• Title/Summary/Keyword: WO3/Ag/WO3

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A Electrical and Optical studies of WO3/Ag/WO3 Transparent Electrode by RF Magnetron Sputtering (RF 마그네트론 스퍼터링을 이용한 WO3/Ag/WO3 투명전극의 전기·광학적 특성 연구)

  • Kang, Dong-Soo;Lee, Boong-Joo;Kwon, Hong-Kyu;Shin, Paik-Kyun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.63 no.11
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    • pp.1533-1537
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    • 2014
  • $WO_3/Ag/WO_3$ multilayer was researched by using RF magnetron sputtering with transparent electrode. Process gas flow ratio with $Ar/O_2$ were selected the optimum conditions at 70sccm/2sccm and $WO_3$ thin film at its conditions was appeared at transmittance about 80% in the visible light region to the average. $WO_3/Ag/WO_3$ multilayer thin films were fabricated from the same process condition which was the same gas flow ratio of Ar and $O_2$ $WO_3/Ag/WO_3$ thin films were appeared transmittance about 93% and sheet resistance about $6.41{\Omega}/{\square}$. From the SEM images, each thin films were appeared when $WO_3$ is 40nm and $O_2$ is 10nm.

Surface Properties of WO3/Ag/WO3 Transparent Electrode Film with Multilayer Structures (적층구조에 적용하기 위한 WO3/Ag/WO3 투명전극막의 표면 특성 제어)

  • Kang, Dong-Soo;Lee, Boong-Joo;Kwon, Hong-Kyu;Shin, Paik-Kyun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.64 no.9
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    • pp.1323-1329
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    • 2015
  • The WO3/Ag/WO3 transparent thin films are fabricated by the RF magnetron sputtering. This has a transmittance of front and rear about 90% in the visible light range and surface resistance of 6.41Ω/□. In this paper, we analyzed the surface characteristics caused by the working pressure and O2 plasma surface treatment to apply a transparent electrode that was prepared to the laminated structure with other materials. The working pressure was changed in the WO3 film to 10mTorr, 7mTorr, and 5mTorr, it showed a lower than roughness of conventional ITO. In addition, by 55.5774 J/m2 at 5mTorr, it shows the hydrophobic property with lower process pressure. O2 plasma surface treatment was changed at the condisions of the RF power to 150W, 100W, and 50W and the process time to 240s, 180s, 120s, and 60s. The surface roughness are the maximum roughness(Rmax) 6.437nm and the average roughness(Rq) 0.827nm at RF power 150W, and the maximum roughness (Rmax) 6.880nm and the average roughness (Rq) 0.839nm at process time 240sec. It showed a lower value than the surface treatment. also about working pressure and process time is increased, it showed the hydrophobic.

Preparation of WO3 by using sol-gel method for photoelectrode and its application for PEC cell (물분해로부터 수소 제조를 위한 광촉매용 텅스텐 산화물 박막 제조)

  • Hong, Eun-Mi;Im, Dong-Chan
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.05a
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    • pp.101-101
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    • 2015
  • Photoelectrochemical water splitting is considered as a promising method of transforming solar energy into chemical energy stored in the type of hydrogen. An n-type $WO_3$ semiconductor is one of the most promising photoanodes for hydrogen production from water splitting. Films annealed at lower temperatures consisted of amorphous, whereas films annealed above $500^{\circ}C$ comprised solely of monoclinic $WO_3$. In this study, we observed photoactivity of $WO_3$ as increasing thickness of $WO_3$. And it shows good photoacivity as thickness increases. Also we tried to improve photoactivity through surface modification and bulk modification by using hydrogen treatment and conducting polymer. The photocurrent was measured in potentiostatic method with the three electrode system. A Pt wire and Ag / AgCl electrode were used as the counter electrode and the reference electrode, respectively. photocurrent-time (I-T) curve was measured at a bias potential of 0.79 V.

