• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.464-467
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• 1999

The undoped-InSe and Sn-doped InSe single crystals were grown by vertical Bridgman method and their properties were invesigated. The orientations and the crystallinites of these crystals were identified by X-ray diffraction(XRD), double crystal rocking curve(DCRC) and etch-pit density(EPD) measurements. From the Raman spectrum at room temperature, TO, LO modes and together with their overtones and combinations were observed. Optical properties were inves ated by PL at 12K and direct band gap of these crystals obtained from optical absorption spectrum. Compared with undo&-InSe, electrical properties of Sn-doped InSe were increased and the electrical conductivity type were n-type. But electrical properties along growth direction of crystals and radial direction of wafer showed nearly uniform distribution. The Zn diffusion mechanism in InSe could be explained by interstitial-substitutional and vacancy complex models and the activation energy of 1.15-3.01eV were needed for diffusion.fusion.

• Journal of Ceramic Processing Research
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• 제13권spc2호
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• pp.407-410
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• 2012

The properties of Al-doped ZnO (AZO) films were investigated as a function of H2/(Ar + H2) gas ratio using an AZO (2 wt% Al2O3) ceramic target in a radio frequency (RF) magnetron sputtering system. The deposition process was done at 200 ℃ and in 2 × 10-2Torr working pressure and with various ratios of H2/(Ar + H2) gas. During the AZO film deposition process, partial H2 gas affected the AZO film characteristics. The electron resistivity (~ 9.21 × 10-4 Ωcm) was lowest and mobility (~17.8 ㎠/Vs) was highest in AZO films when the H2/(Ar + H2) gas ratio was 2.5%. When the H2/(Ar + H2) gas ratio was increased above 2.5%, the electron resistivity increased and mobility decreased with increasing H2/(Ar + H2) gas ratio in AZO films. The carrier concentration increased with increasing H2/(Ar + H2) gas ratio from 0% to 7.5%. This phenomenon was explained by reaction of hydrogen and oxygen and additional formation of oxygen vacancy. The average optical transmission in the visible light wavelength region over 90% and an orientation of the deposition was [002] orientation for AZO films grown with all H2/(Ar + H2) gas ratios.

• 한국전기전자재료학회논문지
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• 제23권11호
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• pp.854-858
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• 2010

In this study, we have investigated the effects of Cr dopant on the sintering and electrical properties of ZnO-$Sb_2O_3$ (ZS) ceramics for varistor application. Spinel phases including $\alpha-$ and $\beta$-type was formed at ZS system and $\alpha$-spinel was stabilized by Cr doping in ZS system. Densification of ZS and ZSCr system was retarded to $1000^{\circ}C$ by the formation of spinel at $800^{\circ}C$. The morphology and its distribution of spinel phases in ZS system was homogeneous but disturbed by Cr doping. In ZSCr the densification of ZnO compared with ZS system was more retarded by low concentration of Zn interstitial defects induced by Cr doping in addition to the effect of spinel phase formation. The defects in each system were identified as attractive coulombic center (ZS: 0.13 eV, ZSCr: 0.12 eV) and singly charged oxygen vacancy $V_0^{\cdot}$ (ZSCr: 0.33 eV). In all ZS and ZSCr system have week varistor behavior by the formation of double Schottky barrier at grain boundary but its stability of barrier was very sensitive to sintering temperature.

• 한국전기전자재료학회논문지
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• 제24권11호
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• pp.882-889
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• 2011

In this study, we have investigated the effects of Co doping on I-V curves, bulk trap levels and grain boundary characteristics of ZnO-$Bi_2O_3$ (ZB) varistor. From I-V characteristics the nonlinear coefficient (a) and the grain boundary resistivity (${\rho}_{gb}$) decreased as 32${\rightarrow}$22 and 18.4${\rightarrow}0.6{\times}10^9{\Omega}cm$ with sintering temperature (900~1,300$^{\circ}C$), respectively. Admittance spectra and dielectric functions show two bulk traps of zinc interstitial, $Zn_i^{{\cdot}{\cdot}}$(0.16~0.18 eV) and oxygen vacancy, $V_o^{{\cdot}}$ (0.28~0.33 eV). The barrier of grain boundaries in ZBCo (ZnO-$Bi_2O_3-Co_3O_4$) could be electrochemically single type. However, its thermal stability was slightly disturbed by ambient oxygen because the apparent activation energy of grain boundaries was changed from 0.93 eV at the 460~580 K to 1.13 eV at the 620~700 K. It is revealed that Co dopant in ZB reduced the heterogeneity of the barrier in grain boundaries and stabilized the barrier against the ambient temperature.

