• 제목/요약/키워드: Vapor volume fraction

검색결과 48건 처리시간 0.028초

HWCVD를 이용한 Amorphous Si 박막 증착공정에서 수소량에 따른 박막성장 특성 (Hydrogen-Dependent Catalytic Growth of Amorphous-Phase Silicon Thin-Films by Hot-Wire Chemical Vapor Deposition)

  • 박승일;지형용;김명준;김근주
    • Current Photovoltaic Research
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    • 제1권1호
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    • pp.27-32
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    • 2013
  • We investigated the growth mechanism of amorphous-phase Si thin films in order to improve the film characteristics and circumvent photo-degradation effects by implementation of hot-wire chemical vapor deposition. Amorphous silicon thin films grown in a silane/hydrogen mixture can be decomposed by a resistive heat filament. The structural properties were observed by Raman spectroscopy, FTIR, SEM, and TEM. The electrical properties of the films were measured by photo-conductivity, dark-conductivity, and photo-sensitivity. The contents of Si-H and $Si-H_n$ bonds were measured to be 19.79 and 9.96% respectively, at a hydrogen flow rate of 5.5 sccm, respectively. The thin film has photo-sensitivity of $2.2{\times}10^5$ without a crystalline volume fraction. The catalyst behavior of the hot-wire to decompose the chemical precursors by an electron tunneling effect depends strongly on the hydrogen mixture rate and an amorphous Si thin film is formed from atomic relaxation.

금속폭발억제재가 충진된 LPG 탱크의 비정상 열전달 및 압력변화 해석 (Transient Analysis of Heat Transfer and Pressure Variation for LPG Tank with Metal Explosion Suppression Material)

  • 김호영;장효환;전철균
    • 대한설비공학회지:설비저널
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    • 제16권4호
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    • pp.406-414
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    • 1987
  • As one of the explosion suppression methods of LPG tank exposed to hot environment by an accident or fire, some material which has large heat capacity and thermal conductivity can be installed inside the LPG tank in order to suppress the temperature increasement of tank wall. In the present study, theoretical model for the horizontally locating cylindrical LPG tank with and without the aluminum explosion suppression material has been developed to predict the characteristics of system. As a parametric study, effects of two major parameters, thickness of material filling and initial vapor volume fraction, on the time variation of wall temperature, temperature and pressure in tank are numerically examined. The results of present study show that the thickness of material filling does not give big differences in the suppression characteristics when the thickness of filling is larger than three inches. In case of material filling, there are marked suppression effects to the increase-ment of wall temperature, average vapor temperature and pressure in tank compared with the case of no filling.

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Parametric study of population balance model on the DEBORA flow boiling experiment

  • Aljosa Gajsek;Matej Tekavcic;Bostjan Koncar
    • Nuclear Engineering and Technology
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    • 제56권2호
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    • pp.624-635
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    • 2024
  • In two-fluid simulations of flow boiling, the modeling of the mean bubble diameter is a key parameter in the closure relations governing the intefacial transfer of mass, momentum, and energy. Monodispersed approach proved to be insufficient to describe the significant variation in bubble size during flow boiling in a heated pipe. A population balance model (PBM) has been employed to address these shortcomings. During nucleate boiling, vapor bubbles of a certain size are formed on the heated wall, detach and migrate into the bulk flow. These bubbles then grow, shrink or disintegrate by evaporation, condensation, breakage and aggregation. In this study, a parametric analysis of the PBM aggregation and breakage models has been performed to investigate their effect on the radial distribution of the mean bubble diameter and vapor volume fraction. The simulation results are compared with the DEBORA experiments (Garnier et al., 2001). In addition, the influence of PBM parameters on the local distribution of individual bubble size groups was also studied. The results have shown that the modeling of aggregation process has the largest influence on the results and is mainly dictated by the collisions due to flow turbulence.

