• 대한화학회지
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• 제10권3호
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• pp.133-135
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• 1966

Stainless steel 속에 들어 있는 chromium, nickel, 및 manganess를 原子吸光分光分析法(atomic absorption spectrophotomer)으로써 보다 빨리 定量할 수 있는 方法을 記述하였다. 現行되고 있는 濕式分析法과 比較한 結果 原子吸光分光分析法도 stainless steel의 分析에 믿을만한 한가지 分析法임을 알게 되었다.

• 한국환경보건학회지
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• 제22권2호
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• pp.83-89
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• 1996

In order to evaluate the air quality, dry and wet deposition samples were collected by deposit containers during four months in Inchon area. The samples were analyzed for its solid composition and trace elements(Ca, Cd, Cu, Fe, Mn, Ni, Pb, Zn). The main results are summarized below 1. The amounts of dry and wet deposition in Inchon area were 1.06~3.14 ton/$km^2$/month, and affected by the rainfall and suspended yellow sand. 2. Through the analysis of solid balance, we found that 50% of total solids(TS) was fixed suspend ed solids(FSS), 25% was fixed dissolved solids(FDS), and each of volatile suspended solids(VSS) and volatile dissolved solids(VDS) accounted for 12.5%. 3. The amounts collected by sampler for trace elements were 938 ~ 2,765 $\mu g$ calcium/10days sampler, 0.2 ~ 90.4 $\mu g$ cadmium/10days/sampler, 26 ~ 298 $\mu g$ copper/10days/sampler, 928 ~ 3,939 $\mu g$ iron/10days/sampler, 50 ~ 202 $\mu g$ manganese/10days/sampler, 4 ~ 37 $\mu g$ nickel/10days/sampler, 52 ~ 406 $\mu g$ lead/10days/sampler, and 97 ~ 1,317 $\mu g$ zinc/10days/sampler, respectively. 4. Using the manganese analysis, it was found that 76.1% of TS was from soil.

• 한국재료학회지
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• 제29권3호
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• pp.155-159
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• 2019

Surface plasmon resonance is the resonant oscillation of conduction electrons at the interface between negative and positive permittivity material stimulated by incident light. In particular, when light transmits through the metallic microhole structures, it shows an increased intensity of light. Thus, it is used to increase the efficiency of devices such as LEDs, solar cells, and sensors. There are various methods to make micro-hole structures. In this experiment, micro holes are formed using a wet chemical etching method, which is inexpensive and can be mass processed. The shape of the holes depends on crystal facets, temperature, the concentration of the etchant solution, and etching time. We select a GaAs(100) single crystal wafer in this experiment and satisfactory results are obtained under the ratio of etchant solution with $H_2SO_4:H_2O_2:H_2O=1:5:5$. The morphology of micro holes according to the temperature and time is observed using field emission - scanning electron microscopy (FE-SEM). The etching mechanism at the corners and sidewalls is explained through the configuration of atoms.

• Nuclear Engineering and Technology
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• 제49권3호
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• pp.562-568
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• 2017

Background: The chemical characterization of metallic alloys and oxides is conventionally carried out by wet chemical analytical methods and/or instrumental methods. Instrumental neutron activation analysis (INAA) is capable of analyzing samples nondestructively. As a part of a chemical quality control exercise, Zircaloys 2 and 4, nimonic alloy, and zirconium oxide samples were analyzed by two INAA methods. The samples of alloys and oxides were also analyzed by inductively coupled plasma optical emission spectroscopy (ICP-OES) and direct current Arc OES methods, respectively, for quality assurance purposes. The samples are important in various fields including nuclear technology. Methods: Samples were neutron irradiated using nuclear reactors, and the radioactive assay was carried out using high-resolution gamma-ray spectrometry. Major to trace mass fractions were determined using both relative and internal monostandard (IM) NAA methods as well as OES methods. Results: In the case of alloys, compositional analyses as well as concentrations of some trace elements were determined, whereas in the case of zirconium oxides, six trace elements were determined. For method validation, British Chemical Standard (BCS)-certified reference material 310/1 (a nimonic alloy) was analyzed using both relative INAA and IM-NAA methods. Conclusion: The results showed that IM-NAA and relative INAA methods can be used for nondestructive chemical quality control of alloys and oxide samples.

• 분석과학
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• 제5권1호
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• pp.73-77
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• 1992

Glow discharge 방출분광법을 이용하여 Zn-Fe 전기도금강판의 도금층을 정량분석하였다. 도금층의 조성 및 부착량에 대한 분석결과를 습식화학분석 결과와 비교하였을 때 두 방법에 의한 결과는 서로 잘 일치하였다.

