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Thermal Effect on Characteristics of IZTO Thin Films Deposited by Pulsed DC Magnetron Sputtering

  • Son, Dong-Jin;Ko, Yoon-Duk;Jung, Dong-Geun;Boo, Jin-Hyo;Choa, Sung-Hoon;Kim, Young-Sung
    • Bulletin of the Korean Chemical Society
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    • v.32 no.3
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    • pp.847-851
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    • 2011
  • This study examined In-Zn-Sn-O (IZTO) films deposited on glass substrates by pulsed DC magnetron sputtering with various substrate temperatures. The structural, electrical, optical properties were analyzed. Xray diffraction showed that the IZTO films prepared at temperatures > $150^{\circ}C$ were crystalline which adversely affected the electrical properties. Amorphous IZTO films prepared at $100^{\circ}C$ showed the best properties, such as a low resistivity, high transmittance, figure of merit, and high work function of $4.07{\times}10^{-4}\;{\Omega}$, 85%, $10.57{\times}10^{-3}\;{\Omega}^{-1}$, and 5.37 eV, respectively. This suggests that amorphous IZTO films deposited at relatively low substrate temperatures ($100^{\circ}C$) are suitable for electrode applications, such as OLEDs as a substitute for conventional crystallized ITO films.

Ferroelectric Properties and Microstructure of Pr-Substituted Bismuth Titanate Prepared by Chemical Solution Deposition (화학 용액 증착법으로 얻어진 $Bi_{4-x}Pr_{0.7}Ti_3O_{12}$ 박막의 강유전성과 미세구조에 관한 연구)

  • Kang, Dong-Kyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.290-291
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    • 2006
  • The effect of praseodymium substitution on the ferroelectric properties of $Bi_4Ti_3O_{12}$ thin films have been investigated. Ferroelectric Pr-substituted $Bi_4Ti_3O_{12}$ thin films were fabricated by chemical solution deposition onto Pt/Ti/$SiO_2$/Si substrates. The structure and morphology of the films were analyzed using Xray diffraction, and scanning electron microscopy, respectively. About 200-nm-thick BPT films grown at $720^{\circ}C$ exhibited a polycrystalline structure and showed excellent ferroelectric properties with a remanent polarization ($2P_r$) of $28.21\;{\mu}C/cm^2$ at an applied voltage of 5 V. The films a1so demonstrate fatigue-free behavior up to $10^{11}$ read/write switching cycles with 1 MHz bipolar pulses at an electric field of ${\pm}5\;V$.

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듀얼 펄스 마그네트론 스퍼터링 방법으로 합성된 Al doped ZnO 박막의 특성 고찰

  • Jo, Seong-Hun;Kim, Seong-Il;Choe, Yun-Seok;Choe, In-Sik;Han, Jeon-Geon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.192-192
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    • 2010
  • Transparent Conductive Oxides (TCO) 박막은 지금 까지 산업 전반에 걸쳐 많이 응용되어 사용되어지는 박막 중에 하나이다. 그대표적인 산업은 디스플레이 산업 중 평면디스플레이 산업에서 투명 전극으로 사용하는 LCD 및 터치패널에 사용되는 전극으로 사용되어져 왔다. 현재에는 솔라 셀의 전극 및 기판으로서의 응용이 많이 연구되어지고 있다. 이와 같은, 산업에서 사용되는 투명전극 재료는 낮은 전기적 특성 및 애칭특성이 우수하고 높은 광 투과도를 필요로 하고 있으며, 이러한 특성을 모두 만족하며 가장 우수한 물성을 나타내는 물질이 (Indium Tin Oxide) film이다. 하지만 Indium의 고갈과 희소성에 따른 고가라는 점의 문제로 인해 대체재료로써 부상되고 있는 ZnO의 연구가 활발히 진행되고 있다. 본 연구에서는 투명 전도성 산화물인 ZnO박막과 Al이 도핑된 AZO박막을 저온공정이 가능한 대향 타겟식 스퍼터링 방법(FTS)을 이용하여 산소가스 분압과 Al타겟에 인가되는 Current에 따른 박막의 전기적, 광학적 특성을 파악하여 적용여부에 대해 조사하였다. ZnO박막의 결정성은 유입되는 산소가스의 유량에 따라 증가하며 일정 영역이상에서는 감소하였다. 산소가스 유량이 1.2 sccm일 때 가장 높은 결정성을 얻었다. 또한 산소가스 유량을 1.2 sccm으로 고정시킨 후 Al타겟에 인가되는 Current에 변화를 주었을 때 0.5A에서 가장 낮은 비저항을 얻었다. ZnO박막의 미세구조는 Xray-diffraction method를 이용하여 측정하였고, 산소 분압에 따른 표면조도 분석을 위해 AFM을 사용하였고 Zn와 Oxide bonding의 화학적 분석을 위해 XPS를 이용하여 분석하였다. 또한 전기적 특성은 Hall measurement, 광 투과도는 UV-VIS Spectrometer를 이용하였다.