• 한국전기전자재료학회논문지
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• 제30권1호
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• pp.54-58
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• 2017

The effect of low temperature ($250^{\circ}C$) heat treatment after electron irradiation (irradiation time = 30, 180, 300s) on the chemical bonding and electrical properties of ZnO thin films prepared using a sol-gel process were examined. XPS (X-ray photoelectron spectroscopy) analysis showed that the electron beam irradiation decreased the concentration of M-O bonding and increased the OH bonding. As a result of the electron beam irradiation, the carrier concentration of ZnO films increased. The on/off ratio was maintained at ${\sim}10^5$ and the $V_{TH}$ values shifted negatively from 11 to 1 V. As the irradiation time increased from 0 to 300s, the calculated S. S. (subthreshold swing) of ZnO TFTs increased from 1.03 to 3.69 V/decade. These values are superior when compared the sample heat-treated at $400^{\circ}C$ representing on/off ratio of ${\sim}10^2$ and S. S. value of 10.40 V/decade.

• 한국전기전자재료학회논문지
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• 제31권5호
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• pp.313-319
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• 2018

This study introduces a new investigation report on the microstructural and electrical property changes of $ZnO-Zn_2BiVO_6-Mn_3O_4$ (ZZMn), where 0.33 mol% of $Mn_3O_4$ and 0.5 mol% of $Zn_2BiVO_6$ were added to ZnO (99.17 mol%) as liquid phase sintering aids. $Zn_2BiVO_6$ contributes to the decrease of sintering temperatures by up to $800^{\circ}C$, and segregates its particles at the grain boundary, while $Mn_3O_4$ enhances ${\alpha}$, the nonlinear coefficient, of varistor properties up to ${\alpha}=62$. In comparison, when the sintering temperature is increased from $800^{\circ}C$ to $1,000^{\circ}C$, the resistivity of ZnO grains decreases from $0.34{\Omega}cm$ to $0.16{\Omega}cm$, and the varistor property degrades. Oxygen vacancy ($V_o^{\bullet}$) (P1, 0.33~0.36 eV) is formed as a dominant defect. Two different kinds of grain boundary activation energies of P2 (0.51~0.70 eV) and P3 (0.70~0.93 eV) are formed according to different sintering temperatures, which are tentatively attributed to be $ZnO/Zn_2BiVO_6$-rich interface and ZnO/ZnO interface, respectively. Accordingly, this study introduces a progressive method of manufacturing ZnO chip varistors by way of sintering ZZMn-based varistor under $900^{\circ}C$. However, to procure a higher reliability, an in-depth study on the multi-component varistors with double-layer grain boundaries should be executed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.327-327
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• 2009