공랭식 미소유로 응축기의 R410A 충전량 예측에 관한 수치적 연구 (A Numerical Study on R410A Charge Amount in an Air Cooled Mini-Channel Condenser)

  • 박창용
    • 설비공학논문집
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    • 제22권10호
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    • pp.710-718
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    • 2010
  • A numerical study was performed to predict refrigerant charge amount in a mini-channel condenser for a R410A residential air-conditioning system. Multi-channel flat tubes with 12 mini-channels of 1.17 mm average hydraulic diameter for each tube were applied to the condenser. The condenser consisted of 3 passes, and the first, second, and third pass had 44, 19, and 11 tubes, respectively. Each pass was connected by a vertical header. In this study, the condenser was divided into 410 finite volumes, and analyzed by an $\varepsilon$-NTU method. With thermophysical properties and void fraction models for each volume element, the R410A amount distribution and a total charge amount in the condenser were calculated. The predicted total charge amount was compared with the experimentally measured charge amount under a standard ARI A condition. The developed model could predict the charge amount in the mini-channel condenser within prediction errors from -23.9% to -3.0%. Air velocity distribution at the condenser face was considered as non-uniform and uniform by the simulation model, and its results showed that the air velocity distribution could significantly influence the charge amount and vapor phase distribution in the condenser.

이산화탄소와 α-Tetralol과의 2성분계 고압상평형 측정 (High Pressure Binary Phase Equilibria Measurements of α-Tetralol with Carbon Dioxide)

  • 변헌수;김춘호;황영기;곽철
    • 공업화학
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    • 제7권1호
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    • pp.67-74
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    • 1996
  • 313.2K, 343.2K 그리고 373.2K 온도와 압력 6.0MPa에서 35.0MPa 범위까지 이산화탄소와 방향족 탄화수소인 1,2,3,4-tetrahydro -1-naphthol($={\alpha}$-tetralol)과의 상평형 실험을 각 온도에서 압력을 변화시키면서 수행하였다. 상평형 장치는 기상과 액상을 동시에 순환시키는 순환형이 사용되었으며, 실험분석은 미량시료채취법으로 시료를 채취하여 분석하였다. 이산화탄소와 ${\alpha}$-tetralol계의 실험은 기상과 액상에서의 상평형데이터 및 혼합물 밀도의 측정이 실험조건별로 이루어졌다. 실험결과 일정압력에서 이산화탄소의 용해도는 액상에서 온도가 증가함에 따라 감소하였고, 기상에서 ${\alpha}$-tetralol의 용해도는 온도가 증가할수록 증가하였다. 혼합물 밀도는 압력이 증가할수록 기상, 액상 모두 혼합물 임계밀도쪽으로 접근해 감을 알 수 있었다. 또한 열역학적 해석을 위하여 3차 상태방정식인 Peng-Robinson식을 이용하여 이산화탄소 -${\alpha}$-tetralol계의 실험치를 상호 연관시켜 이론치를 계산하여 실험치와 비교한 결과 AAD가 K(1)의 경우 1.08%~8.98%이고 K(2)의 경우는 45.71%~72.34% 이었다.

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바이오매스 가스화 과정에서의 온도와 가습의 변화가 전환가스 조성에 미치는 영향 (The effect on the components variation of syngas by changing temperature and steam addition in biomass gasification process)

  • 안성율;최경민;김덕줄
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2007년도 춘계학술대회B
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    • pp.3429-3434
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    • 2007
  • An experimental study was carried out to investigate gasification process of wood sawdust in the I-dimensional downdraft fixed bed gasifier. The preheated air was used oxidizer and steam were used as a gasifying agent. The operating parameters, the supplied air temperature and steam were used. The oxidizer temperature was varied from 500K to 620K and vapor was added. The gasification process was monitored by measuring temperature at three position near the biomass using R-type thermocouples and the syngas composition was analyzed by gas chromatograph. The change of hydrogen and carbon monoxide, carbon dioxide, methane was observed. Overall, the volume fraction of hydrogen and methane were increased widely as increasing the oxidizer temperature and adding steam.

