• 제목/요약/키워드: W-N 박막

검색결과 364건 처리시간 0.025초

Aging effect of Solution-Processed InGaZnO Thin-Film-Transistors Annealed by Conventional Thermal Annealing and Microwave Irradiation

  • 김경준;이재원;조원주
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.211.1-211.1
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    • 2015
  • 최근 용액 공정을 이용한 산화물 반도체에 대한 연구가 활발히 진행되고 있다. 넓은 밴드갭을 가지고 있는 산화물 반도체는 높은 투과율을 가지고 있어 투명 디스플레이에 적용이 가능하다. 기존의 박막 진공증착 방법은 진공상태를 유지하기 위한 장비의 가격이 비싸며, 대면적의 어려움, 높은 생산단가 등으로 생산율이 높지 않다. 하지만 용액 공정을 이용하면 대기압에서 증착이 가능하고 대면적화가 가능하다. 그리고 각각의 조성비를 조절하는 것이 가능하다. 이러한 장점에도 불구하고, 소자의 신뢰성이나 저온공정은 중요한 이슈이다. Instability는 threshold voltage (Vth)의 shift 및 on/off switching의 신뢰성과 관련된 parameter이다. 용액은 소자의 전기적 특성을 열화 시키는 수분 과 탄소계열의 불순물을 다량 포함 하고 있어 고품질의 박막을 형성하기 위해서는 고온의 열처리가 필요하다. 기존의 열처리는 고온에서 장시간 이루어지기 때문에 유리나 플라스틱, 종이 기판의 소자에서는 불가능하지만 $100^{\circ}C$ 이하의 저온 공정인 microwave를 이용하면 유리, 플라스틱, 종이 기판에서도 적용이 가능하다. 본 연구에서는 산화물 반도체 중에서 InGaZnO (IGZO)를 용액 공정으로 제작한 juctionless thin-film transistor를 제작하여 기존의 열처리를 이용하여 처리한 소자와 microwave를 이용해서 열처리한 소자의 전기적 특성을 한 달 동안 관찰 하였다. 또한 In:Zn의 비율을 고정한 후 Ga의 비율을 달리하여 특성을 비교하였다. 먼저 p-type bulk silicon 위에 SiO2 산화막이 100 nm 증착된 기판에 RCA 클리닝을 진행 하였고, solution InGaZnO 용액을 spin coating 방식으로 증착하였다. Coating 후에, solvent와 수분을 제거하기 위해서 $180^{\circ}C$에서 10분 동안 baking공정을 하였다. 이후 furnace열처리와 microwave열처리를 비교하기 위해 post-deposition-annealing (PDA)으로 furnace N2 분위기에서 $600^{\circ}C$에서 30분, microwave를 1800 W로 2분 동안 각각의 샘플에 진행하였다. 또한, HP 4156B semiconductor parameter analyzer를 이용하여 제작된 TFT의 transfer curve를 측정하였다. 그 결과, microwave 열처리한 소자의 경우 기존의 furnace 열처리 소자와 비교하여 높은 mobility, 낮은 hysteresis 값을 나타내었으며, 1달간 소자의 특성을 관찰하였을 때 microwave 열처리한 소자의 경우 전기적 특성이 거의 변하지 않는 것을 확인하였다. 따라서 향후 용액공정, 저온공정을 요구하는 소자 공정에 있어 열처리방법으로 microwave를 이용한 활용이 기대된다.

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Buffer 층을 갖는 CoFe/ Cu/ Co 샌드위치 박막의 자기저항 특성 (Magnetoresistance of Buffer/CoFe/Cu/Co Sandwiches)

