1 |
R. I. EuiJae, J. Kor. Inst. Surf. Eng., 42 (2009) 208.
DOI
|
2 |
V. Varrun Kova et al., Vacuum, 84 (2010) 123.
|
3 |
T. Q. Trung et al., Journal of Physics: Conference Series, (2009) 187.
|
4 |
L. T. Canham, J. Appl. Phys., 82 (1997) 909.
DOI
|
5 |
A. G. Cullis, L. T. Canham et al., J. Appl. Phys.,82 (1997) 909.
DOI
|
6 |
B. Drevillon, M. Toulemonde, J. Appl. Phys., 58(1985) 535.
DOI
|
7 |
C. Surynarayna, X-Ray Diffraction - A Practical Approach, Plenum Press, New York and London,(1998) 153.
|
8 |
J. H. Shim et al., Thin Solid Films, 503 (2006) 55.
DOI
|
9 |
J. I. Pankove, Optical Process in Semiconductor,Dover, New York (1975).
|
10 |
M. Ruckshloss, O. Ambacher, S. Veprek, J. Lumin.,57 (1993) 1.
DOI
|
11 |
A. V. Shah, Prog. Photovolt: Res. Appl., 12 (2004)113.
DOI
|
12 |
A. Matsuda et al., Appl. Phys. Lett., 47 (1985) 1061.
DOI
|