• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2004.08a
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• pp.83-90
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• 2004

The drawbead is one of the most important factors in sheet metal forming for automotive parts. So clarifying the friction characteristics between sheets and drawbead is essential to improve the formability of sheet metal. Therefore in this study, drawbead friction test was performed at various panels(cold rolled steel sheets, galvanized steel sheets, electrogalvanized coating steel sheets, electrogalvanized Zn-Fe alloy steel sheets and aluminum alloy steel sheets). Circular shape bead has been used for the test. The results show that friction and drawing characteristics were mainly influenced by the nature of zinc coating.

• Journal of the Korean Society for Heat Treatment
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• v.21 no.2
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• pp.87-93
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• 2008

A variety of minor alloying elements such as Zr, Sr, Y, and Gd were added to Mg-3%Zn-0.5%Sn base alloy to form various fine precipitates and their effects on the microstructure, tensile properties, and sheet metal formability were investigated. Various very fine precipitates along with fine second phases were observed by the additions. It was found that Zr or Gd additive has a role to suppress the grain coarsening of alloy sheets during the hot working process. The Zr-added alloy showed the highest tensile elongation at $250^{\circ}C$ whereas the Gd-added alloy exhibited the best sheet metal forming characteristics in terms of CCV (conical cup value) and spring-back tendency.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.28 no.12
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• pp.781-786
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• 2015

It is necessary for ferrite sheets to be fabricated with high packing density for excellent electrical properties and high strength. In this study, the relationship between the warpage and the packing density of ferrite green sheet, was investigated with amount variation of organic additives. With 0.4 wt% of dispersant, the packing density was about 48% and warpage appeared 0.5~1.3 mm high. With 1.4 wt% of dispersant, the packing density increased up to 57% and warpage appeared 0.8~2.1 mm high. With high packing density, warpage appeared along the edges of specimen, while with low packing density, deformation appeared over whole specimen inhomogeneously. It is thought that inhomogeneous deformation after sintering came from the inhomogeneity in green sheet prepared with badly dispersed slurry. With good homogeneity in green sheet from well-dispersed slurry, isotropic shrinkage is thought to have occurred along the distance from center to edges of specimen during sintering.

• Journal of the Microelectronics and Packaging Society
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• v.25 no.2
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• pp.31-34
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• 2018

In this study, the feasibility of ZnO/Al/ZnO flexible transparent electrodes for future flexible optoelectronic devices was investigated. All depositions were performed on PET substrates. The thicknesses of the top and bottom ZnO layers were 5-70 nm and 2.5-20 nm, respectively. The highest visible light transmittance was recorded when the thicknesses of the top and bottom ZnO layers 30 nm and 2.5 nm, respectively. 62% optical transmittance (at the wavelength of 400 nm) and sheet resistance of $19{\Omega}/{\Box}$ were measured. After repetitive bending test at a curvature radius of 5 mm, the transmittance and sheet resistance did not change.

• Transactions on Electrical and Electronic Materials
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• v.13 no.4
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• pp.208-211
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• 2012

In the present study, a ZnO thin film, as a buffer layer of ITO (indium tin oxide) film was deposited on glass substrates by RF magnetron sputtering at low temperature of $150^{\circ}C$. In order to estimate the optical characteristics and compare with the experimental results in Glass/ZnO(100 nm)/ITO(35 nm) multilayered film, the simulation program, EMP (Essential Macleod Program) was adopted. The sheet resistance and optical transmittance of the films were measured using the four-point probe method and spectrophotometer, respectively. From X-ray diffraction patterns, all the films deposited at $150^{\circ}C$ demonstrated only the amorphous phase. Optical transmittance was the highest at a ZnO thickness of 100 nm. The ITO(35 nm)/ZnO(100 nm) film exhibits an optical transmittance of >92% at 550 nm. The multilayered film showed an electrical sheet resistance of 407 ${\Omega}/sq.$, which is significantly better than that of a single-layer ITO film without a ZnO buffer layer (815 ${\Omega}/sq.$).

