• Title/Summary/Keyword: Yttrium Oxide

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Formation of Amorphous Oxide Layer on the Crystalline Al-Ni-Y Alloy

  • Kim, Kang Cheol;Kim, Won Tae;Kim, Do Hyang
    • Applied Microscopy
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    • v.43 no.4
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    • pp.173-176
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    • 2013
  • The oxidation behavior of the crystallized $Al_{87}Ni_3Y_{10}$ alloy has been investigated with an aim to compare with that of the amorphous $Al_{87}Ni_3Y_{10}$ alloy. The oxidation at 873 K occurs as follows: (1) growth of an amorphous aluminum-yttrium oxide layer (~10 nm) after heating up to 873 K; and (2) formation of $YAlO_3$ crystalline oxide (~220 nm) after annealing for 30 hours at 873 K. Such an overall oxidation step indicates that the oxidation behavior in the crystallized $Al_{87}Ni_3Y_{10}$ alloy occurs in the same way as in the amorphous $Al_{87}Ni_3Y_{10}$ alloy. The simultaneous presence of aluminum and yttrium in the oxide layer significantly enhances the thermal stability of the amorphous structure in the oxide phase. Since the structure of aluminum-yttrium oxide is dense due to the large difference in ionic radius between aluminum and yttrium ions, the diffusion of oxygen ion through the amorphous oxide layer is limited thus stabilizing the amorphous structure of the oxide phase.

Fabrication of yttrium oxide thin film on ITO by RF magnetron sputtering for TTFT (RF magnetron sputtering법으로 ITO 위에 증착한 yttrium oxide의 특성)

  • Bang, Jun-Ho;Jeong, Je-Heon;Song, Pung-Geun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2011.05a
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    • pp.183-183
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    • 2011
  • TTFT(Transparent TFT)의 유전체로 사용되는 절연층으로 사용이 기대되는 yttrium oxide를 ITO 위에 RF magnetron sputtering법으로 상온 증착하고 구조적 특성을 분석하고 조성 및 표면 상태를 확인하였으며 유전 특성을 분석하였다.

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Analysis of Broad-Range DNA Fragments with Yttrium Oxide or Ytterbium Oxide Nanoparticle/Polymer Sieving Matrix Using High-Performance Capillary Electrophoresis

  • Kwon, Hae-Myun;Kim, Yong-Seong
    • Bulletin of the Korean Chemical Society
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    • v.30 no.2
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    • pp.297-301
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    • 2009
  • We have developed the yttrium oxide (YNP) or ytterbium oxide (YbNP) nanoparticle/polymer matrices for the size-dependent separation of DNA ranging from 100 bp to 9,000 bp. High separation efficiency (> $10^6$ plates/m) and the baseline resolution for various DNA standards (100 bp, 500 bp, and 1 kbp DNA ladder) were obtained in 10 min with these matrices. The effects of concentrations of both polyethylene oxide (PEO) and nanoparticles were investigated and the highest performance was obtained at 0.02% PEO with 0.02% YNP or YbNP. Similar sieving power for both YNP and YbNP matrices was observed probably due to the similar sizes of nanoparticles, resulting in the formation of comparable sieving networks for DNA separation. For the reduction of electrosmotic flow, either dynamic or permanent coating of the capillary inner wall was compared and it turned out that PEO was superior to polyvinylpyrrolidone (PVP) or polyacrylamide (PAA) for better separation efficiency.

Photoluminescence Characteristics of Eu-doped Yttrium Oxide Submicron-sized Particles Prepared by Aerosol Pyrolysis

  • Park, Il-Woo;Park, Chang-Kyun;Lee, Deok-Jin;Yoo, Jea-Soo
    • Transactions on Electrical and Electronic Materials
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    • v.4 no.1
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    • pp.29-33
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    • 2003
  • Europium doped yttrium oxide submicron-sized particles were prepared by ultrasonic aerosol pyrolysis. To examine the size effect of submicron-sized-particle, the photoluminescence of the particles was investigated. The particle size was controlled by pH, reaction temperature, molar concentration of yttrium in precursor solution. The PL intensity of submicron-sized particles was decreased with particles size. When the particle size is above about 150 times of Bohr radius of Y$_2$O$_3$, the optical property of the particles shows the bulk characteristics.

이트륨 옥살레이트의 반응성 결정화 및 열분해 특성 연구

  • 최인식;성민혁;김운수;김우식;김용욱
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1997.10a
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    • pp.51-55
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    • 1997
  • 이트륨 옥살레이트 결정화에 있어서 반응물의 농도, 반응 온도, 반응물의 주입속도 변화등의 반응조건(reaction condition)의 변화와 반응기 내에서의 교반속도와 같은 hydrodynamic condition의 변화가 생성된 옥살레이트 결정의 입자크기, 결정형태등에 미치는 영향을 체계적으로 관찰하였다. 그리고 agglomeration의 영향에 의한 particle의 크기변화에 있어 생성물의 과포화는 agglomerates를 결정 짓는 가장 중요한 변수이다. 또한 반응성 결정화에 의해서 얻어진 Yttrium Oxalate가 온도 변화에 따라서 Yttrium Oxide로 열분해되는 온도구간과 결정구조의 변화 및 분자 구조의 변화를 관찰하여 최종의 Yttrium Oxide가 생성되는 것을 확인하였다.