  • 송은영;오미영;김경민;이장로;김미양;김희중;박창만;이상석;황도근
    • 한국자기학회지
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    • 제7권3호
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    • pp.146-151
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    • 1997
  • DC magnetron sputtering 방법으로 Corning glass 기판 위에 버퍼층을 Fe와 N $i_{81}$$Fe_{19}$로 바꾸어가면서 보자력이 다른 $Co_{90}$ F $e_{10}$와 Co를 이용하여 buffer/CoFe(35 .angs. )/Cu(t .angs. )/Co(35 .angs. )의 형태로 샌드위치 박막을 제작하고 버퍼층 두께 및 바자성층 Cu층 두께, 자성층 두께 변화에 따른 자기저항비 의존성을 조사하였다. 자기저항비와 포화 자기장( $H_{s}$ )은 버퍼층의 두께가 두꺼워짐에 따라 증가하다가 극대치 3%를 보인 후 완만하게 감소하였다. NiFe, Fe 버퍼층을 갖는 시료를 비교한 경우, 각각 CoFe층과 Co층 사이의 결합 자기장( $H_{int}$)은 큰 차이가 없었으나 NiFe 버퍼층을 갖는 시료가 minor 자기저항 곡선의 반가폭 $H_{w}$ 는 감소하고 자기저항(MR) 기울기(slope)와 관련된 field sensitivity(%/Oe)는 향상되었다.다.

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펄스 전기도금법에 의해 제조된 n형 Bi2(Te-Se)3 박막의 Cu 도핑에 따른 열전특성에 관한 연구 (Study on Thermoelectric Properties of Cu Doping of Pulse-Electrodeposited n-type Bi2(Te-Se)3 Thin Films)

  • 허나리;김광호;임재홍
    • 한국표면공학회지
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    • 제49권1호
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    • pp.40-45
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    • 2016
  • Recently, $Bi_2Te_3$-based alloys are the best thermoelectric materials near to room temperature, so it has been researched to achieve increased figure of merit(ZT). Ternary compounds such as Bi-Te-Se and Bi-Sb-Te have higher thermoelectric property than binary compound Bi-Te and Sb-Te, respectively. Compared to DC plating method, pulsed electrodeposition is able to control parameters including average current density, and on/off pulse time etc. Thereby the morphology and properties of the films can be improved. In this study, we electrodeposited n-type ternary Cu-doped $Bi_2(Te-Se)_3$ thin film by modified pulse technique at room temperature. To further enhance thermoelectric properties of $Bi_2(Te-Se)_3$ thin film, we optimized Cu doping concentration in $Bi_2(Te-Se)_3$ thin film and correlated it to electrical and thermoelectric properties. Thus, the crystal, electrical, and thermoelectric properties of electrodeposited $Bi_2(Te-Se)_3$ thin film were characterized the XRD, SEM, EDS, Seebeck measurement, and Hall effect measurement, respectively. As a result, the thermoelectric properties of Cu-doped $Bi_2(Te-Se)_3$ thin films were observed that the Seebeck coefficient is $-101.2{\mu}V/K$ and the power factor is $1412.6{\mu}W/mK^2$ at 10 mg of Cu weight. The power factor of Cu-doped $Bi_2(Te-Se)_3$ thin film is 1.4 times higher than undoped $Bi_2(Te-Se)_3$ thin film.

태양 전지용 $CuInSe_2$ 단결정 박막 성장과 태양 전지로의 응용 (Growth of $CuInSe_2$ single crystal thin film for solar cell development and its solar cell application)

  • 이상열;홍광준
    • 한국태양에너지학회 논문집
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    • 제25권4호
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    • pp.1-11
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    • 2005
  • The stoichiometric mixture of evaporating materials for the $CuInSe_2$ single crystal thin film was prepared from horizontal furnace. Using extrapolation method of X-ray diffraction patterns for the polycrystal $CuInSe_2$, it was found tetragonal structure whose lattice constant $a_0$ and $c_0$ were $5.783\;{\AA}$ and $11.621\;{\AA}$, respectively. To obtain the $CuInSe_2$ single crystal thin film, $CuInSe_2$ mixed crystal was deposited on throughly etched GaAs(100) by the HWE(Hot Wall Epitaxy) system. The source and substrate temperature were $620^{\circ}C$ and $410^{\circ}C$ respectively. The crystalline structure of $CuInSe_2$ single crystal thin film was investigated by the double crystal X-ray diffraction(DCXD). Hall effect on this sample was measured by the method of Van der Pauw and studied on carrier density and mobility depending on temperature. From Hall data, the mobility was likely to be decreased by impurity scattering in the temperature range 30 K to 100 K and by lattice scattering in the temperature range 100 K to 293 K. The temperature dependence of the energy band gap of the $CuInSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=1.1851\;eV-(8.99{\times}10^{-4}\;eV/K)T^2/(T+153\;K)$. The open-circuit voltage, short current density, fill factor, and conversion efficiency of $n-CdS/p-CuGaSe_2$ heterojunction solar cells under $80\;mW/cm^2$ illumination were found to be 0.51V, $29.3\;mA/cm^2$, 0.76 and 14.3 %, respectively.

