• 제목/요약/키워드: Vapor deposition polymerization (VDP)

검색결과 27건 처리시간 0.026초

고분자막을 점착층으로 사용한 유기 박막 트랜지스터의 안정성 (Stability of Organic Thin-Film Transistors Fabricated by Inserting a Polymeric Film)

  • 형건우;표상우;김준호;김영관
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.61-62
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    • 2006
  • In this paper, it was demonstrated that organic thin- film transistors (OTFTs) were fabricated with the organic adhesion layer between an organic semiconductor and a gate insulator by vapor deposition polymerization (VDP) processing. In order to form polymeric film as an adhesion layer, VDP process was also introduced instead of spin-coating process, where polymeric film was co-deposited by high-vacuum thermal evaporation from 6FDA and ODA followed by curing. The saturated slop in the saturation region and the subthreshold nonlinearity in the triode region were c1early observed in the electrical output characteristics in our organic thin film transistors using the staggered-inverted top-contact structure. Field effect mobility, threshold voltage, and on-off current ratio in 15-nm-thick organic adhesion layer were about $0.5\;cm^2/Vs$, -1 V, and $10^6$, respectively. We also demonstrated that threshold voltage depends strongly on the delay time when a gate voltage has been applied to bias stress.

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진공증착중합법에 의해 제조된 폴리이미드박막의 절연파괴특성 (A study on the electric breakdown of polyimide thin film fabricated by vapor deposition polymerization)

  • 이붕주;김형권;김종석;한상옥;박강식;김영봉;이덕출
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1997년도 춘계학술대회 논문집
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    • pp.293-296
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    • 1997
  • The experimental system used for vapor deposition polymerization (VDP) from PMDA (Pyromellitic dianhydride) and DDE (4, 4-diaminodiphenyl ether) were changed to PI (polyimide) thin films by thermal curing. The curing temperatures were 20$0^{\circ}C$, 25$0^{\circ}C$, 30$0^{\circ}C$, 35$0^{\circ}C$. When test number was 40, the electric breakdown strengths of PI were 1.21MV/cm, 3.94MV/cm, 4.61MV/cm, 4.55MV/cm according to curing temperatures.

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Electrical Characteristics of Bottom-Contact Organic Thin-Film-Transistors Inserting Adhesion Layer Fabricated by Vapor Deposition Polymerization and Ti Adhesion Metal Layer

  • Park, Il-Houng;Hyung, Gun-Woo;Choi, Hak-Bum;Kim, Young-Kwan
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.958-961
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    • 2007
  • The electrical characteristics of organic thin-filmtransistor (OTFTs) can be improved by inserting adhesion layer on gate dielectrics. Adhesion layer was used as polymeric adhesion layer deposited on inorganic gate insulators such as silicon dioxide $(SiO_2)$ and it was formed by vapor deposition polymerization (VDP) instead of spin-coating process. The OTFTs obtained the on/off ratio $of{\sim}10^4$, threshold voltage of 1.8V, subthreshold slop of 2.9 V/decade and field effect mobility about $0.01\;cm^2/Vs$.

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게이트 절연막에 사용된 점착층에 대한 영향 (Effect of Adhesion Layer on Gate Insulator)

  • 이동현;형건우;표상우;김영관
    • 한국전기전자재료학회논문지
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    • 제19권4호
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    • pp.357-361
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    • 2006
  • The electrical performances of organic thin-film transistors (OTFTs) have been improved for the last decade. In this paper, it was demonstrated that the electrical characteristics of the organic thin film transistors (OTFTs) were improved by using polymeric material as adhesion layer on gate insulator. We have investigated OTFTs with polyimide adhesion layer which was fabricated by vapor deposition polymerization (VDP) processing and formed by co-deposition of 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride and 4,4'-oxydianiline. It was found that the OTFTs with adhesion layer showed better electrical characteristics than with bare layer because of good matching between semiconductor and gate insulator. Our devices of performance are field effect mobility of $0.4cm^2/Vs$, threshold voltage of -0.8 V and on-off current ratio of $10^6$. In addition, to improve the electrical characteristics of OTFT, we have reduced the thickness of adhesion layer up to a few nanometrs.