ZnO with a large band gap (~3.37 eV) and exciton binding energy (~60 meV), is suitable for optoelectronic applications such as ultraviolet (UV) light emitting diodes (LEDs) and detectors. However, the ZnO-based p-n homojunction is not readily available because it is difficult to fabricate reproducible p-type ZnO with high hall concentration and mobility. In order to solve this problem, there have been numerous attempts to develop p-n heterojunction LEDs with ZnO as the n-type layer. The n-ZnO/p-GaN heterostructure is a good candidate for ZnO-based heterojunction LEDs because of their similar physical properties and the reproducible availability of p-type GaN. Especially, the reduced lattice mismatch (~1.8 %) and similar crystal structure result in the advantage of acquiring high performance LED devices. In particular, a number of ZnO films show UV band-edge emission with visible deep-level emission, which is originated from point defects such as oxygen vacancy, oxygen interstitial, zinc interstitial[1]. Thus, defect-related peak positions can be controlled by variation of growth or annealing conditions. In this work, the undoped ZnO film was grown on the p-GaN:Mg film using RF magnetron sputtering method. The undoped ZnO/p-GaN:Mg heterojunctions were annealed in a horizontal tube furnace. The annealing process was performed at $800^{\circ}C$ during 30 to 90 min in air ambient to observe the variation of the defect states in the ZnO film. Photoluminescence measurements were performed in order to confirm the deep-level position of the ZnO film. As a result, the deep-level emission showed orange-red color in the as-deposited film, while the defect-related peak positions of annealed films were shifted to greenish side as increasing annealing time. Furthermore, the electrical resistivity of the ZnO film was decreased after annealing process. The I-V characteristic of the LEDs showed nonlinear and rectifying behavior. The room-temperature electroluminescence (EL) was observed under forward bias. The EL showed a weak white and strong yellowish emission colors (~575 nm) in the undoped ZnO/p-GaN:Mg heterojunctions before and after annealing process, respectively.

• 대한전자공학회논문지SD
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• 제43권2호
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• pp.8-12
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• 2006

졸-겔 법으로 $Pt/TiO-2/SiO_2/Si$ 기판 위에 ZnO 박막을 제작하여, 열처리 온도에 따른 박막의 결정화 특성 및 미세구조와 광학적 특성을 조사하였다. XRD 측정 결과로부터, 열처리 온도가 $600^{\circ}C$ 일때 가장 우수한 c-축 배향성을 나타냈으며, 이때 반가폭은 $0.4360^{\circ}C$ 이었다. AFM 으로 ZnO 박막의 표면형상과 표면 거칠기를 관찰한 결과, $600^{\circ}C$ 열처리 온도에서 입자가 고르게 성장하여 치밀한 박막이 형성되었음을 관찰할 수 있었고, 표면 거칠기도 1.048nm 로 가장 우수한 값을 나타내었다. ZnO 박막의 열처리 온도에 따른 PL 특성을 조사한 결과, $600^{\circ}C$로 열처리된 ZnO 박막에서 자외선 영역의 발광 피크 (378nm)는 가장 크게 가시광 영역의 발광 피크 (510nm)는 가장 작게 관찰되었다. 가시광 영역의 발광 피크가 작은 것은 산소 공공 또는 불순물이 매우 적다는 것을 의미하므로, $600^{\circ}C$로 열처리된 ZnO 박막은 비교적 화학양론적으로 성장되었음을 확인할 수 있었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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• pp.199-199
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• 2013

