• 한국자기학회지
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• 제6권2호
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• pp.122-129
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• 1996

Fig. 1에서 보는 바와 같이 수 MeV의 에너지를 가진 입사이온이 고체 시료표면과 충돌했을 때 여러 가지의 상호작용과 과정들이 일어난다. 입사 아온이 표적원자의 원자가전자나 내각전자와 상호작용을 하였을 때 원자를 여기시키거나 이온화시키게 되며 입사 이온이 표적 핵과 매우 가까이 접근했을 때 입사이온과 표적 핵사이에 쿨롱상호작용이나 핵 상호작용이 일어나게 된다. 이러한 여러가지 상호작용의 결과들로부터 분석하고자 하는 시료의 성분, 구조, 상호작용 과정에 대한 정보를 얻을 수 있다. 이러한 고에너지 이온선을 이용한 분석기술로는 Fig. 1에서 보는 바와 같이 후방산란법(BS : Backscattering Spectrometry), 전방산란법(FRS : Forward Recoil Spectrometry), 핵반응법(NRA : Nuclear Reaction Analysis), 양성자여기X선검출법(PIXE : Proton Induced X-ray Emission)등과 이러한 방법들과 같이 조합하여 사용하는 이온 채널링(ion channeling)등이 있다. 본 해설에서는 이러한 분석법중에서도 널리 사용되고 있는 후방산란법과 이온 채널링에 대하여 주로 기술하고자 한다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.267-270
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• 1999

We measured the dielectr~c constant of undoped GaN thin films grown on (0001) sapphire substrates In 0.8 - 4.5 eV energy (276 - 1550 nm wavelength) range by spectroscopic ellipsometry. For more accurate data analysis we also performed X-ray diffraction, photolurninescence and Rutherford backscattering spectroscopy on samples. Data were analyzed with a four-phase model. The dielectric constant of GaN thin films was obtained not only in the transparent region but also around the absorption edge. Absorption edge energy, $3.3992{\pm}0.002$eV was determined from the obtained dielectric function.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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• pp.26-26
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• 2000

High quality epitaxial Y2O3 thin films were prepared on Si(111) and (001) substaretes by using ion beam assisted deposition. As a substrate, clean and chemically oxidized Si wafers were used and the effects of surface state on the film crystallinity were investigated. The crystalline quality of the films were estimated by x-ray scattering, rutherford backscattering spectroscopy/channeling, and high-resolution transmission electron microscopy (HRTEM). The interaction between Y and Si atoms interfere the nucleation of Y2O3 at the initial growth stage, it could be suppressed by the interface SiO2 layer. Therefore, SiO2 layer of the 4-6 layers, which have been known for hindering the crystal growth, could rather enhance the nucleation of the Y2O3 , and the high quality epitaxial film could be grown successfully. Electrical properties of Y2O3 films on Si(001) were measured by C-V and I-V, which revealed that the oxide trap charge density of the film was 1.8$\times$10-8C/$\textrm{cm}^2$ and the breakdown field strength was about 10MV/cm.

• Korean Chemical Engineering Research
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• 제43권4호
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• pp.495-502
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• 2005

무전해 도금 용액을 이용하여 구리를 직접 텅스텐(Tungsten, W) 기판 위에 도금하였다. 도금 용액의 농도는 각각 $CuSO_4$ 7.615 g/L, EDTA 10.258 g/L, glyoxylic acid 7 g/L로 하였다. 도금 용액의 pH는 11.0에서 12.8까지 변화시켰으며, 용액의 온도는 $60^{\circ}C$로 유지하였다. 도금된 필름의 특성을 조사하기 위하여 X선 회절분석기, 전계 방출 주사 전자 현미경, 주사형 원자력 현미경, X선 광전자 분석기 및 Rutherford backscattering spectroscope(RBS)를 사용하였다. 구리 도금을 위한 가장 좋은 pH 조건은 11.8이였다. 이 용액에서 10분 동안 도금한 경우 둥근 모양의 구리 입자가 균일하게 도금되었으며, 불순물 peak이 없는 순수 구리 peak이였고, 근평균 제곱 표면 거칠기는 약 11 nm가 되었다. 또한, pH 11.8에서 12분 동안 도금한 필름의 두께는 140 nm이었고 도금속도는 약 12 nm/min였다. 무전해 도금 용액의 pH를 12.8로 증가시키면 도금된 구리 필름은 Cu peak 이외에 불순물 peak인 $Cu_2O$가 나타나고 구리 입자 모양도 기다란 직사각형 모양으로 변하였다. 순수 구리의 도금을 위해서는 도금 용액에서 적당한 pH를 유지하여야 한다. 도금된 구리의 농도는 RBS로 측정한 결과 99 atom％였다. 또한, Cu/W 필름은 전기 도금하는 동안 합금 형태를 이루기 때문에 접착성도 좋았다.