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Preparation of WO3-TiO2 Photocatalyst and Evaluation of Its Photo-activity in the Visible Light Range (가시광 활성 WO3-TiO2 복합체 광촉매의 제조 및 이의 특성 평가)

  • Yeo, In-Chul;Kang, In-Cheol
    • Journal of Powder Materials
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    • v.20 no.6
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    • pp.474-478
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    • 2013
  • The most general photocatalyst, $TiO_2$ and $WO_3$, are acknowledged to be ineffective in range of visible light. Therefore, many efforts have been directed at improving their activity such as: band-gap narrowing with non-metal element doping and making composites with high specific surface area to effectively separate electrons and holes. In this paper, the method was introduced to prepare a photo-active catalyst to visible irradiation by making a mixture with $TiO_2$ and $WO_3$. In the $TiO_2-WO_3$ composite, $WO_3$ absorbs visible light creating excited electrons and holes while some of the excited electrons move to $TiO_2$ and the holes remain in $WO_3$. This charge separation reduces electron-hole recombination resulting in an enhancement of photocatalytic activity. Added Ag plays the role of electron acceptor, retarding the recombination rate of excited electrons and holes. In making a mixture of $TiO_2-WO_3$ composite, the mixing route affects the photocatalytic activity. The planetary ball-mill method is more effective than magnetic stirring route, owing to a more effective dispersion of aggregated powders. The volume ratio of $TiO_2(4)$ and $WO_3(6)$ shows the most effective photocatalytic activity in the range of visible light in the view point of effective separation of electrons and holes.

Electrical and Optical Properties of Asymmetric Dielectric/Metal/Dielectric (D/M/D) Multilayer Electrode Prepared by Radio-Frequency Sputtering for Solar Cells

  • Pandey, Rina;Lim, Ju Won;Lim, Keun Yong;Hwang, Do Kyung;Choi, Won Kook
    • Journal of Sensor Science and Technology
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    • v.24 no.1
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    • pp.15-21
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    • 2015
  • Transparent and conductive multilayer thin films consisting of three alternating layers FZTO/Ag/$WO_3$ have been fabricated by radio-frequency (RF) sputtering for the applications as transparent conducting oxides and the structural and optical properties of the resulting films were carefully studied. The single layer fluorine doped zinc tin oxide (FZTO) and tungsten oxide ($WO_3$) films grown at room temperature are found to have an amorphous structure. Multilayer structured electrode with a few nm Ag layer embedded in FZTO/Ag/$WO_3$ (FAW) was fabricated and showed the optical transmittance of 87.60 % in the visible range (${\lambda}=380{\sim}770nm$), quite low electrical resistivity of ${\sim}10^{-5}{\Omega}cm$ and the corresponding figure of merit ($T^{10}/R_s$) is equivalent to $3.0{\times}10^{-2}{\Omega}^{-1}$. The resultant power conversion efficiency of 2.50% of the multilayer based OPV is lower than that of the reference commercial ITO. Asymmetric D/M/D multilayer is a promising transparent conducting electrode material due to its low resistivity, high transmittance, low temperature deposition and low cost components.

Microwave Dielectric Properties of $PbWO_{4}-TiO_{2}-CuO-B_{2}O_{3}$ Ceramics ($PbWO_{4}-TiO_{2}-CuO-B_{2}O_{3}$ 세라믹의 고주파 유전특성)

  • 이경호;최병훈
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.143-148
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    • 2001
  • PbWO$_4$ can be densified at 85$0^{\circ}C$ and it shows fairy good microwave dielectric properties; dielectric constant($\varepsilon$$_{r}$) of 21.5, quality factor(Q $\times$f$_{0}$) of 37,224 GHz, and temperature coefficient of resonant frequency($\tau$/suf f/) of -31ppm/$^{\circ}C$. Due to its low sintering temperature, PbWO$_4$ can be used as a multilayered chip component at microwave frequency with high electrical performance by using high conductive electrode metals such as Ag and Cu. However, in order to use this material for microwave communication devices, the $\tau$$_{f}$ of PbWO$_4$ must be stabilized to near zero with high Q$\times$f$_{0}$. In present study, PbWO$_4$ was modified by adding TiO$_2$, B$_2$O$_3$, and CuO in order to improve the microwave dielectric properties without increasing the sintering temperature. The addition of TiO$_2$ increased the $\tau$$_{f}$ and $\varepsilon$$_{r}$, due to its high rr(200ppm/$^{\circ}C$) and $\varepsilon$$_{r}$(100). However, the addition of TiO$_2$ reduced the Q$\times$f$_{0}$ value. When the mot ratio of PbWO$_4$ and TiO$_2$ was 0.913:7.087, near zero $\tau$$_{f}$(0.2ppm/$^{\circ}C$) was obtaibed with $\varepsilon$$_{r}$=22.3, and Q$\times$f/$_{0}$=21,443GHz. With this composition, various amount of B$_2$O$_3$ and CuO were added in order to improve the quality factor. The addition, of B$_2$O$_3$ decreased the $\varepsilon$$_{r}$. However, increased Q$\times$f$_{0}$ and $\tau$$_{f}$. When 2.5 wt% of B$_2$O$_3$ was added to the 0.913PbWO$_4$-0.087TiO$_2$ ceramic, $\tau$$_{f}$ =8.2, $\varepsilon$$_{r}$=20.3, Q$\times$f$_{0}$=54784 GHz. When CuO added to the 0.913PbWO$_4$-0.087TiO$_2$ ceramic, $\tau$$_{f}$ was continuously decreased. And $\varepsilon$$_{r}$ . and Q$\times$f$_{0}$ were increased up to 1.0 wt% then decreased. At 0.1 wt% of CuO addition, the 0.913PbWO$_4$-7.087Ti0$_2$ Ceramic Showed $\varepsilon$$_{r}$=23.5, $\tau$$_{f}$=4.4ppm/$^{\circ}C$, and Q$\times$f$_{0}$=32,932 GHz.> 0/=32,932 GHz.X>=32,932 GHz.> 0/=32,932 GHz.