OTFT의 게이트 절연막에 사용된 점착층에 대한 영향 (The Effect of Adhesion layer on Gate Insulator for OTFTs)

  • 이동현;형건우;표상우;김정수;김영관
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.70-71
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    • 2005
  • The electrical performances of organic thin-film transistors (OTFTs) have been improved for the last decade. In this paper, it was demonstrated that the electrical characteristics of the organic thin film transistors (OTFTs) were improved by using polymeric material as adhesion layer on gate insulator. We have investigated OTFTs with polyimide adhesion layer which was fabricated by vapor deposition polymerization (VDP) processing and formed by co-deposition of 6FDA and ODA. It was found that the OTFTs with adhesion layer showed better electrical characteristics than with bare layer because of good matching between semiconductor and gate insulator. Our devices of performance are field effect mobility of $0.4cm^2$/Vs, threshold voltage of -0.8 V and on-of current ratio of $10^6$. In addition, to improve the electrical characteristics of OTFT, we have reduced the thickness of adhesion layer up to a few nanometrs.

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Electrical Effects of the Adhesion Layer Using the VDP Process on Dielectric

  • Lee, Dong-Hyun;Pyo, Sang-Woo;Hyung, Gun Woo;Kim, Young-Kwan
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.1313-1316
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    • 2005
  • In the present paper, it was investigated that adhesion layer on gate insulator could affect the electrical characteristics for the organic thin film transistors (OTFTs). The polyimide (PI) as organic adhesion layer was fabricated by using the vapor deposition polymerization (VDP) processing . It was found that electrical characteristics improved comparing OTFTs using adhesion layer to another. We researched adhesion layer as a function of thickness. For inverted-staggered top contact structure, field effect mobility, threshold voltage, and on-off current ratio of OTFTs using adhesion layer of PI 15 nm thickness on the gate insulator with a thickness of 0.2 ${\mu}m$ were about 0.5 $cm^2/Vs$, -0.8 V, and $10^6$, respectively.

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진공증착중합법을 이용한 6FDA/4-4'DDE 폴리이미드 박막의 제조와 전기적 특성 (Electrical Properties and Preparation of 6FDA/4-4'DDE Polyimide Thin films by Bapor Deposition Polymerization method)

  • 이붕주;김형권;이덕출
    • 한국진공학회지
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    • 제7권3호
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    • pp.229-236
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    • 1998
  • 본 논문에서는 건식중합법에 속하는 진공증착 중합법을 이용하여 내열 절연성 박막 을 제작하고 열경화 온도에 따른 박막의 물성과 전기적 특성에 대해 연구하였다. hexafluoroisopropyliden-2,2-bis[phthalicanhydride](6FDA)와 4,4'-diamino diphenyl ether (DDE) 단량체를 화학량론적으로 최적의 온도인 $214^{\circ}C$, $137^{\circ}C$부분에서 같은 증발율을 보일 때 폴리이미드를 형성하였다. 진공증착 중합된 박막은 열경화에 의해 이미드특성 피이크가 증가되며, 폴리아믹산의 형태에서 폴리이미드 형태로 축중합되어짐을 알 수 있었다. 열경화 온도가 증가함에 따라 박막의 두께는 감소되고 굴절율은 증가된다. 열경화 온도가 $300^{\circ}C$인 경우 최적임을 알았고, 이 온도에서 열경화 시킨 폴리이미드의 전기적 특성에서 100Hz~ 200kHz주파수에서는 3.7의 비유전율을 나타내었고, 유전정접은 0.008의 낮은 값을 보였다. 또한, 30~에서 약1.05$\times$1015$\Omega$cm의 저항율을 보였다.