p-i-n 구조의 InSb 웨이퍼를 이용한 적외선 광다이오드의 제조 및 그 특성 (Fabrication and Characteristics of Infrared Photodiode Using Insb Wafer with p-i-n Structure)

  • 조준영;김종석;손승현;이종현;최시영
    • 센서학회지
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    • 제8권3호
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    • pp.239-246
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    • 1999
  • MOCVD로 성장된 p-i-n 구조의 InSb 웨이퍼를 이용하여 $3{\sim}5\;{\mu}m$ 영역의 적외선을 감지할 수 는 고감도 광기전력 형태의 적외선 광다이오드를 제조하였다. InSb는 녹는점과 표면원자들의 증발온도가 낮기 때문에 광다이오드의 접합계면과 표면의 절연보호막으로 $SiO_2$ 박막을 원격 PECVD를 이용하여 성장시켰다. 광다이오드의 저항성 접촉을 위해 In을 증착하였고 77K의 암상태에서 전류-전압 특성을 조사하였다. 영전위 저항과 수광면적의 적($R_0A$)이 $1.56{\times}10^6\;{\Omega}{\cdot}cm^2$의 높은 값을 가졌는데 이는 BLIP 조건을 만족하는 높은 값이었다. InSb 광다이오드에 적외선을 입사 했을때 $10^{11}\;cm{\cdot}Hz^{1/2}{\cdot}W^{-1}$의 매우 높은 정규화된 검지도를 나타내었다. 높은 양자효율과 검지도로 인해 제조된 InSb 적외선 단위 셀을 적외선 array에 그 적용이 가능할 것으로 보인다.

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ITO를 대체한 고효율 유기박막 태양전지 (Replacement of ITO for efficient organic polymer solar cells)

  • 김재령;박진욱;이보현;이표;이종철;문상진
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2010년도 춘계학술대회 초록집
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    • pp.69.1-69.1
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    • 2010
  • We have fabricated organic photovoltaic cells (OPVs) with highly conductive poly 3,4-ethylenedioxythiophene : poly styrenesulfonate (PEDOT:PSS) layer as an anode without using transparent conducting oxide (TCO), which has been modified by adding some organic solvents like sorbitol (So), dimethyl sulfoxide (DMSO), N-methyl-pyrrolidone (NMP), dimethylformamide (DMF), and ethylene glycol (EG). The conductivity of PEDOT:PSS film modified with each additive was enhanced by three orders of magnitude. According to atomic force microscopy (AFM) study, conductivity enhancement might be related to better connections between the conducting PEDOT chains. TCO-free solar cells with modified PEDOT:PSS layer and the active layer composed of poly(3-hexylthiophene) (P3HT) and phenyl [6,6] C61 butyric acid methyl ester (PCBM) exhibited a comparable device performance to indium tin oxide (ITO) based organic solar cells. The power conversion efficiency (PCE) of the organic solar cells incorporating DMSO, So + DMSO and EG modified PEDOT:PSS layer reached 3.51, 3.64 and 3.77%, respectively, under illumination of AM 1.5 (100mW/$cm^2$).