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Characteristics of an electrochromic ECD (electro-chromic device) film in applications for smart windows with a 4-layer structure, a thickness of 0.5 mm (0.5 mm 이내의 두께를 갖는 4층 구조의 스마트 윈도우에 적용되는 전기변색 ECD(electro-chromic device) 필름 제조 및 특성)

  • Nam Il Kim;Geug Tae Kim
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.34 no.1
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    • pp.16-21
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    • 2024
  • Using electrochromic devices (ECD), smart window films that can change the colors from tinted state into transparent state by applying an external voltage were manufactured. Polyethylene terephthalate (PET) film was used as a substrate instead of conventional glass, and ECD modules having a total thickness of about 50 ㎛ were manufactured by sequentially introducing an ITO/Ag/ITO electrode layer, a WO3/TIC2 organic discoloration layer, and a Nafion fluorine electrolyte layer. Through a series of sputtering, bar coating, and thermal compression processes, a large scale smart window with a horizontal and vertical length of more than 80 mm was manufactured. When DC 3.5 V was applied, the transmittance decreased from 54 % to 24 % and moreover the color change could be confirmed even with the naked eye. Reversible color change capability at low external voltage implies that external sunlight can be selectively blocked which is effective in terms of energy saving.

Taxonomic Position of Korean Isolates of Rhizoctonia solani Based on RAPD and ITS Sequencing of Ribosomal DNA

  • Jeon, Young-Ah;Kim, Wan-Gyu;Kim, Dae-Ho;Kwon, Soon-Wo;Hong, Seung-Beom
    • The Plant Pathology Journal
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    • v.26 no.1
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    • pp.83-89
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    • 2010
  • Taxonomic position of 46 Korean isolates of Rhizoctonia solani which were classified into nine intraspecific groups by anastomosis and cultural characteristics was analyzed by randomly amplified polymorphic DNA (RAPD) and sequence analyses of the internal transcribed spacer (ITS) regions of ribosomal DNA. All the isolates within each group showed highly similar band patterns in RAPD. The ITS regions of the isolates within the same groups showed a high level of sequence similarity above 96.0% whereas similarities among different groups were below 94.4%. When compared with several reference strains of R. solani from foreign countries, all the Korean isolates were clustered with the foreign isolates belonging to the same groups in the phylogenetic tree. All six Korean strains of AG-4 were identified as HG-1 out of 3 subgroup of AG-4. We discussed taxonomic position of Korean isolates of R. solani and showed that sequence analysis with ITS regions could be a rapid and useful method for identification of intraspecific group of R. solani.

High Photocatalytic Activity of Gd2O2S:Tb Modified Titanium Dioxide Films

  • Kim, Bum-Goo;Lee, Hak-Guen;Kim, Hee-Sung;Kim, Young-Soon
    • Bulletin of the Korean Chemical Society
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    • v.30 no.3
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    • pp.675-678
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    • 2009
  • $Fe_2O_3,\;Ag_2O,\;CaWO_4$ and $Gd_2O_2S$:Tb loaded on titanium dioxide photocatalysts (P25, Degussa) were prepared by a calcination. Their composite films containing water-born polyurethane used as a material for immobilization were obtained by spray coating technique. The photocatalytic activity of the titanium dioxide films was characterized by decrease of UV-vis absorption spectra for methylene blue and gas chromatography for photocatalytic decomposition of formaldehyde diluted in water. It was shown that the $Gd_2O_2S$:Tb modified titanium dioxide films had good photocatalytic properties and followed the first-order kinetic model with regard to photocatalytic decoloration of methylene blue. Especially in formaldehyde photodegradation experiment, decrease rate of concentration of the titanium dioxide films with $Gd_2O_2S$:Tb modifying was about 35% larger than that of the unloaded titanium dioxide film.