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Real-time Spectroscopic Ellipsometry studies of the Effect of Preparation Parameters on the Coalescence Characteristics of Microwave-PECVD Diamond Films

  • Hong, Byungyou
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1998년도 PROCEEDINGS OF THE 14TH KACG TECHNICAL MEETING AND THE 5TH KOREA-JAPAN EMGS (ELECTRONIC MATERIALS GROWTH SYMPOSIUM)
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    • pp.49-54
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    • 1998
  • The growth of diamond films in plasma enhanced chemical vapor deposition(PECVD) processes requires high substrate temperatures and gas pressures, as well as high-power excitation of the gas source. Thus determining the substrate temperature in this severe environment is a challenge. The issue is a critical one since substrate temperature is a key parameter for understanding and optimizing diamond film growth. The precise Si substrate temperature calibration based on rapid-scanning spectroscopic ellipsometry have been developed and utilized. Using the true temperature of the top 200 ${\AA}$ of the Si substrate under diamond growth conditions, real time spectroellipsometry (RTSE) has been performed during the nucleation and growth of nanocrystallind thin films prepared by PECVD. RTSE shows that a significant volume fraction of nondiamond(or{{{{ {sp }^{2 } -bonded}}}}) carbon forms during thin film coalescence and is trapped near the substrate interface between ∼300 ${\AA}$ diamond nuclei.

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CURRENT STATUS OF THERMAL/HYDRAULIC FEASIBILITY PROJECT FOR REDUCED- MODERATION WATER REACTOR (2) - DEVELOPMENT OF TWO-PHASE FLOW SIMULATION CODE WITH ADVANCED INTERFACE TRACKING METHOD

  • Yoshida, Hiroyuki;Tamai, Hidesada;Ohnuki, Akira;Takase, Kazuyuki;Akimoto, Hajime
    • Nuclear Engineering and Technology
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    • 제38권2호
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    • pp.119-128
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    • 2006
  • We start to develop a predictable technology for thermal-hydraulic performance of the RMWR core using an advanced numerical simulation technology. As a part of this technology development, we are developing the advanced interface tracking method to improve the conservation of volume of fluid. The present paper describes a part of the development of the twophase flow simulation code TPFIT with the advanced interface tracking method. The numerical results applied to large-scale water-vapor two-phase flow in tight lattice rod bundles are shown and compared with experimental results. In the results of numerical simulation, a tendency of the predicted void fraction distribution in horizontal plane agreed with the measured values obtained by the advanced neutron radiography technique including the bridge formation of the liquid at the position of adjacent fuel rods where an interval is the narrowest.

수소 가스 분율(H2/H2+SiH4)에 따른 비정질 실리콘 박막의 표면 및 구조 분석 (Surface and Structural Features of a-Si Thin Films Prepared by Various H2/H2+SiH4 Dilution)

  • 권진업
    • 한국표면공학회지
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    • 제44권2호
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    • pp.39-43
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    • 2011
  • Amorphous silicon thin film was deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD). Each films were prepared in different dilution in the chamber gas. As a result, silicon crystallites and crystal volume fraction was increased with raising the hydrogen dilution in the gas and optical band gap was decreased. Increasement of the hydrogen contents in the chamber affected on surface roughness. In this study, thickness and surface roughness of the a-Si thin film by different hydrogen dilution was investigated by various techniques.

Residual stress on nanocrystalline silicon thin films deposited with substrate biasing at low temperature

  • Lee, Hyoung-Cheol;Kim, In-Kyo;Yeom, Geun-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1568-1570
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    • 2009
  • Nanocrystalline silicon thin films were deposited using an internal-type inductively coupled plasma-chemical vapor deposition at room temperature by varying the bias power to the substrate and the structural characteristics of the deposited thin film were investigated. The result showed that the crystalline volume fraction was decreased with the increase of bias power. At the low bias power range of 0~60 W, the compress stress in the deposited thin film was in the range of -34 ~ -77 Mpa which is generally lower than the residual stress observed for the nanocrystalline silicon thin films deposited by capacitively coupled plasma.

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