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http://dx.doi.org/10.4313/JKEM.2018.31.7.481

Aluminum Based Oxide/Metal/Oxide Structures for the Application in Transparent Electrodes  

Kim, Daekyun (School of Advanced Materials Engineering, Dong-Eui University)
Choi, Dooho (School of Advanced Materials Engineering, Dong-Eui University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.31, no.7, 2018 , pp. 481-485 More about this Journal
Abstract
In this study, oxide/metal/oxide-type transparent electrodes based on Al and ZnO were investigated. Thin films of these materials were sputter-deposited at room temperature. To evaluate the thickness dependence of the oxide layers, the top and bottom ZnO layers were varied in the range of 5~80 nm and 2.5~20 nm, respectively. When the thicknesses of the top and bottom ZnO layers were fixed at 30 nm and 2.5 nm, a maximum transmitance of 66% and sheet resistance of $16.5{\Omega}/{\square}$ were achieved, which is significantly improved compared with the Al layer without top and bottom ZnO layers showing a maximum transmitance of 44.3% and sheet resistance of $44{\Omega}/{\square}$.
Keywords
Transparent electrode; Anti-Reflection; Sputtering; Thin films;
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