• Bulletin of the Korean Chemical Society
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• 제31권9호
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• pp.2503-2508
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• 2010

ZnO thin films were grown on Si or $SiO_2$/Si substrates, at growth temperatures ranging from 150 to $400^{\circ}C$, by atomic layer deposition (ALD) using diethylzinc and water. Despite the large band gap of 3.3 eV, the ALD ZnO films show high n-type conductivity, i.e. low resistivity in the order of $10^{-3}\;{\Omega}cm$. In order to understand the high conductivity of ALD ZnO films, the films were characterized with X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy, elastic recoil detection, Rutherford backscattering, Photoluminescence, and Raman spectroscopy. In addition, the various analytical data of the ZnO films were compared with those of ZnO single crystal. According to our analytical data, metallic zinc plays an important role for the high conductivity in ALD ZnO films. Therefore when the metallic zinc was additionally oxidized with ozone by a modified ALD sequence, the resistivity of ZnO films could be adjusted in a range of $3.8{\times}10^{-3}\;{\sim}\;19.0\;{\Omega}cm$ depending on the exposure time of ozone.

• 한국표면공학회지
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• 제29권6호
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• pp.683-690
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• 1996

In this study, the diffusion barrier properties of $1000 \AA$ thick molybdenum compounds (Mo, Mo-N, $MoSi_2$, Mo-Si-N) were investigated using sheet resistance measurements, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Scanning electron microscopy (SEM), and Rutherford backscattering spectrometry (RBS). Each barrier material was deposited by the dc magnetron sputtering, and annealed at 300-$800^{\circ}C$ for 30min in vacuum. Mo and $MoSi_2$ barrier were failed at low temperature due to Cu diffusion through grain bound-aries and defects of Mo thin film and the reaction of Cu with Si within $MoSi_2$ respectively. A failure temperature could be raised to $650^{\circ}C$-30min in the Mo barrier system and to $700^{\circ}C$-30min in the Mo-silicide system by replacing Mo and $MoSi_2$ with Mo-N and Mo-Si-N, respectively. The crystallization temperature in the Mo-silicide film was raised by the addition of $N_2$. It is considered that not only the N, stuffing effect but also the variation of crystallization temperature affects the reaction of Cu with Si within Mo-silicide. It was found that Mo-Si-N is more effective barrier than Mo, $MoSi_2$, or Mo-N to copper penetration preventing Cu reaction with the substrate for 30min at a temperature higher than $650^{\circ}C$.

• 한국진공학회지
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• 제7권s1호
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• pp.57-77
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• 1998

Heteroepitaxial $Y_2O_3$ films were grown on a Si(111) substrate by ionized cluster beam deposition(ICBD) in ultra high vacuum, and its qualities such as crystllitnity, film stress, and morphological characteristics were investigated using the various measurement methods. The crystallinity was investigated by x-ray diffraction (XRD) and reflection high energy electron diffraction (RHEED). Interface crystallinity was also examined by Rutherford backscattering spectroscopy(RBS) channeling, transmission electron microscopy(TEM). The stress of the films was measured by RBS channeling and XRD. Surface and interface morphological characteristics were investigated by atomic force microscopy (AFM) and x-ray scattering method. Comparing the interface with the surface characteristics, we can conclude that many defects at the interface region were generated by interface reaction between the yttrium metal and SiO2 layer and by ion beam characteristic such as shallow implantation, so that they influenced the film qualities. The film quality was dominantly depended on the characteristic temperature range. In the temperature range from $500^{\circ}C$ to $600^{\circ}C$, the crystallinity was mainly improved and the surface roughness was drastically decreased. On the other hand, in the temperature range from $600^{\circ}C$ to $700^{\circ}C$, the compressive stress and film density were dominantly increased, and the island size was more decreased. Also the surface morphological shape was transformed from elliptical shape to triangular. The film stress existed dominantly at the interface region due to the defects generation.