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폴리이미드 패시베이션과 폴리비닐알콜 패시베이션 레이어 성막이 고성능 유기박막 트렌지스터에 주는 영향 (Effects of Polyimide Passivation Layers and polyvinylalcohol Passivation Layers for Organic Thin-Film Transistors(OTFTs))

  • 박일흥;형건우;최학범;황선욱;김영관
    • 한국진공학회지
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    • 제17권3호
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    • pp.195-198
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    • 2008
  • 이 논문에서 무기 게이트 인슐레이터 위에 Polyimide 유기 점착층을 성형하여, 고성능의 유기 박막 트렌지스터(OTFT)소자를 제작한 후 450 nm 두께로 폴리이미드를 Vapor deposition polymerization (VDP)방법을 사용하여 패시베이션하였다. 이때 폴리이미드성막을 위해, 스핀코팅 방법 대신 VDP 방법 도입하였다. 이 폴리이미드 고분자막은 2,2 bis(3,4-dicarboxyphenyl) hexafluoropropane dianhydride (6FDA)와 4,4‘-oxydianiline(ODA)을 고진공에서 동시에 열증착 시킨 후, $170^{\circ}C$에서 2시간 열처리하여 고분자화 된 막을 형성하였다. 다른 종류의 유기 패시베이션 막이 소자에 주는 영향을 비교 분석하기 위해, 450 nm 두께로 스핀코팅법을 이용하여 폴리비닐알콜 패시베이션 막을 형성하였다. 이 두 가지 패시베이션 막 형성법이 소자의 문턱전압과, 전하이동도에 주는 영향을 전기적 특성을 통해 변화를 확실히 볼 수 있었다. 최초 유기 박막 트렌지스터의 전기적 특성은 문턱전압, 점멸비, 그리고 정공의 이동도는 각각, -3 V, 약 $10^6$ 그리고, $0.24cm^2$/Vs 이 측정되었고. 폴리이미드를 사용하여 패시베이션 후 특성이 각각 0 V, 약 $10^6$ 그리고, $0.26cm^2/Vs$, 폴리비닐알콜 패시베이션 경우는 특성이 각각, 문턱전압의 경우 0 V에서 +2 V로, 점멸비는 $10^6$에서 $10^5$으로 전계효과이동도는 $0.13cm^2/Vs$ 에서 $0.13cm^2/Vs$로 변화하였다.

진공 증착 중합법에 의해 제작된 폴리이미드박막의 유전특성 (The capacitance characteristics of polyimide thin films by VDP Method)

  • 김형권;김종석;김두석;박복기;김득연;이덕출
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 하계학술대회 논문집 C
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    • pp.1171-1173
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    • 1995
  • Polyimide thin films were fabricated through the vapor deposition polymerization method, and the structure and capacitance characteristics of them were investigated in detail. It was found that the chemical structure and uniformity of the film could be stabilized with curing. The peaks of $720cm^{-l},\;1380cm^{-1}\;and\;1780cm^{-1}$ show C=O stretch mode, C-N stretch mode and carbonyl stretch mode, and those of polyimide which cured over $300^{\circ}C$ were fixed. It was found that capacitance was changed in proportion to temperature.

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삼차원적으로 배향한 Poly($\alpha, \alpha, \alpha′, \alpha′$-tetrafluoro-p-xylylene) 필름의 구조 연구 (A Three-Dimensionally Oriented Texture for Poly($\alpha, \alpha, \alpha′, \alpha′$-tetrafluoro-p-xylylene))

  • Park, Soo-Young;S. Chvalun;John Blackwell
    • 한국섬유공학회:학술대회논문집
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    • 한국섬유공학회 2002년도 봄 학술발표회 논문집
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    • pp.5-8
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    • 2002
  • Poly(p-xylylene) (PPX) is most easily prepared by a vapor deposition polymerization (VDP) of [2, 2]paracychophane, as described by Gorham.$^1$ Poly(tetrafluoro-p-xylylene) (F-PPX) is of interest in view of its potential applications as an interlayer dielectric material in high-speed integrated circuits, since it has an extremely low dielectric constant (〈2.35).$^2$ (omitted)

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