• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.9
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• pp.121-127
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• 1995

We have analyzed the double insulating layer consisting of anodic oxide and ZnS through TEM experiments. The use of double insulating layer for HgCdTe surface passivation is one of the promising passivation method which has been recently studied deeply and the double insulating layer is formed by the evaporation of ZnS on the top of anodic oxide layer grown in H$_{2}$O$_{2}$ electrolyte. The structure of anodic oxide layer on HgCdTe is amorphous but the structure of oxide layer after the evaporation of ZnS has been changed to micro-crystalline. The interface layer of 150.angs. thickness has been found between ZnS and anodic oxide layer and is estimated to be ZnO layer. The results of analysis on the chemical components of ZnS, the interface layer and anodic oxide layer have showed that Zn has diffused into the anodic oxide layer deeply while Hg has been significantly decreased from HgCdTe bulk to the top of oxide layer. The formation of ZnO interface layer and the change of structure of anodic oxide layer after the evaporation of ZnS are estimated to be defects or to induce the defects which might possibly affect the increase of the positive fixed charges shown in C-V measurements of HgCdTe MIS.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.12
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• pp.1117-1123
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• 2005

In this study, our varistors based on M. Matsuoka's composition were fabricated with ZnO nano-powder whose sizes were 50 nm and 100 nm. Before fabrication of ZnO nano-powder varistors, structure and Phase were analyzed by FE-SEM and XRD with size of ZnO nano-powders to obtain manufacturing information to fabricate the first ZnO varistors using by nano-powders. As a results of these analyses, calcination and sintering temperatures were respectively designed at $600^{\circ}C\;and\;1050^{\circ}C$. ZnO nano-powder varistors were analyzed by SEM and XRD to measure the changes of microstructures and phase after sintered by out process conditions. Also, electrical properties of ZnO nano-powder varistors were obtained by capacitance-voltage, frequency-teal impedance, and current-voltage corves. Our ZnO nano-powder varistors had about 2.5 times of electric field at varistor voltage as compared with normal ZnO varistors fabricated with micro-powder. Also, leakage current and non-liner coefficient respectively had $2.0{\times}10^{-6}A/cm^{-2}$ and 41 for ZnO nano-powder varistors with 50 nm.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.8
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• pp.769-774
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• 2006

In this paper the ZnO thin films, which has used spotlight of next generation short wavelength LEDs and semiconductor laser were deposited based on RF magnetron sputtering is described. The temperature at substrate and work pressure, which has implemented in sputtering process of ZnO thin films were settle down at $100^{\circ}C$ and 15 mTorr respectively. The ZnO 5N has used target. The thickness of ZnO thin films was about $1.6{\mu}m$ which was measured by SEM analysis after the sputtering process. Structural properties of ZnO thin films by in-situ and atmosphere annealing were analyzed by XRD. Transformation of grain size and surface roughness were observed by AFM. XPS spectra showed that ZnO thin film had a peak positions corresponding to the $Zn_{2p}$ and the $O_{1s}$. As form above XPS, we confirmed that post-annealing condition changed the atom ratio of Zn/O and microstructure in ZnO thin films.

• Journal of the Korean Chemical Society
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• v.59 no.5
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• pp.397-406
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• 2015

ZnO, II-VI group inorganic compound semi-conductor, has been receiving much attention due to its wide applications in various fields. Since the ZnO has 3.37 eV of a wide band gap and 60 meV of big excitation binding energy, it is well-known material for various uses such the optical property, a semi-conductor, magnetism, antibiosis, photocatalyst, etc. When applied in the field of photocatalyst, many research studies have been actively conducted regarding magnetic materials and the core-shell structure to take on the need of recycling used materials. In this paper, magnetic core-shell ZnFe₂O₄@SiO₂ nanoparticles (NPs) have been successfully synthesized through three steps. In order to analyze the structural characteristics of the synthesized substances, X-ray diffraction (XRD), scanning electron microscopy (SEM), and Fourier transform infrared spectroscopy (FT-IR) were used. The spinel structure of ZnFe₂O₄ and the wurtzite structure of ZnO were confirmed by XRD, and ZnO production rate was confirmed through the analysis of different concentrations of the precursors. The surface change of the synthesized materials was confirmed by SEM. The formation of SiO₂ layer and the synthesis of ZnFe₂O₄@ZnO@SiO₂ NPs were finally verified through the bond of Fe-O, Zn-O and Si-O-Si by FT-IR. The magnetic property of the synthesized materials was analyzed through the vibrating sample magnetometer (VSM). The increase and decrease in the magnetism were respectively confirmed by the results of the formed ZnO and SiO₂ layer. The photocatalysis effect of the synthesized ZnFe₂O₄ @ZnO@SiO₂ NPs was experimented in a black box (dark room) using methylene blue (MB) under UV irradiation.