• Radiation Oncology Journal
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• 제1권1호
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• pp.21-24
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• 1983

Co ${\gamma}$선과 10MV x선으로 폴리스티렌 팬톰에 조사하여 이온함으로 배면과 배면근처의 선량을 측정한 결과는 아래와 같다. 1. 측정점 이하의 팬톰의 두께가 증가함에 따라 선량율과 선량보정계수가 증가하였으며 그 두께가 20cm 이상인 경우에는 일정하였다. 선량보정계수는 1 이하였다. 2. 조사면의 크기가 클수록, 측정점의 깊이가 깊을 수록 선량보정계수는 감소하였다. 3. 선량에 후방산란선량의 기여도는 조사면이 클수록, 깊이가 얕을수록, 그 깊이 이하의 물질의 두께가 두꺼울수록 증가하였다. 4. 10MV x선의 경우에도 선량보정계수는 같은 유형으로 변하기는 했지만 그 값이 0.995~1.000이었다. 5. $^{60}Co$에 경우에 치료부위의 두께가 10cm 이상이면 조사시간을 보정하지 않아도 좋을 것이다.

• 비파괴검사학회지
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• 제29권6호
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• pp.591-602
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• 2009

The Compton backscatter technique has been applied to lap-joint in aircraft structure in order to determine mass loss due to exfoliative corrosion of the aluminum alloy sheet skin. The mass loss of each layer has been estimated from Compton backscatter A-scan including the aluminum sheet, the corrosion layer, and the sealant. A Compton backscattering imaging system has been also developed to obtain a cross-sectional profile of corroded lap-splices of aging aircraft using a specially designed slit-type camera. The camera is to focus on a small scattering volume inside the material from which the backscattered photons are collected by a collimated scintillator detector for interpretation of material characteristics. The cross section of the layered structure is scanned by moving the scattering volume through the thickness direction of the specimen. The theoretical model of the Compton scattering based on Boltzmann transport theory is presented for quantitative characterization of exfoliative corrosion through deconvolution procedure using a nonlinear least-square error minimization method. It produces practical information such as location and width of planar corrosion in layered structures of aircraft, which generally cannot be detected by conventional NDE techniques such as the ultrasonic method.

• Journal of Magnetics
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• 제6권1호
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• pp.23-26
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• 2001

Nano-crystalline hexaferrite $BaFe_{12}O_{19}$(BaM) thin films have been prepared by the sol-gel method. A solution of Ba-nitrate and Fe-nitrates was dissolved in solvent with the stoichiometric ratio Ba/Fe=1/10. Films were spin-coated onto $SiO_2$Si substrates, dried and then heated in air at various temperatures. In films prepared at a drying temperature $T_d=250^{\circ}C$ and a crystallizing temperature 650${\circ}C$, single-phase BaM was obtained. High coercivities were obtained in these nano-crystalline thin films, 4~5.5 kOe for hexaferrite. Polycrystalline BaM/$SiO_2$/Si(100) thin films were characterized by Rutherford backscattering (RBS), thermogravimetry (TGA), differential thermal analysis (DTA), x-ray diffraction (XRD), and vibrating sample magnetometry (VSM), as well as Fourier transform infrared spectroscopy (FTIR). The perpendicular coercivity $H_{C\bot}$ and in-plane coercivity $H_{CII}$ after annealing at 650${\circ}C$ for 2 hours were 4766 Oe and 4480 Oe, respectively, at room temperature, under a maximum applied field of 10 kOe.