• Journal of the Korean Society for Heat Treatment
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• v.6 no.2
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• pp.89-97
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• 1993

An improvement in corrosion resistance of various types of Zn-coated steel sheets is thought to be possible with the addition of fine oxide powder to the coating. In this study the corrosion resistance of the $Al_2O_3$ dispersed Zn-Co-Cr electroplated steel sheet has been investigated and the results were as follows : The corrosion resistance of $Al_2O_3$ dispersed Zn-Co-Cr electroplated steel sheets was improved by increasing the contents of Co and Cr ions, and also $Al_2O_3$ powders in the bath because of the increased amount of Co, Cr and $Al_2O_3$ in deposits. In the $Al_2O_3$ dispersed Zn-Co-Cr electroplated steels sheet, the structure of deposits was changed from fine microstructure as observed in high Co containing deposits to coarse microstructure as in high Cr and $Al_2O_3$ containing deposits. By cold rolling of the $Al_2O_3$ dispersed Zn-Co-Cr electroplated steel sheets to about 2 percent, thr corrosion resistance was improved further.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.6.1-6.1
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• 2009

최근 신 재생 에너지에 대한 관심이 고조되고 있으며 특히 태양전지는 차세대 대체에너지로 많은 연구 개발이 이루어지고 있다. 현재 태양전지 시장은 벌크실리콘 태양전지가 주를 이루고 있으나, 박막형, 유기물, 염료감응형 등 다양한 차세대 태양전지가 개발되고 있다. 차세대 태양전지는 글래스나 폴리머 기판위에 형성된 전극을 바탕으로 하여 다양한 형태의 태양전지가 형성되기 때문에 태양전지용 투명도전성 산화물 전극에 대한 중요성이 증가하고 있다. 예를 들어 실리콘 박막형 태양전지의 경우 수소 플라즈마 분위기 안정성 때문에 ZnO:Al 전극이 개발, 적용되고 있다. 이밖에도 ZnO는 나노입자, 나노로드 등의 다양한 형태를 기반으로 유기물 및 염료감응형 태양전지 전극으로 적용되고 있다. 본 연구에서는 전기화학적 방법을 이용해 나노입자, 나노로드, 나노 sheet 등 다양한 형태의 ZnO 나노구조를 형성한 후, 태양전지 적용을 위한 전기적, 광학적 특성을 분석하였다. 3차원 형태의 ZnO sheet 전극은 90% @ 550 nm 가 넘는 우수한 광특성 (Haze value)을 보였으며, 염료감응형 태양전지에 적용되었을 경우 2차원 형태의 ZnO 전극에 비해 Jsc 값이 2.5배 이상 향상되었다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.5
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• pp.307-311
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• 2017

ZnO:Al thin films were deposited on glass substrate by RF magnetron sputtering followed by in situ heat treatment in the same chamber. Effects of in situ heat treatment on properties of ZnO:Al thin films were investigated in this study. As heat treatment temperature was increased, crystal quality was improved first and then it was deteriorated, surface roughness was decreased, and sheet resistance was also decreased. The decrease in sheet resistance was caused by increasing carrier concentration due to decreased surface roughness. The decrease in surface roughness resulted in increase of transmittance. Therefore, in situ heat treatment is an effective method for obtaining films with better electrical characteristics.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.31 no.7
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• pp.481-485
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• 2018

In this study, oxide/metal/oxide-type transparent electrodes based on Al and ZnO were investigated. Thin films of these materials were sputter-deposited at room temperature. To evaluate the thickness dependence of the oxide layers, the top and bottom ZnO layers were varied in the range of 5~80 nm and 2.5~20 nm, respectively. When the thicknesses of the top and bottom ZnO layers were fixed at 30 nm and 2.5 nm, a maximum transmitance of 66% and sheet resistance of $16.5{\Omega}/{\square}$ were achieved, which is significantly improved compared with the Al layer without top and bottom ZnO layers showing a maximum transmitance of 44.3% and sheet resistance of $44{\Omega}/{\square}$.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.33 no.6
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• pp.450-453
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• 2020

In this study, ZnO:Ga thin films were fabricated on a glass substrate using various Ar flows by an RF magnetron sputter system at room temperature. The dependencies of Ar flow on different properties were investigated. An appropriate control over the Ar flow led to the formation of a high-quality thin film. The ZnO:Ga films were formed as a hexagonal wurtzite structure with high (002) preferential orientation. The films exhibited a typical columnar microstructure and a smooth top face. The average transmittance was 85~89% within the visible area. By decreasing the Ar flow, the sheet resistance was decreased due to an increase in the grain size and a decrease in the root mean square roughness. The lowest sheet resistance of 86 Ω/□ was obtained at room temperature for the 40 sccm Ar flow.