• Journal of IKEEE
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• v.22 no.1
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• pp.61-67
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• 2018

We investigated theoretically the magnetic field dependence of the quantum optical transition of qusi 2-Dimensional Landau splitting system, in CdS and ZnO. In this study, we investigate electron confinement by square well confinement potential in magnetic field system using quantum transport theory(QTR). In this study, theoretical formulas for numerical analysis are derived using Liouville equation method and Equilibrium Average Projection Scheme (EAPS). In this study, the absorption power, P (B), and the Quantum Transition Line Widths (QTLWS) of the magnetic field in CdS and ZnO can be deduced from the numerical analysis of the theoretical equations, and the optical quantum transition line shape (QTLS) is found to increase. We also found that QTLW, ${\gamma}(B)_{total}$ of CdS < ${\gamma}(B)_{total}$ of ZnO in the magnetic field region B<25 Tesla.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.17 no.5
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• pp.187-191
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• 2007

The device performance of ZnO-thin film transistors(ZnO-TFTs) with gate dielectrics of $SiO_2,\;SiN_x$ and Polyvinylphenol(PVP) having a bottom gate configuration were investigated. ZnO-TFTs can induce high device performance with low intrinsic carrier concentration of ZnO only by controlling gas flow rates without additional doping or annealing processes. The field effect mobility and on/off ratio of ZnO-TFTs with $SiN_x$ were $20.2cm^2V^{-1}s^{-1}\;and\;5{\times}10^6$ respectively which is higher than those previously reported. The device adoptable values of the mobility of $1.37cm^2V^{-1}s^{-1}$ and the on/off ratio of $6{\times}10^3$ were evaluated from the device with organic PVP dielectric.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.61 no.6
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• pp.817-820
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• 2012

We studied p-type capacitance characteristics of ZnO thin-film transistors (TFT's), grown by metal organic chemical vapor deposition (MOCVD). We compared two ZnO TFT's: one grown at $450^{\circ}C$ and the other grown at $350^{\circ}C$. ZnO grown at $450^{\circ}C$ showed smooth capacitance profile with electron density of $1.5{\times}10^{20}cm^{-3}$. In contrast, ZnO grown at $350^{\circ}C$ showed a capacitance jump when gate voltage was changed to negative voltages. Current-voltage characteristics measured in the two samples did not show much difference. We explain that the capacitance jump is related to p-type ZnO layer formed at the $SiO_2$ interface. Current-voltage and capacitance-voltage data support that p-type characteristics are observed only when background electron density is very low.

• Journal of the Korean institute of surface engineering
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• v.41 no.1
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• pp.12-15
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• 2008

The zinc oxide(ZnO) nanowires were deposited on Si(001) substrates by thermal chemical vapour deposition without any catalysts. SEM data suggested that the grown nanostructures were the well-aligned ZnO single crystals with preferential orientation. Back-gate ZnO nanowire field effect transistors(FET) were successfully fabricated using a photolithography process. The fabricated nanowire FET exhibits good contact between the ZnO nonowire and Au metal electrodes. Based on I-V characteristics it was found out that the ZnO nanowire revealed a characteristic of n-type field effect transistor. The drain current increases with increasing drain voltage, and the slopes of the $I_{ds}-V_{ds}$ curves are dependent on the gate voltage.

• Proceedings of the KIEE Conference
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• 1999.07d
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• pp.1520-1522
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• 1999

저 전압용 형광체는 최근에 활발히 연구가 진행되고 있으며 가장 대표적인 형광체가 ZnO : Zn 녹색 형광체이다. ZnO : Zn 형광체는 자체발광형 형광체로써 ZnO을 환원분위기 하에서 열처리를 함으로써 얻을 수 있다. 본 연구에서는 자발착화 연소반응법(Glycine Nitrate Process)을 이용하여 ZnO : Zn 분말을 합성하고 형광특성 및 분말특성을 알아보았다. 출발물질로는 Zn Nitrate와 Glycine을 이용하였고 자발연소 반응이 발생하는데 적절한 글리신의 양을 확인하기 위해서 글리신과 양이온의 비를 변화시키며 ZnO를 합성하였다. 그리고 Zn Excess가 생겨난 양과 그에 따른 형광특성을 관찰하기 위해 $N_2$ 분위기에서 각기 $500^{\circ}C,\;750^{\circ}C,\;950^{\circ}C$의 온도에서 열처리를 행하였다. 제조된 ZnO 분말의 입자형태와 결정상태는 SEM과 XRD를 이용하여 분석하였고 TG-DTA를 측정하여 열처리 온도에 따른 질량감소(ZR excess)를 관찰하였다. 또 Particle size analyzer로 분말의 크기를 알아보았고 형광체로써의 발광특성을 살펴보기 위해 PL을 이용하여 발광피크를 관찰하였다.

• Korean Journal of Materials Research
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• v.23 no.10
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• pp.580-585
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• 2013

To observe the formation of defects at the interface between an oxide semiconductor and $SiO_2$, ZnO was prepared on $SiO_2$ with various oxygen gas flow rates by RF magnetron sputtering deposition. The crystallinity of ZnO depends on the characteristic of the surface of the substrate. The crystallinity of ZnO on a Si wafer increased due to the activation of ionic interactions after an annealing process, whereas that of ZnO on $SiO_2$ changed due to the various types of defects which had formed as a result of the deposition conditions and the annealing process. To observe the chemical shift to understand of defect deformations at the interface between the ZnO and $SiO_2$, the O 1s electron spectra were convoluted into three sub-peaks by a Gaussian fitting. The O 1s electron spectra consisted of three peaks as metal oxygen (at 530.5 eV), $O^{2-}$ ions in an oxygen-deficient region (at 531.66 eV) and OH bonding (at 532.5 eV). In view of the crystallinity from the peak (103) in the XRD pattern, the metal oxygen increased with a decrease in the crystallinity. However, the low FWHM (full width at half maximum) at the (103) plane caused by the high crystallinity depended on the increment of the oxygen vacancies at 531.66 eV due to the generation of $O^{2-}$ ions in the oxygen-deficient region formed by thermal activation energy.