• 한국세라믹학회지
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• 제33권8호
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• pp.928-934
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• 1996

X-선 형광분석법을 사용하여 표준검정곡선법으로 시멘트 중의 주, 부성분들을 정량하고 습식법과 분석결과를 비교하였다. 이때, 표준시료 및 미지시료는 용융 케스트 비드법으로 준비하였다. 표준시멘트(227A372)의 오차분석결과 주성분인 CaO, SiO2, Al2O3, Fe2O3 및 부성분중의 MgO, SrO는 상대오차가 1% 이내이었으며, 부성분중 So3, K2O, TiO2, Na2O P2O5 및 Mn2O3는 5% 이하의 상대오차를 가졌다. 부성분의 상대오차는 시료준비오차가 가장 큰 부분을 차지하였다. X-선 형광분석과 습식분석을 비교한 결과 시멘트 분석의 측정값간의 최대혀용범위를 만족하므로, X-선 형광분석법을 시멘트 화학분석에 적용할 수 있을 것으로 판단된다. 그리고, 기존의 습식법으로 분석하기 어려운 시멘트내에 존재하는 미량성분인 P2O5, SrO 및 Mn2O3 의 정밀정확한 분석 또한 가능하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.171.2-171.2
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• 2015

Nowadays, trivalent rare-earth ($RE^{3+}$) ions activated metal oxides have been proved to be excellent host materials due to their various applications. Facile wet-chemical technique have been considered as the best synthetic route due its intensive interest in the preparation of nanostructures. Europium ion doped lanthanum hydroxide ($La(OH)_3:Eu^{3+}$) phosphors were synthesized by the facile wet chemical method using the hexamethylenetetramine (HMTA) as a mediated surfactant. The thermal behavior for the $La(OH)_3:Eu^{3+}$ phosphors was investigated by thermogravimetric and differential thermal analysis method. The morphological studies were measured by scanning electron microscope and transmission electron microscope measurements, indicating three-dimensional (3D) flower-like $La(OH)_3:Eu^{3+}$ nanorod bundles. After subsequent annealing process, the lanthanum oxide ($La_2O_3:Eu^{3+}$) phosphor exhibited similar kind of morphology. The synthesized $La(OH)_3:Eu^{3+}$ and $La_2O_3:Eu^{3+}$ samples were characterized by X-ray powder diffraction and Fourier transform infrared spectroscopy. Furthermore, photoluminescence and cathodoluminescence properties were studied in details.

• 전자공학회논문지A
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• 제30A권11호
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• pp.99-104
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• 1993

We analyzed the D.I. water used in wet cleaning process of semiconductor device manufacturing both at the D.I. water plant and at the wafer cleaning bath to detect the impurity source of D.I. water contamination. This shows that the quantity of impurity is related to the resistivity of D.I. water, and we found that the cleanliness of the wafer surface processed in D.I. water bath was affected by the degree of the ionic impurity contamination. So we evaluated the cleaning effect as different method for Fe ion, having the best adsoptivity on wafer surface. Moreover the temperature effect of the D.I. water is investigated in case of anion in order to remove the chemical residue after wet process. In addition to the control of D.I. water resistivity, chemical analysis of impurity control in D.I. water should be included and a suitable cleaning an drinsing method needs to be investigated for a high yielding semiconductor device.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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• pp.464-465
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• 2006

Monodispersed and nano-sized Cu powders were synthesized from copper sulfate pentahydrate $(CuSO_4{\cdot}5H_2O)$ inside a nonionic polymer matrix by using wet chemical reduction process. The sucrose was used as a nonionic polymer network source. The influences of a nonionic polymer matrix on the particle size of the prepared Cu powders were characterized by means of X-ray diffraction), scanning electron microscopy), and particle size analysis). The smallen Cu powders with size of approximately 100 nm was obtained with adding of 0.04M sucrose at reaction temperature of $60\;^{\circ}C$. The particle size of the Cu powders prepared by the reduction inside polymer network was strongly dependent of the sucrose content and reaction temperature.

• 한국표면공학회지
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• 제37권6호
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• pp.313-318
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• 2004

Vertically-aligned and uniformly-distributed CuO nanowires were formed on copper-coated Si substrates by wet chemical process, immersing them in a hot alkaline solution. The effects of hydrogen plasma treatment on the field emission characteristics of CuO nanowires were investigated. It was found that hydrogen plasma treatment enhanced the field emission properties of CuO nanowires by showing a decrease in turn-on voltage, and an increase in emission current density, and stability of current-voltage curves. However, the excessive hydrogen plasma treatment made the I-V curves unstable. It was confirmed by XPS (X-ray Photoelectron Spectroscopy) analysis that hydrogen plasma treatment deoxidized CuO nanowires, thereby the work function of the nanowires decreased from 4.35 eV (CuO) to 4.1 eV (Cu). It is thought that the decrease in the work function enhanced the field emission characteristics. It is well-known that the lower the work function, the better the field emission characteristics. The results suggest that the hydrogen plasma treatment is very effective in achieving enhanced field emission properties of the CuO nanowires, and there may exist an optimal hydrogen plasma treatment condition.