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http://dx.doi.org/10.5012/bkcs.2011.32.3.847

Thermal Effect on Characteristics of IZTO Thin Films Deposited by Pulsed DC Magnetron Sputtering  

Son, Dong-Jin (Department of Physics, Institute of Basic Science, and Brain Korea 21 Physics Research Division, Sungkyunkwan University)
Ko, Yoon-Duk (Display Lab, Sungkyunkwan University)
Jung, Dong-Geun (Department of Physics, Institute of Basic Science, and Brain Korea 21 Physics Research Division, Sungkyunkwan University)
Boo, Jin-Hyo (Department of Chemistry, Institute of Basic Science, Sungkyunkwan University)
Choa, Sung-Hoon (Graduate School of NID Fusion Technology, Seoul National University of Science and Technology)
Kim, Young-Sung (Graduate School of NID Fusion Technology, Seoul National University of Science and Technology)
Publication Information
Abstract
This study examined In-Zn-Sn-O (IZTO) films deposited on glass substrates by pulsed DC magnetron sputtering with various substrate temperatures. The structural, electrical, optical properties were analyzed. Xray diffraction showed that the IZTO films prepared at temperatures > $150^{\circ}C$ were crystalline which adversely affected the electrical properties. Amorphous IZTO films prepared at $100^{\circ}C$ showed the best properties, such as a low resistivity, high transmittance, figure of merit, and high work function of $4.07{\times}10^{-4}\;{\Omega}$, 85%, $10.57{\times}10^{-3}\;{\Omega}^{-1}$, and 5.37 eV, respectively. This suggests that amorphous IZTO films deposited at relatively low substrate temperatures ($100^{\circ}C$) are suitable for electrode applications, such as OLEDs as a substitute for conventional crystallized ITO films.
Keywords
TCO (transparent conducting oxide); IZTO (indium zinc tin oxide); Substrate temperature; Pulsed dc magnetron sputter;
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  • Reference
1 Coutts, T. J.; Young, D. L. MRS Bulletin 2000, 8, 58.
2 Kim, H.; Piqué, A.; Horwitz, J. S. Appl. Phys. Lett. 1999, 74, 3444.   DOI
3 Shen, Y.; Jacobs, D. B.; Malliaras, G. G.; Koley, G.; Spencer, M. G.; Ioannidis, A. Adv. Mater. 2001, 13, 1234.   DOI   ScienceOn
4 Kim, D. H.; Park, M. R.; Lee, H. J.; Lee, G. H. Appl. Surf. Sci. 2006, 253, 409.   DOI   ScienceOn
5 Liu, D. S.; Lin, C. H.; Huang, B. W.; Wu, C. C. Jpn. J. Appl. Phys. 2006, 45, 3526.   DOI
6 Bae, J. H.; Moon, J. H.; Jeong, S. W.; Kim, J. J.; Kang, J. W.; Kim,D. G.; Kim, J. K.; Park, J. W.; Kim, H. K. J. Electrochem. Soc. 2008, 155, J1.   DOI
7 Ow-Yang, C. W.; Yeom, H.; Paine, D. C. Thin Solid Films 2008, 516, 3105.   DOI   ScienceOn
8 Hung, L. S.; Chen, C. H. Mater. Sci. Eng. 2002, 39, 143.   DOI   ScienceOn
9 Frank, G.; Kowtlin, H. Appl. Phys. A 1982, 27, 197.   DOI
10 Bel Hadj Tahar, R.; Ban, T.; Ohya, Y.; Takahashi, Y. J. Appl. Phys. 1998, 83, 2631.   DOI   ScienceOn
11 Jung, Y. S.; Seo, J. Y.; Lee, D. W.; Jeon, D. Y. Thin Solid Films 2003, 445, 63.   DOI   ScienceOn
12 Fan, J. C. C.; Goodenough, J. B. J. Appl. Phys. 1977, 48, 3524.   DOI   ScienceOn
13 Haacke, G. J. Appl. Phys. 1976, 47, 4086.   DOI   ScienceOn