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신경회로망을 이용한 RF 스퍼터링 ZnO 박막 증착 프로세스 모델링 (Modeling of RF Sputtering Process for ZnO Thin film Deposition using Neural Network)

  • 임근영;이상극;박춘배
    • 한국전기전자재료학회논문지
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    • 제19권7호
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    • pp.624-630
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    • 2006
  • ZnO deposition parameters are not independent and have a nonlinear and complex property. To propose a method that could verify and predict the relations of process variables, neural network was used. At first, ZnO thin films were deposited by using RF magnetron sputtering process with various conditions. Si, GaAs, and Glass were used as substrates. The temperature, work pressure, and RF power of the substrate were $50\sim500^{\circ}C$, 15 mTorr, and $180\sim210W$, respectively : the purity of the target was ZnO 4 N. Structural properties of ZnO thin films were estimated by using XRD (0002) peak intensity. The structure of neural network was a form of 4-7-1 that have one hidden layer. In training a network, learning rate and momentum were selected as 0.2, 0.6 respectively. A backpropagation neural network were performed with XRD (0002) peak data. After training a network, the temperature of substrate was evaluated as the most important parameter by sensitivity analysis and response surface. As a result, neural network could capture nonlinear and complex relationships between process parameters and predict structural properties of ZnO thin films with a limited set of experiments.

졸-겔 공법으로 제작된 SnO2 박막 트랜지스터의 광전기적 특성 (Optoelectronic Properties of Sol-gel Processed SnO2 Thin Film Transistors)

  • 이창민;장재원
    • 센서학회지
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    • 제29권5호
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    • pp.328-331
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    • 2020
  • In this study, a highly crystalline SnO2 thin film was formed using a sol-gel process. In addition, a SnO2 thin-film transistor was successfully fabricated. The fabricated SnO2 thin-film transistor exhibited conventional n-type semiconductor properties, with a mobility of 0.1 cm2 V-1 s-1, an on/off current ratio of 1.2 × 105, and a subthreshold swing of 2.69. The formed SnO2 had a larger bandgap (3.95 eV) owing to the bandgap broadening effect. The fabricated photosensor exhibited a responsivity of 1.4 × 10-6 Jones, gain of 1.43 × 107, detectivity of 2.75 × 10-6 cm Hz1/2 W-1, and photosensitivity of 4.67 × 102.

PECVD 에 의해 형성된 TiCN 박막의 형상 및 밀착성 (The Morphology and Adhesion of TiCN Film formed by PECVD)

  • 허정;남태운
    • 열처리공학회지
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    • 제15권3호
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    • pp.118-126
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    • 2002
  • TiCN thin films were deposited on tool steels at $510^{\circ}C$ by PECVD from a $TiCl_4+N_2+CH_4+H_2+Ar$ gaseous mixture. The microstructures and preferred orientation were investigated. The micro-scratch tests were performed using a system equipped with an acoustic emission sensor. Critical loads were determined to evaluate the adhesion of TiCN to substrate. The influences of the microstructures of substrates, double layered coatings, and coatings after nitriding(duplex coating) were investigated. The experimental results showed that the microstructures of substrates and double layered coating did not affect the critical loads considerably. By the duplex coating, critical loads were not always increased. In some cases, duplex coatings decreased critical loads significantly despite of absence of black layer. In this study, we tried to relate the results of scratch test to the residual stress analysis. Nitriding before the coating reduces the tensile residual stress in the film, which gives rise to low critical load in scratch test.

다양한 열처리 조건에 따른 SBT 박막의 전기적 특성 (Electric Properties of SBT Thin Films with various Annealing Conditions)

  • 조춘남;김진사;오용철;신철기;박건호;최운식;김충혁;홍진웅;이준웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.589-592
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    • 2002
  • The $Sr_{0.7}Bi_{2.3}Ta_2O_9$(SBT) thin films are deposited on Pt-coated electrode(Pt/TiO2/SiO2/Si) using RF magnetron sputtering method. The structural and electric properties of SBT capacitors were influenced with annealing atmosphere. In the XRD pattern, the SBT thin films in all annealing atmosphere had (105) orientation. In the SEM images, Bi-layered perovskite phase was crystallized in all annealing atmosphere and grains largely grew in oxygen annealing atmosphere. The maximum remanent polarization and the coercive electric field in oxygen annealing atmosphere are $12.40{\mu}C/cm^2$ and 48kV/cm respectively. The dielectric constant and leakage current density annealing in oxygen atmosphere are 340 and $6.81{\times}10^{-10}A/cm^2$ respectively. The fatigue characteristics of SBT capacitors did not change up to $10^{10}$ switching cycles.

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