최근 단파장 광전 소자와 고출력 고주파 전자 소자에 대한 수요 때문에 넓은 밴드갭 에너지를 갖는 반도체에 관심이 많다. 이중에서, ZnO는 우수한 화학 및 역학적 안정성, 수소 플라즈마 내구성과 저가 제조의 장점 때문에 광전자 소자 개발 분야에 적합한 산화물 투명 전극으로 관심을 끌고 있다. 불순물이 도핑되지 않은 ZnO는 본질적으로 산소 빈자리 (vacancy)와 아연 격자틈새 (interstitial)와 같은 자체의 결함으로 말미암아 n형의 극성을 갖기 때문에, 반도체 소자로 응용하기 위해서는 도핑 운반자의 농도와 전도성을 제어하는 것이 필요하다. 본 연구에서는 박막 제조시 제어성, 안정성과 용이하게 성장이 가능한 졸겔 (sol-gel) 방법을 사용하여 사파이어와 석영 기판 위에 Cu가 도핑된 ZnO 박막을 성장시켰으며, 그것의 구조, 표면 형상, 평균 투과율, 광학 밴드갭 에너지를 계산하였다. 특히, Cu의 몰 비를 0, 0.01, 0.03, 0.05, 0.07, 0.1 mol로 변화시키면서 ZnO:Cu 박막을 성장시켰다. ZnO:Cu 졸은 zinc acetate dihydrate, 2-methoxyethanol (용매), momoethanolamine (MEA, 안정제)을 사용하여 제조하였다. 상온에서 2-methoxyethanol과 MEA가 혼합된 용액에 zinc acetate dihydrate (Zn)을 용해시켰다. 이때 MEA와 Zn의 몰 비는 1로 유지하였다. 이 용액을 $60^{\circ}C$ 가열판 (hot plate)에서 24 h 동안 자석으로 휘젓으며 혼합하여 맑고 균일한 용액을 얻었다. 이 용액을 3000 rpm 속도로 회전하는 스핀 코터기의 상부에 장착된 사파이어와 석영 기판 위에 주사기 (syringe)를 사용하여 한 방울 떨어뜨려 30 s 동안 스핀한 다음에, 용매를 증발시키고 유기물 찌꺼기를 제거하기 위하여 $300^{\circ}C$에서 10분 동안 건조시킨다. 기판 위에 코팅하는 작업에서 부터 건조 작업까지를 10회 반복한 다음에, 1 h 동안 전기로에 장입하여 석영 기판 위에 증착된 시료는 $550^{\circ}C$에서, 사파이어 기판은 $700^{\circ}C$에서 열처리를 수행하였다. Cu의 몰 비 0, 0.01, 0.03, 0.05, 0.07, 1로 성장된 ZnO:Cu 박막에 대한 x선 회절 분석의 결과에 의하면, 모든 ZnO:Cu 박막의 경우에 관측된 34.3o의 피크는 ZnO (002) 면에서 발생된 회절 패턴을 나타낸다. 이것은 JCPDS #80-0075에 제시된 회절상과 일치하였으며, ZnO:Cu 박막이 기판에 수직인 c-축을 따라 우선 배향됨을 나타낸다. 사파이어 기판 위에 증착된 박막의 경우에, Cu의 몰 비가 점점 증가함에 따라(002)면 회절 피크의 세기는 전반적으로 증가하여 0.07 mol에서 최대를 나타내었으나, 석영 기판 위에 증착된 박막의 경우에는 0.05 mol에서 최대를 보였다. 외선-가시광 분광계를 사용하여 서로 다른 Cu의 몰 비로 성장된 ZnO:Cu 박막에서 광학 흡수율 (absorbance) 스펙트럼을 측정하였으며, 이 데이터를 사용하여 평균 투과율을 계산한 결과, 투과율은 Cu의 몰 비에 따라 현저한 차이를 나타내었다. Cu의 몰 비가 0.07 mol일 때 평균 투과율은 80%로 가장 높았으며, 0.03 mol에서는 30%로 최소이었다. 광학밴드갭 에너지는 Tauc 모델을 사용하여 계산하였고, 결정 입자의 형상과 크기와의 상관 관계를 조사하였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2018년도 춘계학술대회 논문집
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• pp.55-55
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• 2018

Recently, amorphous oxides such as InGaZnO (IGZO) and InZnO (IZO) as a channel layer of an oxide TFT have been attracted by advantages such as high mobility, good uniformity, and high transparency. In order to apply such an amorphous oxide TFTs to a display, the stability in various environments must be ensured. In the InGaZnO which has been studied in the past, Ga elements act as a suppressor of oxygen vacancy and result in a decreased mobility at the same time. Previous studies have been showed that the InZnO, which does not contain Ga, can achieve high mobility, but has relatively poor stability under various instability environments. In this study, the TFTs using $IZO/Al_2O_3$ double layer structure were studied. The introduction of an $Al_2O_3$ interlayer between source/drain and channel causes superior electrical characteristics and electrical stability as well as reduced contact resistance with optimally perfect ohmic contact. For the IZO and $Al_2O_3$ bilayer structures, the IZO 30nm IZO channels were prepared at $Ar:O_2=30:1$ by sputtering and the $Al_2O_3$ interlayer were depostied with various thickness by ALD at $150^{\circ}C$. The optimal sample exhibits considerably good TFT performance with $V_{th}$ of -3.3V and field effect mobility of $19.25cm^2/Vs$, and reduced $V_{th}$ shift under positive bias stress stability, compared to conventional IZO TFT. The enhanced TFT performances are closely related to the nice ohmic contact properties coming from the defect passivation of the IZO surface inducing charge traps, and we will provide the detail mechanism and model via electrical analysis and transmission line method.