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Nano-thick Nickel Silicide and Polycrystalline Silicon on Glass Substrate with Low Temperature Catalytic CVD (유리 기판에 Catalytic CVD 저온공정으로 제조된 나노급 니켈실리사이드와 결정질 실리콘)

  • Song, Ohsung;Kim, Kunil;Choi, Yongyoon
    • Korean Journal of Metals and Materials
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    • v.48 no.7
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    • pp.660-666
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    • 2010
  • 30 nm thick Ni layers were deposited on a glass substrate by e-beam evaporation. Subsequently, 30 nm or 60 nm ${\alpha}-Si:H$ layers were grown at low temperatures ($<220^{\circ}C$) on the 30 nm Ni/Glass substrate by catalytic CVD (chemical vapor deposition). The sheet resistance, phase, microstructure, depth profile and surface roughness of the $\alpha-Si:H$ layers were examined using a four-point probe, HRXRD (high resolution Xray diffraction), Raman Spectroscopy, FE-SEM (field emission-scanning electron microscopy), TEM (transmission electron microscope) and AES depth profiler. The Ni layers reacted with Si to form NiSi layers with a low sheet resistance of $10{\Omega}/{\Box}$. The crystallinty of the $\alpha-Si:H$ layers on NiSi was up to 60% according to Raman spectroscopy. These results show that both nano-scale NiSi layers and crystalline Si layers can be formed simultaneously on a Ni deposited glass substrate using the proposed low temperature catalytic CVD process.

Effect of Pore Structures of a Ti-49.5Ni (at%) Alloy on Bone Cell Adhesion (Ti-49.5Ni (at%)합금의 다공성 구조가 뼈 세포 흡착에 미치는 영향)

  • Im, Yeon-Min;Choi, Jung-Il;Khang, Dong-Woo;Nam, Tae-Hyun
    • Korean Journal of Materials Research
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    • v.22 no.2
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    • pp.66-70
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    • 2012
  • Ti-Ni alloys are widely used in numerous biomedical applications (e.g., orthodontics, cardiovascular science, orthopaedics) due to their distinctive thermomechanical and mechanical properties, such as the shape memory effect, superelasticity and low elastic modulus. In order to increase the biocompatibility of Ti-Ni alloys, many surface modification techniques, such as the sol-gel technique, plasma immersion ion implantation (PIII), laser surface melting, plasma spraying, and chemical vapor deposition, have been employed. In this study, a Ti-49.5Ni (at%) alloy was electrochemically etched in 1M $H_2SO_4$+ X (1.5, 2.0, 2.5) wt% HF electrolytes to modify the surface morphology. The morphology, element distribution, crystal structure, roughness and energy of the surface were investigated by scanning electron microscopy (SEM), energy-dispersive Xray spectrometry (EDS), X-ray diffractometry (XRD), atomic force microscopy (AFM) and contact angle analysis. Micro-sized pores were formed on the Ti-49.5Ni (at%) alloy surface by electrochemical etching with 1M $H_2SO_4$+ X (1.5, 2.0, 2.5) wt% HF. The volume fractions of the pores were increased by increasing the concentration of the HF electrolytes. Depending on the HF concentration, different pore sizes, heights, surface roughness levels, and surface energy levels were obtained. To investigate the osteoblast adhesion of the electrochemically etched Ti-49.5Ni (at%) alloy, a MTT test was performed. The degree of osteoblast adhesion was increased at a high concentration of HF-treated surface structures.

