system were $6.50{\times}10-4{\Omega}{\cdot}cm$ on glass, $7.0{\times}10-4{\Omega}{\cdot}cm$ on PEN, and $7.4{\times}10-4{\Omega}{\cdot}cm$ on PET substrates, while the values of AZO films using CMS system were $7.6{\times}10-4{\Omega}{\cdot}cm$ on glass, $1.20{\times}10-3{\Omega}{\cdot}cm$ on PEN, and $1.58{\times}10-3{\Omega}{\cdot}cm$ on PET substrates. The AZO-films deposited by FTS system showed uniform surface compared to those of the films by CMS system. We thought that the films deposited by FTS system had low stress due to bombardment of high energetic particles during CMS process, resulted in enhanced electrical conductivity and crystalline quality by highly c-axis preferred orientation and closely packed nano-crystalline of AZO films using FTS system.

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대향타겟식 스퍼터법으로 증착된 ZnO/Glass 박막의 결정학적 특성에 관한 연구 (Crystallographic characteristics of ZnO/Glass thin films deposited by facing targets sputtering system)

  • 금민종;성하윤;손인환;김경환
    • 한국진공학회지
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    • 제9권4호
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    • pp.367-372
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    • 2000
  • $SiO_2$/Si 기판과 비정질 slide glass 기판 위에 대향타겟식스퍼터법(FTS법)을 이용하여 sputtering current 0.1~0.8 A, 방전 가스압 0.5~3mTorr, 기판온도 R.T~$400^{\circ}C$에서 ZnO 박막을 증착하였다. sputtering current 0.4 A, 가스압력 0.5 mTorr, 기판온도 30$0^{\circ}C$에서 증착된 ZnO/glass 박막과 ZnO/$SiO_2$/Si 박막의 $\Delta\theta_{50}$$3.8^{\circ}$$2.98^{\circ}$를 각각 나타내었다. 이러한 조건에서 FTS법은 비정질 slide glass 기판 위에서도 우수한 c-축 배향성을 갖는 ZnO 박막을 제작할 수 있다는 것을 알 수 있었다.

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대기 분위기의 알루미나 도가니 내에서 Zn 분말의 산화에 의해 합성된 ZnO 나노분말 (ZnO Nano-Powder Synthesized through a Simple Oxidation of Metallic Zn Powder in Alumina Crucible under an Air Atmosphere)

  • 이근형
    • 대한금속재료학회지
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    • 제48권9호
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    • pp.861-866
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    • 2010
  • Tetrapod-shaped ZnO crystals were synthesized through a simple oxidation of metallic Zn powder in air without the presence of any catalysts or substrates. X-ray diffraction data revealed that the ZnO crystals had wurtzite structure. It is supposed that the growth of the tetrapod proceeded in a vapor-solid growth mechanism. As the amount of the source powder increased, the size of the tetrapod decreased. The tip morphology of the tetrapod changed from a needle-like shape to a spherical shape with the oxidation time. ZnO crystals with rod shape were fabricated via the oxidation of Zn and Sn mixture. Sn played an important role in the formation of ZnO crystals with different morphology by affecting the growth mode of ZnO crystals. The cathodoluminescent properties were measured for the samples. The strongest green emission was observed for the rod-shaped ZnO crystals, suggesting that the crystals had the high density of oxygen vacancies.