Occurrence and Chemical Composition of Ti-bearing Minerals from Samgwang Au-ag Deposit, Republic of Korea (삼광 금-은 광상에서 산출되는 함 티타늄 광물들의 산상 및 화학조성)

  • Yoo, Bong Chul
    • Korean Journal of Mineralogy and Petrology
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    • v.33 no.3
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    • pp.195-214
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    • 2020
  • The Samgwang Au-Ag deposit has been one of the largest deposits in Korea. The deposit consists of eight lens-shaped quartz veins which filled fractures along fault zones in Precambrian metasedimentary rock, which feature suggest that it is an orogenic-type deposit. The Ti-bearing minerals occur in wallrock (titanite, ilmenite and rutile) and laminated quartz vein (rutile). They occur minerals including biotite, muscovite, chlorite, white mica, monazite, zircon, apatite in wallrock and white mica, chlorite, arsenopyrite in laminated quartz vein. Chemical composition of titanite has maximum vaules of 3.94 wt.% (Al2O3), 0.49 wt.% (FeO), 0.52 wt.% (Nb2O5), 0.46 wt.% (Y2O3) and 0.43 wt.% (V2O5). Titanite with 0.06~0.14 (Fe/Al ratio) and 0.06~0.15 (XAl (=Al/Al+Fe3++Ti)) corresponds with metamorphic origin and low-Al variety. Chemical composition of ilmenite has maximum values of 0.07 wt.% (ZrO2), 0.12 wt.% (HfO2), 0.26 wt.% (Nb2O5), 0.04 wt.% (Sb2O5), 0.13 wt.% (Ta2O5), 2.62 wt.% (As2O5), 0.29 wt.% (V2O5), 0.12 wt.% (Al2O3) and 1.59 wt.% (ZnO). Chemical composition of rutile in wallrock and laminated quartz vein has maximum values of 0.35 wt.%, 0.65 wt.% (HfO2), 2.52 wt.%, 0.19 wt.% (WO3), 1.28 wt.%, 1.71 wt.% (Nb2O3), 0.03 wt.%, 0.07 wt.% (Sb2O3), 0.28 wt.%, 0.21 wt.% (As2O5), 0.68 wt.%, 0.70 wt.% (V2O3), 0.48 wt.%, 0.59 wt.% (Cr2O3), 0.70 wt.%, 1.90 wt.% (Al2O3) and 4.76 wt.%, 3.17 wt.% (FeO), respectively. Rutile in laminated quartz vein is higher contents (HfO2, Nb2O3, As2O5, Cr2O3, Al2O3 and FeO) and lower content (WO3) than rutile in wallrock. The substitutions of rutile in wallrock and laminated quatz vein are as followed : rutile in wallrock [(Fe3+, Al3+, Cr3+) + Hf4+ + (W5+, As5+, Nb5+) ⟵⟶ 2Ti4+ + V4+, 2Fe2+ + (Al3+, Cr3+) + Hf4+ + (W5+, As5+, Nb5+) ⟵⟶ 2Ti4+ + 2V4+], rutile in laminated quartz vein [(Fe3+, Al3+) + As5+ ⟵⟶ Ti4+ + V4+, (Fe3+, Al3+) + As5+ ⟵⟶ Ti4+ + Hf4+, 4(Fe3+, Al3+) ⟵⟶ Ti4+ + (W5+, Nb5+) + Cr3+], respectively. Based on these data, titanite, ilmenite and rutile in wallrock were formed by resolution and reconcentration of cations (W5+, Nb5+, As5+, Hf4+, V4+, Cr3+, Al3+, Fe3+, Fe2+) in minerals of wallrock during regional metamorphism. And then rutile in laminated quartz vein was formed by reconcentration of cations (Nb5+, As5+, Hf4+, Cr3+, Al3+, Fe3+, Fe2+) in alteration minerals (white mica, chlorite) and Ti-bearing minerals reaction between hydrothermal fluid originated during ductile shear and Ti-bearing minerals (titanite, ilmenite and rutile) in wallrock.