A Precipitation Behavior of Nano-Oxide Particles in Mechanically Alloyed Fe-5Y2O3 Powders (기계적 합금화하여 제조한 Fe-5Y2O3 합금분말의 나노산화물 석출거동)

  • Kim, Ga Eon;Noh, Sanghoon;Choi, Ji Eun;Kim, Young Do;Kim, Tae Kyu
    • Journal of Powder Materials
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    • v.22 no.1
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    • pp.46-51
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    • 2015
  • A precipitation behavior of nano-oxide particle in Fe-$5Y_2O_3$ alloy powders is studied. The mechanically alloyed Fe-$5Y_2O_3$ powders are pressed at $750^{\circ}C$ for 1h, $850^{\circ}C$ for 1h and $1150^{\circ}C$ for 1h, respectively. The results of Xray diffraction pattern analysis indicate that the $Y_2O_3$ diffraction peak disappear after mechanically alloying process, but $Y_2O_3$ and $YFe_2O_4$ complex oxide precipitates peak are observed in the powders pressed at $1150^{\circ}C$. The differential scanning calorimetry study results reveal that the formation of precipitates occur at around $1054^{\circ}C$. Based on the transmission electron microscopy analysis result, the oxide particles with a composition of Y-Fe-O are found in the Fe-$5Y_2O_3$ alloy powders pressed at 1150oC. It is thus conclude that the mechanically alloyed Fe-$5Y_2O_3$ powders have no precipitates and the oxide particles in the powders are formed by a high temperature heat-treatment.

Effect of Annealing Temperature on the Properties of ITO/Au/ITO Films

  • Chae, Joo-Hyun;Kim, Dae-Il
    • Korean Journal of Materials Research
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    • v.19 no.2
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    • pp.108-110
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    • 2009
  • Transparent Sn-doped $In_2O_3$ (ITO) single-layer and ITO/Au/ITO multilayer films were deposited on glass substrates by reactive magnetron sputtering to compare the properties of the films. They were then annealed in a vacuum of $1{\times}10^{-2}\;Pa$ at temperatures ranging from 150 to $450^{\circ}C$ for 20 min to determine the effect of the annealing temperature on the properties of the films. As-deposited 100 nm thick ITO films exhibit a sheet resistance of $130{\Omega}/{\square}$ and optical transmittance of 77% at a wavelength length of 550 nm. By inserting a 5 nm-thick Au layer in ITO/metal/ITO (IMI) films, the sheet resistance was decreased to as low as $20{\Omega}/{\square}$ and the optical transmittance was decreased to as little as 73% at 550 nm. Post-deposition annealing of ITO/Au/ITO films led to considerably lower electrical resistivity and higher optical transparency. In the Xray diffraction pattern, as-deposited ITO films did not show any diffraction peak, whereas as-deposited ITO/ Au/ITO films have Au (222) and $In_2O_3$ (110) crystal planes. When the annealing temperature reached the 150 - $450^{\circ}C$ range, the both diffraction peak intensities increased significantly. A sheet resistance of $8{\Omega}/{\square}$ and an optical transmittance of 82% were obtained from the ITO/Au/ITO films annealed at $450^{\circ}C$.

Characteristics of the AlON-Al2O3 Ceramic Coatings on the Al2021 Alloy by Electrolytic Plasma Processing

  • Wang, Kai;Byeon, Sang-Sik;Kim, Geun-Woo;Park, Keun-Young;Ahmed, Faheem;Koo, Bon-Heun
    • Korean Journal of Materials Research
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    • v.22 no.3
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    • pp.155-158
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    • 2012
  • In this work, AlON-$Al_2O_3$ coatings were prepared on Al2021 alloy by the electrolytic plasma processing (EPP) method. The experimental electrolytes include: 2 g/l NaOH as the electrolytic conductive agent, 10 g/l $Na_2AlO_2$ as the alumina formative agent, and 0.5 g/l $NaNO_2$, $NaNO_3$, and $NH_4NO_3$ as the nitride inducing agents. The effects of different nitrogen inducing agents were studied by a combined compositional and structural analyses of the ceramic coatings carried out by Xray diffractometry (XRD) and scanning electron microscopy (SEM) for the specimens EPP-treated at room temperature for 15 min under a hybrid voltage of 260 DC along with an AC 50 Hz power supply (200 V). Microhardness tests and wear tests were carried out to correlate the evolution of the microstructure and the resulting mechanical properties. Potentiodynamic polarizations and immersion corrosion tests were carried out in 3.5wt% NaCl water solutions under static conditions in order to evaluate the corrosion behavior of the coated samples. The results demonstrate that $NaNO_2$ is proven to be a good nitrogen inducing agent to produce high quality AlON-$Al_2O_3$ ceramic coatings.