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Hydrogen Trapping Using Yttrium to Manage Hydrogen in HSLA Steel Welds (고장력강의 용접부에서 Yttrium을 이용한 수소의 트랩에 관한 연구)

  • Park, Yeong-Do
    • Proceedings of the KWS Conference
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    • 2005.06a
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    • pp.141-143
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    • 2005
  • Yttrium has been investigated as hydrogen trapping site in pure iron and HSLA steel welds. Assessment of hydrogen trapping parameters for yttrium oxide has also shown the high potential of yttrium addition to improve hydrogen management in high strength steel welding. The purpose of this study was to reduce and control the diffusible hydrogen content in the weld deposit.

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Comparison of surface topography and roughness in different yttrium oxide compositions of dental zirconia after grinding and polishing

  • Shin, Hyun-Sub;Lee, Joon-Seok
    • The Journal of Advanced Prosthodontics
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    • v.13 no.4
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    • pp.258-267
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    • 2021
  • PURPOSE. The purpose of this study was to compare the surface roughness, phase transformation, and surface topography of dental zirconia with three different yttrium oxide compositions under same grinding and polishing conditions. MATERIALS AND METHODS. Three zirconia disks (IPS e.max ZirCAD LT, MT, MT multi, Ivoclar Vivadent AG, Schaan, Liechtenstein) were selected for experimental materials. Sixty-nine bar-shaped specimens were fabricated as 12.0 × 6.0 × 4.0 mm using a milling machine and glazing was conducted on 12.0 × 6.0 mm surface by same operator. With a custom polishing device, 12.0 × 6.0 mm surfaces were polished under same condition. Surface roughness (Ra[㎛]) was measured before grinding (C), after grinding (G), and at every 3 steps of polishing (P1, P2, P3). X-ray diffraction and FE-SEM observation was conducted before grinding, after grinding, and after fine polishing (P3). Statistical analysis of surface roughness was performed using Kruskal-Wallis test and Mann-Whitney-U test was used as a post hoc test (α = .05). RESULTS. There were no significant differences of surface roughness between LT, MT, and MM groups. In LT, MT, and MM groups, P3 groups showed significantly lower surface roughness than C groups. X-ray diffraction showed grinding and polishing didn't lead to phase transformation on zirconia surface. In FE-SEM images, growths in grain size of zirconia were observed as yttrium oxide composition increases. CONCLUSION. Polished zirconia surface showed clinically acceptable surface roughness, but difference in yttrium oxide composition had no significant influence on the surface roughness. Therefore, in clinical situation, zirconia polishing burs could be used regardless of yttrium oxide composition.

Solution-Derived Amorphous Yttrium Gallium Oxide Thin Films for Liquid Crystal Alignment Layers

  • Oh, Byeong-Yun
    • Transactions on Electrical and Electronic Materials
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    • v.17 no.2
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    • pp.109-112
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    • 2016
  • We demonstrated an alternative electrically controlled birefringence liquid crystal (ECB-LC) system with ion beam (IB)-irradiated yttrium gallium oxide (YGaO) alignment films using a sol-gel process. The surface roughness of the films was dependent on the annealing temperature; aggregated particles on surface were observed at lower annealing temperatures, whereas a smooth surface could be obtained with higher annealing temperatures. Higher transmittance in the visible region was observed at higher annealing temperatures. The film had an amorphous crystallographic state irrespective of the annealing temperature. Furthermore, ECB-LC cell with our IB-irradiated YGaO film yielded faster response time when compared to ECB-LC cell with rubbed polyimide. Considering the fast response time and high transmittance, the IB-irradiated YGaO-base LC system is a powerful alternative application for the liquid crystal display industry.

Study on Solution Processed Indium-Yttrium-Oxide Thin-Film Transistors Using Poly (Methyl Methacrylate) Passivation Layer (PMMA 보호막을 이용한 용액 공정 기반의 인듐-이티륨-산화물 트랜지스터에 관한 연구)

  • Kim, Han-Sang;Kim, Sung-Jin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.7
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    • pp.413-416
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    • 2017
  • We investigated solution-processed indium-yttrium-oxide (IYO) TFTs using apoly (methyl methacrylate) (PMMA) passivation layer. The IYO semiconductor solution was prepared with 0.1 M indium nitrate hydrate and 0.1 M yttrium acetate dehydrate as precursor solutions. The solution-processed IYO TFTs showed good performance: field-effect mobility of $13.13cm^2/Vs$, a threshold voltage of 8.2 V, a subthreshold slope of 0.93 V/dec, and a current on-to-off ratio of $7.2{\times}10^6$. Moreover, the PMMA passivation layers used to protectthe IYO active layer of the TFTs, did so without deteriorating their performance under ambient conditions; their operational stability and electrical properties also improved by decreasing leakage current.