Experimental Study of Freeze and Thaw Effect on Gas Diffusion Layer Using XRay Tomography (X-선 단층 촬영을 이용한 동결과 융해가 기체확산층에 미치는 영향에 대한 실험적 연구)

  • Je, Jun-Ho;Kim, Jong-Rok;Doh, Sung-Woo;Kim, Moo-Hwan
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.35 no.5
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    • pp.487-490
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    • 2011
  • We used X-ray tomography to carry out an experimental study to visualize the effect of freeze and thaw cycles on the gas diffusion layer (GDL) in a polymer electrolyte membrane fuel cell (PEMFC). A PEMFC has freeze and thaw cycles if the fuel cell is operating at a below-freezing ambient temperature. The cycle permanently deforms the fuel-cell capillary structures and reduces the ability of the cell to generate electric power and also reduces its service life. The GDL is the thickest capillary layer in the fuel cell, so it experiences the most deformation. The X-ray tomography facility at the Pohang Accelerator Laboratory was used to observe the structural changes in GDLs induced by a freeze and thaw cycle. We discuss the effects of these structural changes on the power production and service life of PEMFCs.

Characterizationof Graphene Modified by Self-Assembled Monolayers on Polyethylene Terephthalate Film

  • Jo, Ju-Mi;Jeong, Dae-Seong;Kim, Yu-Seok;Song, U-Seok;Adhikari, Prashanta Dhoj;Cha, Myeong-Jun;Lee, Su-Il;Jeong, Sang-Hui;Park, Sang-Eun;Park, Jong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.616-616
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    • 2013
  • 그래핀(Graphene)은 열전도도가 높고 전자 이동도(200,000 cm2V-1s-1)가 우수한 전기적 특성을 가지고 있어 전계 효과 트랜지스터(Field effect transistor; FET), 유기 전자 소자(Organic electronic device)와 광전자 소자(Optoelectronic device) 같은 반도체 소자에 응용 가능하다. 최근에는 아크 방출(Arc discharge method), 화학적 기상 증착법(Chemical vapor deposition; CVD), 이온-조사법(Ionirradiation)등을 이용한 이종원자(Hetero atom)도핑과 화학적 처리를 이용한 기능화(Functionalization)등의 방법으로 그래핀의 전도도를 향상시킬 수 있었다. 그러나 이러한 방법들은 기판의 표면을 거칠게 하며, 그래핀에 많은 결함들이 발생한다는 단점이 있다. 이러한 단점을 극복하기 위해 자가조립 단층막법(Self-assembled monolayers; SAMs)을 이용하여 기판을 기능화한 후 그 위에 그래핀을 전사하면, 자가조립 단층막의 기능기에 따라 그래핀의 일함수를 조절 가능하고 운반자 농도나 도핑 유형을 변화시켜 소자의 전기적 특성을 최적화 할 수 있다 [1-3]. 본 연구에서는 PET(polyethylene terephthalate) 기판에 SAMs를 이용하여 유연하고 투명한 그래핀 전극을 제작하였다. 산소 플라즈마와 3-Aminopropyltriethoxysilane (APTES)를 이용하여 PET 기판 표면 위에 하이드록실 기(Hydroxyl group; -OH)와 아민 기(Amine group; -NH2)를 순차적으로 기능화 하였고, 그 위에 화학적 기상 증착법을 이용하여 합성한 대면적의 균일한 그래핀을 전사하였다. PET 기판 위에 NH2 그룹이 존재하는 것을 접촉각 측정(Contact angle measurement)과 X-선 광전자 분광법(Xray photoelectron spectroscopy: XPS)을 통해 확인하였으며, NH2그룹에 의해 그래핀에 도핑 효과가 나타난 것을 라만 분광법(Raman spectroscopy)과 전류-전압 특성곡선(I-V characteristic curve)을 이용하여 확인하였다. 본 연구 결과는 유연하고 투명한 기판 위에 안정적이면서 패턴이 가능하기 때문에 그래핀을 기반으로 하는 반도체 소자에 적용 가능할 것이라 예상된다.

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